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1. 发明申请

US20130324017A1 TWO-PART RETAINING RING WITH INTERLOCK FEATURES 有权
标题翻译：具有互锁功能的两部分保持环
公开(公告)号：US20130324017A1
公开(公告)日：2013-12-05
申请号：US13907658
申请日：2013-05-31
申请人： Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Ravi Aswathnarayanaiah , Abraham Palaty , Young J. Paik , Stacy Meyer , James Klingler , Ashish Bhatnagar
发明人： Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Ravi Aswathnarayanaiah , Abraham Palaty , Young J. Paik , Stacy Meyer , James Klingler , Ashish Bhatnagar
IPC分类号： B24B37/32
CPC分类号： B24B37/32
摘要： A retaining ring includes an annular lower portion and an annular upper portion. The annular lower portion has a main body with a bottom surface for contacting a polishing pad during polishing, an inner rim projecting upward from the main body, an outer rim projecting upward from the main body and separated from the inner rim by a gap, and a plurality of azimuthally separated interlock features positioned between the inner rim and the outer rim, each interlock feature projecting upwardly from the main body. The annular upper portion has a top surface and a bottom surface and a plurality of azimuthally separated recesses in the bottom surface, the recesses defining thin portions of the upper portion, the plurality of interlock features fitting into the plurality of recesses. The lower portion is a plastic and the upper portion is a material that is more rigid than the plastic.
摘要翻译：保持环包括环形下部和环形上部。环形下部具有主体，其具有用于在抛光期间接触抛光垫的底面，从主体向上突出的内边缘，从主体向上突出并与内边缘分开的外缘间隙，位于内边缘和外边缘之间的多个方位分离的互锁特征，每个互锁特征从主体向上突出。环形上部具有顶表面和底表面以及在底表面中的多个方位分离的凹槽，所述凹部限定上部的薄部分，多个互锁特征装配到多个凹部中。下部是塑料，上部是比塑料更硬的材料。

2. 发明申请

US20130035022A1 Two-Part Plastic Retaining Ring 审中-公开
标题翻译：两部分塑料保持环
公开(公告)号：US20130035022A1
公开(公告)日：2013-02-07
申请号：US13560606
申请日：2012-07-27
申请人： Young J. Paik , James Klingler , Stacy Meyer , Christopher R. Mahon , Laxman Murugesh , Ashish Bhatnagar , Padma Gopalakrishnan
发明人： Young J. Paik , James Klingler , Stacy Meyer , Christopher R. Mahon , Laxman Murugesh , Ashish Bhatnagar , Padma Gopalakrishnan
IPC分类号： B24B37/32
CPC分类号： B24B37/32
摘要： A retaining ring includes a generally annular lower portion and a generally annular upper portion. The lower portion has a bottom surface for contacting a polishing pad during polishing and a top surface. The upper portion has a bottom surface secured to the top surface of the lower portion and a top surface configured to be mechanically affixed to and abut a rigid base of a carrier head. The lower portion is a first plastic, and the upper portion is a different second plastic that is about the same or more rigid than the first plastic.
摘要翻译：保持环包括大致环形的下部和大致环形的上部。下部具有用于在抛光期间接触抛光垫的底表面和顶表面。上部具有固定到下部的顶表面的底表面和被配置为机械地固定到承载头的刚性基座并邻接其的刚性基座的顶表面。下部是第一塑料，上部是与第一塑料大致相同或更刚性的不同的第二塑料。

3. 发明申请

US20100327900A1 POLISHING HEAD TESTING WITH MOVABLE PEDESTAL 有权
标题翻译：抛光头测试与可移动的PEDESTAL
公开(公告)号：US20100327900A1
公开(公告)日：2010-12-30
申请号：US12829971
申请日：2010-07-02
申请人： Jeffrey P. Schmidt , Jay Rohde , Stacy Meyer
发明人： Jeffrey P. Schmidt , Jay Rohde , Stacy Meyer
IPC分类号： G01R31/26
CPC分类号： B24B37/34 , B24B37/0053
摘要： A polishing head is tested in a test station having a pedestal for supporting a test wafer and a controllable pedestal actuator to move a pedestal central wafer support surface and a test wafer toward the polishing head. In another aspect of the present description, the test wafer may be positioned using a positioner having a first plurality of test wafer engagement members positioned around the pedestal central wafer support surface. In another aspect, the wafer position may have a second plurality of test wafer engagement members positioned around an outer wafer support surface disposed around the pedestal central wafer support surface and adapted to support a test wafer. The second plurality of test wafer engagement members may be distributed about a second circumference of the ring member, the second circumference having a wider diameter than the first circumference. Additional embodiments and aspects are described and claimed.
摘要翻译：在具有用于支撑测试晶片的基座和可控基座致动器的测试台中测试抛光头，以将基座中心晶片支撑表面和测试晶片移向抛光头。在本说明书的另一方面，测试晶片可以使用具有定位在基座中心晶片支撑表面周围的第一多个测试晶片接合构件的定位器定位。在另一方面，晶片位置可以具有第二多个测试晶片接合构件，其位于围绕基座中心晶片支撑表面设置并适于支撑测试晶片的外部晶片支撑表面周围。第二多个测试晶片接合构件可以围绕环构件的第二圆周分布，第二圆周具有比第一圆周更宽的直径。描述和要求保护附加的实施例和方面。

4. 发明申请

US20070143980A1 Attaching components of a carrier head 失效
标题翻译：安装承载头的部件
公开(公告)号：US20070143980A1
公开(公告)日：2007-06-28
申请号：US11233154
申请日：2005-09-21
申请人： Trung Doan , Jeffrey Schmidt , Douglas McAllister , Stacy Meyer
发明人： Trung Doan , Jeffrey Schmidt , Douglas McAllister , Stacy Meyer
IPC分类号： B23Q17/00 , B23P19/00
CPC分类号： B24B37/32 , Y10T29/49764 , Y10T29/49766 , Y10T29/49769 , Y10T29/49771 , Y10T29/49778 , Y10T29/4978 , Y10T29/49947 , Y10T29/53039 , Y10T29/5343
摘要： Techniques for attaching a retaining ring to a carrier head so that the bottom surface of the retaining ring is orthogonal to a central rotational axis of the carrier head are described.
摘要翻译：描述了用于将保持环附接到承载头使得保持环的底表面与载体头的中心旋转轴线正交的技术。

5. 发明申请

US20140287662A1 RETAINING RING WITH ATTACHABLE SEGMENTS 有权
标题翻译：带连接部分的保持环
公开(公告)号：US20140287662A1
公开(公告)日：2014-09-25
申请号：US14219913
申请日：2014-03-19
申请人： Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Abraham Palaty , Aswathnarayanaiah Ravi , Ashish Bhatnagar , Young J. Paik , Stacy Meyer , Daniel Martin
发明人： Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Abraham Palaty , Aswathnarayanaiah Ravi , Ashish Bhatnagar , Young J. Paik , Stacy Meyer , Daniel Martin
IPC分类号： B24B37/32
CPC分类号： B24B37/32
摘要： A retaining ring includes a generally annular upper portion having a top surface configured to be connected to a base of a carrier head and a lower surface, and a plurality of substantially identical arcuate segments detachably secured to the upper portion to form an annular lower portion. Each of the arcuate segments has an upper surface that abuts the lower surface of the upper portion and a bottom surface for contacting a polishing pad during polishing.
摘要翻译：保持环包括大致环形的上部，其具有构造成连接到承载头和下表面的基部的顶表面，以及可拆卸地固定到上部以形成环形下部的多个基本相同的弧形段。每个弧形段具有邻接上部下表面的上表面和用于在抛光过程中接触抛光垫的底表面。

6. 发明授权

US08585468B2 Retaining ring with shaped surface 有权
公开(公告)号：US08585468B2
公开(公告)日：2013-11-19
申请号：US13305589
申请日：2011-11-28
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B5/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.

7. 发明申请

US20120071067A1 RETAINING RING WITH SHAPED SURFACE 有权
标题翻译：具有形状表面的保持环
公开(公告)号：US20120071067A1
公开(公告)日：2012-03-22
申请号：US13305589
申请日：2011-11-28
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B41/06
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨期间，可以允许环围绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

8. 发明授权

US08066551B2 Retaining ring with shaped surface 有权
标题翻译：带环形表面的保持环
公开(公告)号：US08066551B2
公开(公告)日：2011-11-29
申请号：US13089174
申请日：2011-04-18
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey P. Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey P. Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B1/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨期间，可以允许环围绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

9. 发明申请

US20110195639A1 RETAINING RING WITH SHAPED SURFACE 有权
标题翻译：具有形状表面的保持环
公开(公告)号：US20110195639A1
公开(公告)日：2011-08-11
申请号：US13089174
申请日：2011-04-18
申请人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
发明人： Hung Chih Chen , Steven M. Zuniga , Charles C. Garretson , Douglas R. McAllister , Jian Lin , Stacy Meyer , Sidney P. Huey , Jeonghoon Oh , Trung T. Doan , Jeffrey Schmidt , Martin S. Wohlert , Kerry F. Hughes , James C. Wang , Danny Cam Toan Lu , Romain Beau De Lamenie , Venkata R. Balagani , Aden Martin Allen , Michael Jon Fong
IPC分类号： B24B1/00 , B23P19/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨过程中，可以允许环绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

10. 发明申请

US20050191947A1 Retaining ring with shaped surface 有权
标题翻译：带环形表面的保持环
公开(公告)号：US20050191947A1
公开(公告)日：2005-09-01
申请号：US10988211
申请日：2004-11-12
申请人： Hung Chen , Steven Zuniga , Charles Garretson , Douglas McAllister , Jian Lin , Stacy Meyer , Sidney Huey , Jeonghoon Oh , Trung Doan , Jeffrey Schmidt , Martin Wohlert , Kerry Hughes , James Wang , Danny Cam Lu , Romain Beau De Lamenie , Venkata Balagani , Aden Allen , Michael Fong
发明人： Hung Chen , Steven Zuniga , Charles Garretson , Douglas McAllister , Jian Lin , Stacy Meyer , Sidney Huey , Jeonghoon Oh , Trung Doan , Jeffrey Schmidt , Martin Wohlert , Kerry Hughes , James Wang , Danny Cam Lu , Romain Beau De Lamenie , Venkata Balagani , Aden Allen , Michael Fong
IPC分类号： B24B37/32 , B24B1/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨期间，可以允许环围绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

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