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    • 4. 发明授权
    • Electrical devices containing a carbon nanotube switching layer with a passivation layer disposed thereon and methods for production thereof
    • 包含其上设置有钝化层的碳纳米管切换层的电气装置及其制造方法
    • US08604459B1
    • 2013-12-10
    • US13491550
    • 2012-06-07
    • Jonathan W. WardGaro J. Derderian
    • Jonathan W. WardGaro J. Derderian
    • H01L29/06
    • H01L29/0673B82Y10/00H01L51/0048H01L51/0558H01L51/107
    • Electrical devices containing carbon nanotubes can be passivated to protect the carbon nanotubes from degradation while substantially preserving the carbon nanotubes' electrical conductivity and switching characteristics. Such electrical devices can include a first metal contact, a switching layer containing a plurality of carbon nanotubes disposed on the first metal contact, a passivation layer containing amorphous carbon, a metal carbide, or any combination thereof that is disposed on at least a top surface of the switching layer, and a second metal contact disposed upon the passivation layer. Methods for forming the electrical devices can include disposing a passivation layer containing amorphous carbon on at least a top surface of the switching layer, and optionally heating to at least partially convert the amorphous carbon within the passivation layer into a metal carbide.
    • 可以钝化包含碳纳米管的电子器件以保护碳纳米管免受降解,同时基本上保留碳纳米管的电导率和开关特性。 这样的电气装置可以包括第一金属触点,包含设置在第一金属触点上的多个碳纳米管的开关层,包含无定形碳的钝化层,金属碳化物或其任何组合,其设置在至少一个顶表面 以及设置在钝化层上的第二金属触点。 用于形成电气装置的方法可以包括在开关层的至少顶表面上设置含有无定形碳的钝化层,以及任选地加热至少部分地将钝化层内的无定形碳转化为金属碳化物。
    • 5. 发明授权
    • Nanotube random access memory (NRAM) and transistor integration
    • 纳米管随机存取存储器(NRAM)和晶体管集成
    • US08125824B1
    • 2012-02-28
    • US12875044
    • 2010-09-02
    • Jonathan W. WardAdrian N. RobinsonScott Anderson
    • Jonathan W. WardAdrian N. RobinsonScott Anderson
    • G11C11/34
    • G11C13/025B82Y10/00
    • A nanotube random access memory (NRAM) structure is provided. The structure includes a substrate, a gate electrode disposed in the substrate, and a first nanotube fabric disposed on the substrate. The first nanotube fabric has a channel region spaced apart from the gate electrode by a portion of the substrate. The structure also includes a drain contact contacting the first nanotube fabric. The structure also includes a second nanotube fabric disposed on the substrate, and is adjacent and connected to the first nanotube fabric. The structure also includes a source contact contacting the second nanotube fabric. The first nanotube fabric is a high-voltage fabric compared to the second nanotube fabric such that when a voltage is applied across the first nanotube fabric and the second nanotube fabric via the drain contact and the source contact, the second nanotube fabric is permitted to switch without switching the first nanotube fabric.
    • 提供了纳米管随机存取存储器(NRAM)结构。 该结构包括衬底,设置在衬底中的栅电极和布置在衬底上的第一纳米管织物。 第一纳米管织物具有通过衬底的一部分与栅电极间隔开的沟道区。 该结构还包括接触第一纳米管织物的漏极接触。 该结构还包括布置在基底上并与第一纳米管织物相邻并连接的第二纳米管织物。 该结构还包括接触第二纳米管织物的源极接触。 与第二纳米管织物相比,第一纳米管织物是高电压织物,使得当经由漏极接触和源极接触跨越第一纳米管织物和第二纳米管织物施加电压时,允许第二纳米管织物切换 而不切换第一纳米管织物。