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    • 3. 发明授权
    • Nanotube random access memory (NRAM) and transistor integration
    • 纳米管随机存取存储器(NRAM)和晶体管集成
    • US08125824B1
    • 2012-02-28
    • US12875044
    • 2010-09-02
    • Jonathan W. WardAdrian N. RobinsonScott Anderson
    • Jonathan W. WardAdrian N. RobinsonScott Anderson
    • G11C11/34
    • G11C13/025B82Y10/00
    • A nanotube random access memory (NRAM) structure is provided. The structure includes a substrate, a gate electrode disposed in the substrate, and a first nanotube fabric disposed on the substrate. The first nanotube fabric has a channel region spaced apart from the gate electrode by a portion of the substrate. The structure also includes a drain contact contacting the first nanotube fabric. The structure also includes a second nanotube fabric disposed on the substrate, and is adjacent and connected to the first nanotube fabric. The structure also includes a source contact contacting the second nanotube fabric. The first nanotube fabric is a high-voltage fabric compared to the second nanotube fabric such that when a voltage is applied across the first nanotube fabric and the second nanotube fabric via the drain contact and the source contact, the second nanotube fabric is permitted to switch without switching the first nanotube fabric.
    • 提供了纳米管随机存取存储器(NRAM)结构。 该结构包括衬底,设置在衬底中的栅电极和布置在衬底上的第一纳米管织物。 第一纳米管织物具有通过衬底的一部分与栅电极间隔开的沟道区。 该结构还包括接触第一纳米管织物的漏极接触。 该结构还包括布置在基底上并与第一纳米管织物相邻并连接的第二纳米管织物。 该结构还包括接触第二纳米管织物的源极接触。 与第二纳米管织物相比,第一纳米管织物是高电压织物,使得当经由漏极接触和源极接触跨越第一纳米管织物和第二纳米管织物施加电压时,允许第二纳米管织物切换 而不切换第一纳米管织物。