会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Tough polymeric mixtures
    • 坚韧的聚合物混合物
    • US5238744A
    • 1993-08-24
    • US819407
    • 1992-01-10
    • Jerry W. WilliamsRobert J. DeVoe
    • Jerry W. WilliamsRobert J. DeVoe
    • C08F2/48C08F2/50C08G18/63C09D4/00
    • C08G18/637C08F2/48C09D4/00Y10T428/31507Y10T428/31551Y10T428/31645Y10T428/31678Y10T428/31692
    • A tough polymeric mixture comprises the polymerized product of admixture I or II, whereinadmixture I comprises 5 to 45 weight percent of a first monomer and a photoinitiator therefor, said first monomer being at least one free-radically polymerizable monomer, and 95 to 55 weight percent of a second monomer and a photoinitiator therefor, said second monomer being at least one set of polyurethane precursors, andadmixture II comprises 5 to 45 weight percent of a first monomer and a photoinitiator therefor, said first monomer being at least one set of polyurethane precursors, and 95 to 55 weight percent of a second monomer and a photoinitiator therefor, said second monomer being at least one free-radically polymerizable monomer,said polymeric mixture having been prepared by a process involving two sequential actinic radiations of wavelength ranges centered around .lambda..sub.1 and .lambda..sub.2, respectively, wherein .lambda..sub.1 and .lambda..sub.2 differ from each other by at least 30 nm, andwherein the actinic radiation centered around .lambda..sub.1 does not substantially polymerize the second monomer, andwherein the area under a stress-strain curve as determined by ASTM D638-89 for said polymeric mixture is at least 10 percent greater, preferably 20 percent greater, and more preferably at least 50 percent greater when said precursor monomers are cured by said sequential photoinitiation process compared to when the same mixture is cured by a single photostage cure.
    • 韧性聚合物混合物包含混合物I或II的聚合产物,其中混合物I包含5至45重量%的第一单体和其引发剂,所述第一单体为至少一种可自由基聚合的单体,和95至55重量份 百分比的第二单体和光引发剂,所述第二单体是至少一组聚氨酯前体,并且混合物II包含5至45重量%的第一单体和其光引发剂,所述第一单体为至少一组聚氨酯 前体和95至55重量%的第二单体及其光引发剂,所述第二单体是至少一个可自由基聚合的单体,所述聚合物混合物已经通过涉及以λ为中心的波长范围的两个连续光化辐射 1和λ2,其中λ1和λ2彼此不同至少30nm,并且其中 以λ1为中心的光化辐射基本上不使第二单体聚合,并且其中根据ASTM D638-89对所述聚合物混合物测定的应力 - 应变曲线下的面积为至少10%,优选为20%,更优选为 当所述前体单体通过所述顺序光引发过程固化时相比,通过单次光固化固化相同的混合物时,至少50%以上。
    • 5. 发明授权
    • Polymeric mixtures and process therefor
    • 聚合物混合物及其工艺
    • US5102924A
    • 1992-04-07
    • US568088
    • 1990-08-16
    • Jerry W. WilliamsRobert J. DeVoe
    • Jerry W. WilliamsRobert J. DeVoe
    • C08F2/48C08F2/50C08F4/00C08G18/63C09D4/00
    • C08G18/637C08F2/48C09D4/00
    • A tough polymeric mixture comprises the polymerized product of admixture I or II, whereinadmixture I comprises 5 to 45 weight percent of a first monomer and a photoinitiator therefor, said first monomer being at least one free-radically polymerizable monomer, and 95 to 55 weight percent of a second monomer and a photoinitiator therefor, said second monomer being at least one set of polyurethane precursors, andadmixture II comprises 5 to 45 weight percent of a first monomer and a photoinitiator therefor, said first monomer being at least one set of polyurethane precursors, and 95 to 55 weight percent of a second monomer and a photoinitiator therefor, said second monomer being at least one free-radically polymerizable monomer,said polymeric mixture having been prepared by a process involving two sequential actinic radiations of wavelengths ranges centered around .lambda..sub.1 and .lambda..sub.2, respectively, wherein .lambda..sub.1 and .lambda..sub.2 differ from each other by at least 30 nm, andwherein the actinic radiation centered .lambda..sub.1 does not substantialy polymerize the second monomer, andwherein the area under a stress-strain curve as determined by ASTM D638-89 for said polymeric mixture is at least 10 percent greater, preferably 20 percent greater, and more preferably at least 50 percent greater when said precursor monomers are cured by said sequential photoinitiation process compared to when the same mixture is cured by a single photostage cure.
    • 韧性聚合物混合物包含混合物I或II的聚合产物,其中混合物I包含5至45重量%的第一单体和其引发剂,所述第一单体为至少一种可自由基聚合的单体,和95至55重量份 百分比的第二单体和光引发剂,所述第二单体是至少一组聚氨酯前体,并且混合物II包含5至45重量%的第一单体和其光引发剂,所述第一单体为至少一组聚氨酯 前体和95至55重量%的第二单体及其光引发剂,所述第二单体是至少一个可自由基聚合的单体,所述聚合物混合物已经通过涉及波长范围以λ为中心的两个连续光化辐射的方法制备 1和λ2,其中λ1和λ2彼此不同至少30nm,并且其中 光化辐射居中的λ1不会基本上聚合第二单体,并且其中通过ASTM D638-89测定的针对所述聚合物混合物的应力 - 应变曲线下的面积至少为10%,优选为20%,更优选为 当所述前体单体通过所述顺序光引发过程固化时相比,通过单次光固化固化相同的混合物时,其最大50%更大。