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    • 3. 发明申请
    • LASER PATTERNING USING A STRUCTURED OPTICAL ELEMENT AND FOCUSED BEAM
    • 使用结构化光学元件和聚焦光束的激光图案
    • WO2011079006A1
    • 2011-06-30
    • PCT/US2010/060670
    • 2010-12-16
    • IMRA AMERICA, INC.ARAI, Alan Y.YOSHINO, Fumiyo
    • ARAI, Alan Y.YOSHINO, Fumiyo
    • G01B11/00
    • B23K26/066B23K26/082
    • Various embodiments provide for laser patterning using a structured optical element and a focused beam. In some embodiments a structured optical element may be integrally formed on a single substrate. In some embodiments, multiple optical components may be combined in an optical path to provide a desired pattern. In at least one embodiment, a projection mask is utilized to control exposure of an object to a laser output, in combination with the controlled motion of the projection mask, the controlled motion of the object and the controlled motion of the laser beam. In some embodiments, a projection mask is utilized to control exposure of an object, and the projection mask may absorb, scatter, reflect, or attenuate a laser output. In some embodiments, the projection mask may include optical elements that vary the optical power and polarization of the transmitted laser beam over regions of the projection mask.
    • 各种实施例提供使用结构化光学元件和聚焦光束的激光图案化。 在一些实施例中,结构化光学元件可以一体地形成在单个基板上。 在一些实施例中,多个光学部件可以组合在光路中以提供期望的图案。 在至少一个实施例中,投影掩模用于控制物体对激光输出的曝光,结合投影掩模的受控运动,物体的受控运动和激光束的受控运动。 在一些实施例中,使用投影掩模来控制物体的曝光,并且投影掩模可以吸收,散射,反射或衰减激光输出。 在一些实施例中,投影掩模可以包括在投影掩模的区域上改变透射的激光束的光学功率和偏振的光学元件。