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    • 2. 发明授权
    • Giant magnetoresistive (GMR) sensor element with enhanced magnetoresistive (MR) coefficient
    • 具有增强磁阻(MR)系数的巨磁阻(GMR)传感器元件
    • US06292336B1
    • 2001-09-18
    • US09408703
    • 1999-09-30
    • Cheng T. HorngRu-Ying TongKochan JuMao-Min ChenJei-Wei ChangSimon H. Liao
    • Cheng T. HorngRu-Ying TongKochan JuMao-Min ChenJei-Wei ChangSimon H. Liao
    • G11B5127
    • B82Y25/00B82Y10/00G01R33/093G11B5/3903G11B5/3967G11B2005/3996H01F10/3268
    • A method for forming a giant magnetoresistive (GMR) sensor element, and a giant magnetoresistive (GMR) sensor element formed in accord with the method. In accord with the method, there is first provided a substrate. There is then formed over the substrate a seed layer formed of a magnetoresistive (MR) resistivity sensitivity enhancing material selected from the group consisting or nickel-chromium alloys and nickel-iron-chromium alloys. There is then formed over the seed layer a nickel oxide material layer. Finally, there is then formed over the nickel oxide material layer a free ferromagnetic layer separated from a pinned ferromagnetic layer in turn formed thereover by a non-magnetic conductor spacer layer, where the pinned ferromagnetic layer in turn has a pinning material layer formed thereover. The method contemplates a giant magnetoresistive (GMR) sensor element formed in accord with the method. The nickel oxide material layer provides the giant magnetoresistive (GMR) sensor element with an enhanced magnetoresistive (MR) resistivity sensitivity.
    • 一种用于形成巨磁阻(GMR)传感器元件的方法,以及根据该方法形成的巨磁阻(GMR)传感元件。 根据该方法,首先提供基板。 然后在衬底上形成由选自镍铬合金和镍 - 铁 - 铬合金的磁阻(MR)电阻率敏感度增强材料形成的晶种层。 然后在种子层上形成氧化镍材料层。 最后,然后在氧化镍材料层上形成与被钉扎的铁磁性层分离的自由铁磁层,然后由非磁性导体间隔层形成,其中钉扎的铁磁层又形成有钉扎材料层。 该方法考虑了根据该方法形成的巨磁阻(GMR)传感器元件。 氧化镍材料层提供具有增强的磁阻(MR)电阻率敏感性的巨磁阻(GMR)传感器元件。
    • 3. 发明授权
    • Method of fabrication of striped magnetoresistive (SMR) and dual stripe magnetoresistive (DSMR) heads with anti-parallel exchange configuration
    • 具有反并联交换配置的带状磁阻(SMR)和双条磁阻(DSMR)头的制造方法
    • US06204071B1
    • 2001-03-20
    • US09408491
    • 1999-09-30
    • Kochan JuMao-Min ChenCheng T. HorngJei-Wei Chang
    • Kochan JuMao-Min ChenCheng T. HorngJei-Wei Chang
    • H01L2100
    • B82Y25/00B82Y10/00G11B5/3163G11B5/3903G11B5/3932G11B5/3948G11B2005/3996
    • A method for forming a longitudinally magnetically biased dual stripe magnetoresistive (DSMR) sensor element comprises forming a first patterned magnetoresistive (MR) layer. Contact the opposite ends of the patterned magnetoresistive (MR) layer with a first pair of stacks defining a track width of the first magnetoresistive (MR) layer, each of the stacks including a first Anti-Ferro-Magnetic (AFM) layer and a first lead layer. Then anneal the device in the presence of a longitudinal external magnetic field. Next, form a second patterned magnetoresistive (MR) layer above the previous structure. Contact the opposite ends of the second patterned magnetoresistive (MR) layer with a second pair of stacks defining a second track width of the second patterned magnetoresistive (MR) layer. Each of the second pair of stacks includes spacer layer composed of a metal, a Ferro-Magnetic (FM) layer, a second Anti-Ferro-Magnetic (AFM) layer and a second lead layer. Then anneal the device in the presence of a second longitudinal external magnetic field.
    • 用于形成纵向磁偏置双条磁阻(DSMR)传感器元件的方法包括形成第一图案化磁阻(MR)层。 用限定第一磁阻(MR)层的轨道宽度的第一对叠层接触图案化磁阻(MR)层的相对端,每个堆叠包括第一抗铁磁(AFM)层和第一 铅层。 然后在存在纵向外部磁场的情况下退火该器件。 接下来,在先前的结构之上形成第二图案化磁阻(MR)层。 用限定第二图案化磁阻(MR)层的第二磁道宽度的第二对叠层接触第二图案化磁阻(MR)层的相对端。 第二对堆叠中的每一个包括由金属,铁磁(FM)层,第二抗铁磁(AFM)层和第二引线层组成的间隔层。 然后在存在第二纵向外部磁场的情况下退火该器件。
    • 4. 发明授权
    • Method of fabrication of striped magnetoresistive (SMR) and dual stripe magnetoresistive (DSMR) heads with anti-parallel exchange configuration
    • 具有反并联交换配置的带状磁阻(SMR)和双条磁阻(DSMR)头的制造方法
    • US06430015B2
    • 2002-08-06
    • US09773743
    • 2001-02-02
    • Kochan JuMao-Min ChenCheng T. HorngJei-Wei Chang
    • Kochan JuMao-Min ChenCheng T. HorngJei-Wei Chang
    • G11B539
    • B82Y25/00B82Y10/00G11B5/3163G11B5/3903G11B5/3932G11B5/3948G11B2005/3996
    • A longitudinally magnetically biased dual stripe magnetoresistive (DSMR) sensor element comprises a first patterned magnetoresistive (MR) layer. There are contacts at the opposite ends of the patterned magnetoresistive (MR) layer with a first pair of stacks defining a track width of the first magnetoresistive (MR) layer with a first pair of stacks defining a track width of the first magnetoresistive (MR) layer, each of the stacks including a first Anti-Ferro-Magnetic (AFM) layer and a first lead layer. With the first MR layer in place the device was annealed in the presence of a longitudinal external magnetic field. A second patterned magnetoresistive (MR) layer was formed above the previous structure. There are contacts at the opposite ends of the second patterned magnetoresistive (MR) layer with a second pair of stacks defining a second track width of the second patterned magnetoresistive (MR) layer. Each of the second pair of stacks includes spacer layer is composed of a metal, a Ferro-Magnetic (FM) layer, a second Anti-Ferro-Magnetic (AFM) layer and a second lead layer. With the second MR layer in place, the device was annealed in the presence of a second longitudinal external magnetic field.
    • 纵向磁偏置双条磁阻(DSMR)传感器元件包括第一图案化磁阻(MR)层。 在图案化磁阻(MR)层的相对端处存在触点,第一对叠层限定第一磁阻(MR)层的轨道宽度,第一对堆叠限定第一磁阻(MR)的磁道宽度, 层,每个堆叠包括第一抗铁磁(AFM)层和第一引线层。 在第一MR层就位的情况下,器件在存在纵向外部磁场的情况下退火。 在先前结构之上形成第二图案化磁阻(MR)层。 在第二图案化磁阻(MR)层的相对端具有限定第二图案化磁阻(MR)层的第二磁道宽度的第二对叠层的触点。 第二对堆叠中的每一个包括间隔层由金属,铁磁(FM)层,第二抗铁磁(AFM)层和第二引线层组成。 在第二MR层就位的情况下,器件在第二纵向外部磁场的存在下退火。
    • 8. 发明授权
    • Method of manufacturing magnetoresistive (MR) sensor element with sunken lead structure
    • 具有凹陷引线结构的磁阻(MR)传感器元件的制造方法
    • US06228276B1
    • 2001-05-08
    • US09244882
    • 1999-02-05
    • Kochan JuJei-Wei ChangCheng T. Horng
    • Kochan JuJei-Wei ChangCheng T. Horng
    • G11B5127
    • B82Y25/00B82Y10/00G01R33/09G11B5/3163G11B5/3903G11B5/3967G11B2005/3996
    • A method for forming a magnetoresistive (MR) sensor element. There is first provided a substrate. There is then formed over the substrate a seed layer. There is then formed contacting a pair of opposite ends of the seed layer a pair of patterned conductor lead layer structures. There is then etched, while employing an ion etch method, the seed layer and the pair of patterned conductor lead layer structures to form an ion etched seed layer and a pair of ion etched patterned conductor lead layer structures. Finally, there is then formed upon the ion etched seed layer and the pair of ion etched patterned conductor lead layers structures a magnetoresistive (MR) layered structure. Within the magnetoresistive (MR) sensor element, the pair of patterned conductor lead layer structures may be formed within a pair of recesses within an ion etch recessed dielectric isolation layer.
    • 一种用于形成磁阻(MR)传感器元件的方法。 首先提供基板。 然后在衬底上形成种子层。 然后形成一对图案化的导体引线层结构使种子层的一对相对端接触。 然后蚀刻,同时采用离子蚀刻方法,种子层和一对图案化的导体引线层结构,以形成离子蚀刻种子层和一对离子蚀刻图案化导体引线层结构。 最后,然后形成在离子蚀刻种子层上,并且一对离子蚀刻图案化的导体引线层构成磁阻(MR)层状结构。 在磁阻(MR)传感器元件内,一对图案化的导体引线层结构可以形成在离子蚀刻凹陷的介电隔离层内的一对凹槽内。