会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明申请
    • OPTIMIZED LASER PYROLYSIS REACTOR AND METHODS THEREFOR
    • 优化的激光热裂解反应器及其方法
    • WO2008118865A3
    • 2008-10-02
    • PCT/US2008/058036
    • 2008-03-24
    • INNOVALIGHT, INC.LI, XuegengJURBERGS, David
    • LI, XuegengJURBERGS, David
    • B01J19/12C01B33/027C09K11/59B82B1/00B82B3/00
    • An apparatus for making a set of Group IV nanoparticles is disclosed. The apparatus includes a top plate, the top plate further including an outlet port; a bottom plate; and a casing extending between the top plate and the bottom plate. The apparatus also includes a particle collector assembly configured to be in fluid communication with the outlet port; and a primary precursor tubing assembly passing through the bottom plate into the casing, the primary precursor tubing assembly including a primary precursor tubing assembly nozzle. The apparatus further includes a set of secondary precursor tubing assemblies passing through the bottom plate into the casing, wherein each secondary precursor tubing assembly of the set of secondary precursor tubing assemblies further includes a set of secondary precursor tubing assembly nozzles positioned orthogonally to the primary precursor tubing assembly nozzle, the set of secondary precursor tubing assembly nozzles further configured to be adjusted to a first height above primary precursor tubing assembly nozzle. The apparatus also includes a laser configured to generate a laser beam, the laser beam being substantially perpendicular to the primary precursor tubing assembly nozzle in the reaction zone, wherein the laser may be adjusted to a second height above primary precursor tubing assembly nozzle.
    • 公开了一种用于制造一组IV族纳米颗粒的装置。 该设备包括顶板,顶板还包括出口端口; 底板; 以及在顶板和底板之间延伸的壳体。 该设备还包括构造成与出口端口流体连通的颗粒收集器组件; 以及穿过所述底板进入所述壳体的主前驱物管道组件,所述主前驱物管道组件包括主前驱物管道组件喷嘴。 该设备还包括一组次级前驱物管道组件,该组次级前驱物管道组件穿过底板进入套管,其中该组次级前驱物管道组件中的每个次级前驱物管道组件还包括一组次级前驱物管道组件喷嘴,该一组次级前驱物管道组件喷嘴正交于主要前驱物 管组件喷嘴组,所述一组次级前驱物管组件喷嘴进一步构造成被调节到主要前驱物管组件喷嘴上方的第一高度。 该设备还包括配置成产生激光束的激光器,该激光束基本垂直于反应区中的主前驱体管组件喷嘴,其中激光器可被调节至主前驱体管组件喷嘴上方的第二高度。 p>