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1. 发明授权

US07936860B2 X-ray condensing method and its device using phase restoration method 有权
标题翻译： X射线冷凝法及其装置采用相位恢复法
公开(公告)号：US07936860B2
公开(公告)日：2011-05-03
申请号：US12440121
申请日：2007-12-27
申请人： Kazuto Yamauchi , Hidekazu Mimura , Hiromi Okada
发明人： Kazuto Yamauchi , Hidekazu Mimura , Hiromi Okada
IPC分类号： G21K1/06 , G01D18/00 , G01N23/04
CPC分类号： G21K1/06 , G02B5/0891 , G02B5/10 , G21K2201/067
摘要： An X-ray condensing method and its device are provided with an X-ray mirror that has a wavefront adjustable function to finely adjust a wavefront of a reflecting X-ray, measure an X-ray intensity distribution in the vicinity of a focus, measure an X-ray intensity distribution in the vicinity of the X-ray mirror or use a known X-ray intensity distribution of an incident X-ray, calculate a complex amplitude distribution at the reflective surface by using a phase restoration method from the X-ray intensity distribution in the vicinity of the focus and the X-ray intensity distribution in the vicinity of the reflective surface, calculate a wavefront aberration of an X-ray condensing optical system from the complex amplitude distribution, and control the reflective surface of the X-ray mirror with the wavefront adjustable function so that the wavefront aberration is minimized.
摘要翻译： X射线聚焦方法及其装置设置有具有波前可调功能的X射线镜，以精细地调整反射X射线的波前，测量焦点附近的X射线强度分布，测量在X射线反射镜附近的X射线强度分布或使用已知的入射X射线的X射线强度分布，通过使用来自X射线透镜的相位恢复方法计算出反射面上的复振幅分布，在焦点附近的射线强度分布和反射面附近的X射线强度分布，从复振幅分布计算出X射线聚光光学系统的波前像差，并控制X的反射面具有波前可调功能的光镜，使波前像差最小化。

2. 发明申请

US20100002838A1 HIGH PRECISION POSTURE CONTROL METHOD OF X-RAY MIRROR 有权
标题翻译： X射线镜的高精度控制方法
公开(公告)号：US20100002838A1
公开(公告)日：2010-01-07
申请号：US12374137
申请日：2007-07-17
申请人： Kazuto Yamauchi , Hidekazu Mimura , Hiromi Okada
发明人： Kazuto Yamauchi , Hidekazu Mimura , Hiromi Okada
IPC分类号： G21K1/06
CPC分类号： G21K1/06 , G02B5/10
摘要： A high precision posture control method for sustaining the posture of an X-ray optical element constantly at 1 μrad or less. A longitudinal condensation mirror (5) and a lateral condensation mirror, each having a condensation plane band (7) consisting of an elliptical reflective surface, are arranged perpendicularly to each other to form a K-B mirror arrangement. Fresnel mirrors are respectively constituted of a pair of planar reflective surfaces (9, 10) formed in the vicinities of the incident side end and the exit side end of the condensation plane band of each condensation mirror. Interference fringe (13) by the Fresnel mirror of each condensation mirror is independently monitored at a position insusceptible to a condensation beam by the condensation plane band, and variation in interference fringe is detected electrically and its detection signal is used as a feedback signal for posture control of each condensation mirror.
摘要翻译：一种高精度姿态控制方法，用于将X射线光学元件的姿势恒定地维持在1个以下。每个具有由椭圆形反射表面组成的冷凝平面带（7）的纵向冷凝镜（5）和横向冷凝镜彼此垂直布置以形成K-B反射镜装置。菲涅耳镜分别由形成在每个冷凝镜的冷凝平面带的入射侧端部和出射侧端部附近的一对平面反射面（9,10）构成。每个冷凝镜的菲涅尔镜的干涉条纹（13）在凝结平面带不受凝结光束影响的位置独立地监测，并且电磁检测干涉条纹的变化，其检测信号用作姿势的反馈信号控制每个冷凝镜。

3. 发明申请

US20100183122A1 X-RAY CONDENSING METHOD AND ITS DEVICE USING PHASE RESTORATION METHOD 有权
标题翻译： X射线冷凝方法及其使用相位恢复方法的装置
公开(公告)号：US20100183122A1
公开(公告)日：2010-07-22
申请号：US12440121
申请日：2007-12-27
申请人： Kazuto Yamauchi , Hidekazu Mimura , Hiromi Okada
发明人： Kazuto Yamauchi , Hidekazu Mimura , Hiromi Okada
IPC分类号： G21K1/06
CPC分类号： G21K1/06 , G02B5/0891 , G02B5/10 , G21K2201/067
摘要： An X-ray condensing method and its device are provided with an X-ray mirror that has a wavefront adjustable function to finely adjust a wavefront of a reflecting X-ray, measure an X-ray intensity distribution in the vicinity of a focus, measure an X-ray intensity distribution in the vicinity of the X-ray mirror or use a known X-ray intensity distribution of an incident X-ray, calculate a complex amplitude distribution at the reflective surface by using a phase restoration method from the X-ray intensity distribution in the vicinity of the focus and the X-ray intensity distribution in the vicinity of the reflective surface, calculate a wavefront aberration of an X-ray condensing optical system from the complex amplitude distribution, and control the reflective surface of the X-ray mirror with the wavefront adjustable function so that the wavefront aberration is minimized.
摘要翻译： X射线聚焦方法及其装置设置有具有波前可调功能的X射线镜，以精细地调整反射X射线的波前，测量焦点附近的X射线强度分布，测量在X射线反射镜附近的X射线强度分布或使用已知的入射X射线的X射线强度分布，通过使用来自X射线透镜的相位恢复方法计算出反射面上的复振幅分布，在焦点附近的射线强度分布和反射面附近的X射线强度分布，从复振幅分布计算出X射线聚光光学系统的波前像差，并控制X的反射面具有波前可调功能的光镜，使波前像差最小化。

4. 发明授权

US07616324B2 Ultra precision profile measuring method 有权
标题翻译：超精密轮廓测量方法
公开(公告)号：US07616324B2
公开(公告)日：2009-11-10
申请号：US11992096
申请日：2007-02-15
申请人： Kazuto Yamauchi , Hidekazu Mimura
发明人： Kazuto Yamauchi , Hidekazu Mimura
IPC分类号： G01B11/02
CPC分类号： G01B11/2441 , G01B9/02085 , G01B2290/60 , G01M11/005
摘要： To provide a method for measuring a plane mirror or a curved surface mirror close to plane mirror for condensing hard X-rays or soft X-rays used in a radiation light facility, especially an elliptical or tubular object having a steep profile exceeding 1×10−4 rad, ultra precisely with a precision on nano order or sub-nano order. Overall profile is measured by using overall profile data obtained from a Fizeau interferometer and stitching a plurality of micromeasurement data from a Michelson microinterferometer. A curved surface measured and a reference plane are measured simultaneously by the Fizeau interferometer, a plurality of pieces of partial profile data in a region narrower than the curved surface measured are acquired simultaneously by inclining the curved surface measured and the reference plane simultaneously and sequentially with respect to a reference plane, relative angle between the pieces of partial profile data is measured as the inclination angle of the reference plane, and adjoining pieces of partial profile data are stitched by utilizing coincidence between the inclination angle and an overlapped region thus obtaining overall profile data.
摘要翻译：提供一种用于测量靠近平面镜的平面镜或曲面镜的方法，用于冷凝在辐射光设备中使用的硬X射线或软X射线，特别是具有超过1×10 -4的陡峭轮廓的椭圆形或管状物体 rad，超精密，具有纳米级或亚纳米级的精度。通过使用从Fizeau干涉仪获得的总体轮廓数据并拼接来自迈克尔逊微型干涉仪的多个测微数据来测量总体轮廓。通过Fizeau干涉仪同时测量弯曲表面和参考平面，通过将测量的曲面和参考平面同时并顺序地倾斜并测量的曲面比通过测量的曲面更窄的区域中的多个部分轮廓数据被同时获取测量部分轮廓数据之间的相对角度作为参考平面的倾斜角度，并且通过利用倾斜角度和重叠区域之间的一致来缝合相邻的部分轮廓数据片段，从而获得总体轮廓数据。

5. 发明申请

US20090135431A1 Ultra Precision Profile Measuring Method 有权
标题翻译：超精密轮廓测量方法
公开(公告)号：US20090135431A1
公开(公告)日：2009-05-28
申请号：US11992096
申请日：2007-02-15
申请人： Kazuto Yamauchi , Hidekazu Mimura
发明人： Kazuto Yamauchi , Hidekazu Mimura
IPC分类号： G01B11/24
CPC分类号： G01B11/2441 , G01B9/02085 , G01B2290/60 , G01M11/005
摘要： To provide a method for measuring a plane mirror or a curved surface mirror close to plane mirror for condensing hard X-rays or soft X-rays used in a radiation light facility, especially an elliptical or tubular object having a steep profile exceeding 1×10−4 rad, ultra precisely with a precision on nano order or sub-nano order. Overall profile is measured by using overall profile data obtained from a Fizeau interferometer and stitching a plurality of micromeasurement data from a Michelson microinterferometer. A curved surface measured and a reference plane are measured simultaneously by the Fizeau interferometer, a plurality of pieces of partial profile data in a region narrower than the curved surface measured are acquired simultaneously by inclining the curved surface measured and the reference plane simultaneously and sequentially with respect to a reference plane, relative angle between the pieces of partial profile data is measured as the inclination angle of the reference plane, and adjoining pieces of partial profile data are stitched by utilizing coincidence between the inclination angle and an overlapped region thus obtaining overall profile data.
摘要翻译：提供一种用于测量靠近平面镜的平面镜或曲面镜的方法，用于冷凝在辐射光设备中使用的硬X射线或软X射线，特别是具有超过1×10 -4的陡峭轮廓的椭圆形或管状物体 rad，超精密，具有纳米级或亚纳米级的精度。通过使用从Fizeau干涉仪获得的总体轮廓数据并拼接来自迈克尔逊微型干涉仪的多个测微数据来测量总体轮廓。通过Fizeau干涉仪同时测量弯曲表面和参考平面，通过将测量的曲面和参考平面同时并顺序地倾斜并测量的曲面比通过测量的曲面更窄的区域中的多个部分轮廓数据被同时获取测量部分轮廓数据之间的相对角度作为参考平面的倾斜角度，并且通过利用倾斜角度和重叠区域之间的一致来缝合相邻的部分轮廓数据片段，从而获得总体轮廓数据。

6. 发明授权

US08744046B2 Method and apparatus of precisely measuring intensity profile of X-ray nanobeam 有权
标题翻译：精确测量X射线纳米粒子强度分布的方法和装置
公开(公告)号：US08744046B2
公开(公告)日：2014-06-03
申请号：US13203095
申请日：2009-03-19
申请人： Kazuto Yamauchi , Hidekazu Mimura , Hiromi Okada
发明人： Kazuto Yamauchi , Hidekazu Mimura , Hiromi Okada
IPC分类号： G01N23/20
CPC分类号： G01N23/201 , G21K2201/06 , G21K2207/00
摘要： Provided are a method and an apparatus of precisely measuring the intensity profile of an x-ray nanobeam, which can measure x-rays having different wavelengths with one knife edge and can perform optimal measurements corresponding to the depth of focus of an x-ray beam and the conditions of other measurement devices, using a dark field measurement method which enables precise measurements of the profile of an x-ray beam using a knife edge and using diffracted and transmitted x-rays. The knife edge (4) is formed of a heavy metal which advances the phase of an x-ray passing therethrough and is fabricated in such a manner that the thickness may change in the longitudinal direction continuously or in a stepwise fashion. The knife edge (4) is so set that an x-ray beam may traverse the knife edge (4) at such a thickness position as to achieve a phase shift in a range wherein a transmitted x-ray and a diffracted x-ray diffracted at the end of the knife edge may reinforce each other, and a superposed x-ray of the diffracted x-ray and the transmitted x-ray is measured by an x-ray detector.
摘要翻译：提供了一种精确测量x射线nanobeam的强度分布的方法和装置，其可以用一个刀刃测量具有不同波长的x射线，并且可以执行对应于x射线束的焦深的最佳测量以及使用暗场测量方法的其他测量装置的条件，其能够使用刀刃精确测量X射线束的轮廓并使用衍射和透射的x射线。刀刃（4）由重金属形成，其使穿过其的X射线的相位前进，并且以这样的方式制造，使得厚度可以在纵向方向上连续地或以逐步的方式改变。刀刃（4）被设定为使得X射线束可以在这样的厚度位置处横穿刀刃（4），以在其中透射的x射线和衍射的X射线衍射的范围内实现相移在刀刃的端部可以彼此加强，并且通过x射线检测器测量衍射X射线和透射的X射线的叠加X射线。

7. 发明申请

US20110305317A1 METHOD AND APPARATUS OF PRECISELY MEASURING INTENSITY PROFILE OF X-RAY NANOBEAM 有权
标题翻译： X射线纳米粒子精密测量强度分布的方法与装置
公开(公告)号：US20110305317A1
公开(公告)日：2011-12-15
申请号：US13203095
申请日：2009-03-19
申请人： Kazuto Yamauchi , Hidekazu Mimura , Hiromi Okada
发明人： Kazuto Yamauchi , Hidekazu Mimura , Hiromi Okada
IPC分类号： G01N23/207
CPC分类号： G01N23/201 , G21K2201/06 , G21K2207/00
摘要： Provided are a method and an apparatus of precisely measuring the intensity profile of an x-ray nanobeam, which can measure x-rays having different wavelengths with one knife edge and can perform optimal measurements corresponding to the depth of focus of an x-ray beam and the conditions of other measurement devices, using a dark field measurement method which enables precise measurements of the profile of an x-ray beam using a knife edge and using diffracted and transmitted x-rays. The knife edge (4) is formed of a heavy metal which advances the phase of an x-ray passing therethrough and is fabricated in such a manner that the thickness may change in the longitudinal direction continuously or in a stepwise fashion. The knife edge (4) is so set that an x-ray beam may traverse the knife edge (4) at such a thickness position as to achieve a phase shift in a range wherein a transmitted x-ray and a diffracted x-ray diffracted at the end of the knife edge may reinforce each other, and a superposed x-ray of the diffracted x-ray and the transmitted x-ray is measured by an x-ray detector.
摘要翻译：提供了一种精确测量x射线nanobeam的强度分布的方法和装置，其可以用一个刀刃测量具有不同波长的x射线，并且可以执行对应于x射线束的焦深的最佳测量以及使用暗场测量方法的其他测量装置的条件，其能够使用刀刃精确测量X射线束的轮廓并使用衍射和透射的x射线。刀刃（4）由重金属形成，其使穿过其的X射线的相位前进，并且以这样的方式制造，使得厚度可以在纵向方向上连续地或以逐步的方式改变。刀刃（4）被设定为使得X射线束可以在这样的厚度位置处横穿刀刃（4），以在其中透射的x射线和衍射的X射线衍射的范围内实现相移在刀刃的端部可以彼此加强，并且通过x射线检测器测量衍射X射线和透射的X射线的叠加X射线。

8. 发明授权

US08000443B2 High precision posture control method of X-ray mirror 有权
标题翻译： X射线镜高精度姿态控制方法
公开(公告)号：US08000443B2
公开(公告)日：2011-08-16
申请号：US12374137
申请日：2007-07-17
申请人： Kazuto Yamauchi , Hidekazu Mimura , Hiromi Okada
发明人： Kazuto Yamauchi , Hidekazu Mimura , Hiromi Okada
IPC分类号： G21K1/08 , G02B5/08 , G02B7/182
CPC分类号： G21K1/06 , G02B5/10
摘要： A high precision posture control method for sustaining the posture of an X-ray optical element constantly at 1 μrad or less. A longitudinal condensation mirror and a lateral condensation mirror, each having a condensation plane band consisting of an elliptical reflective surface, are arranged perpendicularly to each other to form a K-B mirror arrangement. Fresnel mirrors are respectively constituted of a pair of planar reflective surfaces formed in the vicinities of the incident side end and the exit side end of the condensation plane band of each condensation mirror. Interference fringe by the Fresnel mirror of each condensation mirror is independently monitored at a position insusceptible to a condensation beam by the condensation plane band, and variation in interference fringe is detected electrically and its detection signal is used as a feedback signal for posture control of each condensation mirror.
摘要翻译：一种用于将X射线光学元件的姿势持续保持在1μrad以下的高精度姿势控制方法。每个具有由椭圆形反射表面组成的冷凝平面带的纵向冷凝镜和横向冷凝镜彼此垂直布置以形成K-B反射镜装置。菲涅尔镜分别由形成在每个冷凝镜的冷凝平面带的入射侧端和出射侧端附近的一对平面反射表面构成。每个冷凝镜的菲涅耳镜的干涉条纹在冷凝平面带不受凝结光束影响的位置处被独立地监测，并且电磁检测干涉条纹的变化，其检测信号用作每个冷凝镜的姿势控制的反馈信号冷凝镜。

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