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    • 8. 发明授权
    • Image processing apparatus and image processing method
    • 图像处理装置和图像处理方法
    • US08199190B2
    • 2012-06-12
    • US12451246
    • 2008-05-09
    • Isahiko TanakaShin-ichi KojimaTakashi Naito
    • Isahiko TanakaShin-ichi KojimaTakashi Naito
    • H04N9/47H04N5/222
    • G06K9/00845G06F9/4831G06F9/4887G06K9/00993
    • An image processing apparatus is configured so that a combination of the processes that are performed is set for each of unit cycles (according to the value of a counter) in accordance with priorities individually set for the processes, and image processing is performed in a fundamental cycle that is constituted of six unit cycles. A face direction determination process, a line-of-sight direction determination process, a blink detection process, a dozing determination process, and a consciousness deterioration level determination process are selectively performed depending on the value of the counter, which varies from 1 to 6. According to the image processing apparatus, it is possible to more efficiently perform image processing that involves a plurality of processes.
    • 图像处理装置被配置为使得根据针对处理单独设置的优先级,针对每个单位周期(根据计数器的值)设置所执行的处理的组合,并且以基本形式执行图像处理 循环由六个单位循环组成。 根据从1到6变化的计数器的值来选择执行面部方向确定处理,视线方向确定处理,眨眼检测处理,打盹确定处理和意识恶化水平确定处理 根据图像处理装置,可以更有效地进行涉及多个处理的图像处理。
    • 10. 发明授权
    • Charged particle beam transfer mask
    • 带电粒子束传递掩模
    • US06218058B1
    • 2001-04-17
    • US09363686
    • 1999-07-29
    • Takehisa YahiroKazuaki SuzukiShin-ichi Kojima
    • Takehisa YahiroKazuaki SuzukiShin-ichi Kojima
    • G03F900
    • B82Y10/00B82Y40/00G03F1/20H01J37/3174H01J2237/31788
    • A charged particle beam transfer mask (6) has a plurality of subfields (8) each of which having a different pattern density. The charged particle beam transfer mask (6) divide-irradiates a charged particle beam (5) for each of the subfields (8) and reduce-transfers a pattern onto a sensitive substrate. The charged particle beam transfer mask (6) corrects the differences in the de-focus amounts (3) caused by Coulomb effect due to the different pattern densities when the pattern is transferred for each of the subfields (8) so as to eliminate the differences in the de-focus amounts (3) caused by Coulomb effect by pre-varying the position (height) of each of the subfields (8) in the optical axis direction.
    • 带电粒子束传递掩模(6)具有多个具有不同图案密度的子场(8)。 带电粒子束传递掩模(6)对每个子场(8)分开照射带电粒子束(5),并将图案减少到敏感基片上。 带电粒子束传递掩模(6)校正当为每个子场(8)传送图案时由于不同图案密度而由库仑效应引起的去焦量(3)的差异,以消除差异 在通过预先改变每个子场(8)在光轴方向上的位置(高度)而由库仑效应引起的去焦量(3)中。