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    • 10. 发明授权
    • Methods of forming a pattern using photoresist compositions
    • 使用光致抗蚀剂组合物形成图案的方法
    • US08247162B2
    • 2012-08-21
    • US12662455
    • 2010-04-19
    • Ji-Man ParkYoung-Ho KimHyo-Jin YunSun-Yul AhnSong-Se YiKyung-Woo Park
    • Ji-Man ParkYoung-Ho KimHyo-Jin YunSun-Yul AhnSong-Se YiKyung-Woo Park
    • G03F7/004G03F7/30
    • G03F7/0048G03F7/0046G03F7/0392
    • A method of forming a pattern and a photoresist composition, the method including forming a photoresist film on a substrate by coating a photoresist composition thereon, the photoresist composition including a polymerized photoresist additive, a polymer including an acid-labile protective group at a side chain, a photoacid generator, and a solvent; exposing the photoresist film; and forming a photoresist pattern by developing the photoresist film using an aqueous alkali developer, wherein the polymerized photoresist additive includes a hydrophilic repeating unit having an aliphatic hydrocarbon backbone and a side chain containing an oxygen heteroatom in a heterocyclic ring substituted with at least three hydroxyl groups, and a hydrophobic repeating unit having an aliphatic hydrocarbon backbone and a side chain containing a fluorinated aliphatic hydrocarbon group.
    • 一种形成图案和光致抗蚀剂组合物的方法,所述方法包括通过在其上涂覆光致抗蚀剂组合物在基底上形成光致抗蚀剂膜,光致抗蚀剂组合物包括聚合的光致抗蚀剂添加剂,在侧链上包含酸不稳定保护基的聚合物 ,光致酸发生剂和溶剂; 曝光光刻胶膜; 以及通过使用含水碱性显影剂显影所述光致抗蚀剂膜来形成光致抗蚀剂图案,其中所述聚合的光致抗蚀剂添加剂包括具有脂族烃骨架的亲水性重复单元和在至少三个羟基取代的杂环中含有氧杂原子的侧链 ,以及具有脂肪族烃主链和含有氟化脂肪族烃基的侧链的疏水性重复单元。