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    • 7. 发明申请
    • NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
    • 非易失性半导体存储器件及其制造方法
    • US20120032246A1
    • 2012-02-09
    • US13196084
    • 2011-08-02
    • Masashi HONDAHitoshi ItoHideyuki Kinoshita
    • Masashi HONDAHitoshi ItoHideyuki Kinoshita
    • H01L29/788H01L21/336
    • H01L29/7881H01L27/11526H01L27/11529H01L29/40114
    • A nonvolatile semiconductor memory device according to an embodiment includes a semiconductor substrate, a memory cell transistor formed in a memory cell region, and a field-effect transistor formed in a peripheral circuit region. The memory cell transistor includes: a floating gate electrode; a first inter-electrode insulating film; and a control gate electrode. The field-effect transistor includes: a lower gate electrode; a second inter-electrode insulating film having an opening; and an upper gate electrode electrically connected to the lower gate electrode via the opening. The control gate electrode and the upper gate electrode are formed by a plurality of conductive films that are stacked. The control gate electrode and the upper gate electrode include a barrier film formed in one of interfaces between the stacked conductive films and configured to suppress diffusion of metal atoms. The control gate electrode and the upper gate electrode have a part that is silicided.
    • 根据实施例的非易失性半导体存储器件包括形成在存储单元区域中的半导体衬底,存储单元晶体管和形成在外围电路区域中的场效应晶体管。 存储单元晶体管包括:浮栅电极; 第一电极间绝缘膜; 和控制栅电极。 场效应晶体管包括:下栅电极; 具有开口的第二电极间绝缘膜; 以及通过所述开口电连接到所述下栅电极的上栅电极。 控制栅极电极和上部栅极电极由堆叠的多个导电膜形成。 控制栅电极和上栅电极包括形成在层叠导电膜之间的界面之一中的阻挡膜,并且被构造成抑制金属原子的扩散。 控制栅极电极和上部栅电极具有被硅化的部分。
    • 10. 发明授权
    • Semiconductor device having elevated source/drain on source region and drain region
    • 在源极区和漏极区具有升高的源极/漏极的半导体器件
    • US07190035B2
    • 2007-03-13
    • US10802758
    • 2004-03-18
    • Hitoshi Ito
    • Hitoshi Ito
    • H01L29/76H01L29/94
    • H01L29/66628H01L21/76224H01L21/823481
    • A semiconductor device disclosed herein comprises: an element isolation insulator which is formed on the surface side of a semiconductor substrate to provide electrical insulation from other elements, a height of a surface of the element isolation insulator being equal to or lower than that of a surface of the semiconductor substrate; a stopper which is formed of a material different from that of the element isolation insulator and which is at a predetermined distance from the semiconductor substrate so as to protrude from the surface of the element isolation insulator; and an elevated source/drain which is formed on a source region and a drain region so as to be elevated from the surface of the semiconductor substrate.
    • 本文公开的半导体器件包括:元件隔离绝缘体,其形成在半导体衬底的表面侧以提供与其它元件的电绝缘,元件隔离绝缘体的表面的高度等于或低于表面的高度 的半导体衬底; 阻挡件,其由与所述元件隔离绝缘体的材料不同的材料形成,并且距所述半导体基板预定距离,以从所述元件隔离绝缘体的表面突出; 以及形成在源极区域和漏极区域上以从半导体衬底的表面升高的源极/漏极的升高。