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1. 发明授权

US5809838A Ball screw device with means for maintaining balance 失效
标题翻译：滚珠丝杠装置，具有保持平衡的装置
公开(公告)号：US5809838A
公开(公告)日：1998-09-22
申请号：US874345
申请日：1997-06-13
申请人： Kazuo Miyaguchi , Daisuke Kuroiwa
发明人： Kazuo Miyaguchi , Daisuke Kuroiwa
IPC分类号： F16H25/22 , F16H57/04
CPC分类号： F16H25/2214 , F16H57/0497 , Y10T74/18744
摘要： In a ball screw device which provides a screw shaft including a ball screw groove in the outer peripheral surface, a ball nut including a ball screw groove formed in the inner peripheral surface opposite to the ball screw groove of the screw shaft, a plurality of balls fitted between the ball screw grooves of the screw shaft and ball nut, and a tube type circulation path for circulating these balls, the ball screw device can reduce the moment of inertia of a rotary portion of the device so as to facilitate the use of the ball screw device of a nut rotation type. Further, the ball screw device further provides an oil supplying structure which includes a first oil supplying hole formed in the outer race of the rolling bearing and passing through the outer race from the outer peripheral surface thereof to the inner peripheral surface thereof, and a second oil supplying hole formed in the ball nut, passing through the ball nut from the outer peripheral surface thereof to the inner peripheral surface thereof and also communicating with the first oil supplying hole through an annular gap. The oil supplying structure can supply oil even while the ball screw device is in operation, and eliminate the mounting and removal of an oil supplying pipe when supplying the oil.
摘要翻译：在提供包括外周面的滚珠丝杠槽的螺杆的滚珠丝杠装置中，具有形成在与螺杆轴的滚珠丝杠槽相反的内周面的滚珠丝杠槽的滚珠螺母，多个滚珠安装在螺杆轴的滚珠丝杠槽和滚珠螺母之间，以及用于使这些滚珠循环的管式循环路径，滚珠丝杠装置可以减少装置的旋转部分的转动惯量，以便于使用螺母旋转式滚珠丝杠装置。此外，滚珠丝杠装置还提供一种供油结构，该供油结构包括形成在滚动轴承的外圈中的第一供油孔，并从其外周表面到达其内周表面，并且第二供油结构在滚珠螺母中形成的供油孔，其从外周面通过滚珠螺母到其内周面，并且还通过环状间隙与第一供油孔连通。即使在滚珠丝杠装置运行时，供油结构也可以供给油，并且在供给油时不排除供油管的安装和拆卸。

2. 发明授权

US07638002B2 Multi-tray film precursor evaporation system and thin film deposition system incorporating same 有权
标题翻译：多托盘膜前体蒸发系统和包含其的薄膜沉积系统
公开(公告)号：US07638002B2
公开(公告)日：2009-12-29
申请号：US10998420
申请日：2004-11-29
申请人： Kenji Suzuki , Emmanuel P. Guidotti , Gerrit J. Leusink , Masamichi Hara , Daisuke Kuroiwa
发明人： Kenji Suzuki , Emmanuel P. Guidotti , Gerrit J. Leusink , Masamichi Hara , Daisuke Kuroiwa
IPC分类号： C23C16/00 , B01D7/00
CPC分类号： C23C16/4481 , C23C16/16
摘要： A high conductance, multi-tray solid precursor evaporation system coupled with a high conductance vapor delivery system is described for increasing deposition rate by increasing exposed surface area of solid precursor. The multi-tray solid precursor evaporation system includes a base tray with one or more upper trays. Each tray is configured to support and retain film precursor in, for example, solid powder form or solid tablet form. Additionally, each tray is configured to provide for a high conductance flow of carrier gas over the film precursor while the film precursor is heated. For example, the carrier gas flows inward over the film precursor, and vertically upward through a flow channel within the stackable trays and through an outlet in the solid precursor evaporation system.
摘要翻译：描述了与高电导蒸气输送系统耦合的高电导多托盘固体前驱物蒸发系统，以通过增加固体前体的暴露表面积来提高沉积速率。多托盘固体前体蒸发系统包括具有一个或多个上托盘的基托。每个托盘被构造成支撑和保持例如固体粉末形式或固体片剂形式的膜前体。此外，每个托盘构造成在膜前体被加热的同时提供载气在膜前体上的高电导流。例如，载体气体向内流过膜前体，并且垂直向上流过可堆放托盘内的流动通道并通过固体前驱物蒸发系统中的出口。

3. 发明申请

US20060185598A1 Film precursor tray for use in a film precursor evaporation system and method of using 有权
标题翻译：用于薄膜前体蒸发系统的薄膜前体托盘及其使用方法
公开(公告)号：US20060185598A1
公开(公告)日：2006-08-24
申请号：US11351546
申请日：2006-02-10
申请人： Kenji Suzuki , Emmanuel Guidotti , Gerrit Leusink , Masamichi Hara , Daisuke Kuroiwa , Tadahiro Ishizaka
发明人： Kenji Suzuki , Emmanuel Guidotti , Gerrit Leusink , Masamichi Hara , Daisuke Kuroiwa , Tadahiro Ishizaka
IPC分类号： C23C16/00
CPC分类号： C23C16/4481
摘要： A high conductance, multi-tray film precursor evaporation system coupled with a high conductance vapor delivery system is described for increasing the deposition rate by increasing exposed surface area of film precursor. The multi-tray film precursor evaporation system includes one or more trays. Each tray is configured to support and retain film precursor in, for example, solid powder form or solid tablet form. Additionally, each tray is configured to provide for a high conductance flow of carrier gas over the film precursor while the film precursor is heated. For example, the carrier gas flows inward over the film precursor, and vertically upward through a flow channel within the stackable trays and through an outlet in the solid precursor evaporation system.
摘要翻译：描述了与高电导蒸气传输系统耦合的高电导多托盘膜前体蒸发系统，以通过增加膜前体的暴露表面积来增加沉积速率。多托盘膜前体蒸发系统包括一个或多个托盘。每个托盘被构造成支撑和保持例如固体粉末形式或固体片剂形式的膜前体。此外，每个托盘构造成在膜前体被加热的同时提供载气在膜前体上的高电导流。例如，载体气体向内流过膜前体，并且垂直向上流过可堆放托盘内的流动通道并通过固体前驱物蒸发系统中的出口。

4. 发明申请

US20060112882A1 Multi-tray film precursor evaporation system and thin film deposition system incorporating same 有权
公开(公告)号：US20060112882A1
公开(公告)日：2006-06-01
申请号：US10998420
申请日：2004-11-29
申请人： Kenji Suzuki , Emmanuel Guidotti , Gerrit Leusink , Masamichi Hara , Daisuke Kuroiwa
发明人： Kenji Suzuki , Emmanuel Guidotti , Gerrit Leusink , Masamichi Hara , Daisuke Kuroiwa
IPC分类号： C23C16/00
CPC分类号： C23C16/4481 , C23C16/16
摘要： A high conductance, multi-tray solid precursor evaporation system coupled with a high conductance vapor delivery system is described for increasing deposition rate by increasing exposed surface area of solid precursor. The multi-tray solid precursor evaporation system includes a base tray with one or more upper trays. Each tray is configured to support and retain film precursor in, for example, solid powder form or solid tablet form. Additionally, each tray is configured to provide for a high conductance flow of carrier gas over the film precursor while the film precursor is heated. For example, the carrier gas flows inward over the film precursor, and vertically upward through a flow channel within the stackable trays and through an outlet in the solid precursor evaporation system.

5. 发明授权

US5555771A Fixing structure for mounting member of a nut 失效
标题翻译：螺母安装构件的固定结构
公开(公告)号：US5555771A
公开(公告)日：1996-09-17
申请号：US183345
申请日：1994-01-19
申请人： Daisuke Kuroiwa , Shigeharu Kobayashi , Mitsuji Kanai
发明人： Daisuke Kuroiwa , Shigeharu Kobayashi , Mitsuji Kanai
IPC分类号： F16B19/00 , F16H25/24 , F16H25/22
CPC分类号： F16H25/2418 , F16B19/004 , F16H2025/2242 , F16H25/2204 , Y10S411/913 , Y10T403/53 , Y10T74/18712
摘要： At least one end portion of a nut threadably engaged with a screw shaft is provided a mounting member mounting stepped portion, a radial through-hole is formed in the peripheral surface of the stepped portion and a radial pin insertion aperture is formed in the peripheral surface of a mounting member correspondingly to the through-hole, and an engagement recess is formed at a location whereat the through-hole and the pin insertion aperture are connected together. A pin member is provided with a protruded portion on the barrel portion thereof. The pin member is elastically deformed and inserted into the through-hole, and the tip end thereof is brought into engagement with the pin insertion aperture to fix the mounting member and bring the protruded portion into engagement with the engagement recess, thereby preventing the pin member from slipping out.
摘要翻译：与螺纹轴螺纹接合的螺母的至少一个端部设置有安装构件安装阶梯部，在台阶部的周面形成有径向通孔，在周面形成有径向的插入孔对应于通孔的安装构件，并且在通孔和销插入孔连接在一起的位置处形成接合凹部。销构件在其筒部上设置有突出部。销构件弹性变形并插入到通孔中，并且其顶端与销插入孔接合以固定安装构件并使突出部与接合凹部接合，从而防止销构件从滑出来。

6. 发明授权

US07488512B2 Method for preparing solid precursor tray for use in solid precursor evaporation system 有权
标题翻译：制备用于固体前驱物蒸发系统的固体前体托盘的方法
公开(公告)号：US07488512B2
公开(公告)日：2009-02-10
申请号：US11007961
申请日：2004-12-09
申请人： Kenji Suzuki , Emmanuel P. Guidotti , Gerrit J. Leusink , Masamichi Hara , Daisuke Kuroiwa , Sandra G. Malhotra , Fenton McFeely , Robert R. Young, Jr.
发明人： Kenji Suzuki , Emmanuel P. Guidotti , Gerrit J. Leusink , Masamichi Hara , Daisuke Kuroiwa , Sandra G. Malhotra , Fenton McFeely , Robert R. Young, Jr.
IPC分类号： B05D3/00 , B22F3/00
CPC分类号： C23C16/4481 , C23C16/16
摘要： In a solid precursor evaporation system configured for use in a thin film deposition system, such as thermal chemical vapor deposition (TCVD), a method for preparing one or more trays of solid precursor is described. The solid precursor may be formed on a coating substrate, such as a tray, using one or more of dipping techniques, spin-on techniques, and sintering techniques.
摘要翻译：在配置用于诸如热化学气相沉积（TCVD）的薄膜沉积系统中的固体前驱物蒸发系统中，描述了制备一种或多种固体前体塔板的方法。固体前体可以使用浸渍技术，旋涂技术和烧结技术中的一种或多种在诸如托盘的涂布基材上形成。

7. 发明申请

US20070032079A1 METHOD FOR THIN FILM DEPOSITION USING MULTI-TRAY FILM PRECURSOR EVAPORATION SYSTEM 有权
标题翻译：使用多层薄膜前驱体蒸发系统薄膜沉积的方法
公开(公告)号：US20070032079A1
公开(公告)日：2007-02-08
申请号：US11537575
申请日：2006-09-29
申请人： Kenji Suzuki , Emmanuel Guidotti , Gerrit Leusink , Masamichi Hara , Daisuke Kuroiwa
发明人： Kenji Suzuki , Emmanuel Guidotti , Gerrit Leusink , Masamichi Hara , Daisuke Kuroiwa
IPC分类号： H01L21/44
CPC分类号： C23C16/4481 , C23C16/16
摘要： A method for depositing a Ru metal layer on a patterned substrate from a film precursor vapor delivered from a multi-tray film precursor evaporation system. The method comprises providing a patterned substrate in a process chamber of a deposition system, and forming a process gas containing Ru3(CO)12 precursor vapor and a carrier gas comprising CO gas. The process gas is formed by: providing a solid Ru3(CO)12 precursor in a plurality of spaced trays within a precursor evaporation system, wherein each tray is configured to support the solid precursor and wherein the plurality of spaced trays collectively provide a plurality of surfaces of solid precursor; heating the solid precursor in the plurality of spaced trays in the precursor evaporation system to a temperature greater than about 60° C. and maintaining the solid precursor at the temperature to form the vapor; and flowing the carrier gas in contact with the plurality of surfaces of the solid precursor during the heating to capture Ru3(CO)12 precursor vapor in the carrier gas as the vapor is being formed at the plurality of surfaces. The method further includes transporting the process gas from the precursor evaporation system to the process chamber and exposing the patterned substrate to the process gas to deposit a Ru metal layer on the patterned substrate by a thermal CVD.
摘要翻译：一种用于从多托盘膜前体蒸发系统递送的膜前体蒸气在图案化衬底上沉积Ru金属层的方法。该方法包括在沉积系统的处理室中提供图案化的衬底，并且形成含有Ru 3（CO）12 N 2前体蒸气的工艺气体和包含CO 加油站。工艺气体通过以下方式形成：在前体蒸发系统内的多个间隔的塔板中提供固体Ru 3（CO）12 N 2前体，其中每个托盘被构造成支撑所述固体前体并且其中所述多个间隔的托盘共同提供固体前体的多个表面; 将前体蒸发系统中的多个间隔的塔板中的固体前体加热到大于约60℃的温度，并将固体前体保持在该温度以形成蒸气; 并且在加热期间使载气与固体前体的多个表面接触，以使载气中的Ru 3（CO）12 N 2前体蒸汽作为蒸气在多个表面上形成。该方法还包括将处理气体从前体蒸发系统输送到处理室，并将图案化衬底暴露于工艺气体，以通过热CVD沉积图案化衬底上的Ru金属层。

8. 发明授权

US07708835B2 Film precursor tray for use in a film precursor evaporation system and method of using 有权
标题翻译：用于薄膜前体蒸发系统的薄膜前体托盘及其使用方法
公开(公告)号：US07708835B2
公开(公告)日：2010-05-04
申请号：US11351546
申请日：2006-02-10
申请人： Kenji Suzuki , Emmanuel P. Guidotti , Gerrit J. Leusink , Masamichi Hara , Daisuke Kuroiwa , Tadahiro Ishizaka
发明人： Kenji Suzuki , Emmanuel P. Guidotti , Gerrit J. Leusink , Masamichi Hara , Daisuke Kuroiwa , Tadahiro Ishizaka
IPC分类号： C23C16/00 , B01D7/00
CPC分类号： C23C16/4481
摘要： A high conductance, multi-tray film precursor evaporation system coupled with a high conductance vapor delivery system is described for increasing the deposition rate by increasing exposed surface area of film precursor. The multi-tray film precursor evaporation system includes one or more trays. Each tray is configured to support and retain film precursor in, for example, solid powder form or solid tablet form. Additionally, each tray is configured to provide for a high conductance flow of carrier gas over the film precursor while the film precursor is heated. For example, the carrier gas flows inward over the film precursor, and vertically upward through a flow channel within the stackable trays and through an outlet in the solid precursor evaporation system.
摘要翻译：描述了与高电导蒸气传输系统耦合的高电导多托盘膜前体蒸发系统，以通过增加膜前体的暴露表面积来增加沉积速率。多托盘膜前体蒸发系统包括一个或多个托盘。每个托盘被构造成支撑和保持例如固体粉末形式或固体片剂形式的膜前体。此外，每个托盘构造成在膜前体被加热的同时提供载气在膜前体上的高电导流。例如，载体气体向内流过膜前体，并且垂直向上流过可堆放托盘内的流动通道并通过固体前驱物蒸发系统中的出口。

9. 发明申请

US20060115593A1 Method for preparing solid precursor tray for use in solid precursor evaporation system 有权
公开(公告)号：US20060115593A1
公开(公告)日：2006-06-01
申请号：US11007961
申请日：2004-12-09
申请人： Kenji Suzuki , Emmanuel Guidotti , Gerrit Leusink , Masamichi Hara , Daisuke Kuroiwa , Sandra Malhotra , Fenton McFeely , Robert Young
发明人： Kenji Suzuki , Emmanuel Guidotti , Gerrit Leusink , Masamichi Hara , Daisuke Kuroiwa , Sandra Malhotra , Fenton McFeely , Robert Young
IPC分类号： B05D1/18 , C23C16/00
CPC分类号： C23C16/4481 , C23C16/16
摘要： In a solid precursor evaporation system configured for use in a thin film deposition system, such as thermal chemical vapor deposition (TCVD), a method for preparing one or more trays of solid precursor is described. The solid precursor may be formed on a coating substrate, such as a tray, using one or more of dipping techniques, spin-on techniques, and sintering techniques.

10. 发明申请

US20060112883A1 Replaceable precursor tray for use in a multi-tray solid precursor delivery system 有权
公开(公告)号：US20060112883A1
公开(公告)日：2006-06-01
申请号：US11007962
申请日：2004-12-09
申请人： Kenji Suzuki , Emmanuel Guidotti , Gerrit Leusink , Masamichi Hara , Daisuke Kuroiwa
发明人： Kenji Suzuki , Emmanuel Guidotti , Gerrit Leusink , Masamichi Hara , Daisuke Kuroiwa
IPC分类号： C23C16/00
CPC分类号： C23C16/16 , C23C16/4481
摘要： A replaceable precursor tray for use with a high conductance, multi-tray solid precursor evaporation system coupled with a high conductance vapor delivery system is described for increasing deposition rate by increasing exposed surface area of solid precursor. The multi-tray solid precursor evaporation system is configured to be coupled to the process chamber of a thin film deposition system, and it includes a base tray with one or more stackable upper trays. Each tray is configured to support and retain film precursor in, for example, solid powder form or solid tablet form. Additionally, each tray is configured to provide for a high conductance flow of carrier gas over the film precursor while the film precursor is heated. For example, the carrier gas flows inward over the film precursor, and vertically upward through a flow channel within the stackable trays and through an outlet in the solid precursor evaporation system.

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