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1. 发明申请

WO2011079006A1 LASER PATTERNING USING A STRUCTURED OPTICAL ELEMENT AND FOCUSED BEAM 审中-公开
标题翻译：使用结构化光学元件和聚焦光束的激光图案
公开(公告)号：WO2011079006A1
公开(公告)日：2011-06-30
申请号：PCT/US2010/060670
申请日：2010-12-16
申请人： IMRA AMERICA, INC. , ARAI, Alan Y. , YOSHINO, Fumiyo
发明人： ARAI, Alan Y. , YOSHINO, Fumiyo
IPC分类号： G01B11/00
CPC分类号： B23K26/066 , B23K26/082
摘要： Various embodiments provide for laser patterning using a structured optical element and a focused beam. In some embodiments a structured optical element may be integrally formed on a single substrate. In some embodiments, multiple optical components may be combined in an optical path to provide a desired pattern. In at least one embodiment, a projection mask is utilized to control exposure of an object to a laser output, in combination with the controlled motion of the projection mask, the controlled motion of the object and the controlled motion of the laser beam. In some embodiments, a projection mask is utilized to control exposure of an object, and the projection mask may absorb, scatter, reflect, or attenuate a laser output. In some embodiments, the projection mask may include optical elements that vary the optical power and polarization of the transmitted laser beam over regions of the projection mask.
摘要翻译：各种实施例提供使用结构化光学元件和聚焦光束的激光图案化。在一些实施例中，结构化光学元件可以一体地形成在单个基板上。在一些实施例中，多个光学部件可以组合在光路中以提供期望的图案。在至少一个实施例中，投影掩模用于控制物体对激光输出的曝光，结合投影掩模的受控运动，物体的受控运动和激光束的受控运动。在一些实施例中，使用投影掩模来控制物体的曝光，并且投影掩模可以吸收，散射，反射或衰减激光输出。在一些实施例中，投影掩模可以包括在投影掩模的区域上改变透射的激光束的光学功率和偏振的光学元件。

2. 发明申请

WO2013055741A1 APPARATUS FOR HIGH CONTRAST OPTICAL SIGNALING, AND EXEMPLARY APPLICATIONS 审中-公开
标题翻译：高对比度光信号的设备和示例应用
公开(公告)号：WO2013055741A1
公开(公告)日：2013-04-18
申请号：PCT/US2012/059466
申请日：2012-10-10
申请人： IMRA AMERICA, INC.
发明人： ARAI, Alan Y.
IPC分类号： G09G5/00
CPC分类号： B60R1/1207 , B60Q1/00 , B60R2001/1215 , G09G2380/06 , G09G2380/10
摘要： A display apparatus generates a high visibility optical signal, such as an ICON, the ICON comprising a symbol, shape, or other image like representation. The ICON becomes visible at an observation point during an illumination ON-state. The ICON may be formed as a portion of display medium, for example as a machined portion of a mirror capable of forming images of a scene by reflection in normal operation. The visibility of the ICON in the illumination OFF -state from an observation point is sufficiently low such that the normal operation of the display medium is maintained. Ultrashort laser processing or other methods for material modification may be utilized to form microscopic features which distribute incident light, increasing the visibility of the optical signal at an observation point in an ON-state, with very low visibility in the OFFstate and minimal effect on the image in the display medium in the OFF state.
摘要翻译：显示装置产生高可见度光信号，例如ICON，包括符号，形状或其他图像的表示的ICON。 ICON在照明ON状态的观察点变得可见。 ICON可以形成为显示介质的一部分，例如作为能够在正常操作中通过反射来形成场景的图像的镜子的加工部分。在观察点的照明OFF状态下的ICON的可视性足够低，使得保持显示介质的正常操作。可以使用超短激光加工或其他材料修饰方法来形成分布入射光的微观特征，在ON状态的观察点增加光信号的可视性，在OFF状态具有非常低的可视性，并且对显示介质中的图像处于OFF状态。

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