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    • 1. 发明申请
    • DEVICE AND METHOD FOR TIME NOTIFICATION FOR UPDATING SOFTWARE
    • 用于更新软件的时间通知的设备和方法
    • US20130332918A1
    • 2013-12-12
    • US13493692
    • 2012-06-11
    • Katsumi AoyagiMiki SuzukiYasuyuki HiraoHidefumi KanekoTakeshi KanemotoTomohiro Ichikawa
    • Katsumi AoyagiMiki SuzukiYasuyuki HiraoHidefumi KanekoTakeshi KanemotoTomohiro Ichikawa
    • G06F9/44
    • G06F8/65
    • A terminal device may include: a communication interface to receive, from a server via a network, a file for updating software in a memory device coupled with the terminal device, and a software update table that includes data regarding one or more performance values and one or more time values indicative of one or more lengths of time taken to update the software using the file; a processor to obtain data regarding a performance value of the memory device, select, from the software update table, one of the one or more performance values based on the performance value of the memory device, and obtain, from the software update table, a time value associated with the selected performance value; and an output device to provide an output corresponding to the obtained time value. Each performance value is associated with one of the one or more time values, respectively.
    • 终端设备可以包括:通信接口,用于经由网络从服务器接收用于更新与终端设备耦合的存储设备中的软件的文件,以及软件更新表,其包括关于一个或多个性能值的数据和一个 或更多的时间值指示使用该文件更新软件所需的一个或多个时间长度; 获取关于存储器件的性能值的数据的处理器,从软件更新表中选择基于存储器件的性能值的一个或多个性能值之一,并从软件更新表中获得 与所选性能值相关联的时间值; 以及输出装置,用于提供对应于所获得的时间值的输出。 每个性能值分别与一个或多个时间值之一相关联。
    • 2. 发明授权
    • Device and method for time notification for updating software
    • 用于更新软件的时间通知的设备和方法
    • US08819662B2
    • 2014-08-26
    • US13493692
    • 2012-06-11
    • Katsumi AoyagiMiki SuzukiYasuyuki HiraoHidefumi KanekoTakeshi KanemotoTomohiro Ichikawa
    • Katsumi AoyagiMiki SuzukiYasuyuki HiraoHidefumi KanekoTakeshi KanemotoTomohiro Ichikawa
    • G06F9/44
    • G06F8/65
    • A terminal device may include: a communication interface to receive, from a server via a network, a file for updating software in a memory device coupled with the terminal device, and a software update table that includes data regarding one or more performance values and one or more time values indicative of one or more lengths of time taken to update the software using the file; a processor to obtain data regarding a performance value of the memory device, select, from the software update table, one of the one or more performance values based on the performance value of the memory device, and obtain, from the software update table, a time value associated with the selected performance value; and an output device to provide an output corresponding to the obtained time value. Each performance value is associated with one of the one or more time values, respectively.
    • 终端设备可以包括:通信接口,用于经由网络从服务器接收用于更新与终端设备耦合的存储设备中的软件的文件,以及软件更新表,其包括关于一个或多个性能值的数据和一个 或更多的时间值指示使用该文件更新软件所需的一个或多个时间长度; 获取关于存储器件的性能值的数据的处理器,从软件更新表中选择基于存储器件的性能值的一个或多个性能值之一,并从软件更新表中获得 与所选性能值相关联的时间值; 以及输出装置,用于提供对应于所获得的时间值的输出。 每个性能值分别与一个或多个时间值之一相关联。
    • 3. 发明申请
    • Method for Manufacturing Semiconductor Device
    • 半导体器件制造方法
    • US20130009247A1
    • 2013-01-10
    • US13547393
    • 2012-07-12
    • Kazuya HanaokaMiki Suzuki
    • Kazuya HanaokaMiki Suzuki
    • H01L27/12
    • H01L21/76823H01L21/76825H01L25/0657H01L27/124H01L2225/06513H01L2225/06541H01L2924/0002H01L2924/00
    • It is an object to form a conductive region in an insulating film without forming contact holes in the insulating film. A method is provided, in which an insulating film is formed over a first electrode over a substrate, a first region having many defects is formed at a first depth in the insulating film by adding first ions into the insulating film at a first accelerating voltage; a second region having many defects is formed at a second depth which is different from the first depth in the insulating film by adding second ions into the insulating film at a second accelerating voltage, a conductive material containing a metal element is formed over the first and second regions; and a conductive region which electrically connects the first electrode and the conductive material is formed in the insulating film by diffusing the metal element into the first and second regions.
    • 其目的是在绝缘膜中形成导电区域,而不在绝缘膜中形成接触孔。 提供了一种方法,其中在衬底上方的第一电极上形成绝缘膜,通过以第一加速电压将绝缘膜中加入第一离子,在绝缘膜的第一深度处形成具有许多缺陷的第一区域; 通过在第二加速电压下将第二离子加入到绝缘膜中,在第二深度上形成具有许多缺陷的第二区域,该第二深度与绝缘膜中的第一深度不同,在第一深度上形成包含金属元素的导电材料, 第二区; 并且通过将金属元素扩散到第一和第二区域中,在绝缘膜中形成电连接第一电极和导电材料的导电区域。
    • 6. 发明授权
    • Method for manufacturing semiconductor device
    • 制造半导体器件的方法
    • US08530973B2
    • 2013-09-10
    • US13547393
    • 2012-07-12
    • Kazuya HanaokaMiki Suzuki
    • Kazuya HanaokaMiki Suzuki
    • H01L29/786
    • H01L21/76823H01L21/76825H01L25/0657H01L27/124H01L2225/06513H01L2225/06541H01L2924/0002H01L2924/00
    • It is an object to form a conductive region in an insulating film without forming contact holes in the insulating film. A method is provided, in which an insulating film is formed over a first electrode over a substrate, a first region having many defects is formed at a first depth in the insulating film by adding first ions into the insulating film at a first accelerating voltage; a second region having many defects is formed at a second depth which is different from the first depth in the insulating film by adding second ions into the insulating film at a second accelerating voltage, a conductive material containing a metal element is formed over the first and second regions; and a conductive region which electrically connects the first electrode and the conductive material is formed in the insulating film by diffusing the metal element into the first and second regions.
    • 其目的是在绝缘膜中形成导电区域,而不在绝缘膜中形成接触孔。 提供了一种方法,其中在衬底上方的第一电极上形成绝缘膜,通过以第一加速电压将绝缘膜中加入第一离子,在绝缘膜的第一深度处形成具有许多缺陷的第一区域; 通过在第二加速电压下将第二离子加入到绝缘膜中,在第二深度上形成具有许多缺陷的第二区域,该第二深度与绝缘膜中的第一深度不同,在第一深度上形成包含金属元素的导电材料, 第二区; 并且通过将金属元素扩散到第一和第二区域中,在绝缘膜中形成电连接第一电极和导电材料的导电区域。
    • 8. 发明授权
    • Semiconductor device and electronic device
    • 半导体器件和电子器件
    • US08766361B2
    • 2014-07-01
    • US13315322
    • 2011-12-09
    • Junichi KoezukaSatoshi ShinoharaMiki SuzukiHideto Ohnuma
    • Junichi KoezukaSatoshi ShinoharaMiki SuzukiHideto Ohnuma
    • H01L27/12
    • H01L29/66772H01L27/1288H01L29/66492H01L29/78624
    • A semiconductor device is provided, which includes a single crystal semiconductor layer formed over an insulating surface and having a source region, a drain region, and a channel formation region, a gate insulating film covering the single crystal semiconductor layer and a gate electrode overlapping with the channel formation region with the gate insulating film interposed therebetween. In the semiconductor device, at least the drain region of the source and drain regions includes a first impurity region adjacent to the channel formation region and a second impurity region adjacent to the first impurity region. A maximum of an impurity concentration distribution in the first impurity region in a depth direction is closer to the insulating surface than a maximum of an impurity concentration distribution in the second impurity region in a depth direction.
    • 提供了一种半导体器件,其包括形成在绝缘表面上并具有源极区,漏极区和沟道形成区的单晶半导体层,覆盖单晶半导体层的栅极绝缘膜和与 沟道形成区域之间插入栅极绝缘膜。 在半导体器件中,源极和漏极区域的至少漏极区域包括与沟道形成区域相邻的第一杂质区域和与第一杂质区域相邻的第二杂质区域。 与深度方向上的第二杂质区域的杂质浓度分布的最大值相比,深度方向上的第一杂质区域的杂质浓度分布的最大值比绝缘面更接近。