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    • 1. 发明授权
    • Semiconductor memory device
    • 半导体存储器件
    • US5280441A
    • 1994-01-18
    • US725782
    • 1991-07-09
    • Tomohisa WadaKenji AnamiShuji Murakami
    • Tomohisa WadaKenji AnamiShuji Murakami
    • G11C11/417G11C7/18G11C11/401G11C11/407G11C11/409G11C11/41H01L27/108G11C5/06
    • H01L27/10817G11C7/18
    • A plurality of bit line signal IO lines L1, /L1, . . . Ln and /Ln are arranged on a memory cell array. These bit line signal IO lines are arranged to cross respective bit lines BL1, /BL1, . . . BLn and /BLn, and are connected to the corresponding bit lines, respectively. Each bit line signal IO line has an end extended to an end, in a direction perpendicular to the bit line, of a memory cell array, and is coupled at the end to a bit line peripheral circuit. Although bit line peripheral circuits could be arranged only at upper and lower ends of the bit lines in the prior art, the bit line peripheral circuits can be arranged also at the ends of the bit line signal IO lines in the invention. This can increase a degree of freedom in a layout for the bit line peripheral circuits, and thus the bit line peripheral circuits can be dispersedly arranged in a larger area.
    • 多个位线信号IO线L1,/ L1,...。 。 。 Ln和/ Ln布置在存储单元阵列上。 这些位线信号IO线被布置成与相应的位线BL1,/ BL1交叉。 。 。 BLn和/ BLn,分别连接到相应的位线。 每个位线信号IO线具有延伸到存储单元阵列的垂直于位线的方向的一端的端部,并且在端部耦合到位线外围电路。 尽管现有技术中位线外围电路只能位于位线的上端和下端,但位线外围电路也可以布置在本发明的位线信号IO线的端部。 这可以增加位线外围电路的布局的自由度,并且因此位线外围电路可以分散地布置在更大的区域中。
    • 5. 发明授权
    • Semiconductor memory device having hierarchical row selecting lines
    • 具有分级行选择线的半导体存储器件
    • US5193074A
    • 1993-03-09
    • US646910
    • 1991-01-28
    • Kenji Anami
    • Kenji Anami
    • G11C11/41G11C8/14G11C11/401G11C11/407
    • G11C8/14
    • A memory cell array of this semiconductor memory device includes a plurality of memory cells each having one transistor and one capacitor and is divided into a plurality of large memory cell groups, and each of the large memory cell groups is further divided into a plurality of small memory cell groups. A plurality of main row-selecting lines, a plurality of sub row-selecting lines and a plurality of word lines are provided in the memory cell array, each of the large memory cell groups and each of the small memory cell groups, respectively. Main global decoders select one of the main row-selecting lines in response to an internal address signal. Sub global decoders select a sub row-selecting line associated with the selected main row-selecting line in the large memory cell group selected by a large memory cell group selecting signal. Local decoders select a word line associated with the selected sub row-selecting line in the small memory cell group selected by a small memory cell group selecting signal.
    • 该半导体存储器件的存储单元阵列包括多个存储单元,每个存储单元具有一个晶体管和一个电容器,并被分成多个大存储单元组,并且每个大存储单元组进一步分为多个小 记忆单元组。 多个主行选择线,多个子行选择线和多个字线分别设置在存储单元阵列中,每个大存储单元组和每个小存储单元组。 主要全局解码器响应内部地址信号选择主行选择行之一。 子全局解码器选择与由大存储器单元组选择信号选择的大存储单元组中的所选主行选择线相关联的子行选择线。 本地解码器选择与由小存储单元组选择信号选择的小存储单元组中的所选子行选择线相关联的字线。
    • 7. 发明授权
    • Semiconductor device having internal circuit other than initial input
stage circuit
    • 具有除初始输入级电路以外的内部电路的半导体器件
    • US5744838A
    • 1998-04-28
    • US455243
    • 1995-05-31
    • Ryuichi MatsuoKenji Anami
    • Ryuichi MatsuoKenji Anami
    • H01L27/04H01L21/822H01L21/8234H01L27/02H01L27/08H01L27/088H01L29/78H01L23/62
    • H01L27/0255
    • Obtained is a semiconductor device which can effectively prevent a gate oxide film from deterioration or breaking caused by plasma charged particles which are accumulated in a wiring layer in plasma etching thereof, even if an antenna ratio is increased. In this semiconductor device, an impurity diffusion layer forming a resistor and a diode is interposed between a gate electrode layer of a field-effect transistor of an internal circuit other than an initial input stage circuit and a first wiring layer for transmitting a circuit signal to the gate electrode layer. Thus, plasma charged particles which are accumulated in the first wiring layer in plasma etching thereof are absorbed by the impurity diffusion layer, whereby no surge voltage is applied to the gate electrode layer which is connected with the first wiring layer. Thus, the gate oxide film which is positioned under the gate electrode layer is prevented from breaking or deterioration.
    • 所获得的是即使天线比率增加,也可以有效地防止栅极氧化膜由于等离子体蚀刻而被积聚在布线层中的等离子体带电粒子导致的劣化或破坏的半导体器件。 在该半导体装置中,在初始输入级电路以外的内部电路的场效应晶体管的栅电极层和用于将电路信号发送到第一布线层之间插入形成电阻器和二极管的杂质扩散层 栅电极层。 因此,在等离子体蚀刻中积聚在第一布线层中的等离子体带电粒子被杂质扩散层吸收,由此没有浪涌电压施加到与第一布线层连接的栅极电极层。 因此,防止位于栅电极层下方的栅极氧化膜破裂或劣化。