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    • 5. 发明授权
    • Power supply for microwave discharge light source
    • 微波放电光源供电
    • US4988922A
    • 1991-01-29
    • US329786
    • 1989-03-17
    • Isao ShodaHitoshi KodamaKazuo MagomeAkihiko IwataKenji YoshizawaMasakazu Taki
    • Isao ShodaHitoshi KodamaKazuo MagomeAkihiko IwataKenji YoshizawaMasakazu Taki
    • H01J65/04H05B41/24H05B41/282H05B41/392
    • H01J65/044H05B41/24
    • A power supply circuit for a magnetron adapted to supply microwave energy to an electrodeless discharge bulb is disclosed. The circuit comprises a rectifier coupled across a commercial AC voltage source, a filter for smoothing the output of the rectifier, an inverter for converting the DC voltage supplied from the filter into a high frequency AC voltage, a step-up transformer for stepping up the high frequency AC voltage outputted from the inverter, and a rectifier which rectifies the high voltage AC output of the transformer into a unidirectional voltage which is supplied to the magnetron. The inverter switching is controlled by a pulse width modulation control circuit to maintain the magnetron output power at a predetermined level. According to one aspect, an inductance is provided in the circuit which supresses high frequency components in the currents flowing through the windings of the transformer; according to another aspect, the inverter switching frequency (expressed in kHz) is set at a value not less than 1500/D, wherein D represents the diameter of the electrodeless bulb expressed in millimeters; according to still another aspect, the peak to the mean value ratio of the magnetron current is limited under 3.75 inclusive.
    • PCT No.PCT / JP88 / 00753 Sec。 371日期:1989年3月17日 102(e)日期1989年3月17日PCT Filed 1988年7月27日PCT公开号 出版物WO89 / 01234 日期:1989年2月9日。公开了一种用于向无电极放电灯提供微波能量的磁控管的电源电路。 该电路包括跨越商用交流电压源耦合的整流器,用于平滑整流器输出的滤波器,将从滤波器提供的直流电压转换成高频交流电压的逆变器,用于加速 从逆变器输出的高频交流电压,以及将变压器的高压交流输出整流为提供给磁控管的单向电压的整流器。 逆变器切换由脉宽调制控制电路控制,以将磁控管输出功率维持在预定水平。 根据一个方面,在电路中提供电感,其抑制流过变压器绕组的电流中的高频分量; 根据另一方面,逆变器开关频率(以kHz表示)设定为不小于1500 / D的值,其中D表示以毫米表示的无电极灯泡的直径; 根据另一方面,磁控管电流的平均值比的峰值被限制在3.75以下。
    • 7. 发明授权
    • Welding machine with automatic seam tracking
    • 焊接机自动焊缝跟踪
    • US4571479A
    • 1986-02-18
    • US588418
    • 1984-03-12
    • Susumu MaedaMasakazu TakiKenji Yoshizawa
    • Susumu MaedaMasakazu TakiKenji Yoshizawa
    • B23K9/127B23Q35/13B23K9/12
    • B23Q35/13B23K9/1276
    • An automatic tracking welding machine includes a pair of rotatably mounted sensors 6a, 6b disposed in advance of a welding torch 3 and coaxial therewith for detecting magnetic leakage flux across a weld line gap 10. The sensors are driven to equalize their outputs by a reversible stepping motor 15 supplied with drive pulses whose frequency is proportional to the sensor output difference up to a fixed limit, thereby implementing slowdown as the center or zero differential point is approached. Alternatively, a greater number of fixed sensors may be peripherally spaced around the torch housing and their outputs sequentially scanned and peak detected to track the weld line gap. In another embodiment a spaced pair of sensors 116a, 116b is laterally and bidirectionally driven by a reversible d.c. motor 123 supplied with a voltage proportional to the off-center distance detected by the sensors, thus also implementing slowdown as the zero point approaches. Hall effect sensor elements encased in a non-magnetic metal housing may be used to avoid sputtering damage. A single leakage flux sensor may also be employed and periodically scanned laterally across the weld line gap, whereby a peak or zero slope in its output would indicate centering.
    • 自动跟踪焊机包括一对可旋转地安装的传感器6a,6b,其设置在焊枪3之前并且与其同轴,用于检测穿过焊缝间隙10的漏磁通量。传感器被驱动以通过可逆步进来均衡其输出 电动机15提供的驱动脉冲的频率与传感器输出差异成正比,达到固定极限,从而在接近中心或零点差时实现减速。 或者,更多数量的固定传感器可以围绕焊炬壳体周边间隔开,并且其输出被顺序地扫描并且被检测到峰值以跟踪焊缝间隙。 在另一个实施例中,间隔开的一对传感器116a,116b由可逆的直流侧向和双向驱动。 电动机123被提供与由传感器检测到的离心距离成比例的电压,因此也随着零点接近而实现减速。 可以使用封装在非磁性金属壳体中的霍尔效应传感器元件来避免溅射损坏。 也可以采用单个漏磁通传感器并且横向跨越焊缝间隙周期性扫描,由此其输出中的峰值或零斜率将指示居中。
    • 8. 发明授权
    • Apparatus for forming thin film and method of manufacturing semiconductor film
    • 用于形成薄膜的装置和制造半导体膜的方法
    • US08474403B2
    • 2013-07-02
    • US13237001
    • 2011-09-20
    • Mutsumi TsudaMasakazu Taki
    • Mutsumi TsudaMasakazu Taki
    • C23C16/00
    • H01L21/0262C23C16/24C23C16/45523C23C16/515H01L21/02532H01L31/202Y02E10/50Y02P70/521
    • An apparatus including a vacuum chamber having a substrate holding unit that holds a substrate and a plasma electrode facing the substrate, a first gas supply unit that supplies a H2 gas to the vacuum chamber at a constant flow rate, a second gas supply unit that opens or closes a valve to turn on or off the supply of a SiH4 gas, a high-frequency power source that applies a high frequency voltage to the plasma electrode, a shield box that is connected to a ground so as to surround the plasma electrode outside the vacuum chamber, and a control unit that controls the valve such that the SiH4 gas is periodically supplied to the vacuum chamber and modulates the amplitude of high frequency power in synchronization with the opening or closing of the valve, and the valve is provided in the shield box.
    • 一种包括具有保持基板的基板保持单元和面向基板的等离子体电极的真空室的设备,以恒定流量向真空室供给H2气体的第一气体供给单元,打开的第二气体供给单元 或关闭阀门以接通或关闭向等离子体电极施加高频电压的高频电源的SiH 4气体的供给,连接到地面以围绕等离子体电极外部的屏蔽盒 真空室和控制单元,其控制阀,使得SiH4气体周期性地供给到真空室,并且与阀的打开或关闭同步地调制高频功率的振幅,并且阀设置在 屏蔽盒。