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1. 发明申请

US20100188723A1 OPTICAL MODULATOR WITH BEAM-POINTING CORRECTION 审中-公开
标题翻译：具有光束校正的光学调制器
公开(公告)号：US20100188723A1
公开(公告)日：2010-07-29
申请号：US12602037
申请日：2008-05-29
申请人： Joshua Monroe Cobb , Paul G. Dewa , Justin Kreuzer
发明人： Joshua Monroe Cobb , Paul G. Dewa , Justin Kreuzer
IPC分类号： G02F1/01 , G02B26/08
CPC分类号： G03F7/70041
摘要： An apparatus for providing a modulated pulsed radiation beam (20) has a radiation source (16) for providing a pulsed radiation beam (10) at a constant pulse repetition frequency and a number of beam intensity modulators (18a-18e). A beam-deflecting element (12) in the path of the pulsed radiation beam and rotatable about an axis redirects the pulsed radiation beam cyclically towards each of the plurality of beam intensity modulators in turn. A beam-recombining element rotatable about the axis in synchronization with the beam-deflecting element combines modulated light, from each of the beam intensity modulators in order to form the modulated pulsed radiation beam at the constant pulse repetition frequency. At least one beam-pointing correction apparatus optically conjugates the beam-deflecting element and the beam recombining element at least one rotational position about the axis.
摘要翻译：用于提供调制的脉冲辐射束（20）的装置具有用于以恒定的脉冲重复频率和多个束强度调制器（18a-18e）提供脉冲辐射束（10）的辐射源（16）。脉冲辐射束的路径中的光束偏转元件（12）可以绕轴线转动，依次将脉冲辐射束周期性地引向多个光束强度调制器中的每一个。可以与光束偏转元件同步地围绕轴旋转的光束重组元件组合来自每个光束强度调制器的调制光，以便以恒定脉冲重复频率形成调制的脉冲辐射束。至少一个光束指向校正装置将光束偏转元件和光束复合元件以围绕轴线的至少一个旋转位置光学地共轭。

2. 发明申请

US20070201034A1 Symmetrical illumination forming system 失效
标题翻译：对称照明成型系统
公开(公告)号：US20070201034A1
公开(公告)日：2007-08-30
申请号：US11361988
申请日：2006-02-27
申请人： Justin Kreuzer
发明人： Justin Kreuzer
IPC分类号： G01B11/02
CPC分类号： G03F9/7069
摘要： A system and method are used to form alignment system illumination light beams having, for example, desirable phase and amplitude symmetry. This is produced using a symmetry forming device, located within the alignment system, having at least a compensator, an interferometer, and an analyzer.
摘要翻译：使用系统和方法来形成具有例如期望的相位和幅度对称性的对准系统照明光束。这是使用位于对准系统内的对称形成装置产生的，至少具有补偿器，干涉仪和分析器。

3. 发明申请

US20060082745A1 System and method to block unwanted light reflecting from a pattern generating portion from reaching an object 有权
标题翻译：阻止从图案生成部分反射的不想要的光到达物体的系统和方法
公开(公告)号：US20060082745A1
公开(公告)日：2006-04-20
申请号：US10965025
申请日：2004-10-15
申请人： Matthew Lipson , Christopher Mason , Justin Kreuzer
发明人： Matthew Lipson , Christopher Mason , Justin Kreuzer
IPC分类号： G03B27/42
CPC分类号： G03B27/42
摘要： A system and method comprise a pattern generating portion that is used to pattern an object via a projection system. The pattern generating portion includes active and inactive areas. The pattern generating portion has active and inactive areas. The pattern generating portion includes active and inactive areas. The pattern generating portion patterns light traveling towards the active areas and the projection system projects the patterned light onto the object. The pattern generating portion directs light traveling towards inactive areas away from the object.
摘要翻译：系统和方法包括用于经由投影系统对对象进行图案化的图案生成部。图案生成部分包括主动和非活动区域。图案生成部分具有活动和非活动区域。图案生成部分包括主动和非活动区域。图案生成部分图案向着有源区域传播的光线，并且投影系统将图案化的光投射到物体上。图案生成部分将朝着不活动区域行驶的光引导远离物体。

4. 发明申请

US20050170267A1 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 有权
标题翻译：在无掩模光刻系统中补偿印刷图案的缝合干扰的方法和系统，利用曝光区域与重叠区域中的空间图像的衰减重叠
公开(公告)号：US20050170267A1
公开(公告)日：2005-08-04
申请号：US11098561
申请日：2005-04-05
申请人： Arno Bleeker , Wenceslao Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
发明人： Arno Bleeker , Wenceslao Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
IPC分类号： G02B26/08 , G02F1/01 , G03B21/18 , G03B27/00 , G03B27/32 , G03B27/68 , G03C5/00 , G03F7/20 , G03F9/00 , G06F17/50 , H01L21/027
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
摘要翻译：提供了一种使用空间光调制器（SLM）在感光表面上印刷图案的方法和系统。示例性方法包括在感光表面上限定两个或更多个曝光区域，曝光区域沿着曝光区域的相应边缘部分重叠以在它们之间形成重叠区域。暴露两个或更多个曝光区域以在其中打印图像，曝光延伸穿过重叠区域。然后在重叠区域内的曝光被衰减。

5. 发明申请

US20050068514A1 METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A PRINTED PATTERN IN A MASKLESS LITHOGRAPHY SYSTEM UTILIZING OVERLAP OF EXPOSURE ZONES WITH ATTENUATION OF THE AERIAL IMAGE IN THE OVERLAP REGION 有权
标题翻译：补偿印刷图案在使用覆盖区域覆盖区域的覆盖区域中的打印干扰的方法和系统与覆盖区域中的空气图像的衰减
公开(公告)号：US20050068514A1
公开(公告)日：2005-03-31
申请号：US10674070
申请日：2003-09-30
申请人： Arno Bleeker , Wenceslao Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
发明人： Arno Bleeker , Wenceslao Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
IPC分类号： G02B26/08 , G02F1/01 , G03B21/18 , G03B27/00 , G03B27/32 , G03B27/68 , G03C5/00 , G03F7/20 , G03F9/00 , G06F17/50 , H01L21/027
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
摘要翻译：提供了一种使用空间光调制器（SLM）在感光表面上印刷图案的方法和系统。示例性方法包括在感光表面上限定两个或更多个曝光区域，曝光区域沿着曝光区域的相应边缘部分重叠以在它们之间形成重叠区域。暴露两个或更多个曝光区域以在其中打印图像，曝光延伸穿过重叠区域。然后在重叠区域内的曝光被衰减。

6. 发明授权

US07773199B2 Methods and systems to compensate for a stitching disturbance of a printed pattern 有权
标题翻译：用于补偿印刷图案的缝合干扰的方法和系统
公开(公告)号：US07773199B2
公开(公告)日：2010-08-10
申请号：US12000523
申请日：2007-12-13
申请人： Arno Bleeker , Wenceslao A. Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
发明人： Arno Bleeker , Wenceslao A. Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
IPC分类号： G03B27/32 , G03B27/42
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region on the surface, the second region being associated with a second element of the patterning device, activating the first element to expose the overlapping region, and deactivating the second element when the first element is active. The first region and the second region overlap in an overlapping region.
摘要翻译：提供了使用图案形成装置的方法和系统。示例性方法包括限定表面上的第一区域，第一区域与图案形成装置的第一元件相关联，限定表面上的第二区域，第二区域与图案形成装置的第二元件相关联，第一元件以暴露所述重叠区域，以及当所述第一元件处于活动状态时停用所述第二元件。第一区域和第二区域在重叠区域中重叠。

7. 发明申请

US20070146672A1 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 审中-公开
标题翻译：在无掩模光刻系统中补偿印刷图案的缝合干扰的方法和系统，利用曝光区域与重叠区域中的空间图像的衰减重叠
公开(公告)号：US20070146672A1
公开(公告)日：2007-06-28
申请号：US11593076
申请日：2006-11-06
申请人： Arno Bleeker , Wenceslao Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
发明人： Arno Bleeker , Wenceslao Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
IPC分类号： G03B27/54
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
摘要翻译：提供了一种使用空间光调制器（SLM）在感光表面上印刷图案的方法和系统。示例性方法包括在感光表面上限定两个或更多个曝光区域，曝光区域沿着曝光区域的相应边缘部分重叠以在它们之间形成重叠区域。暴露两个或更多个曝光区域以在其中打印图像，曝光延伸穿过重叠区域。然后在重叠区域内的曝光被衰减。

8. 发明申请

US20060275708A1 Lithographic printing with polarized light 有权
公开(公告)号：US20060275708A1
公开(公告)日：2006-12-07
申请号：US11503113
申请日：2006-08-14
申请人： Nabila Baba-Ali , Justin Kreuzer , Harry Sewell
发明人： Nabila Baba-Ali , Justin Kreuzer , Harry Sewell
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G02B27/28 , G03F7/2006
摘要： The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negative photoresist layer is then exposed by light in the exposure beam. A chromeless PSM can be used. In further embodiments of the present invention, radially polarized light is used to illuminate a mask and produce an exposure beam. A positive photoresist layer is then exposed by light in the exposure beam. The mask can be an attenuating PSM or binary mask. A very high image quality is obtained even when printing contact holes at various pitches in low k applications.

9. 发明授权

US07090964B2 Lithographic printing with polarized light 有权
标题翻译：带偏光的平版印刷
公开(公告)号：US07090964B2
公开(公告)日：2006-08-15
申请号：US10781803
申请日：2004-02-20
申请人： Nabila Baba-Ali , Justin Kreuzer , Harry Sewell
发明人： Nabila Baba-Ali , Justin Kreuzer , Harry Sewell
IPC分类号： G02B5/30 , G03B27/72
CPC分类号： G03F7/70566 , G02B27/28 , G03F7/2006
摘要： The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negative photoresist layer is then exposed by light in the exposure beam. A chromeless PSM can be used. In further embodiments of the present invention, radially polarized light is used to illuminate a mask and produce an exposure beam. A positive photoresist layer is then exposed by light in the exposure beam. The mask can be an attenuating PSM or binary mask. A very high image quality is obtained even when printing contact holes at various pitches in low k applications.
摘要翻译：本发明提供了利用偏振光改进平版印刷的系统和方法。在本发明的实施例中，使用偏振光（径向或切向极化）照亮相移掩模（PSM）并产生曝光光束。然后在曝光束中用光曝光负性光致抗蚀剂层。可以使用无色PSM。在本发明的另外的实施例中，使用径向偏振光照射掩模并产生曝光光束。然后，正光致抗蚀剂层在曝光束中被光曝光。掩模可以是衰减PSM或二进制掩模。即使在低k应用中以各种间距打印接触孔，也能获得非常高的图像质量。

10. 发明授权

US5757160A Moving interferometer wafer stage 失效
标题翻译：移动干涉仪晶圆台
公开(公告)号：US5757160A
公开(公告)日：1998-05-26
申请号：US785764
申请日：1996-12-23
申请人： Justin Kreuzer
发明人： Justin Kreuzer
IPC分类号： B65G1/00 , B65G43/00 , B65G49/07 , G01B9/02 , G01B11/00 , G01B21/00 , G03F7/20 , H01L21/68
CPC分类号： G03F7/70716 , G01B9/02021 , G01B9/02027 , G03F7/70775
摘要： A stage used for positioning and aligning a wafer, as used in photolithography or microlithography in semiconductor manufacturing having a plurality of interferometer laser gauges placed on a movable wafer stage associated with a pair of stationary orthogonal return mirrors. A beam of light parallel to the X axes is directed through a penta prism to an interferometer laser gauges placed on the wafer stage near the wafer plane through a plurality of beamsplitters and fold mirrors. The present invention is less sensitive to rotation or twisting of the wafer stage and eliminates or reduces certain errors introduced by the rotation. Additionally, large stable return mirrors may be used, increasing the travel distance permitted by the wafer stage while reducing weight on the wafer stage. The wafer stage can be more accurately positioned and accommodate larger wafer sizes with improved positioning and alignment accuracies.
摘要翻译：如在半导体制造中的光刻或微光刻中使用的用于定位和对准晶片的阶段，其具有放置在与一对静止正交返回镜相关联的可移动晶片台上的多个干涉仪激光计。平行于X轴的光束通过五棱镜被引导到通过多个分束镜和折叠镜放置在晶片台附近的晶片台上的干涉仪激光计。本发明对晶片台的旋转或扭转不太敏感，并且消除或减少由旋转引起的某些误差。此外，可以使用大的稳定的返回镜，从而增加晶片台允许的移动距离，同时减少晶片台上的重量。可以更精确地定位晶片台，并适应更大的晶片尺寸，改进的定位和对准精度。

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