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    • 3. 发明授权
    • Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
    • 宽带深紫外/真空紫外线反射折射成像系统
    • US07518789B2
    • 2009-04-14
    • US10959022
    • 2004-10-04
    • David R. ShaferYung-Ho ChuangJ. Joseph Armstrong
    • David R. ShaferYung-Ho ChuangJ. Joseph Armstrong
    • G02B13/14G03B27/54
    • G03F7/70225G02B17/08G02B17/0812G02B17/0856G02B17/0892G02B17/0896G02B21/04G02B21/16G03F1/84G03F7/70275G03F7/70483G03F7/70616G03F7/7065
    • A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately. The objective designs presented have the optical axis of the Mangin mirror image relay at ninety degrees to the optical axis defined by the focusing lenses, or an in-line or straight objective having one ninety degree bend of light rays.
    • 提供了用于检查样品的设计,例如光掩模,用于不想要的颗粒和诸如图案缺陷的特征。 该系统不提供中心遮蔽,用于打开和傅立叶滤波的外部光瞳,以及相对放松的制造公差,并且适用于波长低于365nm的宽带亮场和激光暗场成像和检查。 在许多情况下,所使用的透镜可以使用单一材料来制造或制造。 公开了物镜设计的多个实施例,全部包括至少一个小折叠镜和Mangin镜。 系统离轴实现,使得返回的第二图像从第一图像横向移位,使得横向分离允许分别对每个图像进行光学接收和操纵。 所提出的目标设计具有与由聚焦透镜限定的光轴90度的Mangin镜像继电器的光轴,或具有一个九十度光线弯曲的直列或直线物镜。
    • 4. 发明申请
    • Beam delivery system for laser dark-field illumination in a catadioptric optical system
    • 反射折射光学系统激光暗场照明光束传输系统
    • US20080225282A1
    • 2008-09-18
    • US12074405
    • 2008-03-03
    • Yung-Ho ChuangJ. Joseph Armstrong
    • Yung-Ho ChuangJ. Joseph Armstrong
    • G01N21/88
    • G02B21/10G02B17/0856
    • A method and apparatus for inspecting a specimen are provided. The apparatus comprises a primary illumination source, a catadioptric objective exhibiting central obscuration that directs light energy received from the primary illumination source at a substantially normal angle toward the specimen, and an optical device, such as a prism or reflective surface, positioned within the central obscuration resulting from the catadioptric objective for receiving further illumination from a secondary illumination source and diverting the further illumination to the specimen. The method comprises illuminating a surface of the specimen at a variety of angles using a primary illumination source, illuminating the surface using a secondary illumination source, the illuminating by the secondary illumination source occurring at a substantially normal angle of incidence; and imaging all reflected, scattered, and diffracted light energy received from the surface onto a detector.
    • 提供了一种用于检查样本的方法和装置。 该装置包括初级照明源,显示中心遮蔽的反折射物镜,其将从主照明源接收的光能以基本上垂直的角度朝向样本引导,以及位于中心内的光学装置,例如棱镜或反射表面 由反射折射物镜产生的遮挡,用于接收来自次级照明源的进一步照明并将另外的照明转移到样本。 该方法包括使用主照明源以各种角度照射样本的表面,使用次级照明源照亮表面,由次级照明源以基本上正常的入射角发射; 并将从表面接收的所有反射,散射和衍射的光能成像到检测器上。
    • 7. 发明申请
    • Beam delivery system for laser dark-field illumination in a catadioptric optical system
    • 反射折射光学系统激光暗场照明光束传输系统
    • US20070002465A1
    • 2007-01-04
    • US11171079
    • 2005-06-30
    • Yung-Ho ChuangJ. Joseph Armstrong
    • Yung-Ho ChuangJ. Joseph Armstrong
    • G02B17/00
    • G02B21/10G02B17/0856
    • A method and apparatus for inspecting a specimen are provided. The apparatus comprises a primary illumination source, a catadioptric objective exhibiting central obscuration that directs light energy received from the primary illumination source at a substantially normal angle toward the specimen, and an optical device, such as a prism or reflective surface, positioned within the central obscuration resulting from the catadioptric objective for receiving further illumination from a secondary illumination source and diverting the further illumination to the specimen. The method comprises illuminating a surface of the specimen at a variety of angles using a primary illumination source, illuminating the surface using a secondary illumination source, the illuminating by the secondary illumination source occurring at a substantially normal angle of incidence; and imaging all reflected, scattered, and diffracted light energy received from the surface onto a detector.
    • 提供了一种用于检查样本的方法和装置。 该装置包括初级照明源,显示中心遮蔽的反折射物镜,其将从主照明源接收的光能以基本上垂直的角度朝向样本引导,以及位于中心内的光学装置,例如棱镜或反射表面 由反射折射物镜产生的遮挡,用于接收来自次级照明源的进一步照明并将另外的照明转移到样本。 该方法包括使用主照明源以各种角度照射样本的表面,使用次级照明源照亮表面,由次级照明源以基本上正常的入射角发射; 并将从表面接收的所有反射,散射和衍射的光能成像到检测器上。
    • 8. 发明授权
    • Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
    • 宽带深紫外/真空紫外线反射折射成像系统
    • US06512631B2
    • 2003-01-28
    • US09349036
    • 1999-07-07
    • David R. ShaferYung-Ho ChuangJ. Joseph Armstrong
    • David R. ShaferYung-Ho ChuangJ. Joseph Armstrong
    • G02B1314
    • G03F7/70225G02B17/08G02B17/0812G02B17/0856G02B17/0892G02B17/0896G02B21/04G02B21/16G03F1/84G03F7/70275G03F7/70483G03F7/70616G03F7/7065
    • A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately. The objective designs presented have the optical axis of the Mangin mirror image relay at ninety degrees to the optical axis defined by the focusing lenses, or an in-line or straight objective having one ninety degree bend of light rays.
    • 提供了用于检查样品的设计,例如光掩模,用于不想要的颗粒和诸如图案缺陷的特征。 该系统不提供中心遮蔽,用于打开和傅立叶滤波的外部光瞳,以及相对放松的制造公差,并且适用于波长低于365nm的宽带亮场和激光暗场成像和检查。 在许多情况下,所使用的透镜可以使用单一材料来制造或制造。 公开了物镜设计的多个实施例,全部包括至少一个小折叠镜和Mangin镜。 系统离轴实现,使得返回的第二图像从第一图像横向移位,使得横向分离允许分别对每个图像进行光学接收和操纵。 所提出的目标设计具有与由聚焦透镜限定的光轴90度的Mangin镜像继电器的光轴,或具有一个九十度光线弯曲的直列或直线物镜。
    • 10. 发明授权
    • Small ultra-high NA catadioptric objective using aspheric surfaces
    • 使用非球面表面的小超高NA反射折射物镜
    • US07869121B2
    • 2011-01-11
    • US11375316
    • 2006-03-13
    • David R. ShaferJ. Joseph ArmstrongYung-Ho Chuang
    • David R. ShaferJ. Joseph ArmstrongYung-Ho Chuang
    • G02B5/08
    • G02B21/04G02B17/0856
    • A relatively high NA objective employed for use in imaging a specimen is provided. The objective includes a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive the intermediate image and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy and apply light energy to the specimen. One or more elements may employ an aspheric surface. The objective may provide an uncorrected spectral bandwidth up to approximately 193 to 266 nanometers and numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The field lens may include more than one lens and may be formed of a material different from at least one other lens in the objective.
    • 提供了用于成像试样的相对较高的NA目标。 该目的包括具有至少一个聚焦透镜的透镜组,该至少一个聚焦透镜被配置为接收光能并形成中间图像,定向成接收中间图像并提供中间光能的至少一个场透镜,以及定位成接收中间图像的中间图像 光能并向样品施加光能。 一个或多个元件可以采用非球面。 该目的可以提供高达约193至266纳米的未校正的光谱带宽和超过0.9的数值孔径。 元素的直径小于100毫米,并且可以适合标准显微镜。 场透镜可以包括多于一个透镜,并且可以由与物镜中的至少一个其它透镜不同的材料形成。