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    • 1. 发明申请
    • Self-draining edge wheel system and method
    • 自排水轮系统及方法
    • US20060000494A1
    • 2006-01-05
    • US10882934
    • 2004-06-30
    • James GarciaFritz Redeker
    • James GarciaFritz Redeker
    • B08B3/02
    • H01L21/67051B08B3/02B08B11/02B08B2203/0229H01L21/67023H01L21/67028H01L21/67034H01L21/6704H01L21/68707
    • Provided is a system and method to prevent the transfer of accumulated fluid to wafers during cleaning operations. Specifically, when a wafer is secured by a plurality of self-draining edge wheels, any fluid contacting the self-draining edge wheels is channeled away from the wafer towards a bottom surface of each of the self-draining edge wheels. The channeling occurs by manufacturing the bottom portions of the self-draining edge wheels to have different configurations. The different configurations enhance fluid channeling away from the wafer. To further prevent fluid from wetting a bottom surface of the self-draining edge wheels, an edge wheel dryer can be positioned proximately adjacent to at least one self-draining edge wheel to suction fluid away from the bottom surface by using a vacuum channel of the edge wheel dryer.
    • 提供了一种在清洁操作期间防止积聚的流体转移到晶片的系统和方法。 具体地说,当晶片被多个自排水边缘轮固定时,接触自排水边缘轮的任何流体被引导离开晶片朝向每个自排水边缘轮的底表面。 通过制造自排水边缘轮的底部以具有不同的构造而发生沟槽。 不同的配置增强了远离晶片的流体通道。 为了进一步防止流体润湿自排水边缘轮的底部表面,边缘轮干燥器可以被定位成邻近至少一个自排水边缘轮,以通过使用真空通道从底部表面抽吸流体 边缘烘干机。
    • 3. 发明申请
    • MENISCUS PROXIMITY SYSTEM FOR CLEANING SEMICONDUCTOR SUBSTRATE SURFACES
    • 用于清洁半导体基板表面的MENISCUS接近系统
    • US20070107756A1
    • 2007-05-17
    • US11619599
    • 2007-01-03
    • Carl WoodsJames GarciaJohn de Larios
    • Carl WoodsJames GarciaJohn de Larios
    • B08B3/00B08B3/12
    • H01L21/67051C25D5/22C25D17/001H01L21/02041H01L21/02052H01L21/67028H01L21/67034H01L21/67046Y10S134/902
    • A system and apparatus for cleaning a substrate is provided. The system includes a first head configured as a bar shape that extends approximately a diameter of the substrate. The first head is configured for placement on a first side of the substrate. A second head is also provided, and is configured as a bar shape that extends approximately the diameter of the wafer, and the second head is configured for placement on a second side of the substrate, such that the second side is opposite the first side. In this example, each of the first head and the second head have conduits formed therein along the diameter of the substrate for delivering and removing fluids so that a meniscus is capable of being contained between each of the first head and a substrate surface of the first side of the substrate and the second head and a substrate surface of the second side of the substrate.
    • 提供了一种清洁基板的系统和装置。 该系统包括构造为棒状的第一头部,其大致延伸到基底的直径。 第一头被配置为放置在基底的第一侧上。 还提供了第二头,并且被配置为大致延伸晶片的直径的棒状,并且第二头构造成用于放置在衬底的第二侧上,使得第二侧与第一侧相对。 在该示例中,第一头部和第二头部中的每一个具有沿着基底的直径形成在其中的导管,用于输送和移除流体,使得弯液面能够容纳在第一头部和第一头部的基底表面之间 基板和第二头部的一侧以及基板的第二侧的基板表面。
    • 5. 发明申请
    • Meniscus, vacuum, IPA vapor, drying manifold
    • 半月板,真空,IPA蒸气,干燥歧管
    • US20070023070A1
    • 2007-02-01
    • US11542700
    • 2006-10-03
    • Carl WoodsJames GarciaJohn de Larios
    • Carl WoodsJames GarciaJohn de Larios
    • B08B5/04B08B3/00
    • H01L21/67051C25D5/22C25D17/001H01L21/02041H01L21/02052H01L21/67028H01L21/67034H01L21/67046Y10S134/902
    • A head is provided which includes a first surface of the head capable of being in close proximity to the wafer surface, and includes a first conduit region on the head where the first conduit region is defined for delivery of a first fluid to wafer of the surface and the first conduit region is defined in a center portion of the head. The head further includes a second conduit region on the head which surrounds the first conduit region, and includes a third conduit region on the head which is defined for delivery of a second fluid to the wafer surface. The third conduit region semi-encloses the first conduit region and the second conduit region. The second conduit region enables a removal of the first fluid and the second fluid. The delivery of the first fluid and the second fluid combined with the removal by the third conduit region of the head defines a controllable meniscus.
    • 提供了一种头部,其包括能够靠近晶片表面的头部的第一表面,并且包括头部上的第一导管区域,其中限定第一导管区域以将第一流体输送到表面的晶片 并且第一管道区域被限定在头部的中心部分中。 头部还包括在头部上的围绕第一管道区域的第二管道区域,并且包括头部上的第三管道区域,其被限定用于将第二流体输送到晶片表面。 第三管道区域半封闭第一管道区域和第二管道区域。 第二管道区域能够移除第一流体和第二流体。 第一流体和第二流体的输送与头部的第三导管区域的移除相结合,限定了可控弯液面。
    • 7. 发明授权
    • Device on board a moving vehicle to obtain signals representative of the
relative speed of the vehicle with respect to an ambient fluid
    • 装置在移动车辆上以获得代表相对于环境流体的车辆的相对速度的信号
    • US5047653A
    • 1991-09-10
    • US543081
    • 1990-06-25
    • James GarciaGerard Beigbeder
    • James GarciaGerard Beigbeder
    • G01C21/10G01C21/00G01P5/00G01P5/26
    • G01P5/26
    • A device uses fringe laser diode anemometers which, from the beams coming from one or more laser diodes, form measuring volumes having interference fringes. The component of the relative speed of an aircraft in a direction perpendicular to the plane of these fringes is deduced from the modulation of light reflected by particles moving through the measuring volume to cause modulation of the signal of the photodetector of each anemometer during their passage in the measuring volume of this anemometer. By joining two anemometers with the measuring volumes whose planes of the associated fringes are, for example, orthogonal, it is possible to determine two components of the relative speed vector and determine, for example, this relative speed in the longitudinal vertical plane of the aircraft, and to deduce from it the angle of incidence of the aircraft.
    • 器件使用边缘激光二极管风速计,其来自一个或多个激光二极管的光束形成具有干涉条纹的测量体积。 飞行器在与这些边缘平面垂直的方向上的相对速度的分量是从粒子移动通过测量体积反射的光的调制推导的,以便在每个风速计通过期间对每个风速计的光电检测器的信号进行调制 该风速计的测量体积。 通过连接两个具有相关边缘的平面的测量体积的风速计例如正交,可以确定相对速度矢量的两个分量,并且确定例如飞行器的纵向垂直平面中的相对速度 ,并从中推断出飞机的发生角度。