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1. 发明授权

US07230701B2 Compact spectroscopic ellipsometer 有权
标题翻译：紧凑型光谱椭偏仪
公开(公告)号：US07230701B2
公开(公告)日：2007-06-12
申请号：US10333415
申请日：2001-07-16
申请人： Jean-Louis Stehle , Jean-Philippe Piel , Pierre Boher , Luc Tantart , Jean-Pierre Rey
发明人： Jean-Louis Stehle , Jean-Philippe Piel , Pierre Boher , Luc Tantart , Jean-Pierre Rey
IPC分类号： G01J4/00
CPC分类号： G01J4/04 , G01N21/211
摘要： The invention concerns an ellipsometer comprising: a source (2) capable of emitting a broadband ray (4), a polarizer (10) for producing a polarised incident beam (12) adapted to illuminate a sample (16) according to at least a selected angle; an analyzer (24) providing an output beam (28) in response to said reflected beam (20) and at least a reflecting optical element (14) arranged between the source (2) and the sample (16) and/or between the sample (16) and the sensor, and capable of focusing the incident beam (12) and/or the reflected beam (20) according to a selected spot The ellipsometer further comprises at least a first refracting optical element (22) arranged between the sample (16) and the sensor and/or between the source (2) and the sample (16) to collect and focus said reflected beam and/or said incident beam, thereby enabling to provide at least a refracting element (22) and a reflecting element (14) on either side of the sample (16) and hence to place the source and the sensor on the same side relative to said spot.
摘要翻译：本发明涉及一种光谱椭偏仪，包括：能够发射宽带射线（4）的源极（2），用于偏振宽带光束（4）的偏振器（10），以及用于产生适于照射光束的偏振入射光束至少一个选定角度的样品（16）; 分析器（24），用于接收由所述照明样品（16）反射的光束（20）并响应于所述反射光束（20）产生输出光束（28）; 以及至少一个布置在源（2）和样品（16）之间和/或样品和传感器之间并且能够聚焦入射光束（12）和/或反射光线（12）的反射光学元件（14） 20）根据选定的地点。椭偏仪还包括布置在样品（16）和传感器之间和/或在源（2）和样品（16）之间的至少第一折射元件（22），以收集和聚焦所述反射光束和/或所述事件从而能够在样品（16）的任一侧上提供至少一个折射元件（22）和反射元件（14），从而使源和传感器相对于所述光斑位于同一侧。

2. 发明授权

US06687002B2 Method and apparatus for ellipsometric metrology for a sample contained in a chamber or the like 有权
标题翻译：用于室或类似物中包含的样品的椭偏计量的方法和装置
公开(公告)号：US06687002B2
公开(公告)日：2004-02-03
申请号：US09866503
申请日：2001-05-25
申请人： Jean-Louis Stehle , Pierre Boher
发明人： Jean-Louis Stehle , Pierre Boher
IPC分类号： G01J400
CPC分类号： G01N21/211 , H01L22/12
摘要： An ellipsometric metrology apparatus for a sample contained in a chamber. A light source outside the chamber produces the illuminating beam. A polarizing device outside the chamber polarizes the illuminating beam. A window of selected dimensions and features is disposed in a plane substantially parallel to the sample surface and at least partly closes the chamber. A first directing device directs the polarized illuminating beam on to an area of the sample along a first optical path extending from the polarizing device to the area of the sample through the window. The first optical path forms a predetermined oblique angle of incidence relative to the sample surface. A polarization analyzing device is outside the chamber, a second directing device directs the reflected beam resulting from the illumination of the sample by the illuminating beam on to the analyzing device along a second optical path extending from the sample towards the analyzing device through the window. The reflected beam is symmetrical to the illuminating beam relative to a normal to the sample surface. A detecting device detects the output beam transmitted by the analyzing device in order to supply an output signal processing means processes the output signal in order to determine the changes in stage of polarization in phase and in amplitude caused by the reflection on the area of the sample.
摘要翻译：用于容纳在室中的样品的椭偏计量测量装置。室外的光源产生照明光束。室外的偏振装置使照明光束偏振。所选择的尺寸和特征的窗口设置在基本上平行于样品表面的平面中并且至少部分地封闭室。第一引导装置将偏振照明光束沿着从偏振装置延伸到通过窗口的样品区域的第一光路引导到样品的区域。第一光路相对于样品表面形成预定的入射角。偏振分析装置在室外，第二引导装置将通过照射光束照射的样品产生的反射光束沿着从样品向分析装置通过窗口延伸的第二光路引导到分析装置。反射光束相对于样品表面的法线对称于照明光束。检测装置检测由分析装置发送的输出光束，以便提供输出信号处理装置处理输出信号，以便确定由样本面积上的反射引起的相位和幅度偏振阶段的变化。

3. 发明授权

US06819423B2 High spatial resolution infrared ellipsometer 有权
公开(公告)号：US06819423B2
公开(公告)日：2004-11-16
申请号：US10333416
申请日：2003-01-16
申请人： Jean-Louise Stehle , Pierre Boher , Michel Luttmann
发明人： Jean-Louise Stehle , Pierre Boher , Michel Luttmann
IPC分类号： G01J400
CPC分类号： G01J4/04 , G01N21/211
摘要： The invention concerns an ellipsometer comprising a source (S) supplying at least an infrared radiation, a sample-holder (PE), a sensor (D), a first optical system mounted between the source (S) and the sample-holder (PE), so as to illuminate a sample placed on the sample-holder, under oblique view with a polarised light beam and a second optical system mounted between the sample-holder (PE) and the sensor (D) for collecting the light reflected by the sample. The ellipsometer further comprises a blocking device (F2) mounted on the reflection path in the focal plane of the focusing device (M2) of the second optical system, and adapted to block parasite rays (RP) derived from the rear surface (FAR) of the sample and to allow through useful rays (RU) derived from the front surface (FAV) of the sample towards the sensor (D), thereby enabling to obtain a resolution with respect to the sample front and rear surfaces.

4. 发明申请

US20090218495A1 Device and Method for Discriminating Cernkov and Scintillation Radiation 审中-公开
标题翻译：识别Cernkov和闪烁辐射的装置和方法
公开(公告)号：US20090218495A1
公开(公告)日：2009-09-03
申请号：US12300956
申请日：2007-05-15
申请人： Thierry Leroux , Pierre Boher
发明人： Thierry Leroux , Pierre Boher
IPC分类号： G01T1/20 , G06K9/00
CPC分类号： G01T1/169 , G01T1/20 , G01T1/22
摘要： A device for discriminating Cerenkov and scintillation radiation and a beam inspection device, including an inspection head comprising a scintillator and at least one ionizing radiation diffuser block, a device for discriminating Cerenkov and scintillation radiation, and an imaging system for forming an image from at least a part of the inspection head, along with a corresponding method. In order to suppress spurious Cerenkov radiation contributions to the scintillation radiation, the device has periodically arranged first and second filters, having different relative absorption properties with respect to scintillation radiation and ionizing radiation. Also, an imaging apparatus comprising means for reducing parasitic contributions to a signal of interest, wherein the apparatus has a modulation mask for modulating a signal of interest, wherein, in particular, the signal of interest is the signal illuminating the object or the signal emitted or reflected from the object, and an image analyzing means configured to remove—at least partially—parasitic contributions added to the modulated signal of interest based on the shift of the signal of interest towards higher frequencies due to the modulation.
摘要翻译：用于鉴别切伦科夫和闪烁辐射的装置和光束检查装置，其包括检测头，其包括闪烁体和至少一个电离辐射漫射器块，用于鉴别切伦科夫和闪烁辐射的装置，以及用于从至少形成图像的成像系统检查头的一部分，以及相应的方法。为了抑制对闪烁辐射的假切伦科夫辐射贡献，该装置周期性地布置了第一和第二滤光片，其相对于闪烁辐射和电离辐射具有不同的相对吸收特性。此外，成像设备包括用于减少对感兴趣的信号的寄生贡献的装置，其中该装置具有用于调制感兴趣的信号的调制掩模，其中特别地，感兴趣的信号是照亮对象的信号或发射的信号或从对象反射的图像分析装置，以及图像分析装置，被配置为基于由于调制而导致的感兴趣信号向更高频率的移位，去除至少部分地添加到感兴趣的调制信号的寄生输入。

5. 发明授权

US6073464A Laser surface treatment device and method 失效
标题翻译：激光表面处理装置及方法
公开(公告)号：US6073464A
公开(公告)日：2000-06-13
申请号：US126
申请日：1998-01-16
申请人： Pierre Boher , Marc Stehle
发明人： Pierre Boher , Marc Stehle
IPC分类号： H01L21/20 , H01L21/268 , H01L21/66 , C03B27/012 , C03B5/24 , C03B5/26 , C03B37/01 , C03B37/018
CPC分类号： B24B37/013 , H01L22/26 , H01L2924/0002
摘要： A laser surface method involves applying a laser beam treatment in one or several steps to a series of generally similar surfaces of given depth. Properties of the laser treatment are selected so as to change the physical state of each surface. Ellipsometry measurements are made in a region of the first surface before application of the laser beam treatment to the second surface, so as to obtain a physico-chemical characterization of the first surface. Both the laser beam application and the ellipsometry measurement are conducted under generally similar working conditions, so that the change of the physical state of each surface produced by the laser treatment can be controlled in a real time, in-situ, rapidly and nondestructively.
摘要翻译： PCT No.PCT / FR96 / 01034 Sec。 371日期1998年1月16日 102（e）日期1998年1月16日PCT提交1996年7月3日PCT公布。出版物WO97 / 07539 日期1997年2月27日激光表面方法包括在一个或几个步骤中将激光束处理应用于给定深度的一系列大致相似的表面。选择激光处理的特性以改变每个表面的物理状态。在将激光束处理应用于第二表面之前，在第一表面的区域中进行椭圆偏光测量，以获得第一表面的物理化学表征。激光束施加和椭偏仪测量都在大致相似的工作条件下进行，使得可以实时，原位，快速和非破坏性地控制由激光治疗产生的每个表面的物理状态的变化。

6. 发明授权

US5216539A Device of the mirror type in the range of X-UV rays 失效
标题翻译：在X-UV范围内的镜子类型的装置
公开(公告)号：US5216539A
公开(公告)日：1993-06-01
申请号：US688621
申请日：1991-05-23
申请人： Pierre Boher , Philippe Houdy
发明人： Pierre Boher , Philippe Houdy
IPC分类号： G21K1/06 , G02B5/08 , G02B5/28
CPC分类号： G02B5/0875 , G02B5/0891
摘要： Device of the mirror type in the range of X-UV rays, comprises a periodic stack, on a support, of a system of superimposed layers, which system includes a lower layer of a first heavy element reflecting at the wavelengths of application of the mirror, and an upper spacer layer of a light element which has low optical absorption at these wavelengths. The system of superimposed layers comprises, between the lower layer and the upper layer, an intermediate layer of a second heavy element reflecting at the wavelengths of application to form a three-layer system. The heavy elements are selected to form together with the spacer element first and second pairs, first of which has greater absorption at the wavelengths of application and exhibits a ratio of contrast of real and complex indices lower than the other second pair. The heavy element of the first pair forms the lower layer of the three-layer system, the intermediate layer being composed of the heavy element of the second pair.
摘要翻译： PCT No.PCT / NL90 / 00147 Sec。 371日期1991年5月23日 102（e）日期1991年5月23日PCT提交1990年10月10日PCT公布。出版物WO91 / 06021 日期：1991年5月2日。在X射线范围内的反射镜类型的装置包括在叠层的系统的支撑体上的周期性堆叠，该系统包括在反射镜的应用波长，以及在这些波长处具有低光吸收的光元件的上间隔层。重叠层的系统在下层和上层之间包括以应用的波长反射以形成三层体系的第二重元素的中间层。选择重元素与间隔元件第一和第二对一起形成，其首先在施加的波长处具有更大的吸收，并且表现出比其他第二对低的实数和复数指数的对比度比。第一对的重元素形成三层系统的下层，中间层由第二对的重元素组成。

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