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1. 发明授权

US07927190B2 Retaining ring with shaped surface 有权
公开(公告)号：US07927190B2
公开(公告)日：2011-04-19
申请号：US12049650
申请日：2008-03-17
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B5/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.

2. 发明申请

US20080196833A1 RETAINING RING WITH SHAPED SURFACE 有权
标题翻译：具有形状表面的保持环
公开(公告)号：US20080196833A1
公开(公告)日：2008-08-21
申请号：US12049650
申请日：2008-03-17
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： H01L21/306 , B24B1/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨期间，可以允许环围绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

3. 发明授权

US08585468B2 Retaining ring with shaped surface 有权
公开(公告)号：US08585468B2
公开(公告)日：2013-11-19
申请号：US13305589
申请日：2011-11-28
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B5/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.

4. 发明申请

US20120071067A1 RETAINING RING WITH SHAPED SURFACE 有权
标题翻译：具有形状表面的保持环
公开(公告)号：US20120071067A1
公开(公告)日：2012-03-22
申请号：US13305589
申请日：2011-11-28
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B41/06
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨期间，可以允许环围绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

5. 发明申请

US20110195639A1 RETAINING RING WITH SHAPED SURFACE 有权
标题翻译：具有形状表面的保持环
公开(公告)号：US20110195639A1
公开(公告)日：2011-08-11
申请号：US13089174
申请日：2011-04-18
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B1/00 , B23P19/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨过程中，可以允许环绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

6. 发明授权

US08066551B2 Retaining ring with shaped surface 有权
标题翻译：带环形表面的保持环
公开(公告)号：US08066551B2
公开(公告)日：2011-11-29
申请号：US13089174
申请日：2011-04-18
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey P. Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey P. Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B1/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨期间，可以允许环围绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

7. 发明授权

US07815495B2 Pad conditioner 有权
标题翻译：垫调节剂
公开(公告)号：US07815495B2
公开(公告)日：2010-10-19
申请号：US11734063
申请日：2007-04-11
申请人： Kun Xu , Jimin Zhang , James C. Wang , Thomas H. Osterheld , Yutao Ma , Steven M. Zuniga , Jin Yi
发明人： Kun Xu , Jimin Zhang , James C. Wang , Thomas H. Osterheld , Yutao Ma , Steven M. Zuniga , Jin Yi
IPC分类号： B24B53/12
CPC分类号： B24B53/017 , B24B29/005 , B24B53/12
摘要： A pad conditioner is provided for conditioning a polishing pad in chemical mechanical planarization (CMP). The pad conditioner comprises a plastic abrasive portion having a first hardness and optionally a brush portion having a second hardness less than the first hardness. The plastic abrasive portion comprises a base plate and a plurality of plastic nodules formed on a surface of the base plate, each of the plastic nodules having a planar top surface, wherein the planar top surface is positioned to substantially contact a polishing pad. The brush portion may be positioned adjacent to the plastic abrasive portion, the brush portion having a plurality of brush elements positioned to substantially contact the pad.
摘要翻译：提供了用于在化学机械平面化（CMP）中调理抛光垫的衬垫调节器。衬垫调节剂包括具有第一硬度的塑料磨料部分和任选地具有小于第一硬度的第二硬度的刷部分。塑料研磨部分包括基板和形成在基板的表面上的多个塑料结节，每个塑料结节具有平坦的顶表面，其中平面顶表面被定位成基本接触抛光垫。刷部分可以定位成与塑料研磨部分相邻，刷部分具有多个刷子元件，其定位成基本上接触焊盘。

8. 发明申请

US20140030956A1 CONTROL OF POLISHING OF MULTIPLE SUBSTRATES ON THE SAME PLATEN IN CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：化学机械抛光中相同板上多个基板的抛光控制
公开(公告)号：US20140030956A1
公开(公告)日：2014-01-30
申请号：US13558140
申请日：2012-07-25
申请人： Jimin Zhang , Jose Salas-Vernis , Ingemar Carlsson , David H. Mai , Huyen Tran , Zhihong Wang , Wen-Chiang Tu , Stephen Jew , Boguslaw A. Swedek , Shih-Haur Shen , James C. Wang , Yen-Chu Yang
发明人： Jimin Zhang , Jose Salas-Vernis , Ingemar Carlsson , David H. Mai , Huyen Tran , Zhihong Wang , Wen-Chiang Tu , Stephen Jew , Boguslaw A. Swedek , Shih-Haur Shen , James C. Wang , Yen-Chu Yang
IPC分类号： B24B51/00
CPC分类号： B24B51/00 , B24B37/013
摘要： A polishing method includes positioning two substrates in contact with the same polishing pad. Prior to commencement of polishing and while the two substrates are in contact with the polishing pad, two starting values are generated from an in-situ monitoring system. Either a starting polishing time or a pressure applied to one of the substrates can be adjusted so that the two substrates have closer endpoint conditions. During polishing the two substrates are monitored with the in-situ monitoring system to generate a two sequences of values, and a polishing endpoint can be detected or an adjustment for a polishing parameter can be based on the two sequences of values.
摘要翻译：抛光方法包括将两个基板定位成与相同的抛光垫接触。在开始抛光之前，当两个基板与抛光垫接触时，从原位监测系统产生两个起始值。可以调整施加到一个基板的起始抛光时间或压力，使得两个基板具有更接近的端点条件。在抛光期间，用原位监测系统监测两个基底以产生两个值序列，并且可以检测抛光终点，或者可以基于两个值序列来调整抛光参数。

9. 发明授权

US5403280A Inflatable perfusion catheter 失效
标题翻译：充气灌注导管
公开(公告)号：US5403280A
公开(公告)日：1995-04-04
申请号：US191219
申请日：1994-02-02
申请人： James C. Wang
发明人： James C. Wang
IPC分类号： A61M25/00 , A61M25/10 , A61M29/02 , A61M29/00
CPC分类号： A61M25/104 , A61M25/1011 , A61M2025/1072 , A61M2025/1075 , A61M2025/1086
摘要： A perfusion catheter for insertion into a body conduit, especially an artery. The catheter comprises a shaft (5) having at least one lumen (7) for delivery of a fluid inflation media and an array (1) formed of a plurality of radially disposed inflatable balloons (3) disposed in a cylindrical array around the shaft (5), each of the balloons (3) sharing a common wall (3a) with adjacent balloons (3). The balloons (3) are inflated by an array of channels (11) and separated from each other by a web (19). There is at least one opening (17) between two adjacent channels (11) to allow the flow of fluids into the array (1).
摘要翻译：用于插入身体导管，特别是动脉的灌注导管。导管包括具有用于输送流体膨胀介质的至少一个腔（7）的轴（5）和由围绕轴的圆柱形阵列设置的多个径向设置的可充气气囊（3）形成的阵列（1） 5）中，每个气球（3）与相邻的气球（3）共享公共壁（3a）。气球（3）由通道阵列（11）充气，并通过腹板（19）彼此隔开。在两个相邻通道（11）之间有至少一个开口（17），以允许流体流入阵列（1）。

10. 发明授权

US5389314A Medication dispensing balloon catheter 失效
标题翻译：药物分配气囊导管
公开(公告)号：US5389314A
公开(公告)日：1995-02-14
申请号：US88327
申请日：1993-07-07
申请人： James C. Wang
发明人： James C. Wang
IPC分类号： A61M25/00 , A61F2/958 , A61M29/02 , A61M25/10
CPC分类号： A61M25/10 , A61M2025/105
摘要： An inflatable medical device for the delivery of medications to an organ in the body including a catheter having a plurality of lumens (13, 22, 28) disposed therein. The distal end of the catheter is adapted to be disposed within a bodily organ. A hollow, inflatable, medication-deliverable balloon (16) is disposed on the distal end of the catheter and the interior of the balloon (16) is in fluid flow relationship with one of the lumens (22) to enable the balloon (16) to be inflated. An array of conduits (40) is disposed within the walls of the balloon for the delivery of medications to predetermined locations within said bodily organ. Another lumen (28) in the catheter shaft (14) is provided to deliver medications to the conduits (40) in the wall of the balloon (16). An egress (17) for the medications is provided so that they may be dispensed at the site being treated.
摘要翻译：一种用于将药物递送到身体器官的可充气医疗装置，包括具有设置在其中的多个管腔（13,22,28）的导管。导管的远端适于设置在身体器官内。中空的，可充气的药物递送气囊（16）设置在导管的远端，并且球囊（16）的内部与腔（22）中的一个流体流动关系，以使球囊（16）被充气。一组导管（40）设置在气囊的壁内，用于将药物递送到所述身体器官内的预定位置。提供导管轴（14）中的另一个腔（28）以将药物递送到球囊（16）的壁中的导管（40）。提供用于药物的出口（17），使得它们可以在被治疗的部位分配。

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