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1. 发明授权

US08294991B2 Interference systems for microlithgraphic projection exposure systems 有权
标题翻译：微光刻投影曝光系统的干涉系统
公开(公告)号：US08294991B2
公开(公告)日：2012-10-23
申请号：US12687299
申请日：2010-01-14
申请人： Ralf Mueller , Toralf Gruner , Michael Totzeck , Heiko Feldmann , Hans-Jochen Paul
发明人： Ralf Mueller , Toralf Gruner , Michael Totzeck , Heiko Feldmann , Hans-Jochen Paul
IPC分类号： G02B27/00
CPC分类号： G03F7/70308 , G02B5/205 , G02B5/283 , G02B26/001 , G02B26/0825 , G03F7/70191 , G03F7/70266 , G03F7/70566
摘要： An optical system of a microlithographic projection exposure apparatus permits comparatively flexible and fast influencing of the intensity distribution and/or the polarization state. The optical system includes at least one layer system that is at least one-side bounded by a lens or a mirror. The layer system is an interference layer system of several layers and has at least one liquid or gaseous layer portion with a maximum thickness of one micrometer (μm), and a manipulator for manipulation of the thickness profile of the layer portion.
摘要翻译：微光刻投影曝光装置的光学系统允许强度分布和/或偏振状态的相对灵活和快速的影响。光学系统包括至少一个由透镜或反射镜限定的一个层系统。层系统是几层的干涉层系统，并且具有至少一个最大厚度为1微米（μm）的液体或气体层部分，以及用于操纵层部分的厚度分布的操纵器。

2. 发明申请

US20110075121A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20110075121A1
公开(公告)日：2011-03-31
申请号：US12748862
申请日：2010-03-29
申请人： Alexander Epple , Toralf Gruner , Ralf Mueller
发明人： Alexander Epple , Toralf Gruner , Ralf Mueller
IPC分类号： G03B27/72 , G02B17/06
CPC分类号： G02B13/143 , G02B17/0892 , G03F7/70225
摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9), including a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17) and a third partial objective (19) imaging the second intermediate image onto the image field (7). The second partial objective (15) has exactly one concave mirror (21) and at least one lens (23). The minimum distance between an optically utilized region of the concave mirror (21) and an optically utilized region of a surface (25)—facing the concave mirror—of a lens (23) adjacent to the concave mirror is greater than 10 mm.
摘要翻译：用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7），包括对物场进行成像的第一部分物镜（11）到第一实际中间图像（13），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15）和将第二中间图像成像到图像场（7）上的第三部分目标（19））。第二部分物镜（15）具有正好一个凹面镜（21）和至少一个透镜（23）。凹面镜（21）的光学利用区域与与凹面镜相邻的透镜（23）的凹面镜的表面（25）的光学利用区域之间的最小距离大于10mm。

3. 发明授权

US08379188B2 Optical system 有权
标题翻译：光学系统
公开(公告)号：US08379188B2
公开(公告)日：2013-02-19
申请号：US12782831
申请日：2010-05-19
申请人： Ralf Mueller , Toralf Gruner
发明人： Ralf Mueller , Toralf Gruner
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G02B5/3083 , G02B1/08 , G03F7/70141 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70566 , G03F7/70966
摘要： The disclosure provides an optical system having an optical axis, where the optical system includes a polarization manipulator which includes first and second subelements. The first subelement has a non-planar, optically effective surface. For light passing through the first subelement, the first subelement causes a change in the polarization state. A maximum effective retardation introduced by the first subelement along the optical axis is less than a quarter of the working wavelength of the optical system. The first subelement and the second subelement have mutually facing surfaces which are mutually complementary. The optical system also includes a position manipulator to manipulate the relative position of the first and second subelements.
摘要翻译：本公开提供了一种具有光轴的光学系统，其中光学系统包括包括第一和第二子元件的偏振操纵器。第一个子元件具有非平面的光学有效表面。对于通过第一子元件的光，第一子元件导致极化状态的变化。由第一子元件沿着光轴引入的最大有效延迟小于光学系统的工作波长的四分之一。第一子元件和第二子元件具有相互互补的相互面对的表面。光学系统还包括位置操纵器来操纵第一和第二子元件的相对位置。

4. 发明授权

US08300211B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US08300211B2
公开(公告)日：2012-10-30
申请号：US12748862
申请日：2010-03-29
申请人： Alexander Epple , Toralf Gruner , Ralf Mueller
发明人： Alexander Epple , Toralf Gruner , Ralf Mueller
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G02B13/143 , G02B17/0892 , G03F7/70225
摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9), including a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17) and a third partial objective (19) imaging the second intermediate image onto the image field (7). The second partial objective (15) has exactly one concave mirror (21) and at least one lens (23). The minimum distance between an optically utilized region of the concave mirror (21) and an optically utilized region of a surface (25)—facing the concave mirror—of a lens (23) adjacent to the concave mirror is greater than 10 mm.
摘要翻译：用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7），包括对物场进行成像的第一部分物镜（11）到第一实际中间图像（13），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15）和将第二中间图像成像到图像场（7）上的第三部分目标（19））。第二部分物镜（15）具有正好一个凹面镜（21）和至少一个透镜（23）。凹面镜（21）的光学利用区域与与凹面镜相邻的透镜（23）的凹面镜的表面（25）的光学利用区域之间的最小距离大于10mm。

5. 发明申请

US20100231888A1 OPTICAL SYSTEM 有权
标题翻译：光学系统
公开(公告)号：US20100231888A1
公开(公告)日：2010-09-16
申请号：US12782831
申请日：2010-05-19
申请人： Ralf Mueller , Toralf Gruner
发明人： Ralf Mueller , Toralf Gruner
IPC分类号： G03B27/72 , G02B27/28 , G03F7/20
CPC分类号： G02B5/3083 , G02B1/08 , G03F7/70141 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70566 , G03F7/70966
摘要： The disclosure provides an optical system having an optical axis, where the optical system includes a polarization manipulator which includes first and second subelements. The first subelement has a non-planar, optically effective surface. For light passing through the first subelement, the first subelement causes a change in the polarization state. A maximum effective retardation introduced by the first subelement along the optical axis is less than a quarter of the working wavelength of the optical system. The first subelement and the second subelement have mutually facing surfaces which are mutually complementary. The optical system also includes a position manipulator to manipulate the relative position of the first and second subelements.
摘要翻译：本公开提供了一种具有光轴的光学系统，其中光学系统包括包括第一和第二子元件的偏振操纵器。第一个子元件具有非平面的光学有效表面。对于通过第一子元件的光，第一子元件导致极化状态的变化。由第一子元件沿着光轴引入的最大有效延迟小于光学系统的工作波长的四分之一。第一子元件和第二子元件具有相互互补的相互面对的表面。光学系统还包括位置操纵器来操纵第一和第二子元件的相对位置。

6. 发明授权

US10146137B2 Catadioptric projection objective including a reflective optical component and a measuring device 有权
公开(公告)号：US10146137B2
公开(公告)日：2018-12-04
申请号：US13423344
申请日：2012-03-19
申请人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
发明人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
IPC分类号： G03F7/20 , G02B13/14 , G02B17/08
摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

7. 发明申请

US20120218536A1 CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE 审中-公开
标题翻译：反射光学元件和测量装置的目标投影目标
公开(公告)号：US20120218536A1
公开(公告)日：2012-08-30
申请号：US13423344
申请日：2012-03-19
申请人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
发明人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
IPC分类号： G03B27/42
CPC分类号： G03F7/70258 , G02B13/143 , G02B17/0856 , G02B17/0892 , G03F7/70225 , G03F7/706
摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.
摘要翻译：用于通过成像辐射将物体场映射到图像场上的反射折射投影物镜。投影物镜包括至少一个反射光学部件和测量装置。在投影物镜的操作期间，反射光学部件反射成像辐射的第一部分并透射成像辐射的第二部分。成像辐射的反射的第一部分至少部分地有助于对象场的成像。成像辐射的透射的第二部分至少部分地被馈送到测量装置。这允许在成像辐射的图像位置处的感光层同时曝光并借助测量装置监测成像辐射。

8. 发明申请

US20100134891A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的光学系统
公开(公告)号：US20100134891A1
公开(公告)日：2010-06-03
申请号：US12687299
申请日：2010-01-14
申请人： Ralf Mueller , Toralf Gruner , Michael Totzeck , Heiko Feldmann , Hans-Jochen Paul
发明人： Ralf Mueller , Toralf Gruner , Michael Totzeck , Heiko Feldmann , Hans-Jochen Paul
IPC分类号： G02B27/18 , G02B5/28
CPC分类号： G03F7/70308 , G02B5/205 , G02B5/283 , G02B26/001 , G02B26/0825 , G03F7/70191 , G03F7/70266 , G03F7/70566
摘要： The disclosure concerns an optical system of a microlithographic projection exposure apparatus. To permit comparatively flexible and fast influencing of intensity distribution and/or the polarization state, an optical system includes at least one layer system that is at least one-side bounded by a lens or a mirror. The layer system is an interference layer system of several layers and has at least one liquid or gaseous layer portion with a maximum thickness of one micrometer (μm), and a manipulator for manipulation of the thickness profile of the layer portion.
摘要翻译：本公开涉及微光刻投影曝光装置的光学系统。为了允许强度分布和/或偏振状态的相对灵活和快速的影响，光学系统包括至少一个由透镜或反射镜限定的层系统。层系统是几层的干涉层系统，并且具有至少一个最大厚度为1微米（μm）的液体或气体层部分，以及用于操纵层部分的厚度分布的操纵器。

9. 发明授权

US09238098B2 Method of initialising an apparatus for blood treatment in the single-needle mode and apparatus for blood treatment in the single-needle mode 有权
标题翻译：在单针模式中初始化血液处理装置的方法和在单针模式下用于血液处理的装置
公开(公告)号：US09238098B2
公开(公告)日：2016-01-19
申请号：US13700586
申请日：2011-06-03
申请人： Christoph Bocklet , Ingo Schaefer , Martin Thys , Joachim Noack , Ralf Mueller
发明人： Christoph Bocklet , Ingo Schaefer , Martin Thys , Joachim Noack , Ralf Mueller
IPC分类号： A61M37/00 , A61M5/00 , A61M1/30
CPC分类号： A61M5/00 , A61M1/30 , A61M1/303 , A61M1/306 , A61M1/308 , A61M2205/07
摘要： An apparatus and method for blood treatment for the single-needle mode, the apparatus having an extra-corporeal blood circuit with a blood infeed line running to the inlet and a blood return line leading away from the outlet, of a blood treating unit, includes in the blood return line a device, e.g., container, for amassing blood, which is in flow-permitting connection for gas transfer with a device, e.g., container, for storing gas. A pressure is calculated and set in the device for storing gas before the arterial and venous phases are started, with two constraints. First, the pressure should be sufficiently low to ensure both no infusion of air into the patient and also regulated flow of blood into the patient even at opposing pressures lower than ambient pressure. Second, the pressure should be sufficiently high to expel blood from the device for amassing blood into the device for storing gas.
摘要翻译：一种用于单针模式的血液处理的装置和方法，所述装置具有血液处理单元的离开出口处的入口线和从血液出口导出的血液回流管线的具有血液输入管线的体外血液回路，在血液返回管路中，用于积聚血液的装置，例如容器，其用于与用于储存气体的装置（例如容器）进行气体转移的流动允许连接。计算并设置在用于在动脉和静脉期开始之前储存气体的装置中具有两个限制。首先，压力应该足够低，以确保不向患者输入空气，并且即使在低于环境压力的相对压力下，也将血液调节到患者体内。第二，压力应该足够高，以将血液从装置中排出以将血液聚集到用于储存气体的装置中。

10. 发明申请

US20130240443A1 METHOD FOR DOSING A SUBSTITUATE WHICH WAS PRODUCED BY A BLOOD TREATMENT APPARATUS AS WELL AS APPARATUSES 审中-公开
标题翻译：用于制备由血液处理装置生产的取代物的方法，如装置
公开(公告)号：US20130240443A1
公开(公告)日：2013-09-19
申请号：US13798758
申请日：2013-03-13
申请人： Soeren Gronau , Juergen Haecker , Ralf Mueller
发明人： Soeren Gronau , Juergen Haecker , Ralf Mueller
IPC分类号： A61M1/16
CPC分类号： A61M1/16 , A61M1/1605 , A61M1/3462 , A61M1/3465 , A61M2205/3331 , A61M2205/3334
摘要： The present invention relates to methods for dosing a substituate produced by a blood treatment apparatus. Dosing for the present invention is via a hydraulic system of the blood treatment apparatus, the hydraulic system having at least one dialysis liquid supply line which leads into a dialyzer and at least one substituate line. Regulating or controlling the size of the share which passes through the second filtration stage is performed by affecting at least one conveying apparatus and/or at least one flow limitation device and/or a flow divider valve, which are each located or which each operate in the dialysis liquid supply line and/or the substituate line and/or in the branch line which connects the dialysis liquid supply line with the substituate line. The present invention further relates to a control device, a blood treatment apparatus, a medical functional apparatus, and a computer-readable storage medium related to the methods.
摘要翻译：本发明涉及用于给血液处理装置产生的取代基进行给药的方法。用于本发明的剂量是通过血液处理设备的液压系统，该液压系统具有至少一个通向透析器和至少一个取代线的透析液体供应管线。通过影响至少一个输送装置和/或至少一个流量限制装置和/或分流器阀来执行通过第二过滤级的份额的调节或控制，这些流量限制装置和/或分流阀各自位于或分别操作透析液供给管线和/或取代线和/或连接透析液供给管线与取代线的分支管路。本发明还涉及与该方法相关的控制装置，血液处理装置，医疗功能装置和计算机可读存储介质。

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