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1. 发明授权

US07232595B2 Device comprising low outgassing photo or electron beam cured rubbery polymer material 有权
标题翻译：装置包括低放气光或电子束固化橡胶状聚合物材料
公开(公告)号：US07232595B2
公开(公告)日：2007-06-19
申请号：US11002775
申请日：2004-12-01
申请人： Kelsee L. Coykendall , Paul G. Dewa , Robert Sabia , David Sauer , Paul J. Shustack , Kamal K. Soni
发明人： Kelsee L. Coykendall , Paul G. Dewa , Robert Sabia , David Sauer , Paul J. Shustack , Kamal K. Soni
IPC分类号： C08F2/50 , B29D11/00 , G02B1/10
CPC分类号： C08L15/00 , C08C19/02 , C08F255/00 , C08F255/02 , C08F279/02 , C08F290/06 , C08K3/013 , C08K5/0025 , C08L2666/02 , C09J4/06 , C09J123/02 , Y10T428/1059 , Y10T428/1082 , Y10T428/28 , Y10T428/2809 , Y10T428/2852 , Y10T428/287 , Y10T428/2878 , Y10T428/2883 , Y10T428/2891 , Y10T428/31855 , Y10T428/31938
摘要： Disclosed are photo or electron beam curable polymerizable compositions, and preparation thereof and devices containing such cured material. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools and other optical devices involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 248 nm, 193 nm and 157 nm lithographic tools, as well as other optical devices involving using high fluence irradiation.
摘要翻译：公开了光或可电子束固化的可聚合组合物及其制备方法和包含这种固化材料的装置。该组合物含有完全或基本上完全氢化的烃基材料，其完全自由或基本上不含含有光或电子束可固化末端或侧基的碳 - 碳双键和三键，低脱气光引发剂，任选的粘度调节组分和任选的填料。组合物是可见光，UV或电子束可固化。它固化成低模量，低脱气聚合物材料。该组合物可用作粘合剂，密封剂或透镜灌封材料。它非常适用于涉及深度或真空紫外辐射的光刻工具和其他光学器件，特别是用于248 nm，193 nm和157 nm光刻工具的透镜灌封材料，以及涉及使用高能量照射的其他光学器件。

2. 发明授权

US07256221B2 Low outgassing photo or electron beam curable rubbery polymer material, preparation thereof and device comprising same 有权
标题翻译：低脱气光或电子束固化橡胶状聚合物材料，其制备方法和包含该材料的装置
公开(公告)号：US07256221B2
公开(公告)日：2007-08-14
申请号：US10703800
申请日：2003-11-07
申请人： Kelsee L. Coykendall , Paul G. Dewa , Robert Sabia , David C. Sauer , Paul J. Shustack , Kamal K. Soni
发明人： Kelsee L. Coykendall , Paul G. Dewa , Robert Sabia , David C. Sauer , Paul J. Shustack , Kamal K. Soni
IPC分类号： C08J3/28 , G03C1/72 , G03F7/028 , C08F36/04 , C08F110/02 , C08F110/04
CPC分类号： C08J3/28 , C08C19/02 , C08F255/02 , C08F279/02 , C08F290/048 , C08K3/013 , C08K5/0025 , C08L83/04 , C08L15/00
摘要： Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.
摘要翻译：公开了光或电子束可聚合组合物及其制备方法和含有它们的装置。该组合物含有完全或基本上完全氢化的烃基材料，其完全自由或基本上不含含有光或电子束可固化末端或侧基的碳 - 碳双键和三键，低脱气光引发剂，任选的粘度调节组分和任选的填料。组合物是可见光，UV或电子束可固化。它固化成低模量，低脱气聚合物材料。该组合物可用作粘合剂，密封剂或透镜灌封材料。它适用于涉及深度或真空紫外线辐射的光刻工具，特别是157 nm平版印刷工具的透镜灌封材料。

3. 发明申请

US20100188723A1 OPTICAL MODULATOR WITH BEAM-POINTING CORRECTION 审中-公开
标题翻译：具有光束校正的光学调制器
公开(公告)号：US20100188723A1
公开(公告)日：2010-07-29
申请号：US12602037
申请日：2008-05-29
申请人： Joshua Monroe Cobb , Paul G. Dewa , Justin Kreuzer
发明人： Joshua Monroe Cobb , Paul G. Dewa , Justin Kreuzer
IPC分类号： G02F1/01 , G02B26/08
CPC分类号： G03F7/70041
摘要： An apparatus for providing a modulated pulsed radiation beam (20) has a radiation source (16) for providing a pulsed radiation beam (10) at a constant pulse repetition frequency and a number of beam intensity modulators (18a-18e). A beam-deflecting element (12) in the path of the pulsed radiation beam and rotatable about an axis redirects the pulsed radiation beam cyclically towards each of the plurality of beam intensity modulators in turn. A beam-recombining element rotatable about the axis in synchronization with the beam-deflecting element combines modulated light, from each of the beam intensity modulators in order to form the modulated pulsed radiation beam at the constant pulse repetition frequency. At least one beam-pointing correction apparatus optically conjugates the beam-deflecting element and the beam recombining element at least one rotational position about the axis.
摘要翻译：用于提供调制的脉冲辐射束（20）的装置具有用于以恒定的脉冲重复频率和多个束强度调制器（18a-18e）提供脉冲辐射束（10）的辐射源（16）。脉冲辐射束的路径中的光束偏转元件（12）可以绕轴线转动，依次将脉冲辐射束周期性地引向多个光束强度调制器中的每一个。可以与光束偏转元件同步地围绕轴旋转的光束重组元件组合来自每个光束强度调制器的调制光，以便以恒定脉冲重复频率形成调制的脉冲辐射束。至少一个光束指向校正装置将光束偏转元件和光束复合元件以围绕轴线的至少一个旋转位置光学地共轭。

4. 发明申请

US20090052480A1 Laser pulse conditioning 失效
公开(公告)号：US20090052480A1
公开(公告)日：2009-02-26
申请号：US11895225
申请日：2007-08-23
申请人： Joshua Monroe Cobb , Paul G. Dewa
发明人： Joshua Monroe Cobb , Paul G. Dewa
IPC分类号： H01S3/10
CPC分类号： G03F7/70583 , G02F1/01 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/0057 , H01S3/0085
摘要： A light pulse conditioning apparatus has at least first and second curved reflective surfaces that share a common focus and a light-redirecting element disposed between the first and second curved reflective surfaces to redirect at least a portion of an incident light beam toward the second curved reflective surface as a delayed beam portion. A beam-shifting compensating element is disposed between the first curved reflective surface and the light-redirecting element and in the path of the delayed beam portion, for shifting the optical path of the delayed beam portion as it returns toward the light-redirecting element.

5. 发明授权

US5923425A Grazing incidence interferometry for measuring transparent plane-parallel plates 失效
标题翻译：用于测量透明平面平行板的掠入射干涉测量
公开(公告)号：US5923425A
公开(公告)日：1999-07-13
申请号：US975145
申请日：1997-11-20
申请人： Paul G. Dewa , Andrew W. Kulawiec
发明人： Paul G. Dewa , Andrew W. Kulawiec
IPC分类号： G01B9/02 , G01B11/06 , G01B11/24 , G01B11/30 , G01M11/00 , G02B13/08
CPC分类号： G01B11/06 , G01B9/02021 , G01B9/02022 , G01B9/02028 , G01B9/02058
摘要： A grazing incidence interferometer includes an extended light source for limiting spatial coherence of reference and test beams. A test plate is oriented at a grazing incidence to the test beam so that a first portion of the test beam is reflected from the front surface of the test plate, a second portion of the test beam is reflected from the back surface of the test plate, and the two test beam portions are sheared with respect to each other. The spatial coherence of the test beam is related to the lateral shear between the first and second test beam portions to significantly reduce contrast of an interference fringe pattern between the front and back surfaces of the test plate. Also, the reference beam is realigned with just one of the two test beam portions to favor the formation of an interference pattern between the reference surface and one of the front and back surfaces of the test plate over the formation of an interference pattern between the reference surface and the other of the front and back surfaces of the test plate.
摘要翻译：掠入射干涉仪包括用于限制参考和测试光束的空间相干性的扩展光源。测试板以测试光束的掠入射取向，使得测试光束的第一部分从测试板的前表面反射，测试光束的第二部分从测试板的后表面反射并且两个测试光束部分相对于彼此剪切。测试光束的空间相干性与第一和第二测试光束部分之间的横向剪切有关，以显着降低测试板的前表面和后表面之间的干涉条纹图案的对比度。此外，参考光束仅与两个测试光束部分中的一个重新对准，以有利于在参考表面与测试板的前表面和后表面中的一个之间形成干涉图案，以形成干涉图案之间的干涉图案表面和测试板的前表面和后表面中的另一个。

6. 发明申请

US20140022414A1 HYPERSPECTRAL IMAGING SYSTEM AND METHOD FOR IMAGING A REMOTE OBJECT 有权
标题翻译：用于成像远程对象的高精度成像系统和方法
公开(公告)号：US20140022414A1
公开(公告)日：2014-01-23
申请号：US13555428
申请日：2012-07-23
申请人： Vikram Bhatia , Carl Edgar Crossland , Paul G. Dewa , Michael Lucien Genier
发明人： Vikram Bhatia , Carl Edgar Crossland , Paul G. Dewa , Michael Lucien Genier
IPC分类号： H04N5/347 , H04N5/262
CPC分类号： G01J3/021 , G01J3/0294 , G01J3/04 , G01J3/08 , G01J3/2823 , G01J3/36
摘要： A hyperspectral imaging system and method are described herein for providing a hyperspectral image of an area of a remote object (e.g., scene of interest). The hyperspectral imaging system includes at least one optic, a scannable slit mechanism, a spectrometer, a two-dimensional image sensor, and a controller. The scannable slit mechanism can be a micro-electromechanical system spatial light modulator (MEMS SLM), a diffractive Micro-Opto-Electro-Mechanical Systems (MOEMS) spatial light modulator (SLM), a digital light processing (DLP) system, a liquid crystal display, a rotating drum with at least one slit formed therein, or a rotating disk with at least one slit formed therein.
摘要翻译：本文描述了一种用于提供远程对象（例如，感兴趣的场景）的区域的高光谱图像的高光谱成像系统和方法。高光谱成像系统包括至少一个光学元件，可扫描狭缝机构，光谱仪，二维图像传感器和控制器。可扫描狭缝机构可以是微机电系统空间光调制器（MEMS SLM），衍射微光电机械系统（MOEMS）空间光调制器（SLM），数字光处理（DLP）系统，液体晶体显示器，其中形成有至少一个狭缝的旋转滚筒或其中形成有至少一个狭缝的旋转盘。

7. 发明申请

US20120114875A1 SURFACE CONTAMINATION METROLOGY 审中-公开
标题翻译：表面污染计量学
公开(公告)号：US20120114875A1
公开(公告)日：2012-05-10
申请号：US13285090
申请日：2011-10-31
申请人： Paul G. Dewa
发明人： Paul G. Dewa
IPC分类号： C08J7/18 , B05D5/06 , G01N21/64
CPC分类号： G01N21/94 , G01N21/6486 , G01N21/958
摘要： The present disclosure is directed to a method for determining the state of cleanliness of an optical component (an optic) before any coating is applied to the surface. In method is particularly applicable to optical elements and components that are intended for uses in the DUV (deep ultraviolet) and EUV (extreme ultraviolet) wavelength regions. The disclosure combines a cleaning procedure with contamination metrology utilizing a spectrometer to provide a method that will determine the state of cleanliness of the component surface by measurement of the fluorescence spectrum of the optic and comparing the measured value with a standard or reference optic of known, acceptable cleanliness. The disclosure is further directed to an optic having a selected coating thereon that is formed according to the method described herein.
摘要翻译：本公开涉及一种在将任何涂层施加到表面之前确定光学部件（光学部件）的清洁度的状态的方法。该方法特别适用于用于DUV（深紫外）和EUV（极紫外））波长区域的光学元件和组件。本公开结合了利用光谱仪的清洁程序与污染计量，以提供通过测量光学元件的荧光光谱来确定组件表面的清洁度的状态的方法，并将测量值与已知的，可接受的清洁度。本公开进一步涉及根据本文所述的方法形成的在其上具有选择的涂层的光学元件。

8. 发明授权

US06456384B1 Moiré interferometer with overlapping illumination and imaging systems 失效
标题翻译：具有重叠照明和成像系统的莫尔干涉仪
公开(公告)号：US06456384B1
公开(公告)日：2002-09-24
申请号：US09710660
申请日：2000-11-09
申请人： Andrew W. Kulawiec , Dag Lindquist , James E. Platten , Paul G. Dewa
发明人： Andrew W. Kulawiec , Dag Lindquist , James E. Platten , Paul G. Dewa
IPC分类号： G01B1114
CPC分类号： G01B11/254
摘要： A moiré interferometer has an illumination system and an imaging system that share a common focusing optic, which preferably takes the form of a concave mirror. Within the illumination system, the common focusing optic collimates light en route to a test surface. Within the imaging system, the common focusing optic telecentrically images a grating pattern appearing on the test surface onto a fringe pattern detector.
摘要翻译：莫尔干涉仪具有照明系统和成像系统，其共享共同的聚焦光学元件，其优选地采用凹面镜的形式。在照明系统内，公共聚焦光学器件将路线中的光准直到测试表面。在成像系统内，公共聚焦光学器件将出现在测试表面上的光栅图案中心地成像到条纹图案检测器上。

9. 发明申请

US20080055579A1 Optical power modulation at high frequency 有权
标题翻译：高频光功率调制
公开(公告)号：US20080055579A1
公开(公告)日：2008-03-06
申请号：US11605886
申请日：2006-11-29
申请人： Joshua Monroe Cobb , Paul G. Dewa
发明人： Joshua Monroe Cobb , Paul G. Dewa
IPC分类号： G03B27/00 , G03B27/42 , G03B27/54
CPC分类号： G03B27/42 , G03F7/70041
摘要： An apparatus for providing a pulsed radiation beam has a radiation source providing a pulsed radiation beam at a constant pulse repetition frequency. A beam deflector in the path of the pulsed radiation beam is actuable to redirect the pulsed radiation beam cyclically towards each of a plurality of beam intensity modulators in turn. A beam recombiner combines modulated light from each of the plurality of beam intensity modulators in order to form the modulated pulsed radiation beam at the constant pulse repetition frequency.
摘要翻译：用于提供脉冲辐射束的装置具有以恒定脉冲重复频率提供脉冲辐射束的辐射源。在脉冲辐射束的路径中的光束偏转器可致动以依次将脉冲辐射束循环地重定向到多个光束强度调制器中的每一个。束复合器组合来自多个束强度调制器中的每一个的调制光，以便以恒定脉冲重复频率形成调制的脉冲辐射束。

10. 发明授权

US5757470A Variable annular illuminator for photolithographic projection imager 失效
公开(公告)号：US5757470A
公开(公告)日：1998-05-26
申请号：US516521
申请日：1995-08-17
申请人： Paul G. Dewa , Paul F. Michaloski , Paul J. Tompkins , William N. Partlo
发明人： Paul G. Dewa , Paul F. Michaloski , Paul J. Tompkins , William N. Partlo
IPC分类号： G03F7/20 , G03B27/54
CPC分类号： G03F7/70108 , G03F7/70141 , G03F7/702
摘要： The illumination of a photolithographic projection imager is given a variable annular intensity profile by using diverging and counter diverging elements that are movable relative to each other in the illumination path. An upstream element diverges the illumination into an annular configuration, the radius of which is set by the distance downstream to the counter diverging element. Convex and concave conical surfaces on the movable elements can accomplish this.

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