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1. 发明授权

US09046510B2 Membrane and method of fabricating the same 有权
标题翻译：膜及其制造方法
公开(公告)号：US09046510B2
公开(公告)日：2015-06-02
申请号：US13396078
申请日：2012-02-14
申请人： Jin Kon Kim , Sangshin Jang , Seung Yun Yang , Gumhye Jeon , Won Jong Kim , Sejin Son , Hyunwoo Kim
发明人： Jin Kon Kim , Sangshin Jang , Seung Yun Yang , Gumhye Jeon , Won Jong Kim , Sejin Son , Hyunwoo Kim
IPC分类号： B31D3/00 , G01N33/487 , B82Y40/00 , B82Y30/00
CPC分类号： G01N27/40 , B32B3/12 , B32B3/266 , B32B27/08 , B32B27/302 , B32B2333/12 , B82Y30/00 , B82Y40/00 , G01N27/44791 , G01N33/48721 , Y10T428/24149 , Y10T428/24273 , Y10T428/249978 , Y10T428/249979 , Y10T428/24998
摘要： A membrane according to the present invention includes a support member and a polymer layer disposed on the support member and including a plurality of nano pores each having an inner wall formed of a block-structured polymer material of which the end thereof is substituted by a functional group.
摘要翻译：根据本发明的膜包括支撑构件和设置在支撑构件上的聚合物层，并且包括多个纳米孔，每个纳米孔具有由嵌段结构的聚合物材料形成的内壁，其端部被功能性组。

2. 发明申请

US20130040127A1 MEMBRANE AND METHOD OF FABRICATING THE SAME 有权
标题翻译：膜及其制造方法
公开(公告)号：US20130040127A1
公开(公告)日：2013-02-14
申请号：US13396078
申请日：2012-02-14
申请人： Jin Kon KIM , Sangshin Jang , Seung Yun Yang , Gumhye Jeon , Won Jong Kim , Sejin Son , Hyunwoo Kim
发明人： Jin Kon KIM , Sangshin Jang , Seung Yun Yang , Gumhye Jeon , Won Jong Kim , Sejin Son , Hyunwoo Kim
IPC分类号： B32B5/18 , B32B27/28 , C08J9/26 , B32B3/26 , B82Y40/00
CPC分类号： G01N27/40 , B32B3/12 , B32B3/266 , B32B27/08 , B32B27/302 , B32B2333/12 , B82Y30/00 , B82Y40/00 , G01N27/44791 , G01N33/48721 , Y10T428/24149 , Y10T428/24273 , Y10T428/249978 , Y10T428/249979 , Y10T428/24998
摘要： A membrane according to the present invention includes a support member and a polymer layer disposed on the support member and including a plurality of nano pores each having an inner wall formed of a block-structured polymer material of which the end thereof is substituted by a functional group.
摘要翻译：根据本发明的膜包括支撑构件和设置在支撑构件上的聚合物层，并且包括多个纳米孔，每个纳米孔具有由嵌段结构的聚合物材料形成的内壁，其端部被功能性组。

3. 发明申请

US20150104945A1 METHODS OF FABRICATING A SEMICONDUCTOR DEVICE 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US20150104945A1
公开(公告)日：2015-04-16
申请号：US14328283
申请日：2014-07-10
申请人： Chawon Koh , Cheol Hong Park , Ki-Jeong Kim , Hyunwoo Kim , Hyosung Lee
发明人： Chawon Koh , Cheol Hong Park , Ki-Jeong Kim , Hyunwoo Kim , Hyosung Lee
IPC分类号： H01L21/308
CPC分类号： H01L21/0271 , H01L21/3086 , H01L27/11548 , H01L27/11556 , H01L27/11575 , H01L27/11582
摘要： A method for fabricating a semiconductor device is provided. In the method, a first hard mask layer is formed on a stepped structure. The first hard mask layer has a level top surface and thickness sufficient to etch the structure. A second hard mask pattern is formed on the first hard mask layer. The first hard mask layer is etched using the second hard mask pattern. Size dispersion of the patterns may be reduced by the first hard mask layer.
摘要翻译：提供一种制造半导体器件的方法。在该方法中，在阶梯状结构上形成第一硬掩模层。第一硬掩模层具有足以蚀刻结构的水平顶表面和厚度。在第一硬掩模层上形成第二硬掩模图案。使用第二硬掩模图案蚀刻第一硬掩模层。图案的尺寸分散可以由第一硬掩模层减小。

4. 发明申请

US20050216274A1 Object tracking method and apparatus using stereo images 审中-公开
标题翻译：使用立体图像的物体跟踪方法和装置
公开(公告)号：US20050216274A1
公开(公告)日：2005-09-29
申请号：US11058203
申请日：2005-02-16
申请人： Hyunwoo Kim
发明人： Hyunwoo Kim
IPC分类号： G06T7/20 , G10L19/04
CPC分类号： G06K9/00362 , G06T7/246 , G06T7/285
摘要： An object tracking method and apparatus, the method includes: segmenting a segment of a zone, in which an object is located, from a current frame among consecutively input images and obtaining predetermined measurement information of the segment; determining a plurality of searching zones centered around the segment and predicting parameters of the segment in the current frame based on measurement information of a preceding frame in the searching zones; selecting predetermined searching zones as partial searching candidate zones from the predicted parameters; measuring a visual cue of the segment; and estimating parameters of the segment of the current frame in the partial searching candidate zones based on the visual cue and the predicted parameters and determining parameters having the largest parameter values from the estimated parameters as parameters of the segment.
摘要翻译：一种对象跟踪方法和装置，所述方法包括：从连续输入的图像中的当前帧中分割对象所在的区域的段，并获得所述段的预定测量信息; 基于所述段重点确定多个搜索区域，并且基于所述搜索区域中的前一帧的测量信息来预测所述当前帧中的所述段的参数; 从所述预测参数中选择预定搜索区域作为部分搜索候选区域; 测量段的视觉提示; 以及基于视觉提示和预测参数来估计部分搜索候选区域中的当前帧的段的参数，并且从估计参数确定具有最大参数值的参数作为段的参数。

5. 发明授权

US08027036B2 Apparatus for detecting particles on a glass surface and a method thereof 有权
标题翻译：用于检测玻璃表面上的颗粒的装置及其方法
公开(公告)号：US08027036B2
公开(公告)日：2011-09-27
申请号：US12417318
申请日：2009-04-02
申请人： Hyunwoo Kim , Youngchae Ko , Sungjong Pyo , Taeho Keem
发明人： Hyunwoo Kim , Youngchae Ko , Sungjong Pyo , Taeho Keem
IPC分类号： G01N21/00 , G01N21/47
CPC分类号： G01N21/896 , G01N21/958
摘要： The present invention relates to an apparatus for detecting particles on a glass surface and a method thereof, and more specifically, to an apparatus for detecting particles on a glass surface and a method thereof for exactly inspecting particles which may be created on a glass surface where micro circuits are deposited. The apparatus for detecting the particles on the glass surface in accordance with the present invention comprises laser beam irradiators for detecting particles on a glass substrate on upper and lower sides of the glass substrate at certain intervals, respectively, and wherein the irradiators are configured so that beams emitted from the laser beam irradiators can be irradiated in a direction vertical to a transferring direction of the glass substrate, thereby exactly detecting particles detached to the glass surface without exception.
摘要翻译：本发明涉及一种用于检测玻璃表面上的颗粒的装置及其方法，更具体地，涉及一种用于检测玻璃表面上的颗粒的装置及其方法，用于精确检查可能在玻璃表面上产生的颗粒微电路被沉积。根据本发明的用于检测玻璃表面上的颗粒的装置包括分别用于以一定间隔检测在玻璃基板的上侧和下侧的玻璃基板上的颗粒的激光束照射器，并且其中，可以在垂直于玻璃基板的传送方向的方向上照射从激光束照射器发射的光束，从而精确地检测除玻璃表面之外的颗粒。

6. 发明授权

US09564325B2 Methods of fabricating a semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US09564325B2
公开(公告)日：2017-02-07
申请号：US14328283
申请日：2014-07-10
申请人： Chawon Koh , Cheol Hong Park , Ki-Jeong Kim , Hyunwoo Kim , Hyosung Lee
发明人： Chawon Koh , Cheol Hong Park , Ki-Jeong Kim , Hyunwoo Kim , Hyosung Lee
IPC分类号： H01L21/311 , H01L21/027 , H01L21/308 , H01L27/115
CPC分类号： H01L21/0271 , H01L21/3086 , H01L27/11548 , H01L27/11556 , H01L27/11575 , H01L27/11582
摘要： A method for fabricating a semiconductor device is provided. In the method, a first hard mask layer is formed on a stepped structure. The first hard mask layer has a level top surface and thickness sufficient to etch the structure. A second hard mask pattern is formed on the first hard mask layer. The first hard mask layer is etched using the second hard mask pattern. Size dispersion of the patterns may be reduced by the first hard mask layer.
摘要翻译：提供一种制造半导体器件的方法。在该方法中，在阶梯状结构上形成第一硬掩模层。第一硬掩模层具有足以蚀刻结构的水平顶表面和厚度。在第一硬掩模层上形成第二硬掩模图案。使用第二硬掩模图案蚀刻第一硬掩模层。图案的尺寸分散可以由第一硬掩模层减小。

7. 发明授权

US06730458B1 Method for forming fine patterns through effective glass transition temperature reduction 有权
标题翻译：通过有效的玻璃化转变温度降低形成精细图案的方法
公开(公告)号：US06730458B1
公开(公告)日：2004-05-04
申请号：US10376604
申请日：2003-03-03
申请人： Hyunwoo Kim , Sanggyun Woo
发明人： Hyunwoo Kim , Sanggyun Woo
IPC分类号： G03C500
CPC分类号： G03F7/40 , Y10S430/143
摘要： A method for forming fine patterns, particularly contact holes, on semiconductor devices by forming an ArF resist pattern and then reducing the size of pattern openings by exposing the resist pattern to radiation from an VUV (vacuum ultraviolet) excimer laser or E-beam radiation during thermal treatment to reduce, temporarily, the Tg of the resist pattern and allow it to flow, thereby reducing the size of the spaces and openings in the pattern.
摘要翻译：一种用于通过形成ArF抗蚀剂图案在半导体器件上形成精细图案，特别是接触孔的方法，然后通过将抗蚀剂图案暴露于来自VUV（真空紫外）准分子激光或电子束辐射的辐射而减小图案开口的尺寸热处理以暂时降低抗蚀剂图案的Tg并允许其流动，由此减小图案中的空间和开口的尺寸。

8. 发明授权

US09455121B2 Semiconductor inspection system and methods of inspecting a semiconductor device using the same 有权
标题翻译：半导体检查系统和使用其的半导体器件的检查方法
公开(公告)号：US09455121B2
公开(公告)日：2016-09-27
申请号：US14828021
申请日：2015-08-17
申请人： Hyunwoo Kim , Wooseok Ko , Minkook Kim , Jung Hwan Kim , Yusin Yang , Sangkil Lee , Chungsam Jun
发明人： Hyunwoo Kim , Wooseok Ko , Minkook Kim , Jung Hwan Kim , Yusin Yang , Sangkil Lee , Chungsam Jun
IPC分类号： H01J37/30 , H01J37/305 , H01J37/285 , H01J37/28
CPC分类号： H01J37/3005 , H01J37/28 , H01J37/285 , H01J37/3053 , H01J2237/2812 , H01J2237/3174
摘要： A semiconductor inspection system including an ion beam milling unit configured to irradiate at least one cluster-ion beam onto a surface of a sample wafer and etch the surface of the sample wafer and an image acquisition unit configured to irradiate an electron beam onto the etched surface of the sample wafer and acquire an image of the etched surface may be provided.
摘要翻译：一种半导体检查系统，包括离子束研磨单元，其被配置为将至少一个簇离子束照射到样品晶片的表面上并蚀刻样品晶片的表面;以及图像获取单元，被配置为将电子束照射到蚀刻表面上并且可以提供蚀刻表面的图像。

9. 发明授权

US08536360B2 Compositions and methods for stereoselective aldehyde allylation and crotylation 失效
标题翻译：用于立体选择性醛烯丙基化和crotylation的组合物和方法
公开(公告)号：US08536360B2
公开(公告)日：2013-09-17
申请号：US13089708
申请日：2011-04-19
申请人： Hyunwoo Kim , James Lincoln Leighton
发明人： Hyunwoo Kim , James Lincoln Leighton
IPC分类号： C07F7/00 , C07C27/00
CPC分类号： C07F7/12 , C07B2200/07 , C07C29/38 , C07F7/10 , C07C33/30
摘要： Compositions and methods for practical, stereoselective allylation and crotylation for aldehyde substrates are described. The compositions and methods comprise reagents for allylation and/or crotylation and acids. In some embodiments, the reagents and acids are pre-mixed.
摘要翻译：描述了用于醛底物的实际的立体选择性烯丙基化和胡萝卜素化的组合物和方法。组合物和方法包括用于烯丙基化和/或脱蛋白化和酸的试剂。在一些实施方案中，将试剂和酸预混合。

10. 发明申请

US20110187849A1 DETECTION APPARATUS FO PARICLE ON THE GLASS 审中-公开
标题翻译：检测装置玻璃上的碎屑
公开(公告)号：US20110187849A1
公开(公告)日：2011-08-04
申请号：US12708610
申请日：2010-02-19
申请人： Hyunwoo Kim , Jinhong Park , Taeho Keem , Changha Lee
发明人： Hyunwoo Kim , Jinhong Park , Taeho Keem , Changha Lee
IPC分类号： H04N7/18
CPC分类号： H04N7/18
摘要： The present invention relates to an apparatus for detecting particles on a flat glass, which detects particles adhered to the flat glass having both sides such as a surface A and a surface B, comprising: a surface A laser light irradiating device for irradiating laser light of a first wavelength polarized in a direction S at a first angle based on a surface A normal vector toward the surface A in an upper part of the surface A of the flat glass; a surface A photographing device for taking a picture of a point where the laser light irradiated by the surface A laser light irradiating device is irradiated on the surface A of the flat glass; a surface B laser light irradiating device for irradiating laser light of a second wavelength toward the surface A at a second angle smaller than the first angle based on the surface A normal vector in the upper part of the surface A of the flat glass, and wherein the irradiated laser light is mostly transmitted in thickness direction of the flat glass; a surface B photographing device for taking a picture of a point where the laser light irradiated by the surface B laser light irradiating device is irradiated on the surface B of the flat glass; and a detection signal processor for analyzing video images inputted from the surface A photographing device and the surface B photographing device, and deciding from which photographing device the particles are more clearly outputted, to decide on a surface to which the particles adhere.
摘要翻译：本发明涉及一种用于检测平板玻璃上的颗粒的装置，其检测附着在具有表面A和表面B两侧的平板玻璃上的颗粒，该装置包括：表面A激光照射装置，用于照射基于在平板玻璃的表面A的上部中的朝向表面A的表面A法线向量，在第一角度的方向S上偏振的第一波长; 用于拍摄由表面A激光照射装置照射的激光的点照射在平板玻璃的表面A上的表面A拍摄装置; 表面B激光照射装置，其基于平板玻璃的表面A的上部的表面A法线向量，以比第一角度小的第二角度朝向表面A照射第二波长的激光，并且其中照射的激光主要在平板玻璃的厚度方向上透射; 用于拍摄由表面B激光照射装置照射的激光的点被照射在平板玻璃的表面B上的表面B拍摄装置; 以及检测信号处理器，用于分析从表面A拍摄装置和表面B拍摄装置输入的视频图像，并且确定从哪个拍摄装置更清晰地输出颗粒，以决定颗粒粘附的表面。

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