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1. 发明申请

WO2011032812A1 CONDUCTIVE STRUCTURE FOR NARROW INTERCONNECT OPENINGS 审中-公开
标题翻译：导电结构用于连接开口
公开(公告)号：WO2011032812A1
公开(公告)日：2011-03-24
申请号：PCT/EP2010/062407
申请日：2010-08-25
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM UNITED KINGDOM LIMITED , ROSSNAGEL, Stephen , YANG, Chih-Chao , EDELSTEIN, Daniel , NOGAMI, Takeshi
发明人： ROSSNAGEL, Stephen , YANG, Chih-Chao , EDELSTEIN, Daniel , NOGAMI, Takeshi
IPC分类号： H01L21/768
CPC分类号： H01L21/76871 , H01L21/76846 , H01L21/76868 , H01L21/76883
摘要： An interconnect structure having reduced electrical resistance and a method of forming such an interconnect structure are provided. The interconnect structure includes a dielectric material (24) including at least one opening therein. The at least one opening is filled with an optional barrier diffusion layer (30), a grain growth promotion layer (32), an agglomerated plating seed layer (34'), an optional second plating seed layer a conductive structure (38). The conductive structure which includes a metal-containing conductive material, typically Cu, has a bamboo microstructure and an average grain size of larger than 0.05 microns. In some embodiments, the conductive structure includes conductive grains that have a (111) crystal orientation.
摘要翻译：提供具有降低的电阻的互连结构和形成这种互连结构的方法。互连结构包括其中包括至少一个开口的电介质材料（24）。所述至少一个开口填充有可选的阻挡扩散层（30），晶粒生长促进层（32），聚集的电镀种子层（34'），任选的第二电镀种子层，导电结构（38）。包含含金属的导电材料（通常为Cu）的导电结构具有竹结构，平均晶粒尺寸大于0.05微米。在一些实施例中，导电结构包括具有（111）晶体取向的导电晶粒。

2. 发明申请

WO2008092760A1 SYSTEMS AND METHODS FOR POLYMER CHARACTERIZATION 审中-公开
标题翻译：用于聚合物表征的系统和方法
公开(公告)号：WO2008092760A1
公开(公告)日：2008-08-07
申请号：PCT/EP2008/050562
申请日：2008-01-18
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM UNITED KINGDOM LIMITED , POLONSKY, Stanislav , ROSSNAGEL, Stephen , STOLOVITZKY, Gustavo, Alejandro
发明人： POLONSKY, Stanislav , ROSSNAGEL, Stephen , STOLOVITZKY, Gustavo, Alejandro
IPC分类号： C12Q1/68 , G01N15/12
CPC分类号： G01N33/48721 , B82Y15/00 , B82Y30/00 , C12Q1/6825 , C12Q1/6869 , G01N2015/0038 , Y10S977/924 , C12Q2565/631 , C12Q2565/607 , C12Q2563/155
摘要： Techniques for controlling the position of a charged polymer (112) inside a nanopore (105) are provided. For example, one technique includes using electrostatic control to position a linear charged polymer inside a nanopore, and creating an electrostatic potential well (114) inside the nanopore, whereby the electrostatic potential well controls the position of the linear charged polymer inside the nanopore. By sequentially locking each monomer unit in the potential well (114), nanopore sequencing of DNA with single base resolution can be achieved.
摘要翻译：提供了用于控制纳米孔（105）内的带电聚合物（112）的位置的技术。例如，一种技术包括使用静电控制将线性带电聚合物定位在纳米孔内，并在纳米孔内形成静电势阱（114），由此静电势阱控制纳米孔内线性带电聚合物的位置。通过顺序地将每个单体单元锁定在势阱（114）中，可以实现具有单碱基分辨率的DNA的纳米孔测序。

3. 发明申请

WO2011160989A1 NANO-FLUIDIC FIELD EFFECTIVE DEVICE TO CONTROL DNA TRANSPORT THROUGH A NANO CHANNEL COMPRISING A SET OF ELECTRODES 审中-公开
标题翻译：纳米流体场效应装置，通过包含一组电极的纳米通道来控制DNA的运输
公开(公告)号：WO2011160989A1
公开(公告)日：2011-12-29
申请号：PCT/EP2011/059937
申请日：2011-06-15
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , LUAN, Binquan , MARTYNA, Glenn, John , NEWNS, Dennis , POLONSKY, Stanislav , STOLOVITZKY, Gustavo, Alejandro , PENG, Hongbo , ROSSNAGEL, Stephen , HARRER, Stefan , AFZALI-ARDAKANI, Ali
发明人： LUAN, Binquan , MARTYNA, Glenn, John , NEWNS, Dennis , POLONSKY, Stanislav , STOLOVITZKY, Gustavo, Alejandro , PENG, Hongbo , ROSSNAGEL, Stephen , HARRER, Stefan , AFZALI-ARDAKANI, Ali
IPC分类号： B01L3/00 , B03C5/02 , C12Q1/68 , G01N33/487 , B82Y15/00 , B82Y30/00
CPC分类号： G01N27/44756 , B01L3/502761 , B01L2200/0663 , B01L2300/0645 , B01L2300/0816 , B01L2300/0896 , B01L2400/0421 , B01L2400/0424 , B82Y15/00 , G01N27/447 , G01N27/44791 , G01N33/48721
摘要： Nano-fluidic field effective device includes a channel having a first side and a second side, a first set of electrodes adjacent to the first side, a second set of electrodes adjacent to the second side, a control unit for applying electric potentials to the electrodes and a fluid within the channel containing a charge molecule. The first set of electrodes is disposed such that application of electric potentials produces a spatially varying electric field that confines a charged molecule within a predetermined area of said channel. The second set of electrodes is disposed such that application of electric potentials relative to the electric potentials applied to the first set of electrodes creates an electric field that confines the charged molecule to an area away from the second side of the channel.
摘要翻译：纳米流体场有效装置包括具有第一侧和第二侧的通道，与第一侧相邻的第一组电极，与第二侧相邻的第二组电极，用于将电位施加到电极的控制单元和在通道内的含有电荷分子的流体。第一组电极被布置成使得施加电势产生空间变化的电场，该电场将带电分子限制在所述通道的预定区域内。第二组电极被布置成使得施加相对于施加到第一组电极的电位的电位产生将电荷分子限制在远离通道的第二侧的区域的电场。

4. 发明申请

WO2007112361A2 STRUCTURE AND METHOD OF FORMING ELECTRODEPOSITED CONTACTS 审中-公开
标题翻译：形成电沉积联系的结构和方法
公开(公告)号：WO2007112361A2
公开(公告)日：2007-10-04
申请号：PCT/US2007/064946
申请日：2007-03-26
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , CABRAL, Cyril, Jr. , DELIGIANNI, Hariklia , KNARR, Randolph, F. , MALHOTRA, Sandra, G. , ROSSNAGEL, Stephen , SHAO, Xiaoyan , TOPOL, Anna , VEREECKEN, Philippe, M.
发明人： CABRAL, Cyril, Jr. , DELIGIANNI, Hariklia , KNARR, Randolph, F. , MALHOTRA, Sandra, G. , ROSSNAGEL, Stephen , SHAO, Xiaoyan , TOPOL, Anna , VEREECKEN, Philippe, M.
IPC分类号： H01L23/48
CPC分类号： H01L23/485 , H01L21/2885 , H01L21/76843 , H01L21/76846 , H01L21/76877 , H01L23/53252 , H01L2924/0002 , H01L2924/00
摘要： A contact metallurgy structure comprising a patterned dielectric layer having cavities on a substrate; a suicide or germanide layer such as of cobalt and/or nickel located at the bottom of cavities; a contact layer comprising Ti or Ti/TiN located on top of the dielectric layer and inside the cavities and making contact to the suicide or germanide layer on the bottom; a diffusion barrier layer located on top of the contact layer and inside the cavities; optionally a seed layer for plating located on top of the barrier layer; a metal fill layer in vias is provided along with a method of fabrication. The metal fill layer is electrodeposited with at least one member selected from the group consisting of copper, rhodium, ruthenium, iridium, molybdenum, gold, silver, nickel, cobalt, silver, gold, cadmium and zinc and alloys thereof. When the metal fill layer is rhodium, ruthenium, or iridium, an effective diffusion barrier layer is not required between the fill metal and the dielectric. When the barrier layer is platable, such as ruthenium, rhodium, platinum, or iridium, the seed layer is not required.
摘要翻译：一种接触式冶金结构，包括在基底上具有空腔的图案化电介质层; 位于空腔底部的自杀或锗化物层，例如钴和/或镍; 接触层包括位于介电层顶部并且在空腔内并且与底部上的硅化物或锗化物层接触的Ti或Ti / TiN; 位于所述接触层顶部和所述空腔内的扩散阻挡层; 可选地，位于阻挡层顶部的用于电镀的种子层; 提供通孔中的金属填充层以及制造方法。金属填充层用选自铜，铑，钌，铱，钼，金，银，镍，钴，银，金，镉和锌中的至少一种电池和其合金电沉积。当金属填充层是铑，钌或铱时，在填充金属和电介质之间不需要有效的扩散阻挡层。当阻挡层是可镀的，例如钌，铑，铂或铱时，不需要种子层。

5. 发明申请

WO2018002737A1 TECHNIQUES TO IMPROVE RELIABILITY IN CU INTERCONNECTS USING CU INTERMETALLICS 审中-公开
标题翻译：利用CU INTERMETALLICS提高CU互连可靠性的技术
公开(公告)号：WO2018002737A1
公开(公告)日：2018-01-04
申请号：PCT/IB2017/052728
申请日：2017-05-10
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM UNITED KINGDOM LIMITED , IBM (CHINA) INVESTMENT COMPANY LIMITED
发明人： HU, Chao-Kun , LAVOIE, Christian , ROSSNAGEL, Stephen , SHAW, Thomas, McCarroll
IPC分类号： H01L21/768 , H01L23/532
摘要： Techniques for improving reliability in Cu interconnects using Cu intermetallics are provided. In one aspect, a method of forming a Cu interconnect in a dielectric (114) over a Cu line (112) includes the steps of: forming at least one via (116) in the dielectric (114) over the Cu line (112); depositing a metal layer (118) onto the dielectric (114) and lining the via (116) such that the metal layer (118) is in contact with the Cu line (112) at the bottom of the via (116), wherein the metal layer (118) comprises at least one metal that can react with Cu to form a Cu intermetallic; annealing the metal layer (118) and the Cu line (112) under conditions sufficient to form a Cu intermetallic barrier (120) at the bottom of the via (116); and plating Cu (122) into the via (116) to form the Cu interconnect, wherein the Cu interconnect is separated from the Cu line (112) by the Cu intermetallic barrier (120). A device structure is also provided.
摘要翻译：提供了使用Cu金属间化合物提高Cu互连的可靠性的技术。在一个方面，一种在Cu线（112）上的电介质（114）中形成Cu互连的方法包括以下步骤：在Cu线（112）上的电介质（114）中形成至少一个通孔（116） ; 将金属层（118）沉积到电介质（114）上并对通孔（116）进行衬里，使得金属层（118）与通孔（116）的底部处的Cu线（112）接触，其中金属层（118）包含至少一种可与Cu反应以形成Cu金属间化合物的金属; 在足以在通孔（116）的底部形成Cu金属间势垒（120）的条件下退火金属层（118）和Cu线（112）; 以及将Cu（122）电镀到通孔（116）中以形成Cu互连，其中Cu互连通过Cu金属间阻挡层（120）与Cu线（112）分离。还提供设备结构。

6. 发明申请

WO2012059251A3 FEEDBACK CONTROL OF DIMENSIONS IN NANOPORE AND NANOFLUIDIC DEVICES 审中-公开
公开(公告)号：WO2012059251A3
公开(公告)日：2012-05-10
申请号：PCT/EP2011/064085
申请日：2011-08-16
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , WAGGONER, Philip, Sutton , HARRER, Stefan , ROSSNAGEL, Stephen
发明人： WAGGONER, Philip, Sutton , HARRER, Stefan , ROSSNAGEL, Stephen
IPC分类号： B81C1/00
摘要： Nanofluidic passages such as nanochannels and nanopores are closed or opened in a controlled manner through the use of a feedback system. An oxide layer is grown or removed within a passage in the presence of an electrolyte until the passage reaches selected dimensions or is closed. The change in dimensions of the nanofluidic passage is measured during fabrication. The ionic current level through the passage can be used to determine passage dimensions. Fluid flow through an array of fluidic elements can be controlled by selective oxidation of fluidic passages between elements.

7. 发明申请

WO2011064372A2 DOSIMETER POWERED BY PASSIVE RF ABSORPTION 审中-公开
标题翻译：通过无源射频吸收驱动的计量器
公开(公告)号：WO2011064372A2
公开(公告)日：2011-06-03
申请号：PCT/EP2010/068435
申请日：2010-11-29
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM UNITED KINGDOM LIMITED , ROSSNAGEL, Stephen , CABRAL JR, Cyril , MURRAY, Conal, Eugene , WISNIERFF, Robert, Luke , KOESTER, Steven, John , RODBELL, Kenneth, Parker , GORDON, Michael , YAU, Jeng-Bang
发明人： ROSSNAGEL, Stephen , CABRAL JR, Cyril , MURRAY, Conal, Eugene , WISNIERFF, Robert, Luke , KOESTER, Steven, John , RODBELL, Kenneth, Parker , GORDON, Michael , YAU, Jeng-Bang
IPC分类号： G01T1/02
CPC分类号： G01T1/026
摘要： A system for determining an amount of radiation includes a dosimeter configured to receive the amount of radiation, the dosimeter comprising a circuit having a resonant frequency, such that the resonant frequency of the circuit changes according to the amount of radiation received by the dosimeter, the dosimeter further configured to absorb RF energy at the resonant frequency of the circuit; a radio frequency (RF) transmitter configured to transmit the RF energy at the resonant frequency to the dosimeter; and a receiver configured to determine the resonant frequency of the dosimeter based on the absorbed RF energy, wherein the amount of radiation is determined based on the resonant frequency.
摘要翻译：用于确定辐射量的系统包括配置成接收辐射量的剂量计，该剂量计包括具有谐振频率的电路，使得电路的谐振频率根据剂量计接收的辐射量而改变，剂量计还被配置为吸收电路的谐振频率处的RF能量; 射频（RF）发射器，被配置为以共振频率将所述RF能量传输到所述剂量计; 以及接收器，被配置为基于所吸收的RF能量来确定所述剂量计的谐振频率，其中所述辐射量基于所述谐振频率来确定。

8. 发明公开

EP2109685A1 SYSTEMS AND METHODS FOR POLYMER CHARACTERIZATION 有权
标题翻译：系统和聚合物表征方法
公开(公告)号：EP2109685A1
公开(公告)日：2009-10-21
申请号：EP08701574.9
申请日：2008-01-18
申请人： International Business Machines Corporation
发明人： POLONSKY, Stanislav , ROSSNAGEL, Stephen , STOLOVITZKY, Gustavo, Alejandro
IPC分类号： C12Q1/68 , G01N15/12
CPC分类号： G01N33/48721 , B82Y15/00 , B82Y30/00 , C12Q1/6825 , C12Q1/6869 , G01N2015/0038 , Y10S977/924 , C12Q2565/631 , C12Q2565/607 , C12Q2563/155
摘要： Techniques for controlling the position of a charged polymer (112) inside a nanopore (105) are provided. For example, one technique includes using electrostatic control to position a linear charged polymer inside a nanopore, and creating an electrostatic potential well (114) inside the nanopore, whereby the electrostatic potential well controls the position of the linear charged polymer inside the nanopore. By sequentially locking each monomer unit in the potential well (114), nanopore sequencing of DNA with single base resolution can be achieved.

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