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1. 发明授权

US08089162B2 Semiconductor device and method for manufacturing the same 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US08089162B2
公开(公告)日：2012-01-03
申请号：US12538410
申请日：2009-08-10
申请人： Kenichi Watanabe , Masanobu Ikeda , Takahiro Kimura
发明人： Kenichi Watanabe , Masanobu Ikeda , Takahiro Kimura
IPC分类号： H01L23/52 , H01L23/48 , H01L29/40
CPC分类号： H01L24/05 , H01L23/53238 , H01L23/53295 , H01L24/03 , H01L24/45 , H01L2224/0401 , H01L2224/04042 , H01L2224/05093 , H01L2224/05096 , H01L2224/05546 , H01L2224/05647 , H01L2224/45124 , H01L2224/48747 , H01L2924/01013 , H01L2924/01014 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/0105 , H01L2924/01073 , H01L2924/01074 , H01L2924/01078 , H01L2924/04953 , H01L2924/05042 , H01L2924/13091 , H01L2924/30105 , H01L2924/00014 , H01L2924/00
摘要： In a pad forming region electrically connecting an element forming region to the outside, in which a low dielectric constant insulating film is formed in association with in the element forming region, a Cu film serving as a via formed in the low dielectric constant insulating film in the pad forming region is disposed in higher density than that of a Cu film serving as a via in the element forming region. Hereby, when an internal stress occurs, the stress is prevented from disproportionately concentrating on the via, and deterioration of a function of a wiring caused thereby can be avoided.
摘要翻译：在与元件形成区域相关联地形成有低介电常数绝缘膜的元件形成区域与外部电连接的焊盘形成区域中，形成在低介电常数绝缘膜中的通孔的Cu膜焊盘形成区域以比元件形成区域中的通孔用的Cu膜的密度高的方式设置。因此，当发生内部应力时，防止应力不成比例地集中在通孔上，并且可以避免由此引起的布线的功能的劣化。

2. 发明申请

US20100130004A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US20100130004A1
公开(公告)日：2010-05-27
申请号：US12642143
申请日：2009-12-18
申请人： Kenichi Watanabe , Masanobu Ikeda , Takahiro Kimura
发明人： Kenichi Watanabe , Masanobu Ikeda , Takahiro Kimura
IPC分类号： H01L21/768 , G06F17/50
CPC分类号： H01L24/05 , H01L23/53238 , H01L23/53295 , H01L24/03 , H01L24/45 , H01L2224/0401 , H01L2224/04042 , H01L2224/05093 , H01L2224/05096 , H01L2224/05546 , H01L2224/05647 , H01L2224/45124 , H01L2224/48747 , H01L2924/01013 , H01L2924/01014 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/0105 , H01L2924/01073 , H01L2924/01074 , H01L2924/01078 , H01L2924/04953 , H01L2924/05042 , H01L2924/13091 , H01L2924/30105 , H01L2924/00014 , H01L2924/00
摘要： In a pad forming region electrically connecting an element forming region to the outside, in which a low dielectric constant insulating film is formed in association with in the element forming region, a Cu film serving as a via formed in the low dielectric constant insulating film in the pad forming region is disposed in higher density than that of a Cu film serving as a via in the element forming region. Hereby, when an internal stress occurs, the stress is prevented from disproportionately concentrating on the via, and deterioration of a function of a wiring caused thereby can be avoided.
摘要翻译：在与元件形成区域相关联地形成有低介电常数绝缘膜的元件形成区域与外部电连接的焊盘形成区域中，形成在低介电常数绝缘膜中的通孔的Cu膜焊盘形成区域以比元件形成区域中的通孔用的Cu膜的密度高的方式设置。因此，当发生内部应力时，防止应力不成比例地集中在通孔上，并且可以避免由此引起的布线的功能的劣化。

3. 发明授权

US08034703B2 Semiconductor device and method for manufacturing the same 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US08034703B2
公开(公告)日：2011-10-11
申请号：US12642143
申请日：2009-12-18
申请人： Kenichi Watanabe , Masanobu Ikeda , Takahiro Kimura
发明人： Kenichi Watanabe , Masanobu Ikeda , Takahiro Kimura
IPC分类号： H01L21/44
CPC分类号： H01L24/05 , H01L23/53238 , H01L23/53295 , H01L24/03 , H01L24/45 , H01L2224/0401 , H01L2224/04042 , H01L2224/05093 , H01L2224/05096 , H01L2224/05546 , H01L2224/05647 , H01L2224/45124 , H01L2224/48747 , H01L2924/01013 , H01L2924/01014 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/0105 , H01L2924/01073 , H01L2924/01074 , H01L2924/01078 , H01L2924/04953 , H01L2924/05042 , H01L2924/13091 , H01L2924/30105 , H01L2924/00014 , H01L2924/00
摘要： In a pad forming region electrically connecting an element forming region to the outside, in which a low dielectric constant insulating film is formed in association with in the element forming region, a Cu film serving as a via formed in the low dielectric constant insulating film in the pad forming region is disposed in higher density than that of a Cu film serving as a via in the element forming region. Hereby, when an internal stress occurs, the stress is prevented from disproportionately concentrating on the via, and deterioration of a function of a wiring caused thereby can be avoided.
摘要翻译：在与元件形成区域相关联地形成有低介电常数绝缘膜的元件形成区域与外部电连接的焊盘形成区域中，形成在低介电常数绝缘膜中的通孔的Cu膜焊盘形成区域以比元件形成区域中的通孔用的Cu膜的密度高的方式设置。因此，当发生内部应力时，防止应力不成比例地集中在通孔上，并且可以避免由此引起的布线的功能的劣化。

4. 发明授权

US07692315B2 Semiconductor device and method for manufacturing the same 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US07692315B2
公开(公告)日：2010-04-06
申请号：US11055652
申请日：2005-02-11
申请人： Kenichi Watanabe , Masanobu Ikeda , Takahiro Kimura
发明人： Kenichi Watanabe , Masanobu Ikeda , Takahiro Kimura
IPC分类号： H01L23/52 , H01L23/48 , H01L29/40
CPC分类号： H01L24/05 , H01L23/53238 , H01L23/53295 , H01L24/03 , H01L24/45 , H01L2224/0401 , H01L2224/04042 , H01L2224/05093 , H01L2224/05096 , H01L2224/05546 , H01L2224/05647 , H01L2224/45124 , H01L2224/48747 , H01L2924/01013 , H01L2924/01014 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/0105 , H01L2924/01073 , H01L2924/01074 , H01L2924/01078 , H01L2924/04953 , H01L2924/05042 , H01L2924/13091 , H01L2924/30105 , H01L2924/00014 , H01L2924/00
摘要： In a pad forming region electrically connecting an element forming region to the outside, in which a low dielectric constant insulating film is formed in association with in the element forming region, a Cu film serving as a via formed in the low dielectric constant insulating film in the pad forming region is disposed in higher density than that of a Cu film serving as a via in the element forming region. Hereby, when an internal stress occurs, the stress is prevented from disproportionately concentrating on the via, and deterioration of a function of a wiring caused thereby can be avoided.
摘要翻译：在与元件形成区域相关联地形成有低介电常数绝缘膜的元件形成区域与外部电连接的焊盘形成区域中，形成在低介电常数绝缘膜中的通孔的Cu膜焊盘形成区域以比元件形成区域中的通孔用的Cu膜的密度高的方式设置。因此，当发生内部应力时，防止应力不成比例地集中在通孔上，并且可以避免由此引起的布线的功能的劣化。

5. 发明申请

US20050146041A1 Semiconductor device and method for manufacturing the same 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US20050146041A1
公开(公告)日：2005-07-07
申请号：US11055652
申请日：2005-02-11
申请人： Kenichi Watanabe , Masanobu Ikeda , Takahiro Kimura
发明人： Kenichi Watanabe , Masanobu Ikeda , Takahiro Kimura
IPC分类号： H01L23/485 , H01L23/532 , H01L31/119
CPC分类号： H01L24/05 , H01L23/53238 , H01L23/53295 , H01L24/03 , H01L24/45 , H01L2224/0401 , H01L2224/04042 , H01L2224/05093 , H01L2224/05096 , H01L2224/05546 , H01L2224/05647 , H01L2224/45124 , H01L2224/48747 , H01L2924/01013 , H01L2924/01014 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/0105 , H01L2924/01073 , H01L2924/01074 , H01L2924/01078 , H01L2924/04953 , H01L2924/05042 , H01L2924/13091 , H01L2924/30105 , H01L2924/00014 , H01L2924/00
摘要： In a pad forming region electrically connecting an element forming region to the outside, in which a low dielectric constant insulating film is formed in association with in the element forming region, a Cu film serving as a via formed in the low dielectric constant insulating film in the pad forming region is disposed in higher density than that of a Cu film serving as a via in the element forming region. Hereby, when an internal stress occurs, the stress is prevented from disproportionately concentrating on the via, and deterioration of a function of a wiring caused thereby can be avoided.
摘要翻译：在与元件形成区域相关联地形成有低介电常数绝缘膜的元件形成区域与外部电连接的焊盘形成区域中，形成在低介电常数绝缘膜中的通孔的Cu膜焊盘形成区域以比元件形成区域中的通孔用的Cu膜的密度高的方式设置。因此，当发生内部应力时，防止应力不成比例地集中在通孔上，并且可以避免由此引起的布线的功能的劣化。

6. 发明授权

US09564782B2 Winding, winding method, and automotive rotating electric machine 有权
标题翻译：绕线，绕线方式和汽车旋转电机
公开(公告)号：US09564782B2
公开(公告)日：2017-02-07
申请号：US14116927
申请日：2011-09-01
申请人： Takahiro Kimura , Kazunori Tanaka
发明人： Takahiro Kimura , Kazunori Tanaka
IPC分类号： H02K11/00 , H02K21/12 , H02K3/28 , H02K3/12 , H02K3/18 , H02K3/52
CPC分类号： H02K3/28 , H02K3/12 , H02K3/18 , H02K3/522 , H02K3/528
摘要： [Problem] A winding is provided which is so arranged that disengagement of a winding conductor is not caused after a winding around being finished.[Constitution] A winding according to the present invention includes a first descending conductor portion (2818c) being bent from an end-portion (2818a) of a winding conductor placed at a top portion of an elevated winding portion (28m) toward an outer lateral side in an axial direction of a winding (15), and descending along a side face of the elevated winding portion (28m), from the top portion thereof to a predetermined winding layer (2816) among a plurality of winding layers constituting the elevated winding portion (28m); a first connection conductor portion (2816a) bent from the first descending conductor portion (2818c) toward an inner lateral side in the axial direction of the winding (15), and disposed along the side face of the elevated winding portion (28m) in a direction to which a winding conductor constituting the winding (15) extends; and a second descending conductor portion (2816c) being bent from the first connection conductor portion (2816a) toward the outer lateral side in the axial direction of the winding (15), and descending along the side face of the elevated winding portion (28m), from the predetermined winding layer (2816) to another predetermined winding layer (2814).
摘要翻译： [结构]根据本发明的绕组包括从设置在升高的卷绕部分（28m）的顶部处的卷绕导体的端部（2818a）向外侧弯曲的第一下降导体部分（2818c）（15）的轴向侧，并且沿着升高的卷绕部（28m）的侧面从构成升高的绕组的多个绕组中的顶部到预定的绕组层（2816）下降部分（28m）; 第一连接导体部（2816a），其从所述第一下降导体部（2818c）朝向所述绕线（15）的轴向的内侧侧弯曲，并且沿着所述高架绕组部（28m）的侧面构成绕组（15）的绕组导体延伸的方向; 以及从所述第一连接导体部（2816a）向所述绕组（15）的轴向的外侧侧弯曲的第二下行导体部（2816c），并且沿着所述高架绕组部（28m）的侧面下降，从预定的绕组层（2816）到另一个预定绕组层（2814）。

7. 发明授权

US09021907B2 Range sensing apparatus 有权
标题翻译：范围感测装置
公开(公告)号：US09021907B2
公开(公告)日：2015-05-05
申请号：US13171821
申请日：2011-06-29
申请人： Akira Takagi , Mikio Kanefusa , Shigeki Hirakawa , Takahiro Kimura , Akihiro Mitani , Shotaro Nagai , Keiichiro Sueshige , Takenori Kawano
发明人： Akira Takagi , Mikio Kanefusa , Shigeki Hirakawa , Takahiro Kimura , Akihiro Mitani , Shotaro Nagai , Keiichiro Sueshige , Takenori Kawano
IPC分类号： B60K20/00 , F16H59/70 , G01D5/249 , G01D11/24 , F16H59/10
CPC分类号： F16H59/70 , F16H59/105 , G01D5/2497 , G01D11/24 , Y10T74/19251 , Y10T74/20018
摘要： A housing slidably guides a slider, which is driven in response to selection of a shift range of an automatic transmission. Upper and lateral sides of a movable range of the slider are covered with the housing. Thereby, application of hydraulic fluid and foreign objects to guide rails is limited to limit malfunction of the slider. Furthermore, even when the hydraulic fluid and foreign objects adhere to the guide rails, the hydraulic fluid and foreign objects can be collected at ends of the movable range of the slider and can be expelled to an outside of the housing through open ends of the housing.
摘要翻译：壳体可滑动地引导滑块，该滑块响应于自动变速器的换档范围的选择而被驱动。滑块的可移动范围的上侧和外侧被壳体覆盖。因此，将液压油和异物施加到导轨受到限制，以限制滑块的故障。此外，即使当液压流体和异物粘附到导轨上时，液压流体和异物可以在滑块的可移动范围的端部收集，并且可以通过壳体的开口端被排出到壳体的外部。

8. 发明申请

US20120325191A1 SCAVENGING PASSAGE STRUCTURE FOR TWO-STROKE ENGINE 有权
标题翻译：两冲程发动机的爬升通道结构
公开(公告)号：US20120325191A1
公开(公告)日：2012-12-27
申请号：US13581896
申请日：2011-03-23
申请人： Kazuyuki Uenoyama , Takahiro Kimura
发明人： Kazuyuki Uenoyama , Takahiro Kimura
IPC分类号： F02B33/04
CPC分类号： F02F1/004 , F02B25/14 , F02B2075/025 , F02F1/002 , F02F1/22 , F02F7/0004 , F02F7/0036
摘要： A scavenging passage structure for a two-stroke engine, having a scavenging passage communicating a scavenging port provided in a cylinder with a crank chamber formed inside a crankcase, the scavenging passage being formed to extend through respective fastening surfaces of the cylinder and the crankcase. The scavenging passage includes a cover member attached inside the crankcase to be in contact with an inner wall surface of the crankcase, and a groove formed in at least one of the inner wall surface of the crankcase contacting the cover member, and the cover member contacting the inner wall surface of the crankcase, the groove forming part of the scavenging passage connecting to the crank chamber and to an upper face of the crankcase.
摘要翻译：一种用于二冲程发动机的扫气通道结构，具有将设置在气缸中的扫气口与形成在曲轴箱内的曲柄室连通的扫气通道，所述扫气通道形成为延伸穿过气缸和曲轴箱的相应紧固表面。清扫通道包括附接在曲轴箱内部以与曲轴箱的内壁表面接触的盖构件，以及形成在与盖构件接触的曲轴箱的内壁表面中的至少一个中的凹槽，盖构件接触曲轴箱的内壁表面，形成与曲轴室连接的扫气通道的一部分的槽和曲轴箱的上表面。

9. 发明申请

US20110240499A1 GLASS ROLL AND METHOD FOR MANUFACTURING THE SAME 审中-公开
标题翻译：玻璃滚筒及其制造方法
公开(公告)号：US20110240499A1
公开(公告)日：2011-10-06
申请号：US13073258
申请日：2011-03-28
申请人： Katsuhiro TANIGUCHI , Takahiro Kimura , Hiromichi Umemura
发明人： Katsuhiro TANIGUCHI , Takahiro Kimura , Hiromichi Umemura
IPC分类号： B65D85/04 , B32B1/08
CPC分类号： C03C3/091 , B32B17/064 , B65H2301/414324 , B65H2801/61 , C03C3/093 , G02F1/133305 , Y10T428/131
摘要： Provided is a glass roll (15) manufactured by winding a glass film (10) having a thickness of 0.5 to 300 μm and a density of less than 2.45 g/cm3 in a roll shape with a view to suppressing the damage of a glass film at an inner layer portion of a glass roll when the glass roll is manufactured by winding a long glass film having a thickness of 0.5 to 300 μm.
摘要翻译：本发明提供一种玻璃辊（15），其通过以辊状缠绕厚度为0.5〜300μm，密度小于2.45g / cm 3的玻璃膜（10），以抑制玻璃膜的损伤当玻璃辊通过卷绕厚度为0.5至300μm的长玻璃膜制造时，在玻璃辊的内层部分。

10. 发明申请

US20100118194A1 VIDEO DISPLAY DEVICE 有权
标题翻译：视频显示设备
公开(公告)号：US20100118194A1
公开(公告)日：2010-05-13
申请号：US12439056
申请日：2008-07-03
申请人： Takahiro Kimura
发明人： Takahiro Kimura
IPC分类号： H04N5/46 , H04N5/66
CPC分类号： H04N21/44227 , H04N21/4135 , H04N21/43615
摘要： According to one embodiment, a video display device has a connection unit configured to connect to a plurality of external instruments via a network, a receiving unit configured to receive, from the plurality of external instrument connected to the video display device via the connection unit, standard compatibility information indicating that the external instrument meets the mutual controllability standards, a display unit configured to display video information output by one of the plurality of external instruments and a selection unit configured to select one of the plurality of external instruments, corresponded to information based on the standard compatibility information, connected to the connection unit as an output source of video information to be displayed on the display unit.
摘要翻译：根据一个实施例，视频显示设备具有经由网络连接到多个外部设备的连接单元，被配置为经由连接单元从连接到视频显示设备的多个外部设备接收的接收单元，指示外部仪器满足相互可控性标准的标准兼容性信息;显示单元，被配置为显示由所述多个外部仪器中的一个输出的视频信息;以及选择单元，被配置为选择所述多个外部仪器中的一个对应于基于信息在标准兼容性信息上，连接到连接单元作为显示在显示单元上的视频信息的输出源。

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