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1. 发明授权

US4410546A Antiallergic compositions 失效
标题翻译：抗过敏组合物
公开(公告)号：US4410546A
公开(公告)日：1983-10-18
申请号：US260580
申请日：1981-05-05
申请人： Kanji Noda , Akira Nakagawa , Munehiko Hirano , Kenji Yamagata , Yoichi Nakashima , Terumi Hachiya , Hiroyuki Ide , Akihide Koda
发明人： Kanji Noda , Akira Nakagawa , Munehiko Hirano , Kenji Yamagata , Yoichi Nakashima , Terumi Hachiya , Hiroyuki Ide , Akihide Koda
IPC分类号： A61K31/19
CPC分类号： A61K31/19
摘要： An antiallergic composition comprising, as the effective ingredient, a compound represented by the following general formula ##STR1## wherein R is n-butyl group or n-pentyl group, the compound being preferably supported by a carrier such as sugar, starch, gum arabic or calcium stearate.
摘要翻译：一种抗过敏组合物，其包含作为有效成分的由以下通式表示的化合物，其中R是正丁基或正戊基，该化合物优选由载体例如糖，淀粉，阿拉伯树胶或硬脂酸钙。

2. 发明授权

US4228304A Novel cyclohexanecarboxylic acid and its derivatives 失效
标题翻译：新型环己烷羧酸及其衍生物
公开(公告)号：US4228304A
公开(公告)日：1980-10-14
申请号：US895485
申请日：1978-04-11
申请人： Kanji Noda , Akira Nakagawa , Kenji Yamagata , Terumi Hachiya , Hiroyuki Ide , Akihide Koda
发明人： Kanji Noda , Akira Nakagawa , Kenji Yamagata , Terumi Hachiya , Hiroyuki Ide , Akihide Koda
IPC分类号： C07C69/75 , A23G4/00 , A23G4/06 , A23G4/12 , A61K31/16 , A61K31/19 , A61K31/215 , A61P1/04 , A61P1/16 , A61P7/02 , A61P31/04 , A61P37/08 , C07C51/00 , C07C51/08 , C07C61/08 , C07C61/22 , C07C67/00 , C07C67/14 , C07C231/00 , C07C233/63 , C07C313/00 , C07C103/50
CPC分类号： A23G4/06 , A23G4/064 , A23G4/126 , C07C61/08
摘要： The present invention relates to novel cyclohexanecarboxylic acid and its derivatives represented by the general formula: ##STR1## (wherein R.sup.1 is selected from the group consisting of hydrogen or methyl; R.sup.2 is selected from the group consisting of hydroxyl, lower alkoxy with 1-6 carbons or amino acid rest. In case R.sup.1 is hydrogen, however, R.sup.2 means amino acid rest, which of all the compounds of the present invention are entirely novel ones which have never been in any printed publications, possessing a high degree of pharmacological activities such as anti-allergic, anti-inflammatory, anti-ulcerative, antibacterial, anti-thrombotic and liver-function-improving activities, and therefore, these compounds are useful as medicines, and besides, these compounds are surface-active and, therefore, useful as additives for toothpaste and shampoo, as surface active agents for detergents, dispersing agents, emulsifying agents and cosmetics, as anticarious agents, and also in industrial fields the aforesaid compounds are useful as detergents for keeping textiles soft, as additives for lubricating oil, as anti-rust agents, additives for plastics and also as metal-capturing agent, ion-floating agents and emulsifying agents for other industrial purposes).
摘要翻译：本发明涉及由以下通式表示的新型环己烷羧酸及其衍生物：其中R1选自氢或甲基; R2选自羟基，低级烷氧基与1-6 碳或氨基酸残基，然而，在R1为氢的情况下，R2表示氨基酸残基，本发明的所有化合物中的全部是全新的，从未出现在任何印刷出版物中，具有高度的药理活性，作为抗过敏，抗炎，抗溃疡，抗菌，抗血栓形成和肝功能改善的活性，因此这些化合物可用作药物，此外，这些化合物是表面活性的，因此有用作为牙膏和洗发剂的添加剂，作为洗涤剂，分散剂，乳化剂和化妆品的表面活性剂作为反义剂，以及在工业领域中所含的化合物可用作保持纺织品柔软的清洁剂，作为润滑油的添加剂，作为防锈剂，塑料添加剂以及用作金属捕获剂，用于其它工业目的的离子漂浮剂和乳化剂）。

3. 发明授权

US4443626A 2,3-Dihydro-indene derivatives 失效
标题翻译： 2,3-二氢 - 茚衍生物
公开(公告)号：US4443626A
公开(公告)日：1984-04-17
申请号：US385673
申请日：1982-06-07
申请人： Kanji Noda , Akira Nakagawa , Kenji Yamagata , Yoichi Nakashima , Masayoshi Tsuji , Tetsuo Aoki , Hiroyuki Ide
发明人： Kanji Noda , Akira Nakagawa , Kenji Yamagata , Yoichi Nakashima , Masayoshi Tsuji , Tetsuo Aoki , Hiroyuki Ide
IPC分类号： C07C59/82 , C07C59/88 , C07C59/90 , C07C205/56 , C07C79/46 , C07C59/86
CPC分类号： C07C59/82 , C07C205/56 , C07C59/88 , C07C59/90
摘要： Novel 2,3-dihydro-indene derivatives having remarkable anti-inflammatory effects and represented by the following formula ##STR1## wherein R.sup.1 and R.sup.2 are each a hydrogen atom, halogen atom, nitro group, lower alkyl group or lower alkyloxy group with the proviso that R.sup.1 and R.sup.2 do not take a hydrogen atom at the same time, and n is an integer of 2-4.
摘要翻译：新颖的2,3-二氢 - 茚衍生物具有显着的抗炎作用，由下式表示：其中R1和R2各自为氢原子，卤原子，硝基，低级烷基或低级烷氧基，条件是 R1和R2不同时取氢原子，n为2-4的整数。

4. 发明申请

US20080118228A1 Information Recording Device and Method, Information Reproducing Device and Method, Information Recording/Reproducing Device and Method, and Computer Program 审中-公开
标题翻译：信息记录装置和方法，信息再现装置和方法，信息记录/再现装置和方法以及计算机程序
公开(公告)号：US20080118228A1
公开(公告)日：2008-05-22
申请号：US11661675
申请日：2005-08-30
申请人： Tomohiro Miura , Kenji Yamagata , Hiroshi Nakamura , Ken Miyagawa , Yukio Numakami , Kenichiro Tada , Shinya Hashimoto
发明人： Tomohiro Miura , Kenji Yamagata , Hiroshi Nakamura , Ken Miyagawa , Yukio Numakami , Kenichiro Tada , Shinya Hashimoto
IPC分类号： H04N5/91
CPC分类号： G11B19/122 , G11B20/00086 , G11B20/0021 , G11B20/10 , H04N5/913 , H04N21/2541 , H04N21/4627 , H04N21/835 , H04N21/8355 , H04N2005/91328
摘要： An information device (300) includes: first judgment elements (304) for judging whether an information recording device specified by circumstances information (400a) recorded on a second recording medium (100) coincides with the information recording device which has performed MOVE process; and control elements (307) for controlling display elements (305, etc.) so as to display that the first content information (HD content) can be reproduced if the coincidence is confirmed by the first judgment elements, controlling the content information generation elements (308, etc.) so as to generate first content information according to the circumstances information, and controlling the reproducing elements (310, etc.) so as to reproduce the generated first content information.
摘要翻译：信息装置（300）包括：用于判断由记录在第二记录介质（100）上的环境信息（400a）指定的信息记录装置是否与进行了MOVE处理的信息记录装置一致的第一判断元件（304）以及用于控制显示元件（305等）的控制元件（307），以便如果第一判断元件确认了重合，则显示可以再现第一内容信息（HD内容），控制内容信息生成元素 308等），以便根据环境信息生成第一内容信息，并且控制再现元素（310等），以再现所生成的第一内容信息。

5. 发明授权

US06706618B2 Substrate processing apparatus, substrate support apparatus, substrate processing method, and substrate fabrication method 失效
标题翻译：基板处理装置，基板支撑装置，基板处理方法以及基板的制造方法
公开(公告)号：US06706618B2
公开(公告)日：2004-03-16
申请号：US10206214
申请日：2002-07-29
申请人： Toru Takisawa , Takao Yonehara , Kenji Yamagata
发明人： Toru Takisawa , Takao Yonehara , Kenji Yamagata
IPC分类号： H01L2176
CPC分类号： H01L21/67092 , H01L21/2007
摘要： The spaces in chuck grooves 3a and 3b are evacuated to chuck the entire surface of a wafer 1 to the chuck surface of a wafer support table 3 and curve the wafer 1. A wafer 2 is horizontally opposed to the wafer 1, and the center of the wafer 2 is pressed by a press pin 6a. The centers of the two wafers 1 and 2 are contacted, and the contact portion gradually spreads to the vicinity of the periphery of a central portion 3c and takes a substantially circular shape. After that, the chuck by the chuck grooves 3a is stopped. Consequently, the wafer 1 flattens, and the entire surfaces of the wafers 1 and 2 are contacted.
摘要翻译：吸盘槽3a和3b中的空间被抽真空以将晶片1的整个表面吸附到晶片支撑台3的卡盘表面并使晶片1弯曲。晶片2与晶片1水平相对，晶片2被压销6a按压。两个晶片1和2的中心接触，并且接触部分逐渐扩展到中心部分3c的周边附近并呈现大致圆形。之后，由卡盘槽3a卡住停止。因此，晶片1变平，晶片1和2的整个表面接触。

6. 发明授权

US6156624A Method for production of SOI substrate by pasting and SOI substrate 失效
标题翻译：通过粘贴和SOI衬底生产SOI衬底的方法
公开(公告)号：US6156624A
公开(公告)日：2000-12-05
申请号：US832859
申请日：1997-04-04
申请人： Kenji Yamagata , Takao Yonehara , Tadashi Atoji , Kiyofumi Sakaguchi
发明人： Kenji Yamagata , Takao Yonehara , Tadashi Atoji , Kiyofumi Sakaguchi
IPC分类号： H01L21/02 , H01L21/20 , H01L21/336 , H01L21/762 , H01L27/12 , H01L29/786 , H01L21/306
CPC分类号： H01L21/2007 , H01L21/76251 , Y10S438/977
摘要： This invention solves the problem of a pasted SOI substrate generating voids in the peripheral part thereof and consequently decreasing the number of devices to be derived therefrom. It concerns a method for the production of a SOI substrate obtained by pasting a first Si substrate possessing a SiO.sub.2 surface and a second substrate possessing a Si surface on the SiO.sub.2 surface and the Si surface, which method comprises washing the Si surface of the second Si substrate, thereby imparting hydrophobicity to the Si surface before the first Si substrate and the second Si substrate are pasted together.
摘要翻译：本发明解决了在其周边部分产生空隙的粘贴SOI衬底的问题，从而减少了从其导出的器件的数量。本发明涉及制备通过在SiO 2表面和Si表面上粘贴具有SiO 2表面的第一Si衬底和具有Si表面的第二衬底而获得的SOI衬底的方法，该方法包括：将第二Si的Si表面从而在将第一Si衬底和第二Si衬底粘贴在一起之前对Si表面赋予疏水性。

7. 发明授权

US06103598A Process for producing semiconductor substrate 失效
标题翻译：半导体衬底的制造方法
公开(公告)号：US06103598A
公开(公告)日：2000-08-15
申请号：US678694
申请日：1996-07-11
申请人： Kenji Yamagata , Takao Yonehara , Nobuhiko Sato , Kiyofumi Sakaguchi
发明人： Kenji Yamagata , Takao Yonehara , Nobuhiko Sato , Kiyofumi Sakaguchi
IPC分类号： H01L21/306 , H01L21/762
CPC分类号： H01L21/76256 , H01L21/0203 , H01L21/76243
摘要： A process for producing a semiconductor substrate is provided which comprises providing a first substrate made of silicon having a porous silicon layer formed thereon by making porous the substrate silicon and a nonporous monocrystalline silicon layer epitaxially grown on the porous silicon layer, laminating the first substrate onto a second substrate in a state that at least one of lamination faces of the first and the second substrates has a silicon oxide layer and the nonporous monocrystalline silicon layer is interposed between the laminated substrates, and removing the porous silicon layer by etching, wherein the porous silicon layer is removed by etching with an etchant which etches the nonporous monocrystalline silicon layer and the silicon oxide layer at respective etching rates of not more than 10 angstroms per minute.
摘要翻译：提供一种制造半导体衬底的方法，其包括：通过使衬底硅多孔化和多孔硅层上外延生长的无孔单晶硅层，提供由其上形成有多孔硅层的硅制成的第一衬底，将第一衬底层压到第二基板，其中第一和第二基板的至少一个层叠面具有氧化硅层，并且无孔单晶硅层插入在层压基板之间，并且通过蚀刻去除多孔硅层，其中多孔通过蚀刻除去硅层，蚀刻剂以不大于10埃每分钟的蚀刻速率蚀刻无孔单晶硅层和氧化硅层。

8. 发明授权

US5130103A Method for forming semiconductor crystal and semiconductor crystal article obtained by said method 失效
标题翻译：形成半导体晶体和半导体晶体物理方法
公开(公告)号：US5130103A
公开(公告)日：1992-07-14
申请号：US752922
申请日：1991-08-30
申请人： Kenji Yamagata , Hideya Kumomi , Hiroyuki Tokunaga , Kozo Arao
发明人： Kenji Yamagata , Hideya Kumomi , Hiroyuki Tokunaga , Kozo Arao
IPC分类号： C30B25/02 , C30B25/18 , H01L21/20 , H01L27/142 , H01L31/0352 , H01L31/18
CPC分类号： H01L31/1804 , C30B25/02 , C30B25/18 , H01L21/02422 , H01L21/0245 , H01L21/02463 , H01L21/02532 , H01L21/02576 , H01L21/02579 , H01L21/0262 , H01L21/02639 , H01L21/02647 , H01L31/03529 , H01L31/0475 , Y02E10/547 , Y02P70/521 , Y10S428/901 , Y10T428/24917 , Y10T428/31504 , Y10T428/31678
摘要： Semiconductor crystals are formed by applying a semiconductor crystal forming treatment on a substrate having a free surface on which a deposition surface (S.sub.NDS) with a small nucleation density and a deposition surface (S.sub.NDL) with metal having a sufficiently small area for crystal growth only from a single nucleus and having a greater nucleation density (ND.sub.L) than the nucleation density (ND.sub.S) of the deposition surface (S.sub.NDS) are arranged adjacent to each other, thereby growing a semiconductor single crystal from the single nucleus.

9. 发明授权

US4843457A Drop-out correcting luminance-chrominance signal separation circuit 失效
标题翻译：滴出校正亮度 - 色度信号分离电路
公开(公告)号：US4843457A
公开(公告)日：1989-06-27
申请号：US298231
申请日：1989-01-09
申请人： Kenji Yamagata
发明人： Kenji Yamagata
IPC分类号： H04N9/78 , H04N9/804 , H04N9/808 , H04N9/82 , H04N9/88
CPC分类号： H04N9/88 , H04N9/78
摘要： A luminance-chrominance signal separation circuit in which only those values of a digitized video signal which do not manifest drop-out are used for producing a luminance and a chrominance signal from linear combinations of the video signals. Different combinations are used depending on the locations of the drop-out.
摘要翻译：一种亮度色度信号分离电路，其中仅使用不显示辍学的数字化视频信号的值来产生来自视频信号的线性组合的亮度和色度信号。取决于辍学的位置使用不同的组合。

10. 发明授权

US07550305B2 Method of forming light-emitting element 失效
标题翻译：形成发光元件的方法
公开(公告)号：US07550305B2
公开(公告)日：2009-06-23
申请号：US11874452
申请日：2007-10-18
申请人： Kenji Yamagata , Takao Yonehara , Yoshinobu Sekiguchi , Kojiro Nishi
发明人： Kenji Yamagata , Takao Yonehara , Yoshinobu Sekiguchi , Kojiro Nishi
IPC分类号： H01L21/00 , H01L21/30 , H01L21/46
CPC分类号： H01L33/0079 , H01L33/08 , H01L33/20
摘要： An object of the present invention is to provide a method of forming a light-emitting element at a lower cost than a conventional cost with suppressing the deterioration of the substrate due to thermal distortion in comparison with a conventional method of recycling a substrate and further having an effect equal to that of the method of recycling a substrate. The method of forming a light-emitting element by growing a separation layer and a light-emitting layer in this order on a first substrate, bonding the light-emitting layer onto a second substrate, and removing the separation layer to form the light-emitting layer on the second substrate, includes growing a plurality of groups each containing the separation layer and light-emitting layer on the first substrate; patterning the light-emitting layer existing as a uppermost layer into an island shape, and then bonding the light-emitting layer onto the second substrate, and etching the separation layer adjacent to the light-emitting layer patterned into the island shape to form the light-emitting layer patterned into the island shape on the second substrate.
摘要翻译：本发明的目的是提供一种以比常规成本低的成本形成发光元件的方法，与常规的基板再循环方法相比，可以抑制由于热变形引起的基板的劣化，并且还具有其效果与回收基材的方法相同。通过在第一基板上依次生长分离层和发光层来形成发光元件的方法，将发光层接合到第二基板上，并且去除分离层以形成发光包括在第一基板上生长各自包含分离层和发光层的多个基团; 将作为最上层存在的发光层图案化为岛状，然后将发光层接合到第二基板上，并且蚀刻与图案化为岛状的发光层相邻的分离层，以形成光在第二基板上图案化成岛状的发光层。

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