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1. 发明授权

US08345222B2 High transmission, high aperture catadioptric projection objective and projection exposure apparatus 有权
标题翻译：高透射率，高孔径反射折射投影物镜和投影曝光装置
公开(公告)号：US08345222B2
公开(公告)日：2013-01-01
申请号：US12580369
申请日：2009-10-16
申请人： Daniel Kraehmer , Ralf Mueller , Thomas Schicketanz , Wilhelm Ulrich , Alexander Epple
发明人： Daniel Kraehmer , Ralf Mueller , Thomas Schicketanz , Wilhelm Ulrich , Alexander Epple
IPC分类号： G03B27/54 , G03B27/70 , G03B27/68 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70958 , G02B1/115 , G02B17/0812 , G03F7/70225 , G03F7/70341
摘要： The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image surface of the projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective. The disclosure also provides projection exposure apparatus which include such projection objectives, as well as related components and methods.
摘要翻译：本公开提供了投影物镜，其可以用于微光刻投影曝光设备中，以使布置在投影物镜的图像表面区域中的辐射敏感基底与至少一个掩模图案的图像布置在投影物镜的物体表面。本公开还提供了包括这种投影目标的投影曝光装置以及相关的部件和方法。

2. 发明申请

US20100097592A1 HIGH TRANSMISSION, HIGH APERTURE CATADIOPTRIC PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS 有权
标题翻译：高传输，高光电子投影预测目标和投影曝光装置
公开(公告)号：US20100097592A1
公开(公告)日：2010-04-22
申请号：US12580369
申请日：2009-10-16
申请人： Daniel Kraehmer , Ralf Mueller , Thomas Schicketanz , Wilhelm Ulrich , Alexander Epple
发明人： Daniel Kraehmer , Ralf Mueller , Thomas Schicketanz , Wilhelm Ulrich , Alexander Epple
IPC分类号： G03B27/54 , G02B27/18 , G02B17/08
CPC分类号： G03F7/70958 , G02B1/115 , G02B17/0812 , G03F7/70225 , G03F7/70341
摘要： The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image surface of the projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective. The disclosure also provides projection exposure apparatus which include such projection objectives, as well as related components and methods.
摘要翻译：本公开提供了投影物镜，其可以用于微光刻投影曝光设备中，以使布置在投影物镜的图像表面区域中的辐射敏感基底与至少一个掩模图案的图像布置在投影物镜的物体表面。本公开还提供了包括这种投影目标的投影曝光装置以及相关的部件和方法。

3. 发明授权

US08446665B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US08446665B2
公开(公告)日：2013-05-21
申请号：US12562693
申请日：2009-09-18
申请人： Alexander Epple , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
发明人： Alexander Epple , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
IPC分类号： G02B5/08
CPC分类号： G02B17/0892 , G02B1/11 , G02B17/08 , G02B17/0896 , G03F7/70 , G03F7/70225 , G03F7/70275
摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.2% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.
摘要翻译：用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7）上。该目的包括将对象场成像到第一实际中间图像（13）上的第一部分目标（11），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15）物镜（19）将第二中间图像成像到图像场上。第二部分目标是具有恰好一个凹面镜并具有至少一个透镜（L21，L22）的反射折射物镜。第一折叠镜（23）将来自物体平面的辐射偏转到凹面镜，并且第二折叠镜（25）将来自凹面镜的辐射偏转到图像平面。第二部分物镜的透镜的至少一个表面（L21，L22）具有对于150nm至250nm的工作波长具有小于0.2％的反射率的抗反射涂层，并且对于介于0°和30°之间。作为替代或另外，第二部分物镜的透镜的所有表面被配置为使得与边缘射线同心度的偏差大于或等于20°。

4. 发明申请

US20110038061A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20110038061A1
公开(公告)日：2011-02-17
申请号：US12562693
申请日：2009-09-18
申请人： Alexander EPPLE , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
发明人： Alexander EPPLE , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
IPC分类号： G02B17/00 , G03B27/52
CPC分类号： G02B17/0892 , G02B1/11 , G02B17/08 , G02B17/0896 , G03F7/70 , G03F7/70225 , G03F7/70275
摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.2% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.
摘要翻译：用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7）上。该目的包括将对象场成像到第一实际中间图像（13）上的第一部分目标（11），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15）物镜（19）将第二中间图像成像到图像场上。第二部分目标是具有恰好一个凹面镜并具有至少一个透镜（L21，L22）的反射折射物镜。第一折叠镜（23）将来自物体平面的辐射偏转到凹面镜，并且第二折叠镜（25）将来自凹面镜的辐射偏转到图像平面。第二部分物镜的透镜（L21，L22）的至少一个表面具有对于150nm至250nm的工作波长具有小于0.2％的反射率的抗反射涂层，并且对于介于0°和30°之间。作为替代或另外，第二部分物镜的透镜的所有表面被配置为使得与边缘射线同心度的偏差大于或等于20°。

5. 发明申请

US20110090559A1 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC EUV PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波预处理曝光装置的投影目标
公开(公告)号：US20110090559A1
公开(公告)日：2011-04-21
申请号：US12904513
申请日：2010-10-14
申请人： Siegfried Rennon , Hans-Juergen Mann , Thomas Schicketanz
发明人： Siegfried Rennon , Hans-Juergen Mann , Thomas Schicketanz
IPC分类号： G02B17/06
CPC分类号： G02B1/10 , G02B5/00 , G02B5/08 , G02B5/085 , G02B5/0891 , G02B17/0657 , G03F7/70233 , G03F7/70958
摘要： A projection objective for a microlithographic EUV projection exposure apparatus includes a first mirror and a second mirror. The first mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The second mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The first and second mirrors are configured so that, with otherwise equal irradiation by EUV light, the mirror substrate of the first mirror compacts less than the mirror substrate of the second mirror under the effect of the EUV light.
摘要翻译：微光刻EUV投影曝光装置的投影物镜包括第一镜和第二镜。第一反射镜包括镜面基板和由反射镜基板承载的反射涂层。第二反射镜包括镜面基板和由反射镜基板承载的反射涂层。第一和第二反射镜被配置为使得在EUV光的另外相等的照射下，在EUV光的作用下，第一反射镜的反射镜基板小于第二反射镜的反射镜基板。

6. 发明授权

US08902406B2 Projection objective 有权
标题翻译：投影目标
公开(公告)号：US08902406B2
公开(公告)日：2014-12-02
申请号：US12951216
申请日：2010-11-22
申请人： Reinhold Walser , Thomas Schicketanz
发明人： Reinhold Walser , Thomas Schicketanz
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G02B17/0647 , G03F7/70233 , G03F7/70308 , G03F7/70316
摘要： A projection objective, such as for EUV lithography, for imaging a pattern arranged in an object plane into an image plane with the aid of electromagnetic radiation from the extreme ultraviolet range is provided. The projection objective includes a plurality of mirrors provided with reflective coatings and arranged between the object plane and the image plane. At least one of the mirrors includes a graded reflective coating with a rotationally-asymmetric coating thickness profile in the mirror plane on a substrate with a rotationally-asymmetric or rotationally-symmetric surface profile. The projection objective can exhibit increased overall transmission.
摘要翻译：提供了一种诸如用于EUV光刻的投影物镜，用于借助于来自极紫外范围的电磁辐射将在物平面中布置的图案成像到图像平面中。投影物镜包括设置有反射涂层并且布置在物平面和像平面之间的多个反射镜。至少一个反射镜包括在基板上的镜面中具有旋转非对称涂层厚度分布的渐变反射涂层，具有旋转不对称或旋转对称的表面轮廓。投影物镜可以表现出增加的整体透射。

7. 发明授权

US08896814B2 Catadioptric projection objective comprising deflection mirrors and projection exposure method 有权
标题翻译：折反射投影物镜包括偏转镜和投影曝光方法
公开(公告)号：US08896814B2
公开(公告)日：2014-11-25
申请号：US13431681
申请日：2012-03-27
申请人： Thomas Schicketanz , Toralf Gruner
发明人： Thomas Schicketanz , Toralf Gruner
IPC分类号： G03B27/54 , G03B27/42 , G02B17/08 , G03F7/20 , G02B13/14
CPC分类号： G02B17/0892 , G02B13/14 , G02B17/08 , G02B17/0896 , G03F1/26 , G03F7/702 , G03F7/70225 , G03F7/70258 , G03F7/70266 , G03F7/70275 , G03F7/70308 , G03F7/70316 , G03F7/70441 , G03F7/70791
摘要： A catadioptric projection objective has a multiplicity of lenses and at least one concave mirror, and also two deflection mirrors in order to separate a partial beam path running from the object field to the concave mirror from the partial beam path running from the concave mirror to the image field. The deflection mirrors are tilted relative to the optical axis of the projection objective about tilting axes running parallel to a first direction (x-direction). The first deflection mirror is arranged in optical proximity to a first field plane and the second deflection mirror is arranged in optical proximity to a second field plane, which is optically conjugate with respect to the first field plane. A displacement device for the synchronous displacement of the deflection mirrors is provided. The deflection mirrors have different local distributions of their reflection properties in first and second reflection regions, respectively.
摘要翻译：反射折射投射物镜具有多个透镜和至少一个凹面镜，以及两个偏转镜，以便将从物镜场延伸的部分光束路径与从凹面镜到图像字段。偏转镜相对于投影物镜的光轴相对于平行于第一方向（x方向）延伸的倾斜轴线倾斜。第一偏转镜被布置成光接近第一场平面，并且第二偏转镜布置成光学接近于相对于第一场平面光学共轭的第二场平面。提供了用于偏转镜的同步位移的位移装置。偏转镜在第一反射区域和第二反射区域中的反射特性分别具有不同的局部分布。

8. 发明授权

US08693098B2 Projection objective for a microlithographic EUV projection exposure apparatus 有权
标题翻译：微光EUV投影曝光设备的投影目标
公开(公告)号：US08693098B2
公开(公告)日：2014-04-08
申请号：US12904513
申请日：2010-10-14
申请人： Siegfried Rennon , Hans-Juergen Mann , Thomas Schicketanz
发明人： Siegfried Rennon , Hans-Juergen Mann , Thomas Schicketanz
IPC分类号： G02B5/08 , G02B1/10 , G02B5/00
CPC分类号： G02B1/10 , G02B5/00 , G02B5/08 , G02B5/085 , G02B5/0891 , G02B17/0657 , G03F7/70233 , G03F7/70958
摘要： A projection objective for a microlithographic EUV projection exposure apparatus includes a first mirror and a second mirror. The first mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The second mirror includes a mirror substrate and a reflective coating carried by the mirror substrate. The first and second mirrors are configured so that, with otherwise equal irradiation by EUV light, the mirror substrate of the first mirror compacts less than the mirror substrate of the second mirror under the effect of the EUV light.
摘要翻译：微光刻EUV投影曝光装置的投影物镜包括第一镜和第二镜。第一反射镜包括镜面基板和由反射镜基板承载的反射涂层。第二反射镜包括镜面基板和由反射镜基板承载的反射涂层。第一和第二反射镜被配置为使得在EUV光的另外相等的照射下，在EUV光的作用下，第一反射镜的反射镜基板小于第二反射镜的反射镜基板。

9. 发明申请

US20120236277A1 CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING DEFLECTION MIRRORS AND PROJECTION EXPOSURE METHOD 有权
标题翻译：包含反射镜和投影曝光方法的目标投影目标
公开(公告)号：US20120236277A1
公开(公告)日：2012-09-20
申请号：US13431681
申请日：2012-03-27
申请人： Thomas Schicketanz , Toralf Gruner
发明人： Thomas Schicketanz , Toralf Gruner
IPC分类号： G03B27/42 , G02B17/08
CPC分类号： G02B17/0892 , G02B13/14 , G02B17/08 , G02B17/0896 , G03F1/26 , G03F7/702 , G03F7/70225 , G03F7/70258 , G03F7/70266 , G03F7/70275 , G03F7/70308 , G03F7/70316 , G03F7/70441 , G03F7/70791
摘要： A catadioptric projection objective has a multiplicity of lenses and at least one concave mirror, and also two deflection mirrors in order to separate a partial beam path running from the object field to the concave mirror from the partial beam path running from the concave mirror to the image field. The deflection mirrors are tilted relative to the optical axis of the projection objective about tilting axes running parallel to a first direction (x-direction). The first deflection mirror is arranged in optical proximity to a first field plane and the second deflection mirror is arranged in optical proximity to a second field plane, which is optically conjugate with respect to the first field plane. A displacement device for the synchronous displacement of the deflection mirrors is provided. The deflection mirrors have different local distributions of their reflection properties in first and second reflection regions, respectively.
摘要翻译：反射折射投射物镜具有多个透镜和至少一个凹面镜，以及两个偏转镜，以便将从物镜场延伸的部分光束路径与从凹面镜到图像字段。偏转镜相对于投影物镜的光轴相对于平行于第一方向（x方向）延伸的倾斜轴线倾斜。第一偏转镜被布置成光接近第一场平面，并且第二偏转镜布置成光学接近于相对于第一场平面光学共轭的第二场平面。提供了用于偏转镜的同步位移的位移装置。偏转镜在第一反射区域和第二反射区域中的反射特性分别具有不同的局部分布。

10. 发明申请

US20110141446A1 PROJECTION OBJECTIVE 有权
标题翻译：投影目标
公开(公告)号：US20110141446A1
公开(公告)日：2011-06-16
申请号：US12951216
申请日：2010-11-22
申请人： Reinhold Walser , Thomas Schicketanz
发明人： Reinhold Walser , Thomas Schicketanz
IPC分类号： G03B27/54 , G02B17/06
CPC分类号： G02B17/0647 , G03F7/70233 , G03F7/70308 , G03F7/70316
摘要： A projection objective, such as for EUV lithography, for imaging a pattern arranged in an object plane into an image plane with the aid of electromagnetic radiation from the extreme ultraviolet range is provided. The projection objective includes a plurality of mirrors provided with reflective coatings and arranged between the object plane and the image plane. At least one of the mirrors includes a graded reflective coating with a rotationally-asymmetric coating thickness profile in the mirror plane on a substrate with a rotationally-asymmetric or rotationally-symmetric surface profile. The projection objective can exhibit increased overall transmission.
摘要翻译：提供了一种诸如用于EUV光刻的投影物镜，用于借助于来自极紫外范围的电磁辐射将在物平面中布置的图案成像到图像平面中。投影物镜包括设置有反射涂层并且布置在物平面和像平面之间的多个反射镜。至少一个反射镜包括在基板上的镜面中具有旋转非对称涂层厚度分布的渐变反射涂层，具有旋转不对称或旋转对称的表面轮廓。投影物镜可以表现出增加的整体透射。

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