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1. 发明申请

US20120216156A1 Method of Pattern Selection for Source and Mask Optimization 有权
标题翻译：源和掩码优化的模式选择方法
公开(公告)号：US20120216156A1
公开(公告)日：2012-08-23
申请号：US13505286
申请日：2010-10-26
申请人： Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li , Jun Ye , Min-Chun Tsai , Youping Zhang , Yen-Wen Lu , Jiangwei Li
发明人： Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li , Jun Ye , Min-Chun Tsai , Youping Zhang , Yen-Wen Lu , Jiangwei Li
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F7/70125 , G03F7/70425 , G03F7/70441 , G03F7/705 , G03F7/70666 , G06F17/50 , G06F17/5009
摘要： The present invention relates to a method of selecting a subset of patterns from a design, to a method of performing source and mask optimization, and to a computer program product for performing the method of selecting a subset of patterns from a design. According to certain aspects, the present invention enables coverage of the full design while lowering the computation cost by intelligently selecting a subset of patterns from a design in which the design or a modification of the design is configured to be imaged onto a substrate via a lithographic process. The method of selecting the subset of patterns from a design includes identifying a set of patterns from the design related to the predefined representation of the design. By selecting the subset of patterns according to the method, the selected subset of patterns constitutes a similar predefined representation of the design as the set of patterns.
摘要翻译：本发明涉及从设计中选择模式子集的方法，以及执行源和掩码优化的方法以及用于执行从设计中选择模式子集的方法的计算机程序产品。根据某些方面，本发明能够覆盖整个设计，同时降低计算成本，通过智能地从设计中选择图案子集，其中设计的设计或修改被配置为经由光刻成像到衬底上处理。从设计中选择图案子集的方法包括从与设计的预定义表示相关的设计中识别一组图案。通过根据该方法选择模式子集，所选择的模式子集构成与模式集合相似的设计表示。

2. 发明授权

US08739082B2 Method of pattern selection for source and mask optimization 有权
标题翻译：源和掩码优化的图案选择方法
公开(公告)号：US08739082B2
公开(公告)日：2014-05-27
申请号：US13505286
申请日：2010-10-26
申请人： Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li , Jun Ye , Min-Chun Tsai , Youping Zhang , Yen-Wen Lu , Jiangwei Li
发明人： Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li , Jun Ye , Min-Chun Tsai , Youping Zhang , Yen-Wen Lu , Jiangwei Li
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F7/70125 , G03F7/70425 , G03F7/70441 , G03F7/705 , G03F7/70666 , G06F17/50 , G06F17/5009
摘要： The present invention relates to a method of selecting a subset of patterns from a design, to a method of performing source and mask optimization, and to a computer program product for performing the method of selecting a subset of patterns from a design. According to certain aspects, the present invention enables coverage of the full design while lowering the computation cost by intelligently selecting a subset of patterns from a design in which the design or a modification of the design is configured to be imaged onto a substrate via a lithographic process. The method of selecting the subset of patterns from a design includes identifying a set of patterns from the design related to the predefined representation of the design. By selecting the subset of patterns according to the method, the selected subset of patterns constitutes a similar predefined representation of the design as the set of patterns.
摘要翻译：本发明涉及从设计中选择模式子集的方法，以及执行源和掩码优化的方法以及用于执行从设计中选择模式子集的方法的计算机程序产品。根据某些方面，本发明能够覆盖整个设计，同时降低计算成本，通过智能地从设计中选择图案子集，其中设计的设计或修改被配置为经由光刻成像到衬底上处理。从设计中选择图案子集的方法包括从与设计的预定义表示相关的设计中识别一组图案。通过根据该方法选择模式子集，所选择的模式子集构成与模式集合相似的设计表示。

3. 发明授权

US08543947B2 Selection of optimum patterns in a design layout based on diffraction signature analysis 有权
$Selection of optimum patterns in a design layout based on diffraction signature analysis$
标题翻译：基于衍射特征分析在设计布局中选择最佳图案
公开(公告)号：US08543947B2
公开(公告)日：2013-09-24
申请号：US12914954
申请日：2010-10-28
申请人： Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li
发明人： Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F7/70125 , G03F7/70425 , G03F7/70441 , G03F7/705 , G03F7/70666 , G06F17/50 , G06F17/5009
摘要： The present invention relates generally to selecting optimum patterns based on diffraction signature analysis, and more particularly to, using the optimum patterns for mask-optimization for lithographic imaging. A respective diffraction map is generated for each of a plurality of target patterns from an initial larger set of target patterns from the design layout. Diffraction signatures are identified from the various diffraction maps. The plurality of target patterns is grouped into various diffraction-signature groups, the target patterns in a specific diffraction-signature group having similar diffraction signature. A subset of target patterns is selected to cover all possible diffraction-signature groups, such that the subset of target patterns represents at least a part of the design layout for the lithographic process. The grouping of the plurality of target patterns may be governed by predefined rules based on similarity of diffraction signature. The predefined rules comprise coverage relationships existing between the various diffraction-signature groups.
摘要翻译：本发明一般涉及基于衍射特征分析来选择最佳图案，并且更具体地涉及使用用于光刻成像的掩模优化的最佳图案。从来自设计布局的初始较大的目标图案集合中的多个目标图案中的每一个生成相应的衍射图。从各种衍射图识别衍射特征。多个目标图案被分组成各种衍射签名组，具有相似衍射特征的特定衍射签名组中的目标图案。选择目标图案的子集以覆盖所有可能的衍射签名组，使得目标图案的子集代表光刻工艺的设计布局的至少一部分。多个目标图案的分组可以通过基于衍射签名的相似性的预定规则来管理。预定义的规则包括存在于各种衍射签名组之间的覆盖关系。

4. 发明申请

US20110107280A1 Selection of Optimum Patterns in a Design Layout Based on Diffraction Signature Analysis 有权
$Selection of Optimum Patterns in a Design Layout Based on Diffraction Signature Analysis$
标题翻译：基于衍射签名分析的设计布局中最优模式的选择
公开(公告)号：US20110107280A1
公开(公告)日：2011-05-05
申请号：US12914954
申请日：2010-10-28
申请人： Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li
发明人： Hua-Yu Liu , Luoqi Chen , Hong Chen , Zhi-Pan Li
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F7/70125 , G03F7/70425 , G03F7/70441 , G03F7/705 , G03F7/70666 , G06F17/50 , G06F17/5009
摘要： The present invention relates generally to selecting optimum patterns based on diffraction signature analysis, and more particularly to, using the optimum patterns for mask-optimization for lithographic imaging. A respective diffraction map is generated for each of a plurality of target patterns from an initial larger set of target patterns from the design layout. Diffraction signatures are identified from the various diffraction maps. The plurality of target patterns is grouped into various diffraction-signature groups, the target patterns in a specific diffraction-signature group having similar diffraction signature. A subset of target patterns is selected to cover all possible diffraction-signature groups, such that the subset of target patterns represents at least a part of the design layout for the lithographic process. The grouping of the plurality of target patterns may be governed by predefined rules based on similarity of diffraction signature. The predefined rules comprise coverage relationships existing between the various diffraction-signature groups.
摘要翻译：本发明一般涉及基于衍射特征分析来选择最佳图案，更具体地说，涉及使用用于光刻成像的掩模优化的最佳图案。从来自设计布局的初始较大的目标图案集合中的多个目标图案中的每一个生成相应的衍射图。从各种衍射图识别衍射特征。多个目标图案被分组成各种衍射签名组，具有相似衍射特征的特定衍射签名组中的目标图案。选择目标图案的子集以覆盖所有可能的衍射签名组，使得目标图案的子集代表光刻工艺的设计布局的至少一部分。多个目标图案的分组可以通过基于衍射签名的相似性的预定规则来管理。预定义的规则包括存在于各种衍射签名组之间的覆盖关系。

5. 发明申请

US20120254813A1 Integration of Lithography Apparatus and Mask Optimization Process with Multiple Patterning Process 有权
标题翻译：光刻设备与掩模优化过程的多重图案化处理
公开(公告)号：US20120254813A1
公开(公告)日：2012-10-04
申请号：US13439692
申请日：2012-04-04
申请人： Luoqi Chen , Jun Ye , Hong Chen
发明人： Luoqi Chen , Jun Ye , Hong Chen
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/70 , G03F7/70433 , G03F7/70466 , G03F7/705 , G03F7/70508 , G03F7/707
摘要： The present invention relates to lithographic apparatuses and processes, and more particularly to multiple patterning lithography for printing target patterns beyond the limits of resolution of the lithographic apparatus. A method of splitting a pattern to be imaged onto a substrate via a lithographic process into a plurality of sub-patterns is disclosed, wherein the method comprises a splitting step being configured to be aware of requirements of a co-optimization between at least one of the sub-patterns and an optical setting of the lithography apparatus used for the lithographic process. Device characteristic optimization techniques, including intelligent pattern selection based on diffraction signature analysis, may be integrated into the multiple patterning process flow.
摘要翻译：本发明涉及光刻设备和工艺，更具体地涉及用于将目标图案打印超出光刻设备的分辨率限制的多重图形化光刻技术。公开了一种通过光刻处理将待成像的图案图案分割成多个子图案的方法，其中该方法包括分割步骤，其被配置为意识到在以下过程中的至少一个之间的共优化的要求：用于光刻工艺的光刻设备的子图案和光学设置。包括基于衍射特征分析的智能图案选择的设备特征优化技术可以被集成到多个图案化工艺流程中。

6. 发明申请

US20140012672A1 CONTENT-BASED BIDDING IN ONLINE ADVERTISING 审中-公开
标题翻译：基于内容的在线广告投标
公开(公告)号：US20140012672A1
公开(公告)日：2014-01-09
申请号：US13543708
申请日：2012-07-06
申请人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
发明人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
IPC分类号： G06Q30/02
CPC分类号： G06Q30/0241
摘要： A method of providing targeted online advertisement includes receiving a request for an ad impression. The request includes a first content and a second content. The method also includes determining information related to (i) a context of the first content, (ii) a context of the second content, and (iii) a correlation between the context of the first content and the context of the second content, and providing the determined information to a bidding service, thereby enabling one or more advertisers to place one or more bids on the ad impression based on the provided information. Each of the one or more bids includes a bid price. The method further includes receiving the one or more bids for the ad impression, selecting one of the one or more received bids based at least in part on the bid prices, and providing an ad impression associated with the selected bid.
摘要翻译：提供有针对性的在线广告的方法包括接收对广告印象的请求。该请求包括第一内容和第二内容。该方法还包括确定与（i）第一内容的上下文相关的信息，（ii）第二内容的上下文，以及（iii）第一内容的上下文与第二内容的上下文之间的相关性，以及将确定的信息提供给投标服务，从而使得一个或多个广告商能够基于所提供的信息对广告印象进行一个或多个出价。每个一个或多个出价都包含一个出价。所述方法还包括接收针对所述广告展示的所述一个或多个出价，至少部分地基于所述出价来选择所述一个或多个所接收的出价中的一个，以及提供与所选择的出价相关联的广告展示。

7. 发明申请

US20140012671A1 CONTENT-BASED TARGETED ONLINE ADVERTISEMENT 审中-公开
标题翻译：基于内容的目标在线广告
公开(公告)号：US20140012671A1
公开(公告)日：2014-01-09
申请号：US13543705
申请日：2012-07-06
申请人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
发明人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
IPC分类号： G06Q30/02
CPC分类号： G06Q30/0251
摘要： A method of providing targeted online advertisement includes receiving a request for an ad impression to be provided to a user in a network environment. The request includes a first content and a second content. The method also includes, using a processor, determining a context of the first content and a context of the second content, determining a correlation between the context of the first content and the context of the second content, and identifying a plurality of ads as candidates for consideration. The method further includes, using the processor, ranking the plurality of identified ads, selecting an ad among the plurality of identified ads based at least in part on a result of the ranking, and providing the selected ad as the ad impression to be displayed to the user in response to receiving the request.
摘要翻译：提供目标在线广告的方法包括在网络环境中接收要向用户提供的广告印象的请求。该请求包括第一内容和第二内容。该方法还包括使用处理器确定第一内容的上下文和第二内容的上下文，确定第一内容的上下文与第二内容的上下文之间的相关性，以及将多个广告标识为候选审议。所述方法还包括：使用所述处理器对所述多个识别的广告进行排名，至少部分地基于所述排名的结果来选择所述多个识别的广告中的广告，并且将所选择的广告提供为要显示的广告展示用户响应于接收到请求。

8. 发明授权

US08819601B2 Integration of lithography apparatus and mask optimization process with multiple patterning process 有权
标题翻译：光刻设备和掩模优化工艺与多个图案化工艺的集成
公开(公告)号：US08819601B2
公开(公告)日：2014-08-26
申请号：US13439692
申请日：2012-04-04
申请人： Luoqi Chen , Jun Ye , Hong Chen
发明人： Luoqi Chen , Jun Ye , Hong Chen
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/70 , G03F7/70433 , G03F7/70466 , G03F7/705 , G03F7/70508 , G03F7/707
摘要： The present invention relates to lithographic apparatuses and processes, and more particularly to multiple patterning lithography for printing target patterns beyond the limits of resolution of the lithographic apparatus. A method of splitting a pattern to be imaged onto a substrate via a lithographic process into a plurality of sub-patterns is disclosed, wherein the method comprises a splitting step being configured to be aware of requirements of a co-optimization between at least one of the sub-patterns and an optical setting of the lithography apparatus used for the lithographic process. Device characteristic optimization techniques, including intelligent pattern selection based on diffraction signature analysis, may be integrated into the multiple patterning process flow.
摘要翻译：本发明涉及光刻设备和工艺，更具体地涉及用于将目标图案打印超出光刻设备的分辨率限制的多重图形化光刻技术。公开了一种通过光刻处理将待成像的图案图案分割成多个子图案的方法，其中该方法包括分割步骤，其被配置为意识到在以下过程中的至少一个之间的共优化的要求：用于光刻工艺的光刻设备的子图案和光学设置。包括基于衍射特征分析的智能图案选择的设备特征优化技术可以被集成到多个图案化工艺流程中。

9. 发明授权

US08572521B2 Method for performing pattern decomposition for a full chip design 有权
标题翻译：执行全芯片设计模式分解的方法
公开(公告)号：US08572521B2
公开(公告)日：2013-10-29
申请号：US12270498
申请日：2008-11-13
申请人： Luoqui Chen , Hong Chen , Jiangwei Li , Robert John Socha
发明人： Luoqui Chen , Hong Chen , Jiangwei Li , Robert John Socha
IPC分类号： G06F17/50
CPC分类号： G03F7/70466 , G03F1/70
摘要： A method for decomposing a target pattern containing features to be printed on a wafer into multiple patterns. The method includes the steps of segmenting the target pattern into a plurality of patches; identifying critical features within each patch which violate minimum spacing requirements; generating a critical group graph for each of the plurality of patches having critical features, where the critical group graph of a given patch defines a coloring scheme of the critical features within the given patch, and the critical group graph identifies critical features extending into adjacent patches to the given patch; generating a global critical group graph for the target pattern, where the global critical group graph includes the critical group graphs of each of the plurality of patches, and an identification of the features extending into adjacent patches; and coloring the target pattern based on the coloring scheme defined by the global critical group graph.
摘要翻译：一种用于将包含要印刷在晶片上的特征的目标图案分解为多个图案的方法。该方法包括以下步骤：将目标图案分割成多个贴片; 识别每个补丁内的违反最小间距要求的关键特征; 为具有关键特征的多个补丁中的每一个生成关键组图，其中给定补丁的关键组图定义给定补丁内的关键特征的着色方案，并且关键组图识别延伸到相邻补丁中的关键特征给给定补丁; 为目标模式生成全局关键组图，其中全局关键组图包括多个补丁中的每一个的关键组图，以及延伸到相邻补丁中的特征的标识; 并基于由全局关键组图定义的着色方案着色目标图案。

10. 发明授权

US09470867B1 Retaining enclosure for above-ground fiber optic/cable network terminal 有权
标题翻译：用于地面光纤/电缆网络终端的保护罩
公开(公告)号：US09470867B1
公开(公告)日：2016-10-18
申请号：US14756752
申请日：2015-10-08
申请人： Chun-Nam Chan James , Hong Chen , Donovan Hammersley , Mahmud Harji
发明人： Chun-Nam Chan James , Hong Chen , Donovan Hammersley , Mahmud Harji
IPC分类号： G02B6/44
CPC分类号： G02B6/445 , G02B6/4447 , G02B6/4452 , G02B6/4471
摘要： The unit for retaining/securing a fiber optic cable comprises an enclosure including a tray having a back base plate, a top and a bottom sides and a unit for retaining/securing a fiber optic cable, disposed in an interior of the enclosure. The bottom side is provided with a pair of identical apertures. Each aperture resembles to a flat shovel having an upper rectangular shape continued by a circular sector; the aperture is so profiled as to engage alternatively a biting-retaining fixture for inserting a cable or an exit grommet for a leaving cable; the former is made of a rigid plastic, while the second—of a soft, elastic polymer. The unit for retaining/securing a fiber optic cable is actuated by a shifting lever, having a shape of an angled, cantilevered part with a longitudinal axis of symmetry bent generally at 90 degrees.
摘要翻译：用于保持/固定光纤电缆的单元包括外壳，其包括具有后基板，顶部和底侧的托盘和用于保持/固定设置在外壳内部的光纤电缆的单元。底侧设有一对相同的孔。每个孔类似于具有由圆形扇形继续的上矩形的平铲; 该孔是如此轮廓以交替地与咬合保持夹具相配合，用于插入用于离开电缆的电缆或出口护环; 前者由刚性塑料制成，而第二种是柔软的弹性聚合物。用于保持/固定光纤电缆的单元由变速杆致动，变速杆具有成角度的悬臂部分的形状，其纵向对称轴线通常以90度弯曲。

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