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1. 发明授权

US07226869B2 Methods for protecting silicon or silicon carbide electrode surfaces from morphological modification during plasma etch processing 有权
标题翻译：在等离子体蚀刻处理期间保护硅或碳化硅电极表面免受形态修饰的方法
公开(公告)号：US07226869B2
公开(公告)日：2007-06-05
申请号：US10975946
申请日：2004-10-29
申请人： Kenji Takeshita , Tsuyoshi Aso , Seiji Kawaguchi , Thomas McClard , Wan-Lin Chen , Enrico Magni , Michael Kelly , Michelle Lupan , Robert Hefty
发明人： Kenji Takeshita , Tsuyoshi Aso , Seiji Kawaguchi , Thomas McClard , Wan-Lin Chen , Enrico Magni , Michael Kelly , Michelle Lupan , Robert Hefty
IPC分类号： H01L21/302
CPC分类号： B08B7/0035 , B05D1/62 , H01J37/32559 , H01L21/31116
摘要： Methods for forming a protective polymeric coating on a silicon or silicon-carbide electrode of a plasma processing chamber are provided. The polymeric coating provides protection to the underlying surface of the electrode with respect to exposure to constituents of plasma and gaseous reactants. The methods can be performed during a process of cleaning the chamber, or during a process for etching a semiconductor substrate in the chamber.
摘要翻译：提供了在等离子体处理室的硅或碳化硅电极上形成保护性聚合物涂层的方法。相对于暴露于等离子体和气态反应物的组分，聚合物涂层为电极的下表面提供保护。可以在清洁室的过程中或在用于蚀刻室中的半导体衬底的工艺期间执行这些方法。

2. 发明申请

US20060091104A1 Methods for protecting silicon or silicon carbide electrode surfaces from morphological modification during plasma etch processing 有权
标题翻译：在等离子体蚀刻处理期间保护硅或碳化硅电极表面免受形态修饰的方法
公开(公告)号：US20060091104A1
公开(公告)日：2006-05-04
申请号：US10975946
申请日：2004-10-29
申请人： Kenji Takeshita , Tsuyoshi Aso , Seiji Kawaguchi , Thomas McClard , Wan-Lin Chen , Enrico Magni , Michael Kelly , Michelle Lupan , Robert Hefty
发明人： Kenji Takeshita , Tsuyoshi Aso , Seiji Kawaguchi , Thomas McClard , Wan-Lin Chen , Enrico Magni , Michael Kelly , Michelle Lupan , Robert Hefty
IPC分类号： B44C1/22 , H01L21/311 , B08B6/00
CPC分类号： B08B7/0035 , B05D1/62 , H01J37/32559 , H01L21/31116
摘要： Methods for forming a protective polymeric coating on a silicon or silicon-carbide electrode of a plasma processing chamber are provided. The polymeric coating provides protection to the underlying surface of the electrode with respect to exposure to constituents of plasma and gaseous reactants. The methods can be performed during a process of cleaning the chamber, or during a process for etching a semiconductor substrate in the chamber.
摘要翻译：提供了在等离子体处理室的硅或碳化硅电极上形成保护性聚合物涂层的方法。相对于暴露于等离子体和气态反应物的组分，聚合物涂层为电极的下表面提供保护。可以在清洁室的过程中或在用于蚀刻室中的半导体衬底的工艺期间执行这些方法。

3. 发明授权

US07090782B1 Etch with uniformity control 有权
标题翻译：蚀刻均匀性控制
公开(公告)号：US07090782B1
公开(公告)日：2006-08-15
申请号：US10934324
申请日：2004-09-03
申请人： Seiji Kawaguchi , Kenji Takeshita
发明人： Seiji Kawaguchi , Kenji Takeshita
IPC分类号： B44C1/22
CPC分类号： H01L21/0271 , H01L21/0332 , H01L21/0334 , H01L21/0337 , H01L21/31116 , H01L21/31144
摘要： A method of forming semiconductor devices on a wafer is provided. An etch layer is formed over a wafer. A photoresist mask is formed over the etch layer. The photoresist mask is removed only around an outer edge of the wafer to expose the etch layer around the outer edge of the wafer. A deposition gas is provided comprising carbon and hydrogen containing species. A plasma is formed from the deposition gas. A polymer layer is deposited on the exposed etch layer around the outer edge of the wafer, wherein the polymer is formed from the plasma from the deposition gas. The etch layer is etched through the photoresist mask, while consuming the photoresist mask and the polymer deposited on the exposed etch layer around the outer edge of the wafer.
摘要翻译：提供了一种在晶片上形成半导体器件的方法。在晶片上形成蚀刻层。在蚀刻层上形成光致抗蚀剂掩模。仅在晶片的外边缘周围除去光致抗蚀剂掩模，以暴露围绕晶片的外边缘的蚀刻层。提供包含碳和氢的物质的沉积气体。从沉积气体形成等离子体。聚合物层沉积在围绕晶片的外边缘的暴露的蚀刻层上，其中聚合物由来自沉积气体的等离子体形成。通过光致抗蚀剂掩模蚀刻蚀刻层，同时消耗光刻胶掩模和沉积在围绕晶片的外边缘的暴露的蚀刻层上的聚合物。

4. 发明申请

US20120276747A1 PREVENTION OF LINE BENDING AND TILTING FOR ETCH WITH TRI-LAYER MASK 有权
标题翻译：使用三层面罩防止线弯曲和倾斜
公开(公告)号：US20120276747A1
公开(公告)日：2012-11-01
申请号：US13096697
申请日：2011-04-28
申请人： Youn-Jin Oh , Kenji Takeshita , Hitoshi Takahashi
发明人： Youn-Jin Oh , Kenji Takeshita , Hitoshi Takahashi
IPC分类号： H01L21/3065 , H01L21/308
CPC分类号： H01L21/31144 , H01L21/31116 , H01L21/31138
摘要： A method for etching features in an etch layer is provided. An organic mask layer is etched, using a hard mask as an etch mask. The hard mask is removed, by selectively etching the hard mask with respect to the organic mask and etch layer. Features are etched in the etch layer, using the organic mask as an etch mask.
摘要翻译：提供了一种用于蚀刻蚀刻层中的特征的方法。使用硬掩模作为蚀刻掩模蚀刻有机掩模层。通过相对于有机掩模和蚀刻层选择性地蚀刻硬掩模，去除硬掩模。在蚀刻层中蚀刻特征，使用有机掩模作为蚀刻掩模。

5. 发明申请

US20110097904A1 METHOD FOR REPAIRING LOW-K DIELECTRIC DAMAGE 审中-公开
标题翻译：修复低K电介质损伤的方法
公开(公告)号：US20110097904A1
公开(公告)日：2011-04-28
申请号：US12604224
申请日：2009-10-22
申请人： Stephen M. Sirard , Kenji Takeshita , Andrew D. Bailey, III
发明人： Stephen M. Sirard , Kenji Takeshita , Andrew D. Bailey, III
IPC分类号： H01L21/3065
CPC分类号： H01L21/3105 , H01L21/76814 , H01L21/76826
摘要： A method for repairing damage to a silicon based low-k dielectric layer with organic compounds, where damage replaces a methyl attached to silicon with a hydroxyl attached to silicon is provided. A repair gas comprising CH4 gas is provided. The repair gas is formed into a plasma, while maintaining a pressure below 50 mTorr. Hydroxyl attached to silicon is replaced with methyl from the plasma formed by the repair gas.
摘要翻译：提供了用有机化合物修复对基于硅的低k电介质层的损伤的方法，其中损伤用连接到硅上的羟基连接到硅上的甲基替代。提供了包含CH 4气体的修复气体。将修复气体形成为等离子体，同时保持低于50mTorr的压力。与由修复气体形成的等离子体中的被甲基取代的羟基被甲基取代。

6. 发明申请

US20090161702A1 Optically pumped disk-type solid state laser oscillator and optically pumped disk-type solid state laser system 有权
标题翻译：光泵浦式固态激光振荡器和光泵式盘式固态激光系统
公开(公告)号：US20090161702A1
公开(公告)日：2009-06-25
申请号：US12003178
申请日：2007-12-20
申请人： Kenji Takeshita , Shinya Ishii
发明人： Kenji Takeshita , Shinya Ishii
IPC分类号： H01S5/30
CPC分类号： H01S3/09415 , H01S3/042 , H01S3/0604 , H01S3/0621 , H01S3/0627 , H01S3/0915 , H01S3/094038
摘要： An optically pumped disk type solid state laser oscillator includes: a cylindrical shape thin film laser gain medium having a through-hole; a ring mirror whose surface is opposing to a side surface of the thin film laser gain medium; a conical mirror arranged in the through-hole and reflects a light from the ring mirror to a direction perpendicular to the thin film laser gain medium where an output mirror is arranged. The ring mirror, the conical mirror and the output mirror compose a resonator for oscillating a laser beam to be outputted from the output mirror.
摘要翻译：光泵式固态激光振荡器包括：具有通孔的圆柱形薄膜激光增益介质; 表面与薄膜激光增益介质的侧表面相对的环形镜; 布置在所述通孔中的圆锥镜，并将来自所述环形镜的光反射到与设置有输出镜的所述薄膜激光增益介质垂直的方向。环形镜，锥形镜和输出镜组成用于振荡从输出镜输出的激光束的谐振器。

7. 发明授权

US07534363B2 Method for providing uniform removal of organic material 有权
标题翻译：提供均匀去除有机材料的方法
公开(公告)号：US07534363B2
公开(公告)日：2009-05-19
申请号：US10877222
申请日：2004-06-25
申请人： Rao V. Annapragada , Odette Turmel , Kenji Takeshita , Lily Zheng , Thomas S. Choi , David R. Pirkle
发明人： Rao V. Annapragada , Odette Turmel , Kenji Takeshita , Lily Zheng , Thomas S. Choi , David R. Pirkle
IPC分类号： C23F1/00
CPC分类号： H01J37/3244 , G03F7/427 , H01J37/32082 , H01L21/31116 , H01L21/31138
摘要： A method for removing organic material over a substrate is provided. The substrate is placed in a plasma processing chamber. A first gas is provided to an inner zone within the plasma processing chamber. A second gas is provided to an outer zone of the plasma processing chamber, wherein the outer zone surrounds the inner zone and the second gas has a carbon containing component, wherein a concentration of the carbon containing component of the second gas is greater than a concentration of the carbon containing component in the first gas. Plasmas are simultaneously generated from the first gas and second gas. Some or all of the organic material is removed using the generated plasmas.
摘要翻译：提供了一种在衬底上除去有机材料的方法。将基板放置在等离子体处理室中。第一气体被提供到等离子体处理室内的内部区域。第二气体被提供到等离子体处理室的外部区域，其中外部区域围绕内部区域，第二气体具有含碳成分，其中第二气体的含碳成分的浓度大于浓度的第一气体中的含碳组分。从第一气体和第二气体同时产生等离子体。使用所产生的等离子体去除部分或全部有机材料。

8. 发明申请

US20070120944A1 Laser scanning optical apparatus 有权
标题翻译：激光扫描光学仪器
公开(公告)号：US20070120944A1
公开(公告)日：2007-05-31
申请号：US11519769
申请日：2006-09-13
申请人： Kenji Takeshita , Atsushi Ohata , Hajime Taniguchi
发明人： Kenji Takeshita , Atsushi Ohata , Hajime Taniguchi
IPC分类号： B41J2/435
CPC分类号： B41J2/473 , G02B26/123
摘要： A laser scanning optical apparatus wherein a plural number of beams are deflected by one polygon mirror and are scanned on respective corresponding photosensitive drums via a scanning optical system. The scanning optical system has a first scanning lens which transmits all the beams, exclusive second scanning lenses which transmit exclusively the respective beams and plane mirrors for reflecting the beams. The second scanning lenses are located such that at least one of the second scanning lenses is at a distance from the corresponding photosensitive drum on which the beam transmitted by the at least one of the second scanning lenses is scanned and that another second scanning lens is at another distance from the corresponding photosensitive drum on which the beams transmitted by the another second scanning lens is scanned. For example, at least one of the exclusive optical elements is at a distance from the corresponding photosensitive drum, and the other exclusive optical elements are at another distance from the respective corresponding photosensitive drums. Alternatively, the exclusive optical elements are at mutually different distances from the respective corresponding photosensitive drums.
摘要翻译：一种激光扫描光学装置，其中多个光束被一个多面镜偏转并且经由扫描光学系统在相应的对应的感光鼓上进行扫描。扫描光学系统具有透射所有光束的第一扫描透镜，专门发送各个光束的专用第二扫描透镜和用于反射光束的平面镜。第二扫描透镜被定位成使得至少一个第二扫描透镜距离相应的感光鼓一个距离，在该感光鼓上扫描由至少一个第二扫描透镜发射的光束，并且另一个第二扫描透镜处于距离相应的感光鼓的另一个距离，其上扫描由另一个第二扫描透镜传输的光束。例如，至少一个专用光学元件距离对应的感光鼓有一定距离，而其他专用光学元件距离各个相应的感光鼓相距一定距离。或者，专用光学元件与相应的相应的感光鼓相距不同的距离。

9. 发明申请

US20050154354A1 Cartridge syringe, cartridge and ophthalmologic syringe set having such syringe 审中-公开
标题翻译：筒式注射器，药筒和具有这种注射器的眼科注射器
公开(公告)号：US20050154354A1
公开(公告)日：2005-07-14
申请号：US10498985
申请日：2002-12-26
申请人： Yoshihiko Kawasaki , Yoichi Shimoda , Yoshihiro Shishido , Takahiro Endo , Naoki Kondo , Kenji Takeshita
发明人： Yoshihiko Kawasaki , Yoichi Shimoda , Yoshihiro Shishido , Takahiro Endo , Naoki Kondo , Kenji Takeshita
IPC分类号： A61M5/178 , A61M5/24 , A61M5/31 , A61M5/00
CPC分类号： A61M5/24 , A61M5/1782 , A61M5/1785 , A61M2005/2407 , A61M2005/2488 , A61M2005/2496 , A61M2005/3139
摘要： An object of the present invention to provide a cartridge syringe and an ophthalmologic syringe set equipped with the cartridge syringe, where the cartridge syringe can be used repeatedly by only exchanging the cartridge containing an ophthalmologic therapeutic agent, and to reduce the amount of waste products and ensure storage space for the ophthalmologic therapeutic agents. The cartridge syringe 1 of the present invention comprises a syringe body 3 having a cartridge housing portion 11, a needle holding member 5 that is disposed in a connectable manner to the tip of the syringe body 3, and a plunger 7 that is slidably disposed on a base-end side of the syringe body 3, the plunger 7 having a pusher 37 at the tip thereof, wherein a one-touch loading mechanism is provided in the syringe body 3 or at a coupling portion between the syringe body 3 and the plunger 7, the one-touch loading mechanism allowing the position of the plunger 7 to be temporarily changed such that the cartridge 9 can be loaded into the syringe body 3.
摘要翻译：本发明的目的是提供一种盒式注射器和配备有药筒注射器的眼科注射器组，其中可以通过仅更换含有眼科治疗剂的药筒来反复使用药筒注射器，并且减少废物的量和确保眼科治疗剂的储存空间。本发明的药筒注射器1包括具有药筒容纳部分11的注射器主体3，以与注射器主体3的前端可连接的方式设置的针保持部件5和可滑动地设置在注射器主体3上的柱塞7 注射器主体3的基端侧，柱塞7的顶端具有推动器37，其中在注射器主体3中或者在注射器主体3和柱塞之间的联接部分设置有单触式装载机构如图7所示，能够暂时改变柱塞7的位置的单触式装载机构，使得筒9能够被装载到注射器主体3内。

10. 发明申请

US20050006346A1 Method for providing uniform removal of organic material 有权
标题翻译：提供均匀去除有机材料的方法
公开(公告)号：US20050006346A1
公开(公告)日：2005-01-13
申请号：US10877222
申请日：2004-06-25
申请人： Rao Annapragada , Odette Turmel , Kenji Takeshita , Lily Zheng , Thomas Choi , David Pirkle
发明人： Rao Annapragada , Odette Turmel , Kenji Takeshita , Lily Zheng , Thomas Choi , David Pirkle
IPC分类号： C23F1/00 , H01J37/32 , H01L21/306 , H01L21/311
CPC分类号： H01J37/3244 , G03F7/427 , H01J37/32082 , H01L21/31116 , H01L21/31138
摘要： A method for removing organic material over a substrate is provided. The substrate is placed in a plasma processing chamber. A first gas is provided to an inner zone within the plasma processing chamber. A second gas is provided to an outer zone of the plasma processing chamber, wherein the outer zone surrounds the inner zone and the second gas has a carbon containing component, wherein a concentration of the carbon containing component of the second gas is greater than a concentration of the carbon containing component in the first gas. Plasmas are simultaneously generated from the first gas and second gas. Some or all of the organic material is removed using the generated plasmas.
摘要翻译：提供了一种在衬底上除去有机材料的方法。将基板放置在等离子体处理室中。第一气体被提供到等离子体处理室内的内部区域。第二气体被提供到等离子体处理室的外部区域，其中外部区域围绕内部区域，第二气体具有含碳成分，其中第二气体的含碳成分的浓度大于浓度的第一气体中的含碳组分。从第一气体和第二气体同时产生等离子体。使用所产生的等离子体去除部分或全部有机材料。

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