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1. 发明授权

US07230701B2 Compact spectroscopic ellipsometer 有权
标题翻译：紧凑型光谱椭偏仪
公开(公告)号：US07230701B2
公开(公告)日：2007-06-12
申请号：US10333415
申请日：2001-07-16
申请人： Jean-Louis Stehle , Jean-Philippe Piel , Pierre Boher , Luc Tantart , Jean-Pierre Rey
发明人： Jean-Louis Stehle , Jean-Philippe Piel , Pierre Boher , Luc Tantart , Jean-Pierre Rey
IPC分类号： G01J4/00
CPC分类号： G01J4/04 , G01N21/211
摘要： The invention concerns an ellipsometer comprising: a source (2) capable of emitting a broadband ray (4), a polarizer (10) for producing a polarised incident beam (12) adapted to illuminate a sample (16) according to at least a selected angle; an analyzer (24) providing an output beam (28) in response to said reflected beam (20) and at least a reflecting optical element (14) arranged between the source (2) and the sample (16) and/or between the sample (16) and the sensor, and capable of focusing the incident beam (12) and/or the reflected beam (20) according to a selected spot The ellipsometer further comprises at least a first refracting optical element (22) arranged between the sample (16) and the sensor and/or between the source (2) and the sample (16) to collect and focus said reflected beam and/or said incident beam, thereby enabling to provide at least a refracting element (22) and a reflecting element (14) on either side of the sample (16) and hence to place the source and the sensor on the same side relative to said spot.
摘要翻译：本发明涉及一种光谱椭偏仪，包括：能够发射宽带射线（4）的源极（2），用于偏振宽带光束（4）的偏振器（10），以及用于产生适于照射光束的偏振入射光束至少一个选定角度的样品（16）; 分析器（24），用于接收由所述照明样品（16）反射的光束（20）并响应于所述反射光束（20）产生输出光束（28）; 以及至少一个布置在源（2）和样品（16）之间和/或样品和传感器之间并且能够聚焦入射光束（12）和/或反射光线（12）的反射光学元件（14） 20）根据选定的地点。椭偏仪还包括布置在样品（16）和传感器之间和/或在源（2）和样品（16）之间的至少第一折射元件（22），以收集和聚焦所述反射光束和/或所述事件从而能够在样品（16）的任一侧上提供至少一个折射元件（22）和反射元件（14），从而使源和传感器相对于所述光斑位于同一侧。

2. 发明授权

US07714992B2 Equipment and method for monitoring an immersion lithography device 失效
标题翻译：浸没式光刻设备监控的设备和方法
公开(公告)号：US07714992B2
公开(公告)日：2010-05-11
申请号：US11991613
申请日：2006-09-11
申请人： Jean-Philippe Piel , Jean-Louis Stehle
发明人： Jean-Philippe Piel , Jean-Louis Stehle
IPC分类号： G01N21/41
CPC分类号： G03F7/70858 , G01N21/431 , G03F7/70341
摘要： The invention concerns an equipment for monitoring an immersion lithography device provided with a main light source and a projection optics for printing images on a wafer. The propagating medium extending from the projection optics to the wafer consists of a liquid (3). The equipment comprises: a chamber (51) for receiving at least part of said liquid (3), a diffraction grating (50) immersed in the chamber; a secondary light source (271) for emitting a secondary incident beam (20) towards the grating so as to obtain a diffracted beam; angle measuring members (57) capable of measuring at least one diffraction angle corresponding to a maximum intensity of an order of diffraction of the beam diffracted by the grating (500), and computing means (505) for calculating an estimate of a physical quantity concerning the refractive index of the liquid.
摘要翻译：本发明涉及一种用于监测浸没式光刻设备的设备，该设备具有主光源和用于在晶片上打印图像的投影光学元件。从投影光学器延伸到晶片的传播介质由液体（3）组成。该设备包括：用于容纳所述液体（3）的至少一部分的腔室（51），浸入所述腔室中的衍射光栅（50）; 用于向光栅发射次级入射光束（20）的二次光源（271），以便获得衍射光束; 能够测量与由光栅（500）衍射的光束的衍射级的最大强度对应的至少一个衍射角的角度测量部件（57），以及用于计算与光栅（500）相关的物理量的估计的计算装置（505）液体的折射率。

3. 发明申请

US20090116001A1 Equipment and Method for Monitoring an Immersion Lithography Device 失效
标题翻译：用于监测浸没光刻设备的设备和方法
公开(公告)号：US20090116001A1
公开(公告)日：2009-05-07
申请号：US11991613
申请日：2006-09-11
申请人： Jean-Philippe Piel , Jean-Louis Stehle
发明人： Jean-Philippe Piel , Jean-Louis Stehle
IPC分类号： G01N21/41 , G06F15/00
CPC分类号： G03F7/70858 , G01N21/431 , G03F7/70341
摘要： The invention concerns an equipment for monitoring an immersion lithography device provided with a main light source and a projection optics for printing images on a wafer. The propagating medium extending from the projection optics to the wafer consists of a liquid (3). The equipment comprises: a chamber (51) for receiving at least part of said liquid (3), a diffraction grating (50) immersed in the chamber; a secondary light source (271) for emitting a secondary incident beam (20) towards the grating so as to obtain a diffracted beam; angle measuring members (57) capable of measuring at least one diffraction angle corresponding to a maximum intensity of an order of diffraction of the beam diffracted by the grating (500), and computing means (505) for calculating an estimate of a physical quantity concerning the refractive index of the liquid.
摘要翻译：本发明涉及一种用于监测浸没式光刻设备的设备，该设备具有主光源和用于在晶片上打印图像的投影光学元件。从投影光学器延伸到晶片的传播介质由液体（3）组成。该设备包括：用于容纳所述液体（3）的至少一部分的腔室（51），浸入所述腔室中的衍射光栅（50）; 用于向光栅发射次级入射光束（20）的二次光源（271），以便获得衍射光束; 能够测量与由光栅（500）衍射的光束的衍射级的最大强度对应的至少一个衍射角的角度测量部件（57），以及用于计算与光栅（500）相关的物理量的估计的计算装置（505）液体的折射率。

4. 发明授权

US5991037A High spatial resolution ellipsometry device 失效
标题翻译：高空间分辨率椭圆测量装置
公开(公告)号：US5991037A
公开(公告)日：1999-11-23
申请号：US386
申请日：1998-01-27
申请人： Jean-Philippe Piel , Jean-Louis Stehle , Dorian Zahorski
发明人： Jean-Philippe Piel , Jean-Louis Stehle , Dorian Zahorski
IPC分类号： G01N21/21
CPC分类号： G01N21/211
摘要： The ellipsometry device includes a first focusing device, combined with a first optical system, for focusing the light beam from the first optical system onto the sample, a second focusing device, combined with a second optical system, for focusing the beam reflected by the sample surface onto the input of the second optical system, and an optical correction device for correcting, together with the first and second focusing devices, the position of the focused reflected beam so as to reject the interference reflections generated by the surface of the sample opposite the light beam receiving surface, and to obtain a maximum signal level at the photodetector.
摘要翻译： PCT No.PCT / FR96 / 01035 Sec。 371日期：1998年1月27日 102（e）1998年1月27日PCT PCT 1996年7月3日PCT公布。公开号WO97 / 07392 日期1997年2月27日椭圆测量装置包括与第一光学系统组合的第一聚焦装置，用于将来自第一光学系统的光束聚焦到样品上，与第二光学系统组合的第二聚焦装置，由样品表面反射的光束到第二光学系统的输入上;以及光学校正装置，用于与第一和第二聚焦装置一起校正聚焦反射光束的位置，以便抑制表面产生的干涉反射并且在光电检测器处获得最大信号电平。

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