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1. 发明申请

US20110294068A1 Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties 审中-公开
公开(公告)号：US20110294068A1
公开(公告)日：2011-12-01
申请号：US13190226
申请日：2011-07-25
申请人： Joy Cheng , Dario L. Goldfarb , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Libor Vyklicky
发明人： Joy Cheng , Dario L. Goldfarb , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Libor Vyklicky
IPC分类号： G03F7/004
CPC分类号： G03F7/091 , G03F7/0752 , Y10S430/136 , Y10S438/952 , Y10T428/24802
摘要： A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer. Pattern-wise exposing the coated substrate to imaging radiation and contacting the coated substrate with a developer, produces the patterned material layer. Any optional top coat material and a portion of the photoresist layer can be simultaneously removed from the coated substrate to form a patterned photoresist layer on the substrate.

2. 发明申请

US20110300483A1 Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties 审中-公开
标题翻译：具有内置抗反射特性的自分离多层成像叠层
公开(公告)号：US20110300483A1
公开(公告)日：2011-12-08
申请号：US13190252
申请日：2011-07-25
申请人： Joy Cheng , Dario L. Goldfarb , David R. Medeiros , Daniel P. Sanders , Dirk Pfeiffer , Libor Vyklicky
发明人： Joy Cheng , Dario L. Goldfarb , David R. Medeiros , Daniel P. Sanders , Dirk Pfeiffer , Libor Vyklicky
IPC分类号： G03F7/004 , G03F7/075
CPC分类号： G03F7/091 , G03F7/0752 , Y10S430/136 , Y10S438/952 , Y10T428/24802
摘要： A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer. Pattern-wise exposing the coated substrate to imaging radiation and contacting the coated substrate with a developer, produces the patterned material layer. Any optional top coat material and a portion of the photoresist layer can be simultaneously removed from the coated substrate to form a patterned photoresist layer on the substrate.
摘要翻译：涂覆方法包括使用包含聚合物光致抗蚀剂材料和包含在单一溶液中的抗反射涂层材料的自分离聚合物组合物在基材上形成图案化材料层。当将该溶液沉积在基材上并除去溶剂时，两种材料自分离成两层。这产生了具有单轴双层涂层的涂覆基材，该单轴双层涂层在垂直于基板的方向上具有顶部光刻胶涂层和底部抗反射涂层。将经涂覆的基底图案地曝光成成像辐射并使涂覆的基底与显影剂接触，产生图案化的材料层。任何可选的表面涂层材料和光致抗蚀剂层的一部分可以同时从涂覆的基底上移除，以在基底上形成图案化的光致抗蚀剂层。

3. 发明授权

US07588879B2 Graded spin-on organic antireflective coating for photolithography 有权
标题翻译：梯度旋涂有机抗反射涂层用于光刻
公开(公告)号：US07588879B2
公开(公告)日：2009-09-15
申请号：US12042709
申请日：2008-03-05
申请人： Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
发明人： Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
IPC分类号： G03F7/11
CPC分类号： G03F7/091 , Y10S438/952
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译：提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。

4. 发明授权

US07816069B2 Graded spin-on organic antireflective coating for photolithography 有权
标题翻译：梯度旋涂有机抗反射涂层用于光刻
公开(公告)号：US07816069B2
公开(公告)日：2010-10-19
申请号：US11473338
申请日：2006-06-23
申请人： Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
发明人： Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
IPC分类号： G03F7/11 , G03C1/00 , C08L29/04 , C08L27/12
CPC分类号： G03F7/091 , Y10S438/952
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译：提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。

5. 发明申请

US20080213707A1 Graded Spin-on Organic Antireflective Coating for Photolithography 有权
标题翻译：用于光刻的分级自旋有机抗反射涂层
公开(公告)号：US20080213707A1
公开(公告)日：2008-09-04
申请号：US12042709
申请日：2008-03-05
申请人： Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
发明人： Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
IPC分类号： G03F1/14
CPC分类号： G03F7/091 , Y10S438/952
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译：提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。

6. 发明申请

US20080008955A1 Graded spin-on organic antireflective coating for photolithography 有权
标题翻译：梯度旋涂有机抗反射涂层用于光刻
公开(公告)号：US20080008955A1
公开(公告)日：2008-01-10
申请号：US11473338
申请日：2006-06-23
申请人： Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
发明人： Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
IPC分类号： G03C1/00
CPC分类号： G03F7/091 , Y10S438/952
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译：提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。

7. 发明授权

US08137874B2 Organic graded spin on BARC compositions for high NA lithography 有权
标题翻译：用于高NA光刻的BARC组合物上的有机分级纺丝
公开(公告)号：US08137874B2
公开(公告)日：2012-03-20
申请号：US12018541
申请日：2008-01-23
申请人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
发明人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
IPC分类号： G03F7/09 , G03F7/40
CPC分类号： G03F7/091
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译：提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。

8. 发明申请

US20090186294A1 ORGANIC GRADED SPIN ON BARC COMPOSITIONS FOR HIGH NA LITHOGRAPHY 有权
标题翻译：有机高分子转印在BARC组合物上，用于高NA光刻
公开(公告)号：US20090186294A1
公开(公告)日：2009-07-23
申请号：US12018541
申请日：2008-01-23
申请人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
发明人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
IPC分类号： G03F7/26 , G03F7/004
CPC分类号： G03F7/091
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译：提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。

9. 发明授权

US08652762B2 Organic graded spin on BARC compositions for high NA lithography 有权
标题翻译：用于高NA光刻的BARC组合物上的有机分级纺丝
公开(公告)号：US08652762B2
公开(公告)日：2014-02-18
申请号：US13423838
申请日：2012-03-19
申请人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
发明人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
IPC分类号： H01L21/312 , H01L29/02 , G03F7/38
CPC分类号： G03F7/091
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译：提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。

10. 发明申请

US20100009132A1 SELF-SEGREGATING MULTILAYER IMAGING STACK WITH BUILT-IN ANTIREFLECTIVE PROPERTIES 有权
标题翻译：自包含多层抗反射特性的多层成像叠层
公开(公告)号：US20100009132A1
公开(公告)日：2010-01-14
申请号：US12172233
申请日：2008-07-12
申请人： Joy Cheng , Dario L. Goldfarb , David R. Medeiros , Daniel P. Sanders , Dirk Pfeifer , Libor Vylicky
发明人： Joy Cheng , Dario L. Goldfarb , David R. Medeiros , Daniel P. Sanders , Dirk Pfeifer , Libor Vylicky
IPC分类号： G03F7/20 , G03F7/004 , B32B3/10
CPC分类号： G03F7/091 , G03F7/0752 , Y10S430/136 , Y10S438/952 , Y10T428/24802
摘要： A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material. The polymeric photoresistive material and the antireflective coating material that make up the self segregating composition are contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. The substrate can comprise one of a ceramic, dielectric, metal, or semiconductor material and in some instances a material such as a BARC material that is not from the self segregating composition. The composition may also contain a radiation-sensitive acid generator and a base quencher. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer. The process may also include optionally coating a top coat material on the coated substrate. Pattern-wise exposing the coated substrate to imaging radiation and contacting the coated substrate with a developer, produces the patterned material layer wherein the optional top coat material and a portion of the photoresist layer are simultaneously removed from the coated substrate, thereby forming a patterned photoresist layer on the substrate. Alternatively, the optional top coat material, a portion of the photoresist layer and a portion of the bottom antireflective layers are simultaneously removed from the coated substrate by the developer, thereby forming a patterned photoresist layer on the substrate.
摘要翻译：涂覆方法包括使用包含聚合物光致抗蚀剂材料和抗反射涂层材料的自分离聚合物组合物在基材上形成图案化材料层。构成自分离组合物的聚合物光致抗蚀剂材料和抗反射涂层材料包含在单一溶液中。当将该溶液沉积在基材上并除去溶剂时，两种材料自分离成两层。衬底可以包括陶瓷，电介质，金属或半导体材料中的一种，并且在一些情况下可以是不是来自自分离组合物的诸如BARC材料的材料。组合物还可以含有辐射敏感性酸产生剂和碱猝灭剂。这产生了具有单轴双层涂层的涂覆基材，该单轴双层涂层在垂直于基板的方向上具有顶部光刻胶涂层和底部抗反射涂层。该方法还可以包括任选在涂覆的基材上涂覆顶涂层材料。将涂覆的基底图案地曝光成成像辐射并使涂覆的基底与显影剂接触，产生图案化材料层，其中可任选的外涂层材料和光刻胶层的一部分同时从涂覆的基底上移除，从而形成图案化的光致抗蚀剂层。或者，可选的顶涂层材料，光致抗蚀剂层的一部分和底部抗反射层的一部分由显影剂同时从涂覆的基底上移除，从而在基板上形成图案化的光致抗蚀剂层。

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