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    • 2. 发明授权
    • Light emitting diode with ITO layer and method for fabricating the same
    • 具有ITO层的发光二极管及其制造方法
    • US07998761B2
    • 2011-08-16
    • US12088902
    • 2006-12-08
    • Dae Won KimYeo Jin YoonDuck Hwan OhJong Hwan Kim
    • Dae Won KimYeo Jin YoonDuck Hwan OhJong Hwan Kim
    • H01L21/00
    • H01L33/42H01L27/153H01L33/62H01L2924/0002H01L2924/00
    • The present invention relates to a light emitting diode with enhanced luminance and light emitting performance due to increase in efficiency of current diffusion into an ITO layer, and a method of fabricating the light emitting diode. According to the present invention, there is manufactured at least one light emitting cell including an N-type semiconductor layer, an active layer and a P-type semiconductor layer on a substrate. The method of the present invention comprises the steps of (a) forming at least one light emitting cell with an ITO layer formed on a top surface of the P-type semiconductor layer; (b) forming a contact groove for wiring connection in the ITO layer through dry etching; and (c) filling the contact groove with a contact connection portion made of a conductive material for the wiring connection.
    • 本发明涉及一种具有增强的亮度和发光性能的发光二极管,由于电流扩散到ITO层中的效率的提高,以及制造该发光二极管的方法。 根据本发明,在衬底上制造至少一个包括N型半导体层,有源层和P型半导体层的发光单元。 本发明的方法包括以下步骤:(a)在P型半导体层的顶表面上形成至少一个具有ITO层的发光单元; (b)通过干蚀刻形成用于在ITO层中布线连接的接触槽; 和(c)用接线连接用导电材料制成的接触连接部分填充接触槽。