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1. 发明申请

US20090315223A1 TEMPLATE AND PATTERN FORMING METHOD 审中-公开
标题翻译：模式和图案形成方法
公开(公告)号：US20090315223A1
公开(公告)日：2009-12-24
申请号：US12483705
申请日：2009-06-12
申请人： Ikuo Yoneda , Shinji Mikami , Takumi Ota , Tetsuro Nakasugi
发明人： Ikuo Yoneda , Shinji Mikami , Takumi Ota , Tetsuro Nakasugi
IPC分类号： B29C35/08 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A template includes a substrate, an element pattern formed on a surface of the substrate, and a light absorbing portion formed on or inside the substrate.
摘要翻译：模板包括基板，形成在基板的表面上的元件图案，以及形成在基板上或内部的光吸收部。

2. 发明授权

US08202463B2 Imprint method 有权
标题翻译：印记法
公开(公告)号：US08202463B2
公开(公告)日：2012-06-19
申请号：US12426527
申请日：2009-04-20
申请人： Ikuo Yoneda , Tetsuro Nakasugi , Shinji Mikami
发明人： Ikuo Yoneda , Tetsuro Nakasugi , Shinji Mikami
IPC分类号： B29C59/00
CPC分类号： B29C37/006 , B29C35/0888 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint method includes contacting a template on a first substrate. The template includes a pattern to be transferred on the first substrate. The first substrate includes a first semiconductor substrate, and a first light curable resin coated on the first semiconductor substrate. The method further includes separating the template from the first substrate, and removing particles adhered on the template. The particle removal includes: pressing the template on an adhesive member which is distinct from the first substrate. The adhesive member includes a dummy substrate, a particle removing film formed on the dummy substrate and configured to remove the particles, and a second light curable resin coated on the particle removing film. The second light curable resin is thicker than the first light curable resin.
摘要翻译：压印方法包括在第一衬底上接触模板。模板包括要在第一基板上转印的图案。第一基板包括第一半导体基板和涂覆在第一半导体基板上的第一光固化树脂。该方法还包括从第一基底分离模板，以及除去附着在模板上的颗粒。颗粒去除包括：将模板压在与第一基板不同的粘合剂构件上。所述粘合部件包括虚拟基板，形成在所述虚设基板上并构成为除去所述粒子的除粒膜，以及涂覆在所述除粒膜上的第二光固化树脂。第二光固化树脂比第一光固化树脂厚。

3. 发明申请

US20090267267A1 IMPRINT METHOD 有权
标题翻译： IMPRINT方法
公开(公告)号：US20090267267A1
公开(公告)日：2009-10-29
申请号：US12426527
申请日：2009-04-20
申请人： Ikuo Yoneda , Tetsuro Nakasugi , Shinji Mikami
发明人： Ikuo Yoneda , Tetsuro Nakasugi , Shinji Mikami
IPC分类号： B29C59/00
CPC分类号： B29C37/006 , B29C35/0888 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint method includes contacting a template on a substrate, the template including a pattern to be transferred on the substrate, separating the template from the substrate, and removing particle adhered on the template before contacting the template on the substrate, the removing the particle including pressing the template on an adhesive member and separating the pressed template from the adhesive member, wherein adhesiveness of the adhesive member to the template is higher than adhesiveness of the adhesive member to the substrate.
摘要翻译：压印方法包括使基板上的模板接触，所述模板包括要在基板上转印的图案，将模板与基板分离，以及在与基板之间的模板接触之前除去附着在模板上的颗粒，除去包括将模板压在粘合剂构件上并将压制模板与粘合构件分离，其中粘合剂与模板的粘合性高于粘合剂与基材的粘合性。

4. 发明授权

US08221827B2 Patterning method 有权
标题翻译：图案化方法
公开(公告)号：US08221827B2
公开(公告)日：2012-07-17
申请号：US12549232
申请日：2009-08-27
申请人： Hiroshi Tokue , Ikuo Yoneda , Shinji Mikami , Takumi Ota
发明人： Hiroshi Tokue , Ikuo Yoneda , Shinji Mikami , Takumi Ota
IPC分类号： B05D5/00
CPC分类号： B29C33/424 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A patterning method according to an embodiment of the present invention comprises: acquiring information about a surface state of an underlying film formed on a substrate; determining, based on the surface state, whether irregularity/foreign matter is present in each shot region in which a pattern is to be formed; and solidifying a resist agent while a first template, when it is determined that no irregularity/foreign matter is present in the shot region, or a second template that is different from the first template, when it is determined that irregularity/foreign matter is present in the shot region, is brought close to the underlying film on the shot region at a certain distance with the resist agent therebetween.
摘要翻译：根据本发明的实施例的图案化方法包括：获取关于形成在基板上的底层膜的表面状态的信息; 基于表面状态确定在要形成图案的每个拍摄区域中是否存在不规则/异物; 并且当确定存在不规则/异物时，当确定在射击区域中不存在不规则/异物或与第一模板不同的第二模板时，第一模板固化抗蚀剂在射出区域中，与其间的抗蚀剂在一定距离处使其与射出区域上的底层膜接近。

5. 发明申请

US20110192300A1 IMPRINT METHOD AND IMPRINT APPARATUS 有权
标题翻译： IMPRINT方法和印刷装置
公开(公告)号：US20110192300A1
公开(公告)日：2011-08-11
申请号：US13023225
申请日：2011-02-08
申请人： Masayuki Hatano , Ikuo Yoneda , Tetsuro Nakasugi , Kenji Ooki
发明人： Masayuki Hatano , Ikuo Yoneda , Tetsuro Nakasugi , Kenji Ooki
IPC分类号： B41F1/40 , B41F9/01
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to one embodiment, an imprint method is disclosed. The method can include forming a liquid droplet of a transfer material with a volume greater than a predetermined reference volume by dropping the transfer material onto a major surface of a processing substrate. The method can include reducing the volume of the liquid droplet to be less than the reference volume by volatilizing the liquid droplet. In addition, the method can include filling the transfer material into a recess provided in a transfer surface of a template by bringing the liquid droplet having the volume reduced to be less than the reference volume into contact with the transfer surface of the template.
摘要翻译：根据一个实施例，公开了压印方法。该方法可以包括通过将转印材料落到处理衬底的主表面上来形成体积大于预定参考体积的转印材料的液滴。该方法可以包括通过挥发液滴来将液滴的体积减小到小于参考体积。此外，该方法可以包括通过使体积减小到小于参考体积的液滴与模板的转印表面接触来将转印材料填充到设置在模板的转印表面中的凹部中。

6. 发明申请

US20100078860A1 IMPRINT METHOD 有权
标题翻译： IMPRINT方法
公开(公告)号：US20100078860A1
公开(公告)日：2010-04-01
申请号：US12563461
申请日：2009-09-21
申请人： Ikuo Yoneda , Kentaro Matsunaga , Yukiko Kikuchi , Yoshihisa Kawamura , Eishi Shiobara , Shinichi Ito , Tetsuro Nakasugi , Hirokazu Kato
发明人： Ikuo Yoneda , Kentaro Matsunaga , Yukiko Kikuchi , Yoshihisa Kawamura , Eishi Shiobara , Shinichi Ito , Tetsuro Nakasugi , Hirokazu Kato
IPC分类号： B29C35/08
CPC分类号： B29C37/0003 , B29C35/0888 , B29C37/006 , B29C59/022 , B29C2035/0822 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint method includes applying a light curable resin on a substrate to be processed, the substrate including first and second regions on which the light curable resin is applied, contacting an imprint mold with the light curable resin, curing the light curable resin by irradiating the light curable resin with light passing through the imprint mold, generating gas by performing a predetermined process to the light curable resin applied on a region of the substrate, the region including at least the first region, wherein an amount of gas generated from the light curable resin applied on the first region is larger than an amount of gas generated from the light curable resin of the second region, and forming a pattern by separating the imprint mold from the light curable resin after the gas being generated.
摘要翻译：压印方法包括将光固化树脂施加在待加工的基板上，所述基板包括施加有光固化树脂的第一和第二区域，使印模与光固化树脂接触，通过照射光固化树脂来固化光固化树脂光固化树脂，其光通过压印模具，通过对施加在基板的区域上的光固化树脂进行预定处理产生气体，该区域至少包括第一区域，其中从光可固化施加在第一区域上的树脂大于由第二区域的光固化树脂产生的气体的量，并且在产生气体之后通过从光固化树脂分离压印模具来形成图案。

7. 发明授权

US08419995B2 Imprint method 有权
标题翻译：印记法
公开(公告)号：US08419995B2
公开(公告)日：2013-04-16
申请号：US12563461
申请日：2009-09-21
申请人： Ikuo Yoneda , Kentaro Matsunaga , Yukiko Kikuchi , Yoshihisa Kawamura , Eishi Shiobara , Shinichi Ito , Tetsuro Nakasugi , Hirokazu Kato
发明人： Ikuo Yoneda , Kentaro Matsunaga , Yukiko Kikuchi , Yoshihisa Kawamura , Eishi Shiobara , Shinichi Ito , Tetsuro Nakasugi , Hirokazu Kato
IPC分类号： B28B11/08 , B29C35/08
CPC分类号： B29C37/0003 , B29C35/0888 , B29C37/006 , B29C59/022 , B29C2035/0822 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint method includes applying a light curable resin on a substrate to be processed, the substrate including first and second regions on which the light curable resin is applied, contacting an imprint mold with the light curable resin, curing the light curable resin by irradiating the light curable resin with light passing through the imprint mold, generating gas by performing a predetermined process to the light curable resin applied on a region of the substrate, the region including at least the first region, wherein an amount of gas generated from the light curable resin applied on the first region is larger than an amount of gas generated from the light curable resin of the second region, and forming a pattern by separating the imprint mold from the light curable resin after the gas being generated.
摘要翻译：压印方法包括将光固化树脂施加在待加工的基板上，所述基板包括施加有光固化树脂的第一和第二区域，使印模与光固化树脂接触，通过照射光固化树脂来固化光固化树脂光固化树脂，其光通过压印模具，通过对施加在基板的区域上的光固化树脂进行预定处理产生气体，该区域至少包括第一区域，其中从光可固化施加在第一区域上的树脂大于由第二区域的光固化树脂产生的气体的量，并且在产生气体之后通过从光固化树脂分离压印模具来形成图案。

8. 发明申请

US20120164346A1 METHOD AND DEVICE FOR FORMING PATTERN 审中-公开
标题翻译：用于形成图案的方法和装置
公开(公告)号：US20120164346A1
公开(公告)日：2012-06-28
申请号：US13230591
申请日：2011-09-12
申请人： Ikuo Yoneda , Tetsuro Nakasugi
发明人： Ikuo Yoneda , Tetsuro Nakasugi
IPC分类号： B05D3/06 , B05B5/16
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0035 , G03F7/165
摘要： According to a method for forming a pattern in one embodiment, a first pattern is formed on a substrate, and an upper part of the first pattern is irradiated with ultraviolet rays, to enhance a liquid-repellent property to an inversion resin material. Furthermore, according to the method for forming the pattern, the inversion resin material is applied to the substrate after the irradiation of the ultraviolet rays, the first pattern is removed after the inversion resin material has been applied to form a second pattern containing the inversion resin material, and the substrate is processed using the second pattern as a mask.
摘要翻译：根据一个实施例中的图案形成方法，在基板上形成第一图案，并且用紫外线照射第一图案的上部，以提高反转树脂材料的拒水性。此外，根据形成图案的方法，在照射紫外线之后，将反转树脂材料施加到基板，在反转树脂材料被施加之后去除第一图案以形成包含反转树脂的第二图案材料，并且使用第二图案作为掩模来处理基板。

9. 发明授权

US09046763B2 Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：US09046763B2
公开(公告)日：2015-06-02
申请号：US12727025
申请日：2010-03-18
申请人： Takeshi Koshiba , Ikuo Yoneda , Tetsuro Nakasugi
发明人： Takeshi Koshiba , Ikuo Yoneda , Tetsuro Nakasugi
IPC分类号： B27N3/18 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： B05D1/322 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A pattern forming method includes determining an amount of curable resin to be formed on a substrate, the curable resin having volatility, the amount of the curable resin being determined by a calculation considering volatile loss of the curable resin, the calculation being performed for each of a plurality of regions of the substrate, forming the curable resin having the determined amount on the substrate, the forming the curable resin being performed for each of the plurality of regions of the substrate, contacting the curable resin formed on the substrate with a template, the template including a pattern to be filled with the curable resin by the contacting, and curing the curable resin under a condition where the curable resin is in contact with the template.
摘要翻译：图案形成方法包括确定在基材上形成的固化性树脂的量，所述固化性树脂具有挥发性，所述固化性树脂的量是通过考虑了固化性树脂的挥发性损失的计算而计算的，基板的多个区域，在基板上形成具有确定量的固化树脂，对基板的多个区域中的每一个进行固化树脂的形成，使形成在基板上的可固化树脂与模板接触，模板包括通过接触填充固化树脂的图案，并且在可固化树脂与模板接触的条件下固化可固化树脂。

10. 发明授权

US08227267B2 Template inspection method and manufacturing method for semiconductor device 有权
标题翻译：半导体器件的模板检查方法和制造方法
公开(公告)号：US08227267B2
公开(公告)日：2012-07-24
申请号：US12553906
申请日：2009-09-03
申请人： Ikuo Yoneda , Tetsuro Nakasugi , Masamitsu Itoh , Ryoichi Inanami
发明人： Ikuo Yoneda , Tetsuro Nakasugi , Masamitsu Itoh , Ryoichi Inanami
IPC分类号： H01L21/66
CPC分类号： G01N21/956 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A template inspection method for performing defect inspection of a template, by bringing a pattern formation surface of a template used to form a pattern close to a first fluid coated on a flat substrate, filling the first fluid into a pattern of the template, and by performing optical observation of the template in a state that the first fluid is sandwiched between the template and the substrate, wherein a difference between an optical constant of the first fluid and an optical constant of the template is larger than a difference between an optical constant of air and the optical constant of the template.
摘要翻译：一种用于对模板进行缺陷检查的模板检查方法，通过将用于形成图案的模板的图案形成表面靠近涂覆在平坦基板上的第一流体，将第一流体填充到模板的图案中，以及通过在第一流体夹在模板和基板之间的状态下进行模板的光学观察，其中第一流体的光学常数与模板的光学常数之间的差异大于模板的光学常数之间的差异空气和模板的光学常数。

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