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    • 3. 发明授权
    • Scanning electron microscope
    • 扫描电子显微镜
    • US5614713A
    • 1997-03-25
    • US617030
    • 1996-03-18
    • Atsushi KobaruTadashi OtakaTatsuya MaedaKatsuhiro Sasada
    • Atsushi KobaruTadashi OtakaTatsuya MaedaKatsuhiro Sasada
    • H01J37/20H01J37/21H01J37/22H01J37/244H01J37/26
    • H01J37/22H01J2237/216H01J2237/2482
    • An electron beam is focused on a specimen by a focusing lens. A light beam is incident on the position of irradiation of the specimen with the electron beam and the reflected light beam is detected by a linear light detector. The output of the detector is used to measure the height of the specimen at the position of irradiation of the electron beam. The specimen is moved in a plane perpendicular to an optical axis of the focusing lens. A specimen height measuring device carries out the height measurement of the specimen at a position to be observed on the specimen and at positions thereon which are in the vicinity of the position to be observed, when those positions are located at the position of irradiation of the electron beam. The specimen height measuring device averages the measured values so as to produce a focusing correction signal on the basis thereof and controls the focusing lens on the basis of the focusing correction signal.
    • 电子束通过聚焦透镜聚焦在样本上。 光束入射到具有电子束的样本的照射位置,并且通过线性光检测器检测反射光束。 检测器的输出用于测量样品在电子束照射位置的高度。 样本在垂直于聚焦透镜的光轴的平面内移动。 样本高度测量装置在样本上观察的位置和在待观察位置附近的位置上执行样本的高度测量,当这些位置位于待观察位置的位置时 电子束。 样本高度测量装置对测量值进行平均,以便基于此产生聚焦校正信号,并且基于聚焦校正信号控制聚焦透镜。
    • 4. 发明授权
    • Electron beam apparatus
    • 电子束装置
    • US5598002A
    • 1997-01-28
    • US632664
    • 1996-03-28
    • Hideo TodokoroTadashi OtakaTatsuya MaedaKatsuhiro Sasada
    • Hideo TodokoroTadashi OtakaTatsuya MaedaKatsuhiro Sasada
    • H01J37/141H01J37/20H01J37/21H01L21/027G02B21/18
    • H01J37/21H01J2237/216H01J2237/2482
    • An electron beam apparatus focusses an electron beam onto a specimen by means of an objective magnetic lens. In order to detect changes in the height of the specimen, a laser light beam from a laser source is incident on the specimen and the reflected laser beam is detected by a light detector. Any change in the height of the specimen changes the path of the laser beam to the detector. Therefore, by monitoring the detector, the focussing of the electron beam on the specimen can be controlled by varying the current to an excitation coil of the objective magnetic lens or by moving the specimen via a mounting stage. At least one of the pole pieces of the objective lens is on the opposite side of the path of the laser beam to the source of the electron beam, so that the objective magnetic lens may be close to the specimen, permitting a short focal length. Thus, the laser beam may pass between the pole pieces. An optical microscope may also be provided to permit the specimen to be viewed. The viewing path of the optical microscope extends through an opening in one or both of the pole pieces of the objective magnetic lens.
    • 电子束装置通过物镜磁性透镜将电子束聚焦在样本上。 为了检测样品的高度变化,来自激光源的激光束入射到样品上,并且通过光检测器检测反射的激光束。 样品高度的任何变化会改变激光束到检测器的路径。 因此,通过监视检测器,可以通过改变到物镜磁性透镜的激励线圈的电流或通过安装级移动样本来控制电子束在样本上的聚焦。 物镜的极片中的至少一个位于激光束到电子束源的路径的相对侧,使得物镜磁性透镜可能靠近样本,允许短焦距。 因此,激光束可以在极片之间通过。 还可以提供光学显微镜以允许观察样品。 光学显微镜的观察路径延伸穿过物镜磁性透镜的一个或两个极片中的开口。
    • 8. 发明授权
    • Electron microscope
    • 电子显微镜
    • US07626166B2
    • 2009-12-01
    • US12038076
    • 2008-02-27
    • Hiroyuki SaitoKatsuhiro Sasada
    • Hiroyuki SaitoKatsuhiro Sasada
    • H01J37/16H01J3/14G01N23/04
    • G01N23/225H01J37/10H01J37/18H01J37/265H01J37/28H01J2237/022H01J2237/204H01J2237/2817
    • An object of the present invention is to prevent foreign bodies attracted by a magnetic field of an objective lens or an electric field of an electrode plate and adhered to a surface of the objective lens or electrode plate from dropping onto the surface of a sample and adhering there during observation of the sample.To achieve the above object, an electron microscope in which, when a sample to be measured is moved away from below an objective lens, an exciting current to the objective lens of a scanning electron microscope is turned off or excitation thereof is made weaker than before the sample to be measured being moved away, or an applied voltage to an acceleration cylinder for accelerating an electron beam is turned off or made lower than before the sample to be measured being moved away is proposed.
    • 本发明的目的是防止被物镜的磁场或电极板的电场所吸引的异物附着在物镜或电极板的表面上,从而落在样品的表面上并粘附 在样品观察期间。 为了实现上述目的,一种电子显微镜,其中当待测量的样品从物镜的下方移开时,扫描电子显微镜的物镜的激励电流被关闭或使其激发弱于之前 要测量的样本被移开,或提供加速电子束的加速气缸的施加电压被关闭或低于被测量样品移开之前。
    • 9. 发明申请
    • Electron Microscope
    • 电子显微镜
    • US20080203301A1
    • 2008-08-28
    • US12038076
    • 2008-02-27
    • Hiroyuki SaitoKatsuhiro Sasada
    • Hiroyuki SaitoKatsuhiro Sasada
    • G01N23/04H01J3/14
    • G01N23/225H01J37/10H01J37/18H01J37/265H01J37/28H01J2237/022H01J2237/204H01J2237/2817
    • An object of the present invention is to prevent foreign bodies attracted by a magnetic field of an objective lens or an electric field of an electrode plate and adhered to a surface of the objective lens or electrode plate from dropping onto the surface of a sample and adhering there during observation of the sample.To achieve the above object, an electron microscope in which, when a sample to be measured is moved away from below an objective lens, an exciting current to the objective lens of a scanning electron microscope is turned off or excitation thereof is made weaker than before the sample to be measured being moved away, or an applied voltage to an acceleration cylinder for accelerating an electron beam is turned off or made lower than before the sample to be measured being moved away is proposed.
    • 本发明的目的是防止被物镜的磁场或电极板的电场所吸引的异物附着在物镜或电极板的表面上,从而落在样品的表面上并粘附 在样品观察期间。 为了实现上述目的,一种电子显微镜,其中当待测量的样品从物镜的下方移开时,扫描电子显微镜的物镜的激励电流被关闭或使其激发弱于之前 要测量的样本被移开,或提供加速电子束的加速气缸的施加电压被关闭或低于被测量样品移开之前。