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1. 发明授权

US06076404A Micromechanical sensor including a single-crystal silicon support 失效
标题翻译：微机械传感器包括单晶硅支架
公开(公告)号：US06076404A
公开(公告)日：2000-06-20
申请号：US791106
申请日：1997-01-29
申请人： Joerg Muchow , Horst Muenzel , Michael Offenberg , Winfried Waldvogel
发明人： Joerg Muchow , Horst Muenzel , Michael Offenberg , Winfried Waldvogel
IPC分类号： G01H11/06 , G01L9/00 , G01P15/08 , G01P15/12 , G01P15/125
CPC分类号： G01H11/06 , G01L9/0042 , G01L9/0054 , G01L9/0073 , G01P15/0802 , G01P15/123 , G01P15/125 , G01P2015/0814 , G01P2015/0817 , G01P2015/0828
摘要： A micromechanical sensor includes a support of silicon substrate having an epitaxial layer of silicon applied on the silicon substrate. A part of the epitaxial layer is laid bare to form at least one micromechanical deflection part by an etching process. The bared deflection part is made of polycrystalline silicon which has grown in polycrystalline form during the epitaxial process over a silicon-oxide layer which has been removed by etching. In the support region and/or at the connection to the silicon substrate, the exposed deflection part passes into single crystal silicon. By large layer thicknesses, a large working capacity of the sensor is possible. The sensor structure provides enhanced mechanical stability, processability, and possibilities of shaping, and it can be integrated, in particular, in a bipolar process or mixed process (bipolar-CMOS, bipolar-CMOS-DMOS).
摘要翻译：微机械传感器包括具有施加在硅衬底上的硅的外延层的硅衬底的支撑体。通过蚀刻工艺将外延层的一部分裸露以形成至少一个微机械偏转部分。裸露的偏转部分由多晶硅制成，该多晶硅在外延生长过程中在已通过蚀刻去除的氧化硅层上形成多晶体。在支撑区域和/或与硅衬底的连接处，暴露的偏转部分进入单晶硅。通过大层厚度，传感器的大工作容量是可能的。该传感器结构提供增强的机械稳定性，可加工性和成形的可能性，并且其可以特别集成在双极工艺或混合工艺（双极CMOS，双极型CMOS-DMOS）中。

2. 发明授权

US5616514A Method of fabricating a micromechanical sensor 失效
标题翻译：制造微机械传感器的方法
公开(公告)号：US5616514A
公开(公告)日：1997-04-01
申请号：US470373
申请日：1995-06-06
申请人： Joerg Muchow , Horst Muenzel , Michael Offenberg , Winfried Waldvogel
发明人： Joerg Muchow , Horst Muenzel , Michael Offenberg , Winfried Waldvogel
IPC分类号： G01H11/06 , G01L9/00 , G01P15/08 , G01P15/12 , G01P15/125 , H01L21/20
CPC分类号： G01H11/06 , G01L9/0042 , G01L9/0054 , G01L9/0073 , G01P15/0802 , G01P15/123 , G01P15/125 , G01P2015/0814 , G01P2015/0817 , G01P2015/0828
摘要： A micromechanical sensor includes a support of silicon substrate having an epitaxial layer of silicon applied on the silicon substrate. A part of the epitaxial layer is laid bare to form at least one micromechanical deflection part by an etching process. The bared deflection part is made of polycrystalline silicon which has grown in polycrystalline form during the epitaxial process over a silicon-oxide layer which has been removed by etching. In the support region and/or at the connection to the silicon substrate, the exposed deflection part passes into single crystal silicon. By large layer thicknesses, a large working capacity of the sensor is possible. The sensor structure provides enhanced mechanical stability, processability, and possibilities of shaping, and it can be integrated, in particular, in a bipolar process or mixed process (bipolar-CMOS, bipolar-CMOS-DMOS).
摘要翻译：微机械传感器包括具有施加在硅衬底上的硅的外延层的硅衬底的支撑体。通过蚀刻工艺将外延层的一部分裸露以形成至少一个微机械偏转部分。裸露的偏转部分由多晶硅制成，该多晶硅在外延生长过程中在已通过蚀刻去除的氧化硅层上形成多晶体。在支撑区域和/或与硅衬底的连接处，暴露的偏转部分进入单晶硅。通过大层厚度，传感器的大工作容量是可能的。该传感器结构提供增强的机械稳定性，可加工性和成形的可能性，并且其可以特别集成在双极工艺或混合工艺（双极CMOS，双极CMOS-DMOS）中。

3. 发明授权

US06318175B1 Micromechanical sensor and method for the manufacture thereof 有权
标题翻译：微机械传感器及其制造方法
公开(公告)号：US06318175B1
公开(公告)日：2001-11-20
申请号：US09585141
申请日：2000-06-01
申请人： Joerg Muchow , Horst Muenzel , Michael Offenberg , Winfried Waldvogel
发明人： Joerg Muchow , Horst Muenzel , Michael Offenberg , Winfried Waldvogel
IPC分类号： G01P1500
CPC分类号： G01H11/06 , G01L9/0042 , G01L9/0054 , G01L9/0073 , G01P15/0802 , G01P15/123 , G01P15/125 , G01P2015/0814 , G01P2015/0817 , G01P2015/0828
摘要： A micromechanical sensor includes a support of silicon substrate having an epitaxial layer of silicon applied on the silicon substrate. A part of the epitaxial layer is laid bare to form at least one micromechanical deflection part by an etching process. The bared deflection part is made of polycrystalline silicon which has grown in polycrystalline form during the epitaxial process over a silicon-oxide layer which has been removed by etching. In the support region and/or at the connection to the silicon substrate, the exposed deflection part passes into single crystal silicon. By large layer thicknesses, a large working capacity of the sensor is possible. The sensor structure provides enhanced mechanical stability, processability, and possibilities of shaping, and it can be integrated, in particular, in a bipolar process or mixed process (bipolar-CMOS, bipolar-CMOS-DMOS).
摘要翻译：微机械传感器包括具有施加在硅衬底上的硅的外延层的硅衬底的支撑体。通过蚀刻工艺将外延层的一部分裸露以形成至少一个微机械偏转部分。裸露的偏转部分由多晶硅制成，该多晶硅在外延生长过程中在已通过蚀刻去除的氧化硅层上形成多晶体。在支撑区域和/或与硅衬底的连接处，暴露的偏转部分进入单晶硅。通过大层厚度，传感器的大工作容量是可能的。该传感器结构提供增强的机械稳定性，可加工性和成形的可能性，并且其可以特别集成在双极工艺或混合工艺（双极CMOS，双极CMOS-DMOS）中。

4. 发明申请

US20150036203A1 MICROMIRROR 审中-公开
公开(公告)号：US20150036203A1
公开(公告)日：2015-02-05
申请号：US14364991
申请日：2012-10-23
申请人： Heiko Nitsche , Frederic Njikam Njimonzie , Wolfram Schock , Joerg Muchow , Helmut Grutzeck , Zoltan Lestyan
发明人： Heiko Nitsche , Frederic Njikam Njimonzie , Wolfram Schock , Joerg Muchow , Helmut Grutzeck , Zoltan Lestyan
IPC分类号： G02B26/08 , G02B26/10
CPC分类号： G02B26/0833 , B81B3/0043 , B81B2201/042 , B81B2203/0109 , B81B2203/0163 , G02B7/1821 , G02B26/101 , G02B26/105
摘要： A micromirror including a first layer having a first main extension plane, and a second layer having a second main extension plane, the first main extension plane and the second main extension plane being situated parallel to one another, the first layer and the second layer being sectionally connected to one another via at least one connection area, at least one spring element being implemented in the first layer, a movably suspended mirror plate being implemented in the second layer, the mirror plate having a mirror surface on a first side parallel to the main extension plane and being connected on an opposing second side via the connection area to an anchor of the spring element, a part of the spring element on the second side of the mirror plate being movably situated in relation to the mirror plate. A two-mirror system having such a micromirror is also provided.
摘要翻译：一种微镜，包括具有第一主延伸面的第一层和具有第二主延伸面的第二层，第一主延伸面和第二主延伸面相互平行，第一层和第二层为通过至少一个连接区域彼此分开连接，至少一个弹簧元件被实施在第一层中，可移动悬挂的镜板被实施在第二层中，镜板具有在平行于第二层的第一侧上的镜面主延伸平面并经由连接区域连接到弹簧元件的锚固件的相对的第二侧上，反射镜板的第二侧上的弹簧元件的一部分相对于镜板可移动地定位。还提供了具有这种微镜的双镜像系统。

5. 发明申请

US20120133242A1 MICROMECHANICAL COMPONENT AND PRODUCTION METHOD FOR A MICROMECHANICAL COMPONENT 审中-公开
标题翻译：微生物组分的微生物组分和生产方法
公开(公告)号：US20120133242A1
公开(公告)日：2012-05-31
申请号：US13320712
申请日：2010-05-18
申请人： Frederic Njikam Njimonzie , Joerg Muchow , Zoltan Lestyan , Wolfram Schock
发明人： Frederic Njikam Njimonzie , Joerg Muchow , Zoltan Lestyan , Wolfram Schock
IPC分类号： H02N1/00 , H05K13/00
CPC分类号： G02B26/0841 , B81B3/0021 , B81B2201/033 , B81B2201/042 , Y10T29/49002
摘要： A micromechanical component has an outer stator electrode component and an outer actuator electrode component which is connected to a holder via at least one outer spring, an adjustable element being adjustable about a first rotation axis by application of a first voltage between the outer actuator electrode component and the outer stator electrode component, and having an inner stator electrode component and an inner actuator electrode component having a first web with at least one electrode finger disposed thereon, the adjustable element being adjustable about a second rotation axis by application of a second voltage between the at least one electrode finger of the inner actuator electrode component and the inner stator electrode component, and the inner actuator electrode component being connected to the outer actuator electrode component via an intermediate spring which is oriented along the second rotation axis. Also described is a production method for a micromechanical component.
摘要翻译：微机械部件具有外部定子电极部件和外部致动器电极部件，其经由至少一个外部弹簧连接到保持器，可调节元件可围绕第一旋转轴线调节，通过在外部致动器电极部件和外部定子电极部件，并且具有内部定子电极部件和内部致动器电极部件，所述内部致动器电极部件具有设置在其上的至少一个电极指的第一网状物，所述可调节元件可围绕第二旋转轴线调节，内部致动器电极部件的至少一个电极指和内部定子电极部件，内部致动器电极部件通过沿着第二旋转轴线取向的中间弹簧连接到外部致动器电极部件。还描述了一种用于微机械部件的制造方法。

6. 发明申请

US20110261428A1 MICROMECHANICAL COMPONENT AND A METHOD FOR OPERATING A MICROMECHANICAL COMPONENT 有权
标题翻译：微机电组件和操作微机电组件的方法
公开(公告)号：US20110261428A1
公开(公告)日：2011-10-27
申请号：US12998538
申请日：2009-09-16
申请人： Stefan Pinter , Joerg Muchow , Joachim Fritz , Christoph Friese
发明人： Stefan Pinter , Joerg Muchow , Joachim Fritz , Christoph Friese
IPC分类号： G02B26/10 , G01J1/42
CPC分类号： G02B26/0833 , G02B27/01 , Y10S359/90
摘要： A micromechanical component has a light window; a mirror element adjustable with respect to the light window from a first position into at least one second position about at least one axis of rotation, an optical sensor having a detection surface designed to ascertain a light intensity on the detection surface and to provide a corresponding sensor signal. The light window, the mirror element in the first position and the detection surface are situated in relation to one another in such a way that a portion of a light beam reflected on the light window strikes the detection surface at least partially; and an evaluation unit designed to define, on the basis of the sensor signal, information regarding an instantaneous position of the mirror element and/or an instantaneous intensity of the deflected light beam.
摘要翻译：微机械部件具有光窗口; 相对于所述光窗可从第一位置调节到关于至少一个旋转轴线的至少一个第二位置的反射镜元件;光学传感器，具有被设计成确定所述检测表面上的光强度的检测表面，并且提供对应的传感器信号。光窗，第一位置的反射镜元件和检测表面彼此相对设置，使得在光窗上反射的光束的一部分至少部分地撞击检测表面; 以及评估单元，其被设计为基于传感器信号来定义关于镜元件的瞬时位置和/或偏转光束的瞬时强度的信息。

7. 发明授权

US07918136B2 Micromechanical sensor element 有权
标题翻译：微机械传感器元件
公开(公告)号：US07918136B2
公开(公告)日：2011-04-05
申请号：US12158425
申请日：2006-11-21
申请人： Joerg Muchow , Hubert Benzel , Simon Armbruster , Christoph Schelling
发明人： Joerg Muchow , Hubert Benzel , Simon Armbruster , Christoph Schelling
IPC分类号： G01L9/06
CPC分类号： G01L9/0054 , G01L9/0055
摘要： A micromechanical sensor element (1) is provided, which has a sealed diaphragm (2) affixed in a frame (3), exhibits high sensitivity at high overload resistance and has a small size, and which allows a piezoresistive measured-value acquisition. To this end, at least one carrier element (4), which is connected to the frame (3) via at least one connection link (5), is formed in the region of the diaphragm (2). Furthermore, piezoresistors (6) for detecting a deformation are situated in the region of the connection link (5).
摘要翻译：提供了一种微机械传感器元件（1），其具有固定在框架（3）中的密封隔膜（2），在高过载电阻下表现出高灵敏度并且具有小尺寸，并且允许压阻测量值采集。为此，在隔膜（2）的区域中形成至少一个通过至少一个连接连杆（5）连接到框架（3）的载体元件（4）。此外，用于检测变形的压电电阻（6）位于连接连杆（5）的区域中。

8. 发明申请

US20100201292A1 ELECTROSTATIC DRIVE, METHOD FOR OPERATING A MICROMECHANICAL COMPONENT HAVING AN ELECTROSTATIC DRIVE, AND METHOD FOR MANUFACTURING AN ELECTROSTATIC DRIVE 有权
标题翻译：静电驱动装置，具有静电驱动装置的微型组件的操作方法以及制造静电驱动装置的方法
公开(公告)号：US20100201292A1
公开(公告)日：2010-08-12
申请号：US12698806
申请日：2010-02-02
申请人： Michael Krueger , Frederic Njikam Njimonzie , Joerg Muchow
发明人： Michael Krueger , Frederic Njikam Njimonzie , Joerg Muchow
IPC分类号： H02N11/00 , H05K13/00
CPC分类号： H02N1/006 , Y10T29/49226
摘要： An electrostatic drive having at least three intermediate frames, each two adjacent intermediate frames being connected to one another via at least one intermediate spring whose longitudinal directions lie on a first axis of rotation, and intermediate electrode fingers being situated on frame girders oriented parallel to the first axis of rotation of the intermediate frames, and having an outer frame that surrounds the intermediate frames and that is connected to the outermost intermediate frame via at least one outer spring whose longitudinal direction lies on a second axis of rotation that is oriented non-parallel to the first axis of rotation, and outer electrode fingers being situated on frame girders oriented parallel to the second axis of rotation of the outer frame and of the outermost intermediate frame of the at least three intermediate frames. In addition, a micromechanical component having this electrostatic drive, a method for operating such a micromechanical component, and methods for manufacturing the electrostatic drive and the micromechanical component are described.
摘要翻译：具有至少三个中间框架的静电驱动器，每两个相邻的中间框架经由至少一个中间弹簧彼此连接，所述至少一个中间弹簧的纵向位于第一旋转轴线上，中间电极指位于平行于中间框架的第一旋转轴线，并且具有环绕中间框架的外框架，并且其经由至少一个外部弹簧连接到最外侧中间框架，该外部弹簧的纵向位于不平行的第二旋转轴线上并且外电极指位于平行于外框的第二旋转轴线和至少三个中间框架的最外侧中间框架的框架梁上。此外，描述了具有这种静电驱动的微机械部件，用于操作这种微机械部件的方法，以及用于制造静电驱动器和微机械部件的方法。

9. 发明授权

US07667282B2 Micromechanical component and method for manufacturing such a component 失效
标题翻译：微机械部件及其制造方法
公开(公告)号：US07667282B2
公开(公告)日：2010-02-23
申请号：US11187346
申请日：2005-07-21
申请人： Joerg Muchow , Torsten Ohms , Volkmar Senz , Guenther-Nino-Carlo Ullrich , Ronald Gampp
发明人： Joerg Muchow , Torsten Ohms , Volkmar Senz , Guenther-Nino-Carlo Ullrich , Ronald Gampp
IPC分类号： H01L29/78
CPC分类号： B81B3/0072 , B81B2203/0127
摘要： A method and a micromechanical component which counteract manufacturing-process-related mechanical stresses in the membrane are provided. The membrane is formed on a substrate in a layer system and spans a cavity in the substrate. The layer system includes at least one base layer formed on the substrate for circuit elements. At least one structured masking layer is also formed on the base layer for defining the circuit elements. The masking layer is structured in the area of the membrane in such a way that mechanical stresses acting in the area of the membrane under vacuum are at least partially compensated, the intrinsic stress of the masking layer being taken into account in the layout of the structuring.
摘要翻译：提供了一种抵抗膜中与制造过程相关的机械应力的方法和微机械部件。膜在层系统中的基底上形成并跨越衬底中的空腔。层系统包括在用于电路元件的基板上形成的至少一个基底层。至少一个结构化掩模层也形成在基底层上以限定电路元件。屏蔽层被构造在膜的区域中，使得在真空下作用在膜的区域中的机械应力被至少部分地补偿，掩蔽层的固有应力在结构化的布局中被考虑。

10. 发明申请

US20090084182A1 MICROMECHANICAL SENSOR ELEMENT 有权
标题翻译：微机电传感器元件
公开(公告)号：US20090084182A1
公开(公告)日：2009-04-02
申请号：US12158425
申请日：2006-11-21
申请人： Joerg Muchow , Hubert Benzel , Simon Armbruster , Christoph Schelling
发明人： Joerg Muchow , Hubert Benzel , Simon Armbruster , Christoph Schelling
IPC分类号： G01L9/06 , G01P15/09 , H04R17/02
CPC分类号： G01L9/0054 , G01L9/0055
摘要： A micromechanical sensor element (1) is provided, which has a sealed diaphragm (2) affixed in a frame (3), exhibits high sensitivity at high overload resistance and has a small size, and which allows a piezoresistive measured-value acquisition. To this end, at least one carrier element (4), which is connected to the frame (3) via at least one connection link (5), is formed in the region of the diaphragm (2). Furthermore, piezoresistors (6) for detecting a deformation are situated in the region of the connection link (5).
摘要翻译：提供了一种微机械传感器元件（1），其具有固定在框架（3）中的密封隔膜（2），在高过载电阻下表现出高灵敏度并且具有小尺寸，并且允许压阻测量值采集。为此，在隔膜（2）的区域中形成至少一个通过至少一个连接连杆（5）连接到框架（3）的载体元件（4）。此外，用于检测变形的压电电阻（6）位于连接连杆（5）的区域中。

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