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1. 发明专利

JPH0290522A WAFER HANDLING DEVICE FOR CLEANING WAFER 失效
公开(公告)号：JPH0290522A
公开(公告)日：1990-03-30
申请号：JP24075988
申请日：1988-09-28
申请人： TOSHIBA CORP , KURITA WATER IND LTD
发明人： KAMETANI SHIGEJI , IMAIZUMI MASABUMI , INAGAKI KIYOHIKO , OTANI TAIICHI , MASHITA NORIYOSHI
IPC分类号： B65H1/28 , B25J15/00 , B65G1/00 , B65G1/07 , H01L21/304
摘要： PURPOSE:To obtain a high cleaning effect, to cut down the time of dipping, and to reduce the flow rate of a cleaning fluid by a method wherein a large number of wafers are held in a line maintaining space in forward and backward directions in an almost exposed condition by the four-point contact using a part of guide arms and a pair of chuck arms. CONSTITUTION:In order to grab up a wafer from an auxiliary means 13, a pair of chuck arms 12a and 12b are opened maximum by moving them in separating direction, the chuck arms and guide arms are lowered, and the pair of guide arms 11a and 11b are brought close to the upper surface of the left and right supporting walls A and B of the auxiliary means. Then, a pusher 14 is lifted up and erected in the auxiliary means 13, all the arranged wafers are pushed up, and when they are placed in the supporting grooves 11 and 11 opposing to the guide arms, the twin guide arms and the chuck arms begin to rise at the same speed as the rising speed of the pusher 14. Then, when the pusher pushed up almost whole of the wafers and its rising is stopped, the rising of the twin guide arms and the chuck arms is also stopped, the chucks 12a and 12b are shifted to approaching direction, And the right and left side edges of the wafer lower than the largest diameter part are inserted into and pinched by the supporting grooves 12 and 12. Then, the pusher is lowered and returned to its original condition, and the wafers are grabbed up above the auxiliary means by the guide arms and the chuck arms.

2. 发明专利

JPH08103670A ION EXCHANGER 失效
公开(公告)号：JPH08103670A
公开(公告)日：1996-04-23
申请号：JP26444394
申请日：1994-10-05
申请人： KURITA WATER IND LTD
发明人： FURUKAWA MASAHIRO , SATO KAZUICHI , KAMETANI SHIGEJI , ISHII SEIICHI , MOTOMURA TAKAHITO
IPC分类号： C02F1/42 , B01J47/00 , B01J49/00
摘要： PURPOSE: To facilitate the exchange of an ion-exchange resin. CONSTITUTION: A resin-packed part 4 separated by a first screen 2 provided at the upper part and a second screen 3 fixed at the lower part is formed in a vessel 1. The raw water inlet 5, treated water outlet 7 and resin inlet 6 are provided at the upper part of the vessel 1 piercing the first screen, and a resin outlet 9 is furnished at the lower part of the vessel piercing the second screen.

3. 发明专利

JPH03242932A WASHING AND DRYING APPARATUS FOR WAFER 失效
公开(公告)号：JPH03242932A
公开(公告)日：1991-10-29
申请号：JP3844490
申请日：1990-02-21
申请人： KURITA WATER IND LTD
发明人： KAMETANI SHIGEJI , IMAIZUMI MASABUMI , INAGAKI KIYOHIKO
IPC分类号： H01L21/304
摘要： PURPOSE:To prevent formation of an oxide film, abrasion by a spinner jig, etc. by a method wherein a nitrogen gas is supplied into and discharged from a tank body made of quartz which supports a carrier holding a plurality of wafers set up in juxtaposition vertically inside the tank body, and a space inside the tank body is filled up with the nitrogen gas. CONSTITUTION:A tank body 1 is made of silica glass and has an immersion part 8 of a carrier and a corridor-shaped inundation part 9 so provided around the immersion part 8 as to project from the upper part of the outside, and a cover body 2 closes up the upper side of the inundation part 9 and covers it up. Wafers 4 to be washed are set up vertically and juxtaposed in the carrier 3, which is set on a support rack 15 in the immersion part 8. Next, the upper side of the inundation part 9 is covered up with the cover body 2, the inside of the tank body 1 is shut off from the outside air and washing water is supplied into the immersion part 8 from an introduction port 10 provided in the bottom. At the same time, a nitrogen gas is introduced into the tank body and filled up in a space above the immersion part 8 in the tank body 1. According to this constitution, formation of an oxide film on the wafers, abrasion with the carrier, production of dust and impairment are eliminated.

4. 发明专利

JP2009254935A Gas dissolving membrane device and method of manufacturing gas-dissolved solution 审中-公开
标题翻译：气体分解膜装置及制造气体溶解溶液的方法
公开(公告)号：JP2009254935A
公开(公告)日：2009-11-05
申请号：JP2008104819
申请日：2008-04-14
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , KAMETANI SHIGEJI , MORITA HIROSHI
IPC分类号： B01F1/00 , B01D53/22 , B01F3/04 , B01F5/06 , B01F15/02
摘要： PROBLEM TO BE SOLVED: To provide a gas dissolving membrane device which can be stably operated continuously for a long time and a method of manufacturing a gas-dissolved solution.
SOLUTION: A first valve 31 is opened during operation of manufacturing a gas-dissolved water, and a condensate water obtained by condensing process in a gas phase chamber 13 is stored in a reservoir 34 passing through a first valve 31 (a process for reserving condensate water). Next, when the amount of the condensate water measured by a condensate water detection means 35 exceeds a predetermined value, the first valve 31 is closed, and a second valve 32, a third valve 33 and a valve 42 are opened. Further, a sweep gas is supplied to upstream of the reservoir 34 through piping 41, and the condensate water is drained from an outflow part of the reservoir 34 (a process for draining condensate water). After that, the valve 42 and the third valve 33 are closed and a valve 53 is opened by actuating an exhaust device 52, and then the interior of the reservoir 34 is evacuated until the readings of a manometer 54 are equal to the pressure levels measured by the manometer 54 (a process for adjusting pressure). Then, the operation returns to the process of reserving condensate water.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够长时间连续稳定运行的气体溶解膜装置和制造气体溶解溶液的方法。解决方案：在制造气体溶解水的操作期间打开第一阀31，并且通过在气相室13中的冷凝过程获得的冷凝水被储存在通过第一阀31的储存器34中（流程用于保留冷凝水）。接下来，当由冷凝水检测装置35测量的冷凝水的量超过预定值时，关闭第一阀31，打开第二阀32，第三阀33和阀42。此外，吹扫气体通过管道41供应到储存器34的上游，并且冷凝水从储存器34的流出部分排出（用于排出冷凝水的过程）。之后，关闭阀42和第三阀33，通过致动排气装置52来打开阀53，然后抽空储存器34的内部，直到压力计54的读数等于测量的压力水平通过压力计54（用于调节压力的过程）。然后，操作返回到保留冷凝水的过程。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JPH0398636A APPARATUS FOR SUPPLYING CHEMICAL SOLUTION TO CHEMICAL SOLUTION WASHING TANK 失效
公开(公告)号：JPH0398636A
公开(公告)日：1991-04-24
申请号：JP23169889
申请日：1989-09-08
申请人： TOSHIBA CORP , KURITA WATER IND LTD
发明人： KAMETANI SHIGEJI , MASHITA NORIYOSHI , OTANI TAIICHI
IPC分类号： B08B3/08 , B01J4/00 , H01L21/304
摘要： PURPOSE:To miniaturize the title apparatus and the installation space thereof by providing the guide member for allowing a chemical solution to flow in a washing tank along the inner wall thereof to the flow-down end of a guide chute and mounting the guide chute to a support member possible to revolve, rise and fall. CONSTITUTION:A plurality of liquid-supply pipes 3a-3c supplying chemical solutions to a washing tank 1 are connected to the chemical solution supply head 2 arranged at a position higher than the upper surface of the washing tank 1 and downward sprinkling holes 4 sprinkling the chemical solutions supplied from the respective liquid supply pipes are provided. The chemical solution guide chute 5 arranged under the supply head 2 receives the chemical solutions flowing down from the sprinkling holes 4 to allow the same to flow down into the washing tank 1. A guide member 6 allowing the chemical solutions flowing out from the flow-down end 5' of the guide chute 5 to flow in the tank 1 along the inner wall of the tank 1 is provided to said flow- down end 5' and the guide chute 5 is mounted to a support member 7 possible to revolve, rise and fall. As a result, the apparatus and the installation space thereof can be miniaturized.

6. 发明专利

JPS6457624A CLEANING EQUIPMENT 失效
公开(公告)号：JPS6457624A
公开(公告)日：1989-03-03
申请号：JP21293887
申请日：1987-08-28
申请人： KURITA WATER IND LTD
发明人： KAMETANI SHIGEJI
IPC分类号： B08B3/04 , H01L21/304
摘要： PURPOSE:To obtain a cleaning equipment with excellent cleaning effect wherein convection does not occur with comparatively small amount of supplied water to a cleaning tank, even if the flow rate between wafers in a carrier is increased, by making the opening ratio of a region of a rectifying plate just under part where an object to be cleaned is dipped, larger than the other parts, said rectifying plate being rackwise provided above the wafer supplying position in a cleaning tank. CONSTITUTION:The title cleaning equipment comprizes a cleaning tank 1 wherein water to be supplied to the bottom part is made to overflow from the upper part, and an object 8 to be cleaned which is dipped in the inside is washed with water, and a rectifying plate 7 provided rackwise above the water supplying position in the cleaning tank 1. The opening ratio of a region 7a of the rectifying plate 7 just under the part where the object 8 to be cleaned is dipped, is made larger than the other parts 7b. For example, the rectifying plate 7 is provided rackwise a little higher than the set position of a spraying pipe 3. In the region 7a just under the part where a semiconductor wafer 8 is dipped, the rectifying plate 7 has 25mm diameter holes 8a having the respective centers at the four corners of 27mm side squares which are mutually adjacent in length and breadth. In the other parts 7b, the above plate 7 has 2.5mm diameter holes 8b at the four corners and the centers of 10mm side squares which mutually adjacent in length and breadth.

7. 发明专利

JP2009219995A Gas-dissolved water supply system 有权
标题翻译：气体溶解水供应系统
公开(公告)号：JP2009219995A
公开(公告)日：2009-10-01
申请号：JP2008066269
申请日：2008-03-14
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , MORITA HIROSHI , KAMETANI SHIGEJI
IPC分类号： B08B3/08 , H01L21/304
CPC分类号： C02F1/68 , C02F1/66 , C02F1/685 , C02F1/727 , C02F1/74
摘要： PROBLEM TO BE SOLVED: To provide a gas-dissolved water supply system which can efficiently produce gas-dissolved water of a high concentration and can circulate and supply the water to a use point.
SOLUTION: Waste water (or rinsing waste water) after washing a material to be washed with gas (oxygen)-dissolved water is stored into a storage tank 1 via a pipe 15, and make-up water is supplied via a make-up water pipe 1a. Water in the storage tank 1 is fed to a purifying device 4 via a forced feed pump 2 and a heat-exchanger 3 for keeping water temperature constant. Water wherein foreign matters are removed by the purifying device 4 is fed to a degassing device 6 via a flow meter 5. Thereafter, gas is dissolved into the water by a gas dissolving device 7, chemical is added thereto and, thereafter, the water is fed to a use point.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够有效地生产高浓度的溶解溶解水的气体溶解的供水系统，并且可以将水循环并供给到使用点。
解决方案：用气体（氧）溶解的水洗涤待洗涤物质后的废水（或漂洗废水）通过管道15储存在储罐1中，补给水通过制造水管1a。储罐1中的水通过强制供给泵2和用于保持水温恒定的热交换器3供给到净化装置4。由净化装置4除去异物的水通过流量计5供给到脱气装置6.然后，通过气体溶解装置7将气体溶解在水中，向其中加入化学物质，喂给使用点。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2009044042A Immersing type processing apparatus of object to be processed, and method of processing the object 有权
标题翻译：要处理的对象类型处理装置，以及处理对象的方法
公开(公告)号：JP2009044042A
公开(公告)日：2009-02-26
申请号：JP2007209204
申请日：2007-08-10
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , MORITA HIROSHI , KUROBE HIROSHI , KAMETANI SHIGEJI
IPC分类号： H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide an immersing type processing apparatus and method which can suppress a gas from dispersing into the atmosphere outside the processing apparatus when extracting the object from a liquid.
SOLUTION: In the processing apparatus and method, the air blown from an air blower 5 is sent to first and second gas jetting nozzles 4a, 5a. The airs jetted out respectively from the first and second gas jetting nozzles 4a, 5a are sucked respectively into first and second gas sucking nozzles 4b, 5b so as to form two sets of air curtains in a releasing portion 1a. When extracting the object 32 from the releasing portion 1a to the outside of a container 1, a liquid 31 left on the whole surface of the object 32 is blown away enough by the airs blown down respectively from the first and second gas jetting nozzles 4a, 5a.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种浸渍型处理装置和方法，当从液体中提取物体时，可以抑制气体分散到处理装置外部的大气中。解决方案：在处理设备和方法中，从吹风机5吹出的空气被送到第一和第二气体喷射喷嘴4a，5a。分别从第一和第二气体喷射喷嘴4a，5a喷出的空气被分别吸入第一和第二气体吸入喷嘴4b，5b，以便在释放部分1a中形成两组气帘。当将物体32从释放部分1a提取到容器1的外部时，残留在物体32的整个表面上的液体31被分别从第一和第二气体喷射喷嘴4a吹出的空气吹走， 5a。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2007319843A Gas dissolving module 审中-公开
标题翻译：气体解析模块
公开(公告)号：JP2007319843A
公开(公告)日：2007-12-13
申请号：JP2006156404
申请日：2006-06-05
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , KAMETANI SHIGEJI , MORITA HIROSHI
IPC分类号： B01D53/22 , B01F1/00 , B01F15/02 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a gas dissolving module which can stably discharge a condensate collected in a gas chamber over a long period, is free from troubles accompanying the discharge of the condensate, and can produce gas-dissolved water with a desired concentration.
SOLUTION: The gas dissolving module is divided into a water chamber and the gas chamber by a gas-permeable membrane. Water to be treated is fed to the water chamber, and gas to be dissolved in the water to be treated is fed to the gas chamber. One end of a condensate discharge pipe is made to communicate with the gas chamber, and the other end is connected to a pressure reducing device without a mechanical driving part, for example, an aspirator, to discharge the condensate collected in the gas chamber.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够长时间稳定地排出收集在气室中的冷凝物的气体溶解组件，没有伴随排出冷凝物的问题，并且可以产生气体溶解的水，所需浓度。解决方案：气体溶解模块通过透气膜分为水室和气室。待处理的水被送入水室，待溶解在被处理水中的气体被供给至气室。使冷凝水排出管的一端与气室连通，另一端与没有机械驱动部件例如吸气器的减压装置连接，以排出收集在气室中的冷凝物。版权所有（C）2008，JPO＆INPIT

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