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1. 发明授权

US06835468B2 Fluorene based polymers and light emitting diodes fabricated with the same as light emitting material 失效
标题翻译：芴基聚合物和与发光材料相同制造的发光二极管
公开(公告)号：US06835468B2
公开(公告)日：2004-12-28
申请号：US09947208
申请日：2001-09-04
申请人： Hyun Nam Cho , Young Chul Kim , Jae-Min Hong , Jong-Bok Kim , Doo Kyung Moon , Young Sei Park , Ho Seong Nam
发明人： Hyun Nam Cho , Young Chul Kim , Jae-Min Hong , Jong-Bok Kim , Doo Kyung Moon , Young Sei Park , Ho Seong Nam
IPC分类号： H05B3314
CPC分类号： H01L51/0043 , C08G61/02 , C08L65/00 , C09K11/06 , H01L51/0035 , H01L51/0038 , H01L51/0039 , Y10S428/917
摘要： A fluorene-based polymer of the following Formula (I) and electroluminescent devices using the same. wherein, R1, R2, R3 and R4 are same or different and represent hydrogen, aliphatic or alicyclic alkyl or alkoxy groups containing 1 to 22 carbon atoms, aryl or aryloxy group containing 6 to 18 carbon atoms, cyano, cyanoethyl, or an alkyl or aryl derivative of silicon, tin or germanium; X represents diacetylene, diethynyl aryl, divinylaryl group or a single bond; and n is an integer equal to or greater than 1.
摘要翻译：下述式（I）的芴系聚合物和使用其的电致发光元件，其中R1，R2，R3和R4相同或不同，代表氢，含有1至22个碳原子的脂族或脂环族烷基或烷氧基，含有6〜18个碳原子的芳基或芳氧基，氰基，氰基乙基或硅，锡或锗的烷基或芳基衍生物; X表示乙炔基，二乙炔基芳基，二乙烯基芳基或单键; n为1以上的整数。

2. 发明申请

US20110217910A1 CHEMICAL MECHANICAL POLISHING APPARATUS 有权
标题翻译：化学机械抛光装置
公开(公告)号：US20110217910A1
公开(公告)日：2011-09-08
申请号：US13033876
申请日：2011-02-24
申请人： One-Moon CHANG , Jae-Phil Boo , Jong-Bok Kim , Soo-Young Tak , Jong-Sun Ahn , Shin Kim
发明人： One-Moon CHANG , Jae-Phil Boo , Jong-Bok Kim , Soo-Young Tak , Jong-Sun Ahn , Shin Kim
IPC分类号： B24B41/06
CPC分类号： B24B41/06
摘要： A chemical mechanical polishing apparatus includes a platen having a first region configured to support a wafer, and a second region disposed outside the first region. The chemical mechanical polishing apparatus further includes a polishing pad disposed on the platen, a pad head to which the polishing pad is attached, a slurry supply configured to supply a slurry onto the wafer, and an injection port disposing on the second region of the platen. The injection port is configured to inject a predetermined gas to an edge of a bottom surface of the wafer and toward the outside of the wafer.
摘要翻译：化学机械抛光装置包括具有构造成支撑晶片的第一区域的压板和设置在第一区域外的第二区域。化学机械抛光装置还包括设置在压板上的抛光垫，附接有抛光垫的焊盘头，配置成将浆料供应到晶片上的浆料供应源和设置在压板的第二区域上的注入口。注入口被配置为将预定气体注入到晶片的底表面的边缘并朝向晶片的外部。

3. 发明授权

US07755733B2 Method of forming vertical inorganic alignment layer and liquid crystal display apparatus having the same 有权
标题翻译：形成垂直无机取向层的方法和具有该方法的液晶显示装置
公开(公告)号：US07755733B2
公开(公告)日：2010-07-13
申请号：US11452826
申请日：2006-06-14
申请人： Soon-Joon Rho , Hong-Koo Baik , Kyung-Chan Kim , Jong-Bok Kim , Byoung-Har Hwang , Han-Jin Ahn
发明人： Soon-Joon Rho , Hong-Koo Baik , Kyung-Chan Kim , Jong-Bok Kim , Byoung-Har Hwang , Han-Jin Ahn
IPC分类号： G02F1/1337
CPC分类号： C23C16/325 , C23C14/0635 , C23C14/3457 , C23C14/3464 , C23C16/56 , G02F1/1337 , G02F2202/00 , H01J37/3429 , Y10T428/10
摘要： A liquid crystal display apparatus includes a first display substrate, a second display substrate and a liquid crystal layer disposed therebetween. The first and second display substrates include first and second vertical inorganic alignment layers, respectively, to vertically align liquid crystal molecules of the liquid crystal layer. The first and second vertical inorganic alignment layers each include a silicon carbide and are formed on the first and second display substrates, respectively, by a chemical vapor deposition method or a sputtering method. Thus, processes for the vertical inorganic alignment layer may be simplified, thereby improving manufacturing productivity of the liquid crystal display apparatus.
摘要翻译：液晶显示装置包括第一显示基板，第二显示基板和设置在其间的液晶层。第一和第二显示基板分别包括垂直取向液晶层的液晶分子的第一和第二垂直无机取向层。第一和第二垂直无机取向层各自包括碳化硅，并分别通过化学气相沉积法或溅射法形成在第一和第二显示器基板上。因此，可以简化用于垂直无机取向层的工艺，从而提高液晶显示装置的制造生产率。

4. 发明授权

US07052368B2 Polishing pad for chemical mechanical polishing apparatus 失效
标题翻译：化学机械抛光设备抛光垫
公开(公告)号：US07052368B2
公开(公告)日：2006-05-30
申请号：US10861254
申请日：2004-06-03
申请人： Jin-Kook Kim , Jae-Phil Boo , Sang-Seon Lee , Jong-Bok Kim
发明人： Jin-Kook Kim , Jae-Phil Boo , Sang-Seon Lee , Jong-Bok Kim
IPC分类号： B24B49/00
CPC分类号： B24B37/205
摘要： Provided is a polishing pad for a chemical mechanical polishing (CMP) apparatus, having a sealing barrier which prevents fluid leakage and moisture accumulation on a window. The polishing pad comprises an upper pad having polishing surface in contact with a wafer, a bottom pad an upper face of which is attached to a lower face of the upper pad and a lower face of which is attached to an upper face of a platen of the CMP apparatus, an aperture through the bottom pad and the upper pad, a transparent window fitted in the aperture in the upper pad, and a sealing barrier, placed between the aperture and an external face of the bottom pad in contact with a fluid, to prevent fluid leakage and accumulation of moisture derived from fluid fed on the polishing surface through the bottom pad.
摘要翻译：本发明提供一种用于化学机械抛光（CMP）装置的抛光垫，其具有防止液体泄漏和水分积聚在窗户上的密封屏障。抛光垫包括具有与晶片接触的抛光表面的上焊盘，底垫，其上表面附接到上焊盘的下表面，其下表面附接到压板的上表面 CMP装置，通过底垫和上垫的孔，安装在上垫中的孔中的透明窗和密封屏障，放置在孔与底部垫的与流体接触的外表面之间，以防止流体通过底部衬垫泄漏和积聚来自在抛光表面上供给的流体的水分。

5. 发明申请

US20100053513A1 Method of Manufacturing a Display Substrate, a Display Substrate Manufactured According to the Method, and a Method for Manufacturing a Display Device Having the Display Substrate 审中-公开
标题翻译：显示基板的制造方法，根据该方法制造的显示基板以及具有显示基板的显示装置的制造方法
公开(公告)号：US20100053513A1
公开(公告)日：2010-03-04
申请号：US12496409
申请日：2009-07-01
申请人： Soon-Joon Rho , Baek-Kyun Jeon , Hee-Keun Lee , Hong-Koo Baik , Youn-Sang Kim , Jong-Bok Kim , Byoung-Har Hwang , Chu-Ji Choi , Min-Jung Lee
发明人： Soon-Joon Rho , Baek-Kyun Jeon , Hee-Keun Lee , Hong-Koo Baik , Youn-Sang Kim , Jong-Bok Kim , Byoung-Har Hwang , Chu-Ji Choi , Min-Jung Lee
IPC分类号： G02F1/1335 , B05D5/12 , B05D3/06
CPC分类号： G02F1/133719 , G02F2001/136222
摘要： In a method of manufacturing a display substrate, a color filter is formed on a first substrate including a switching element. A pixel electrode is formed on the first substrate including the color filter. An inorganic alignment layer including an inorganic compound is formed on the first substrate including the pixel electrode. Thus, impurities generated from the color filter may be blocked from flowing into a liquid crystal layer, and liquid crystal molecules of the liquid crystal layer may be aligned by the inorganic layer.
摘要翻译：在制造显示基板的方法中，在包括开关元件的第一基板上形成滤色器。在包括滤色器的第一基板上形成像素电极。在包括像素电极的第一基板上形成包括无机化合物的无机取向层。因此，可以阻止从滤色器产生的杂质流入液晶层，液晶层的液晶分子可以通过无机层排列。

6. 发明申请

US20070110920A1 Method of forming vertical inorganic alignment layer and liquid crystal display apparatus having the same 有权
标题翻译：形成垂直无机取向层的方法和具有该方法的液晶显示装置
公开(公告)号：US20070110920A1
公开(公告)日：2007-05-17
申请号：US11452826
申请日：2006-06-14
申请人： Soon-Joon Rho , Hong-Koo Baik , Kyung-Chan Kim , Jong-Bok Kim , Byoung-Har Hwang , Han-Jin Ahn
发明人： Soon-Joon Rho , Hong-Koo Baik , Kyung-Chan Kim , Jong-Bok Kim , Byoung-Har Hwang , Han-Jin Ahn
IPC分类号： C09K19/00 , C23C16/00 , B05D3/00 , H05H1/24
CPC分类号： C23C16/325 , C23C14/0635 , C23C14/3457 , C23C14/3464 , C23C16/56 , G02F1/1337 , G02F2202/00 , H01J37/3429 , Y10T428/10
摘要： A liquid crystal display apparatus includes a first display substrate, a second display substrate and a liquid crystal layer disposed therebetween. The first and second display substrates include first and second vertical inorganic alignment layers, respectively, to vertically align liquid crystal molecules of the liquid crystal layer. The first and second vertical inorganic alignment layers each include a silicon carbide and are formed on the first and second display substrates, respectively, by a chemical vapor deposition method or a sputtering method. Thus, processes for the vertical inorganic alignment layer may be simplified, thereby improving manufacturing productivity of the liquid crystal display apparatus.
摘要翻译：液晶显示装置包括第一显示基板，第二显示基板和设置在其间的液晶层。第一和第二显示基板分别包括垂直取向液晶层的液晶分子的第一和第二垂直无机取向层。第一和第二垂直无机取向层各自包括碳化硅，并分别通过化学气相沉积法或溅射法形成在第一和第二显示器基板上。因此，可以简化用于垂直无机取向层的工艺，从而提高液晶显示装置的制造生产率。

7. 发明授权

US07044833B2 Apparatus for transporting and polishing wafers 有权
标题翻译：用于运输和抛光晶圆的设备
公开(公告)号：US07044833B2
公开(公告)日：2006-05-16
申请号：US11004612
申请日：2004-12-02
申请人： Hyun-Joo Yun , Sang-Seon Lee , Jong-Bok Kim , Kwang-Hee Lee , Min-Su Kim , Hyun-Sung Lee
发明人： Hyun-Joo Yun , Sang-Seon Lee , Jong-Bok Kim , Kwang-Hee Lee , Min-Su Kim , Hyun-Sung Lee
IPC分类号： B24B49/00
CPC分类号： B24B37/345 , B24B41/005 , B24B49/12
摘要： The present invention discloses an apparatus for transporting wafers. The apparatus includes a tray having a sloped portion on which a wafer having a sidewall can be mounted, a plurality of guides that disposed about the tray, and a plurality of sensors for detecting the position of the sidewall of the wafer with respect to the tray on which it is mounted by sensing the position of the sidewall. The present invention also discloses an apparatus for polishing wafers having the apparatus for transporting wafers comprising the circular tray and a plurality of guides and a plurality of sensors above-mentioned.
摘要翻译：本发明公开了一种输送晶片的装置。该装置包括具有倾斜部分的托盘，可以在其上安装具有侧壁的晶片，布置在托盘周围的多个引导件和用于检测晶片侧壁相对于托盘的位置的多个传感器通过感测侧壁的位置来安装它。本发明还公开了一种用于抛光晶片的装置，其具有用于输送包括圆形托盘的晶片的装置和多个导向器以及上述多个传感器。

8. 发明授权

US08790158B2 Chemical mechanical polishing apparatus 有权
标题翻译：化学机械抛光装置
公开(公告)号：US08790158B2
公开(公告)日：2014-07-29
申请号：US13033876
申请日：2011-02-24
申请人： One-Moon Chang , Jae-Phil Boo , Jong-Bok Kim , Soo-Young Tak , Jong-Sun Ahn , Shin Kim
发明人： One-Moon Chang , Jae-Phil Boo , Jong-Bok Kim , Soo-Young Tak , Jong-Sun Ahn , Shin Kim
IPC分类号： B24B49/03 , B24B49/12 , B24B37/04
CPC分类号： B24B41/06
摘要： A chemical mechanical polishing apparatus includes a platen having a first region configured to support a wafer, and a second region disposed outside the first region. The chemical mechanical polishing apparatus further includes a polishing pad disposed on the platen, a pad head to which the polishing pad is attached, a slurry supply configured to supply a slurry onto the wafer, and an injection port disposing on the second region of the platen. The injection port is configured to inject a predetermined gas to an edge of a bottom surface of the wafer and toward the outside of the wafer.
摘要翻译：化学机械抛光装置包括具有构造成支撑晶片的第一区域的压板和设置在第一区域外的第二区域。化学机械抛光装置还包括设置在压板上的抛光垫，附接有抛光垫的焊盘头，配置成将浆料供应到晶片上的浆料供应源和设置在压板的第二区域上的注入口。注入口被配置为将预定气体注入到晶片的底表面的边缘并朝向晶片的外部。

9. 发明授权

US07455575B2 Polishing pad cleaner and chemical mechanical polishing apparatus comprising the same 失效
标题翻译：抛光垫清洁剂和包括其的化学机械抛光装置
公开(公告)号：US07455575B2
公开(公告)日：2008-11-25
申请号：US11477525
申请日：2006-06-30
申请人： Jong-Bok Kim , Seung-Lyong Choi
发明人： Jong-Bok Kim , Seung-Lyong Choi
IPC分类号： B24B1/00
CPC分类号： B24B53/017
摘要： A polishing pad cleaner of a chemical mechanical polishing apparatus throughly and efficiently cleans the polishing pad of the apparatus. The head of the polishing pad cleaner includes a nozzle support plate, a plurality of nozzles mounted to the nozzle support plate, and extending from the bottom of the nozzle support plate, and partitions interposed between the nozzles. The head is placed over the polishing pad. Subsequently, the polishing pad is roated relative to the nozzles, and cleaning agent is ejected from the nozzles. The partitions help maintain the pressure of the cleaning agent as the agent flows from the nozzles to the polishing pad. Also, different types of cleaning agents can be simultaneously ejected from the nozzles, respectively, onto the polishing pad. Specifically, a high pressure gas and a cleaning solution can be directed onto the same region of the pad one after the other.
摘要翻译：化学机械抛光装置的抛光垫清洁器通过并有效地清洁装置的抛光垫。抛光垫清洁器的头部包括喷嘴支撑板，安装在喷嘴支撑板上并从喷嘴支撑板的底部延伸的多个喷嘴以及插入在喷嘴之间的分隔件。头部放置在抛光垫上。随后，抛光垫相对于喷嘴而旋转，清洗剂从喷嘴喷出。当试剂从喷嘴流到抛光垫时，隔板有助于保持清洁剂的压力。此外，可以将不同类型的清洁剂分别从喷嘴喷射到抛光垫上。具体地说，可以将高压气体和清洗液一个接一个地引导到垫的同一区域上。

10. 发明申请

US20070279562A1 Alignment layer for liquid crystal display 审中-公开
标题翻译：液晶显示器对准层
公开(公告)号：US20070279562A1
公开(公告)日：2007-12-06
申请号：US11786814
申请日：2007-04-12
申请人： Soon-Joon Rho , Baek-Kyun Jeon , Kyoong-Ok Park , Hee-Keun Lee , Hong-Koo Baik , Kyung-Chan Kim , Jong-Bok Kim , Byoung-Har Hwang , Dong-Choon Hyun , Han-Jin Ahn
发明人： Soon-Joon Rho , Baek-Kyun Jeon , Kyoong-Ok Park , Hee-Keun Lee , Hong-Koo Baik , Kyung-Chan Kim , Jong-Bok Kim , Byoung-Har Hwang , Dong-Choon Hyun , Han-Jin Ahn
IPC分类号： G02F1/1337 , H01L21/316
CPC分类号： G02F1/1337 , G02F2001/133738 , G02F2001/133742 , G02F2001/133765
摘要： An alignment layer for an LCD includes a thin layer of silicon oxide SiOx. The silicon oxide layer horizontally aligns liquid crystals thereon when the value of x is in the range from about 1.0 to about 1.5, but vertically aligns the liquid crystals when the value of x is in a range from about 1.5 to about 2.0. The alignment layer is readily formed on a large area of the substrate through chemical vapor deposition or evaporation deposition. Because the alignment layer is thermally and physically stable, the operational characteristics of the liquid crystal display employing this alignment layer are improved. In addition, the alignment layer has a thickness of about 500 to about 3000 angstroms thereby improving light transmittance of the LCD having the alignment layer.
摘要翻译：用于LCD的取向层包括氧化硅SiO x的薄层。当x的值在约1.0至约1.5的范围内时，氧化硅层水平对准其上的液晶，但是当x的值在约1.5至约2.0的范围内时，液晶垂直取向。通过化学气相沉积或蒸发沉积容易地在基板的大面积上形成取向层。由于取向层的热和物理稳定性，所以采用该取向层的液晶显示装置的操作特性得到改善。此外，取向层具有约500至约3000埃的厚度，从而提高具有取向层的LCD的透光率。

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