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1. 发明授权

US07455575B2 Polishing pad cleaner and chemical mechanical polishing apparatus comprising the same 失效
标题翻译：抛光垫清洁剂和包括其的化学机械抛光装置
公开(公告)号：US07455575B2
公开(公告)日：2008-11-25
申请号：US11477525
申请日：2006-06-30
申请人： Jong-Bok Kim , Seung-Lyong Choi
发明人： Jong-Bok Kim , Seung-Lyong Choi
IPC分类号： B24B1/00
CPC分类号： B24B53/017
摘要： A polishing pad cleaner of a chemical mechanical polishing apparatus throughly and efficiently cleans the polishing pad of the apparatus. The head of the polishing pad cleaner includes a nozzle support plate, a plurality of nozzles mounted to the nozzle support plate, and extending from the bottom of the nozzle support plate, and partitions interposed between the nozzles. The head is placed over the polishing pad. Subsequently, the polishing pad is roated relative to the nozzles, and cleaning agent is ejected from the nozzles. The partitions help maintain the pressure of the cleaning agent as the agent flows from the nozzles to the polishing pad. Also, different types of cleaning agents can be simultaneously ejected from the nozzles, respectively, onto the polishing pad. Specifically, a high pressure gas and a cleaning solution can be directed onto the same region of the pad one after the other.
摘要翻译：化学机械抛光装置的抛光垫清洁器通过并有效地清洁装置的抛光垫。抛光垫清洁器的头部包括喷嘴支撑板，安装在喷嘴支撑板上并从喷嘴支撑板的底部延伸的多个喷嘴以及插入在喷嘴之间的分隔件。头部放置在抛光垫上。随后，抛光垫相对于喷嘴而旋转，清洗剂从喷嘴喷出。当试剂从喷嘴流到抛光垫时，隔板有助于保持清洁剂的压力。此外，可以将不同类型的清洁剂分别从喷嘴喷射到抛光垫上。具体地说，可以将高压气体和清洗液一个接一个地引导到垫的同一区域上。

2. 发明申请

US20070042691A1 Polishing pad cleaner and chemical mechanical polishing apparatus comprising the same 失效
标题翻译：抛光垫清洁剂和包括其的化学机械抛光装置
公开(公告)号：US20070042691A1
公开(公告)日：2007-02-22
申请号：US11477525
申请日：2006-06-30
申请人： Jong-Bok Kim , Seung-Lyong Choi
发明人： Jong-Bok Kim , Seung-Lyong Choi
IPC分类号： B24B21/18
CPC分类号： B24B53/017
摘要： A polishing pad cleaner of a chemical mechanical polishing apparatus throughly and efficiently cleans the polishing pad of the apparatus. The head of the polishing pad cleaner includes a nozzle support plate, a plurality of nozzles mounted to the nozzle support plate, and extending from the bottom of the nozzle support plate, and partitions interposed between the nozzles. The head is placed over the polishing pad. Subsequently, the polishing pad is roated relative to the nozles, and cleaning agent is ejected from the nozzles. The partitions help maintain the pressure of the cleaning agent as the agent flows from the nozzles to the polishing pad. Also, different types of cleaning agents can be simultaneously ejected from the nozzles, respectively, onto the polishing pad. Specifically, a high pressure gas and a cleaning solution can be directed onto the same region fo the pad one after the other.
摘要翻译：化学机械抛光装置的抛光垫清洁器通过并有效地清洁装置的抛光垫。抛光垫清洁器的头部包括喷嘴支撑板，安装在喷嘴支撑板上并从喷嘴支撑板的底部延伸的多个喷嘴以及插入在喷嘴之间的分隔件。头部放置在抛光垫上。随后，抛光垫相对于透镜旋转，清洗剂从喷嘴喷出。当试剂从喷嘴流到抛光垫时，隔板有助于保持清洁剂的压力。此外，可以将不同类型的清洁剂分别从喷嘴喷射到抛光垫上。具体地说，高压气体和清洁溶液可以一个接一个地引导到垫的相同区域上。

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