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1. 发明授权

US09606339B2 Mirror of a projection exposure apparatus for microlithography with mirror surfaces on different mirror sides, and projection exposure apparatus 有权
公开(公告)号：US09606339B2
公开(公告)日：2017-03-28
申请号：US13367116
申请日：2012-02-06
申请人： Jochen Hetzler , Ralf Mueller , Wolfgang Singer
发明人： Jochen Hetzler , Ralf Mueller , Wolfgang Singer
IPC分类号： G01B9/02 , G02B17/06 , G02B13/14 , G03F7/20
CPC分类号： G02B17/0647 , G02B13/143 , G03F7/70233 , G03F7/70958
摘要： A mirror (M) of a projection exposure apparatus for microlithography configured for structured exposure of a light-sensitive material and a method for producing a mirror (M). The mirror (M) has a substrate body (B), a first mirror surface (S) and a second mirror surface (S′). The first mirror surface (S) is formed on a first side (VS) of the substrate body (B). The second mirror surface (S′) is formed on a second side (RS) of the substrate body (B), the second side being different from the first side of the substrate body (B). The mirror (M) may be embodied, in particular, such that the substrate body (B) is produced from a glass ceramic material.

2. 发明授权

US08411356B2 Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror 有权
标题翻译：反射折射投影物镜具有倾斜的偏转镜，投影曝光装置，投影曝光方法和反射镜
公开(公告)号：US08411356B2
公开(公告)日：2013-04-02
申请号：US13217793
申请日：2011-08-25
申请人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
发明人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
IPC分类号： G02B17/08
CPC分类号： G02B17/08 , G02B27/286 , G03F7/70225 , G03F7/70566
摘要： A projection objective has an object surface and an image surface. The projection objective includes a plurality of optical elements arranged along an optical axis and configured so that during operation the projection objective images a pattern arranged in the object surface onto the image surface. The optical elements include a concave mirror a first deflecting mirror and a second deflecting mirror. The first deflecting mirror is tilted relative to the optical axis by a first tilt angle, t1, about a first tilt axis so that during operation the first deflecting mirror deflects light at a wavelength λ from the object surface towards the concave mirror or deflects light at λ from the concave mirror towards the image surface. The second deflecting mirror is tilted relative to the optical axis by a second tilt angle, t2, about a second tilt axis. For a pattern including a grating having a line width of 45 nm and a pitch, p, the projection objective images the pattern to the image surface such that for a first orientation of the pattern and a second orientation of the pattern a difference, ΔHV, between the imaged line width is 1.2 nm or less for 100 nm
摘要翻译：投影物镜具有物体表面和图像表面。投影物镜包括沿着光轴布置的多个光学元件，并且被配置为使得在操作期间，投影物镜将布置在物体表面中的图案图像映像到图像表面上。光学元件包括凹面镜，第一偏转镜和第二偏转镜。第一偏转镜相对于光轴相对于第一倾斜轴倾斜第一倾斜角度t1，使得在操作期间，第一偏转镜将波长λ的物体从物体表面偏转到凹面镜，或使光线偏转 λ从凹面镜朝向图像表面。第二偏转镜相对于光轴倾斜第二倾斜角t2，约为第二倾斜轴。对于包括具有45nm的线宽度和间距p的光栅的图案，投影物镜将图案图像到图像表面，使得对于图案的第一取向和图案的第二取向而言，Dgr; HV，对于100nm

3. 发明申请

US20110304926A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD, AND MIRROR 有权
标题翻译：投影曝光装置，投影曝光方法和镜像的目标投影目标
公开(公告)号：US20110304926A1
公开(公告)日：2011-12-15
申请号：US13217793
申请日：2011-08-25
申请人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
发明人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
IPC分类号： G02B17/08
CPC分类号： G02B17/08 , G02B27/286 , G03F7/70225 , G03F7/70566
摘要： A projection objective has an object surface and an image surface. The projection objective includes a plurality of optical elements arranged along an optical axis and configured so that during operation the projection objective images a pattern arranged in the object surface onto the image surface. The optical elements include a concave mirror a first deflecting mirror and a second deflecting mirror. The first deflecting mirror is tilted relative to the optical axis by a first tilt angle, t1, about a first tilt axis so that during operation the first deflecting mirror deflects light at a wavelength λ from the object surface towards the concave mirror or deflects light at λ from the concave mirror towards the image surface. The second deflecting mirror is tilted relative to the optical axis by a second tilt angle, t2, about a second tilt axis. For a pattern including a grating having a line width of 45 nm and a pitch, p, the projection objective images the pattern to the image surface such that for a first orientation of the pattern and a second orientation of the pattern a difference, ΔHV, between the imaged line width is 1.2 nm or less for 100 nm
摘要翻译：投影物镜具有物体表面和图像表面。投影物镜包括沿着光轴布置的多个光学元件，并且被配置为使得在操作期间，投影物镜将布置在物体表面中的图案图像映像到图像表面上。光学元件包括凹面镜，第一偏转镜和第二偏转镜。第一偏转镜相对于光轴相对于第一倾斜轴倾斜第一倾斜角度t1，使得在操作期间，第一偏转镜将波长λ的物体从物体表面偏转到凹面镜，或使光线偏转 λ从凹面镜朝向图像表面。第二偏转镜相对于光轴倾斜第二倾斜角t2，约为第二倾斜轴。对于包括具有45nm的线宽度和间距p的光栅的图案，投影物镜将图案图像到图像表面，使得对于图案的第一取向和图案的第二取向而言，Dgr; HV，对于100nm

4. 发明授权

US08027088B2 Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror 有权
标题翻译：反射折射投影物镜具有倾斜的偏转镜，投影曝光装置，投影曝光方法和反射镜
公开(公告)号：US08027088B2
公开(公告)日：2011-09-27
申请号：US11964527
申请日：2007-12-26
申请人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
发明人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
IPC分类号： G02B27/28 , G02B5/30
CPC分类号： G02B17/08 , G02B27/286 , G03F7/70225 , G03F7/70566
摘要： In general, in one aspect, the invention features a catadioptric projection objective having a plurality of optical elements arranged along an optical axis to image a pattern arranged in an object surface of the projection objective onto an image surface of the projection objective. The optical elements include a concave mirror, a first deflecting mirror tilted relative to the optical axis and a second deflecting mirror. The catadioptric projection objective can image patterns including sub-patterns oriented in various directions such that line width variations due to differences of orientation of sub-patterns are largely avoided.
摘要翻译：通常，一方面，本发明的特征在于一种反射折射投影物镜，其具有沿着光轴布置的多个光学元件，以将布置在投影物镜的物体表面中的图案成像到投影物镜的图像表面上。光学元件包括凹面镜，相对于光轴倾斜的第一偏转镜和第二偏转镜。反射折射投影物镜可以对包括在各个方向上取向的子图案的图案图案进行图像化，从而大大避免了由于子图案的取向差异引起的线宽变化。

5. 发明申请

US20080158665A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD, AND MIRROR 有权
公开(公告)号：US20080158665A1
公开(公告)日：2008-07-03
申请号：US11964527
申请日：2007-12-26
申请人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
发明人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
IPC分类号： G02B17/08 , G02B5/08 , G03B27/54 , G02B17/06
CPC分类号： G02B17/08 , G02B27/286 , G03F7/70225 , G03F7/70566
摘要： In general, in one aspect, the invention features a catadioptric projection objective having a plurality of optical elements arranged along an optical axis to image a pattern arranged in an object surface of the projection objective onto an image surface of the projection objective. The optical elements include a concave mirror; a first deflecting mirror tilted relative to the optical axis by a first tilt angle t1 about a first tilt axis to deflect light from the object surface towards the concave mirror or to deflect light from the concave mirror towards the image surface; and a second deflecting mirror tilted relative to the optical axis by a second tilt angle t2 about a second tilt axis. The first deflecting mirror has a first reflective coating with reflectivity Rs1(α1) for s-polarized light and a reflectivity Rp1(α1) for p-polarized light incident on the first deflecting mirror at first angles of incidence α1 from a first range of angles of incidence according to (t1−Δα1)≦α1≦(t1+Δα1). The second deflecting mirror has a second reflective coating with a reflectivity Rs2(α2) for s-polarized light and a reflectivity Rp2(α2) for p-polarized light incident on the second deflecting mirror at second angles of incidence α2 from a second range of angles of incidence according to (t2−Δα2)≦α2≦(t2+Δα2). A first reflectivity sum, RsPE, for s-polarized light of polar edge rays accumulated upon reflection on the first and second deflecting mirrors is substantially equal to a second reflectivity sum, RpE for p-polarized light of equatorial edge rays accumulated upon reflection on the first and second deflecting mirrors.

6. 发明授权

US09238098B2 Method of initialising an apparatus for blood treatment in the single-needle mode and apparatus for blood treatment in the single-needle mode 有权
标题翻译：在单针模式中初始化血液处理装置的方法和在单针模式下用于血液处理的装置
公开(公告)号：US09238098B2
公开(公告)日：2016-01-19
申请号：US13700586
申请日：2011-06-03
申请人： Christoph Bocklet , Ingo Schaefer , Martin Thys , Joachim Noack , Ralf Mueller
发明人： Christoph Bocklet , Ingo Schaefer , Martin Thys , Joachim Noack , Ralf Mueller
IPC分类号： A61M37/00 , A61M5/00 , A61M1/30
CPC分类号： A61M5/00 , A61M1/30 , A61M1/303 , A61M1/306 , A61M1/308 , A61M2205/07
摘要： An apparatus and method for blood treatment for the single-needle mode, the apparatus having an extra-corporeal blood circuit with a blood infeed line running to the inlet and a blood return line leading away from the outlet, of a blood treating unit, includes in the blood return line a device, e.g., container, for amassing blood, which is in flow-permitting connection for gas transfer with a device, e.g., container, for storing gas. A pressure is calculated and set in the device for storing gas before the arterial and venous phases are started, with two constraints. First, the pressure should be sufficiently low to ensure both no infusion of air into the patient and also regulated flow of blood into the patient even at opposing pressures lower than ambient pressure. Second, the pressure should be sufficiently high to expel blood from the device for amassing blood into the device for storing gas.
摘要翻译：一种用于单针模式的血液处理的装置和方法，所述装置具有血液处理单元的离开出口处的入口线和从血液出口导出的血液回流管线的具有血液输入管线的体外血液回路，在血液返回管路中，用于积聚血液的装置，例如容器，其用于与用于储存气体的装置（例如容器）进行气体转移的流动允许连接。计算并设置在用于在动脉和静脉期开始之前储存气体的装置中具有两个限制。首先，压力应该足够低，以确保不向患者输入空气，并且即使在低于环境压力的相对压力下，也将血液调节到患者体内。第二，压力应该足够高，以将血液从装置中排出以将血液聚集到用于储存气体的装置中。

7. 发明申请

US20130240443A1 METHOD FOR DOSING A SUBSTITUATE WHICH WAS PRODUCED BY A BLOOD TREATMENT APPARATUS AS WELL AS APPARATUSES 审中-公开
标题翻译：用于制备由血液处理装置生产的取代物的方法，如装置
公开(公告)号：US20130240443A1
公开(公告)日：2013-09-19
申请号：US13798758
申请日：2013-03-13
申请人： Soeren Gronau , Juergen Haecker , Ralf Mueller
发明人： Soeren Gronau , Juergen Haecker , Ralf Mueller
IPC分类号： A61M1/16
CPC分类号： A61M1/16 , A61M1/1605 , A61M1/3462 , A61M1/3465 , A61M2205/3331 , A61M2205/3334
摘要： The present invention relates to methods for dosing a substituate produced by a blood treatment apparatus. Dosing for the present invention is via a hydraulic system of the blood treatment apparatus, the hydraulic system having at least one dialysis liquid supply line which leads into a dialyzer and at least one substituate line. Regulating or controlling the size of the share which passes through the second filtration stage is performed by affecting at least one conveying apparatus and/or at least one flow limitation device and/or a flow divider valve, which are each located or which each operate in the dialysis liquid supply line and/or the substituate line and/or in the branch line which connects the dialysis liquid supply line with the substituate line. The present invention further relates to a control device, a blood treatment apparatus, a medical functional apparatus, and a computer-readable storage medium related to the methods.
摘要翻译：本发明涉及用于给血液处理装置产生的取代基进行给药的方法。用于本发明的剂量是通过血液处理设备的液压系统，该液压系统具有至少一个通向透析器和至少一个取代线的透析液体供应管线。通过影响至少一个输送装置和/或至少一个流量限制装置和/或分流器阀来执行通过第二过滤级的份额的调节或控制，这些流量限制装置和/或分流阀各自位于或分别操作透析液供给管线和/或取代线和/或连接透析液供给管线与取代线的分支管路。本发明还涉及与该方法相关的控制装置，血液处理装置，医疗功能装置和计算机可读存储介质。

8. 发明授权

US08379188B2 Optical system 有权
标题翻译：光学系统
公开(公告)号：US08379188B2
公开(公告)日：2013-02-19
申请号：US12782831
申请日：2010-05-19
申请人： Ralf Mueller , Toralf Gruner
发明人： Ralf Mueller , Toralf Gruner
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G02B5/3083 , G02B1/08 , G03F7/70141 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70566 , G03F7/70966
摘要： The disclosure provides an optical system having an optical axis, where the optical system includes a polarization manipulator which includes first and second subelements. The first subelement has a non-planar, optically effective surface. For light passing through the first subelement, the first subelement causes a change in the polarization state. A maximum effective retardation introduced by the first subelement along the optical axis is less than a quarter of the working wavelength of the optical system. The first subelement and the second subelement have mutually facing surfaces which are mutually complementary. The optical system also includes a position manipulator to manipulate the relative position of the first and second subelements.
摘要翻译：本公开提供了一种具有光轴的光学系统，其中光学系统包括包括第一和第二子元件的偏振操纵器。第一个子元件具有非平面的光学有效表面。对于通过第一子元件的光，第一子元件导致极化状态的变化。由第一子元件沿着光轴引入的最大有效延迟小于光学系统的工作波长的四分之一。第一子元件和第二子元件具有相互互补的相互面对的表面。光学系统还包括位置操纵器来操纵第一和第二子元件的相对位置。

9. 发明授权

US08345222B2 High transmission, high aperture catadioptric projection objective and projection exposure apparatus 有权
标题翻译：高透射率，高孔径反射折射投影物镜和投影曝光装置
公开(公告)号：US08345222B2
公开(公告)日：2013-01-01
申请号：US12580369
申请日：2009-10-16
申请人： Daniel Kraehmer , Ralf Mueller , Thomas Schicketanz , Wilhelm Ulrich , Alexander Epple
发明人： Daniel Kraehmer , Ralf Mueller , Thomas Schicketanz , Wilhelm Ulrich , Alexander Epple
IPC分类号： G03B27/54 , G03B27/70 , G03B27/68 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70958 , G02B1/115 , G02B17/0812 , G03F7/70225 , G03F7/70341
摘要： The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image surface of the projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective. The disclosure also provides projection exposure apparatus which include such projection objectives, as well as related components and methods.
摘要翻译：本公开提供了投影物镜，其可以用于微光刻投影曝光设备中，以使布置在投影物镜的图像表面区域中的辐射敏感基底与至少一个掩模图案的图像布置在投影物镜的物体表面。本公开还提供了包括这种投影目标的投影曝光装置以及相关的部件和方法。

10. 发明授权

US08300211B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US08300211B2
公开(公告)日：2012-10-30
申请号：US12748862
申请日：2010-03-29
申请人： Alexander Epple , Toralf Gruner , Ralf Mueller
发明人： Alexander Epple , Toralf Gruner , Ralf Mueller
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G02B13/143 , G02B17/0892 , G03F7/70225
摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9), including a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17) and a third partial objective (19) imaging the second intermediate image onto the image field (7). The second partial objective (15) has exactly one concave mirror (21) and at least one lens (23). The minimum distance between an optically utilized region of the concave mirror (21) and an optically utilized region of a surface (25)—facing the concave mirror—of a lens (23) adjacent to the concave mirror is greater than 10 mm.
摘要翻译：用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7），包括对物场进行成像的第一部分物镜（11）到第一实际中间图像（13），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15）和将第二中间图像成像到图像场（7）上的第三部分目标（19））。第二部分物镜（15）具有正好一个凹面镜（21）和至少一个透镜（23）。凹面镜（21）的光学利用区域与与凹面镜相邻的透镜（23）的凹面镜的表面（25）的光学利用区域之间的最小距离大于10mm。

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