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    • 8. 发明授权
    • Method for process window optimized optical proximity correction
    • 过程窗口优化光学邻近校正方法
    • US08413081B2
    • 2013-04-02
    • US12709373
    • 2010-02-19
    • Jun YeJiangwei LiStefan Hunsche
    • Jun YeJiangwei LiStefan Hunsche
    • G06F17/50
    • G06F17/50G03F1/144G03F1/36
    • One embodiment of a method for process window optimized optical proximity correction includes applying optical proximity corrections to a design layout, simulating a lithography process using the post-OPC layout and models of the lithography process at a plurality of process conditions to produce a plurality of simulated resist images. A weighted average error in the critical dimension or other contour metric for each edge segment of each feature in the design layout is determined, wherein the weighted average error is an offset between the contour metric at each process condition and the contour metric at nominal condition averaged over the plurality of process conditions. A retarget value for the contour metric for each edge segment is determined using the weighted average error and applied to the design layout prior to applying further optical proximity corrections.
    • 用于处理窗口优化的光学邻近校正的方法的一个实施例包括将光学邻近校正应用于设计布局,使用后OPC布局模拟光刻处理和在多个工艺条件下的光刻工艺的模型,以产生多个模拟 抵抗图像。 确定设计布局中每个特征的每个边缘段的关键尺寸或其他轮廓度量的加权平均误差,其中加权平均误差是在每个处理条件下的轮廓度量与标称条件下的轮廓度量之间的偏移平均 在多个工艺条件下。 使用加权平均误差确定每个边缘段的轮廓度量的重定向值,并在应用进一步的光学邻近校正之前应用于设计布局。
    • 10. 发明申请
    • Method and Apparatus for Performing Feature Extraction Using Local Primitive Code
    • 使用本地原始码执行特征提取的方法和装置
    • US20100296739A1
    • 2010-11-25
    • US12470520
    • 2009-05-22
    • Jiangwei LiKongqiao WangLei Xu
    • Jiangwei LiKongqiao WangLei Xu
    • G06K9/46
    • G06K9/00281G06K9/4647G06K9/468
    • Various methods for feature extraction using local primitive code are provided. One example method includes determining an origin block within an image, an arc, an arc orientation, and a distance between the origin block and the arc. In this regard, the origin block may include one or more pixels of the image. The example method also includes determining at least one arc block. In this regard, the arc block may be located on the arc and the arc may be located with respect to the origin block based on the arc orientation and the distance. Some or all of the at least one arc blocks may include one or more pixels of the image. The example method also includes determining at least one feature value based on attributes of the origin block and the at least one arc block. Similar and related example methods and example apparatuses are also provided.
    • 提供了使用本地原语代码进行特征提取的各种方法。 一个示例性方法包括确定图像内的原始块,弧,弧定向以及原始块和弧之间的距离。 在这方面,原始块可以包括图像的一个或多个像素。 示例性方法还包括确定至少一个弧块。 在这方面,弧形块可以位于弧形上,并且弧可以相对于原点块基于圆弧取向和距离而定位。 至少一个弧形块的一些或全部可以包括图像的一个或多个像素。 示例性方法还包括基于原始块和至少一个弧块的属性来确定至少一个特征值。 还提供了类似的和相关的示例性方法和示例设备。