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    • 10. 发明授权
    • Homojunction type high-speed photodiode
    • 同功型高速光电二极管
    • US08541813B1
    • 2013-09-24
    • US13549425
    • 2012-07-14
    • Jin-Wei ShiKai-Lun Chi
    • Jin-Wei ShiKai-Lun Chi
    • H01L21/02
    • H01L31/103H01L31/065H01L31/105Y02E10/50
    • A homojunction type high-speed photodiode has an active area of greater than at least 50 microns (μm) or preferably greater than 60 microns (μm) in diameter, which has an p-i-n junction epitaxial layer formed on a semiconductor substrate and includes a first ohmic contact layer, an absorption layer, a collector layer and a second ohmic contact layer. No more absorbance occurs in the collector layer of InGaAs, by means of completely absorbing the photon energy in advance by the absorption layer in which the absorption layer has powerful optical absorption constant. Not only can the prior art problems be solved, such as surface absorbance, but also improved electron transport can be achieved by using InGaAs as the constructing material, compared to other materials. The resistance capacitance (RC) for the entire structure can be significantly reduced, and the limitations to the bandwidth resulted from the carrier transport time can be improved.
    • 同质结型高速光电二极管具有直径大于至少50微米(mum)或优选大于60微米(mum)的有效面积,其具有形成在半导体衬底上的pin结外延层,并且包括第一欧姆 接触层,吸收层,集电极层和第二欧姆接触层。 通过吸收层具有强大的光吸收常数的吸收层预先完全吸收光子能量,在InGaAs的集电极层中不再发生吸光度。 与其他材料相比,不仅可以解决现有技术问题,例如表面吸光度,而且可以通过使用InGaAs作为构造材料来实现改进的电子传输。 可以显着降低整个结构的电阻电容(RC),并且可以提高载波传输时间带宽的限制。