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1. 发明专利

JP2005027859A Local fire extinguishing system of clean room 有权
标题翻译：清洁厅本地消防系统
公开(公告)号：JP2005027859A
公开(公告)日：2005-02-03
申请号：JP2003196118
申请日：2003-07-11
申请人： Hitachi Plant Eng & Constr Co Ltd , Japan Air Gases Ltd , Tadahiro Omi , Shinko Technos Kk , ジャパン・エア・ガシズ株式会社 , 忠弘大見 , 新晃テクノス株式会社 , 日立プラント建設株式会社
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , CHIBA SHOGO , FUKUDA MUNEHARU , SAITO KENJI , HANAOKA HIDEO , YUKITA KOJI , TAKIGAWA YASUHIRO , KISHIDA YOSHIHARU
IPC分类号： A62C3/00 , A62C35/02 , A62C35/68 , A62C37/38
摘要： PROBLEM TO BE SOLVED: To provide a system locally extinguishing a fire only a site of fire break-out at the time of a fire in a clean room.
SOLUTION: The local fire extinguishing system of the clean room has an environment fire extinguishing unit 12 and a device fire extinguishing unit 14. The environment fire extinguishing unit 12 connects a movable type hose unit 34 to the gas pipe connecting port 33 of an inactive fire extinguishing gas pipe 16 for supplying an inactive fire extinguishing gas by detection of the fire in the clean room by super high sensitive sensor 36 to locally extinguishing the fire in the clean room. Whereas, the device fire extinguishing unit 14 releases the inactive fire extinguishing gas from a fire extinguishing nozzle 39 connected to the inactive fire extinguishing pipe 16 having an inactive fire extinguishing gas cylinder supplying source which is common to the above environment fire extinguishing unit 12 to locally extinguish device fire by detection of the fire in a manufacturing device by a heat sensor 40 placed inside the manufacturing device 37 arranged in the clean room.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一个系统，在洁净室内，在火灾时提供火灾的地方扑灭火灾现场。
解决方案：洁净室的本地灭火系统具有环境灭火单元12和设备灭火单元14.环境灭火单元12将可移动式软管单元34连接到气体管连接口33 一个不活动的灭火气体管道16，用于通过超高灵敏度传感器36检测洁净室内的火焰来提供不活泼的灭火气体，以局部扑灭洁净室内的火灾。而且，设备灭火单元14从与上述环境灭火单元12共同的非活性灭火气体供给源的不活动灭火管16连接的灭火喷嘴39将本发明的灭火气体释放到局部通过设置在洁净室内的制造装置37内部的热传感器40检测制造装置中的火焰来消除装置的火灾。版权所有（C）2005，JPO＆NCIPI

2. 发明专利

JP2005027858A Inactive fire extinguishing gas and extinguisher using inactive fire extinguishing gas 有权
标题翻译：使用不活动消防气体的不活动灭火气体和灭火器
公开(公告)号：JP2005027858A
公开(公告)日：2005-02-03
申请号：JP2003196117
申请日：2003-07-11
申请人： Hitachi Plant Eng & Constr Co Ltd , Japan Air Gases Ltd , Tadahiro Omi , Shinko Technos Kk , ジャパン・エア・ガシズ株式会社 , 忠弘大見 , 新晃テクノス株式会社 , 日立プラント建設株式会社
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , CHIBA SHOGO , FUKUDA MUNEHARU , SAITO KENJI , HANAOKA HIDEO , YUKITA KOJI , TAKIGAWA YASUHIRO , KISHIDA YOSHIHARU
IPC分类号： A62C3/00 , A62C15/00 , A62D1/08
摘要： PROBLEM TO BE SOLVED: To quickly clean a clean room after having extinguished a fire, by using an inactive fire extinguishing gas having high fire extinguishing ability, and by making the inactive fire extinguishing gas clean.
SOLUTION: The inactive fire extinguishing gas for extinguishing a fire is the mixture of two kind of gases including 80 vol% or more and 92 vol% or less of argon and the balance of carbon dioxide. Further, a fire extinguishing gas cylinder for filling the above inactive fire extinguishing gas is made of aluminium and its inner portion is cleaned by electrolytic polishing, the gas cylinder is filled with the cleaned fire extinguishing gas. The above fire extinguishing gas cylinder is a shouldering type having a fire extinguishing nozzle, and can be quickly carried to a fire break-out site in the clean room. Therefore, a fire can be quickly extinguished by releasing the above inactive fire extinguishing gas to the fire break-out site, and the clean room can be restored in a short time after having extinguished the fire.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：通过使用具有高灭火能力的非活性灭火气体，并使惰性灭火气体清洁，快速消除灭火室后的清洁室。解决方案：用于灭火的非活性灭火气体是包括80体积％以上至92体积％以下的氩气和二氧化碳余量的两种气体的混合物。此外，用于填充上述不活动灭火气体的灭火气瓶由铝制成，其内部部分通过电解抛光进行清洗，气瓶中填充有清洁的灭火气体。上述灭火气瓶是具有灭火喷嘴的肩型，可以快速地携带到洁净室的防火场地。因此，通过将上述不活动的灭火气体释放到火灾分离场地，可以迅速熄灭火灾，并且可以在熄火后的短时间内恢复洁净室。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2005034894A Positioning fixture for butt welding of piping 有权
标题翻译：管接头焊接定位装置
公开(公告)号：JP2005034894A
公开(公告)日：2005-02-10
申请号：JP2003276348
申请日：2003-07-17
申请人： Japan Air Gases Ltd , Tadahiro Omi , ジャパン・エア・ガシズ株式会社 , 忠弘大見
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , KISHIDA YOSHIHARU , MATSUOKA HIDETOSHI , IGAWA TETSUJI , SHINDO TAKAHIKO , YUGAWA MASAKUNI , MIYOSHI SHINJI
IPC分类号： B23K37/053
摘要： PROBLEM TO BE SOLVED: To provide a positioning fixture for but welding of piping which can easily determine an abutting position at the time of setting the piping even though it has a simple constitution and regardless of a working environment.
SOLUTION: A shaft part 11 is clamped in the same state that the other piping is clamped with a cassette 2 for fixing the piping before one piping H is clamped with the cassette 2 for fixing the piping in the positioning fixture for the butt welding of the piping. A positioning part 12, which has a larger diameter than the shaft part 11 and is set so that the height along in its axis direction coincides with the abutting position of the piping when the piping H is installed to the cassette 2 for fixing the piping, is provided at the tip of the shaft part 11.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种管道的定位固定装置，其可以容易地确定在设置管道时的邻接位置，即使其具有简单的构造并且不管工作环境如何。
解决方案：轴部11以与其他管道夹紧的相同状态夹紧，用于在一个管道H与用于将管道固定在用于对接的定位夹具中的盒2之间固定管道管道焊接。具有比轴部11大的直径的定位部12被设定为使得当管道H安装到用于固定管道的盒2中时，其轴向方向上的高度与配管的抵接位置一致，设置在轴部11的末端。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2006108717A Method of feeding gas to excimer laser oscillation device 有权
标题翻译：将气体送入激光振荡器的方法
公开(公告)号：JP2006108717A
公开(公告)日：2006-04-20
申请号：JP2006006937
申请日：2006-01-16
申请人： Canon Inc , Japan Air Gases Ltd , Tadahiro Omi , キヤノン株式会社 , ジャパン・エア・ガシズ株式会社 , 忠弘大見
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , MIZOGAMI SATOSHI , SANO NAOTO
IPC分类号： H01S3/225
摘要： PROBLEM TO BE SOLVED: To provide a gas feeding system for a plurality of excimer laser oscillation devices, in which the deviation in gas pressure does not exist by each line of a plurality of main lines. SOLUTION: In a method of feeding gas to a plurality of excimer laser oscillation devices, the gas feed system comprises a plurality of main lines, each having a supply end that is connected to a gas source and a tail end that is connected to an evacuation means; and a plurality of branch lines that are branched from respective main lines and are respectively connected to the excimer laser oscillation devices, where purging is carried out at all times at a flowrate of 1 cc/min or higher, at each tail end of the main lines. In a gas feeding system for feeding fluorine gas to the oscillation devices 31, a fluorinated passivation film is provided to fluorine-gas contacting surfaces. A chromium-oxide passivation film is provided on inert-gas contacting surfaces. The supply ends and the tail ends of the plurality of main lines 111a are respectively connected to common lines 111b, 111c, wherein each of the main lines has a plurality of branch lines 21, that are respectively connected to the plurality of the oscillation devices 31. Purging is carried out at all times at a flow rate of 1 cc/min or higher at the tail ends. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于多个准线激光振荡装置的气体供给系统，其中多个主线的每条线不存在气压的偏差。解决方案：在将气体供给到多个受激准分子激光振荡装置的方法中，气体供给系统包括多条主线，每条主线具有连接到气源的供给端和连接的尾端撤离方式; 以及从各主线分支并分别连接到准分子激光振荡装置的多条分支线，其中在主体的每个尾端始终以1cc / min以上的流量一直进行清洗线。在向振荡装置31供给氟气的供气系统中，在氟气接触面上设置氟化钝化膜。在惰性气体接触表面上提供氧化铬钝化膜。供给端和多条主线111a的尾端分别连接到公共线路111b，111c，其中每条主线路具有分别连接到多个振荡装置31的多个分支线路21 在尾端以1cc / min或更高的流速始终进行清洗。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2005152955A Welding method and welding system 审中-公开
标题翻译：焊接方法和焊接系统
公开(公告)号：JP2005152955A
公开(公告)日：2005-06-16
申请号：JP2003395982
申请日：2003-11-26
申请人： Japan Air Gases Ltd , Tadahiro Omi , ジャパン・エア・ガシズ株式会社 , 忠弘大見
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , KISHIDA YOSHIHARU , NAKANO YUSUKE , MIYOSHI SHINJI , NAKAMURA MASAKAZU
IPC分类号： B23K9/23 , B23K9/00 , B23K9/028 , B23K31/00 , B23K37/06 , B23K101/06 , B23K103/04
摘要： PROBLEM TO BE SOLVED: To provide a welding method and welding system by which film qualities of a weld zone and heat affected zone where the corrosion is most likely to occur can be improved, the deterioration due to the corrosion of supply piping and the metal contamination of supply gas can be reduced, and a Cr
2 O
3 passivation film is excellent in non-catalyst property, so that a highly decomposable gas such as hydride can stably be supplied without being decomposed.
SOLUTION: In the method, welding is performed by using gaseous argon as a back shielding gas in a welding process and the 100% Cr
2 O
3 passivation film is formed again by switching the gaseous argon to gaseous argon containing about several 10 ppm oxygen in a heat treatment process, following which the back shielding gas is switched to the gaseous argon and the annealing treatment is performed.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种焊接方法和焊接系统，通过该焊接方法和焊接系统，可以改善最可能发生腐蚀的焊接区域和热影响区域的膜质量，由于供应管道和可以减少供给气体的金属污染，并且Cr 2 SB 3 O 3 SB 3钝化膜的非催化剂性能优异，因此高分解性气体如氢化物可以稳定地供给而不分解。解决方案：在该方法中，通过在焊接工艺中使用气态氩作为背部保护气体进行焊接，并且100％Cr O 3 SB 3钝化膜是通过在热处理过程中将气态氩转换成含有约10ppm氧气的气态氩再次形成，随后将后保护气体切换到气态氩并进行退火处理。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2005034895A Welding method and welding system 审中-公开
标题翻译：焊接方法和焊接系统
公开(公告)号：JP2005034895A
公开(公告)日：2005-02-10
申请号：JP2003276349
申请日：2003-07-17
申请人： Japan Air Gases Ltd , Tadahiro Omi , ジャパン・エア・ガシズ株式会社 , 忠弘大見
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , SHINDO TAKAHIKO , YUGAWA MASAKUNI , MIYOSHI SHINJI
IPC分类号： B23K9/23 , B23K37/00 , B23K101/04
摘要： PROBLEM TO BE SOLVED: To provide a welding method by which the simplification of internal pressure adjusting work at the weld part and the improvement of the productivity can be realized, when a pair of piping are butt-welded.
SOLUTION: A flow rate of a back shielding gas, which is fed to the inside of the piping when a pair of the piping are butt-welded, is controlled to be constant with a flow rate controller in the welding method. A pressure loss of the piping, which is located at a position on the downstream side compared with the weld part, is previously calculated. The internal pressure in the vicinity of the weld part is adjusted with a pressure monitor, which is arranged to the most downstream side compared with the weld part, and a pressure loss adjusting valve.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种焊接方法，通过该焊接方法可以实现在焊接部分的内部压力调节工作的简化和生产率的提高，当一对管道被对接焊接时。解决方案：当一对管道对接时，供给到管道内部的后保护气体的流量通过焊接方法中的流量控制器被控制为恒定。预先计算与焊接部分相比位于下游侧的位置处的管道的压力损失。焊接部附近的内部压力通过与焊接部相比配置在最下游侧的压力监视器和压力损失调节阀进行调整。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2004245428A Air cooling device and its method 审中-公开
公开(公告)号：JP2004245428A
公开(公告)日：2004-09-02
申请号：JP2003032589
申请日：2003-02-10
申请人： Hitachi Plant Eng & Constr Co Ltd , Nichias Corp , Tadahiro Omi , ニチアス株式会社 , 忠弘大見 , 日立プラント建設株式会社
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , KOBAYASHI SADAO , HANAOKA HIDEO , TERADA ISAO , MINOBE SATOSHI , OKABE TOSHIHISA
IPC分类号： F24F1/00 , F24F3/00 , F28C1/02
摘要： PROBLEM TO BE SOLVED: To provide an air cooling method offering high cooling performance, good heat efficiency, a small liquid-gas ratio and less pressure loss and saving space and energy.
SOLUTION: This air cooling device comprises a cooling unit including an approximately rectangular solid skewing honeycomb having a plurality of corrugated plates laminated and stored in a case with opening portions only in two opposed faces, the cooling unit being arranged in a vertical duct in approximate horizontal with the two opposed opening portions as an upper face opening portion and a lower face opening portion, a cooling water supply means, a water receiving part, and a blowing means. The skewing honeycomb of the cooling unit has a height of 100-600 mm between both the upper and lower faces and cells each having a skewing angle of 30-80°.
COPYRIGHT: (C)2004,JPO&NCIPI

8. 发明专利

JP2004245429A Air cooling device and its method 审中-公开
公开(公告)号：JP2004245429A
公开(公告)日：2004-09-02
申请号：JP2003032590
申请日：2003-02-10
申请人： Hitachi Plant Eng & Constr Co Ltd , Nichias Corp , Tadahiro Omi , ニチアス株式会社 , 忠弘大見 , 日立プラント建設株式会社
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , KOBAYASHI SADAO , HANAOKA HIDEO , TERADA ISAO , MINOBE SATOSHI , OKABE TOSHIHISA
IPC分类号： F25D17/02 , F24F1/00 , F24F3/00 , F28F25/08
摘要： PROBLEM TO BE SOLVED: To provide an air cooling method offering high cooling performance, good heat efficiency, a small liquid-gas ratio and small pressure loss and saving space and energy. SOLUTION: This air cooling device comprises a cooling unit including an approximately rectangular solid skewing honeycomb having a plurality of corrugated plates and storing in a case with opening portions only in two opposed faces, the cooling unit being arranged in inclination in a horizontal duct with the opening portion on an air introduction side as a front face opening portion and the opposite opening portion as a rear face opening portion in such a manner that the upper end of the front face opening portion of the cooling unit is located closer to the air introduction side than the lower end, a cooling water supply means, a water receiving part, and a blowing means. The skewing honeycomb of the cooling unit has a thickness of 100-600 mm between both the front and rear faces, a forward tilting angle of 10-15°, and both the large and small elevation cell skewing angles of 1-89° of the cooling unit, when arranged in inclination. COPYRIGHT: (C)2004,JPO&NCIPI

9. 发明专利

JP2005039897A Power feeding method for production facility 有权
标题翻译：电力供电方法
公开(公告)号：JP2005039897A
公开(公告)日：2005-02-10
申请号：JP2003197729
申请日：2003-07-16
申请人： Hitachi Plant Eng & Constr Co Ltd , Tadahiro Omi , 忠弘大見 , 日立プラント建設株式会社
发明人： OMI TADAHIRO , SHIRAI YASUYUKI , FUKUDA MUNEHARU , OSAWA TAKAO , NAMIKAWA TOMONOBU , YUKITA KOJI , SAITO KENJI
IPC分类号： H02J3/00
CPC分类号： Y02P80/11
摘要： PROBLEM TO BE SOLVED: To reduce a facility cost, the footprint for installation, a load loss/non-load loss at a transformer, and electromagnetic waves that leak from a feeder cable. SOLUTION: The method comprises a special high transformer 36 which steps down a special high voltage power received from a power grid to an intermediate voltage of 500-1,000V, a first feeding system 42 which directly feeds power of the intermediate voltage to a first-group electric equipments 50A, 50B, and 50C, and a second feeding system 44 which steps down the power of the intermediate voltage to a wanted voltage and then supplies it to a second group electric equipment 54. The first-group electric equipments 50A, 50B, and 50C are equipped with power converters 52A, 52B, and 52C which convert the supplied power of intermediate voltage to a power used by the electric equipments. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：降低设备成本，安装占地面积，变压器的负载损耗/非负载损耗以及从馈线电缆泄漏的电磁波。解决方案：该方法包括一个特殊的高压变压器36，其将从电网接收的特殊高压电力降低到500-1,000V的中间电压;第一馈电系统42，其将中间电压的功率直接馈送到第一组电气设备50A，50B和50C，以及第二馈电系统44，其将中间电压的功率降低到所需电压，然后将其提供给第二组电气设备54.第一组电气设备 50A，50B和50C配备有电力转换器52A，52B和52C，其将所提供的中间电压的电力转换为由电气设备使用的电力。版权所有（C）2005，JPO＆NCIPI

10. 发明专利

JP2010135810A METHOD OF CONTROLLING pH VALUE OF SOLUTION AND OXIDATION-REDUCTION POTENTIAL, AND APPARATUS 审中-公开
标题翻译：控制溶液pH值和氧化还原电位的方法及装置
公开(公告)号：JP2010135810A
公开(公告)日：2010-06-17
申请号：JP2010002909
申请日：2010-01-08
申请人： Tadahiro Omi , Pre-Tech At:Kk , 忠弘大見 , 株式会社プレテックAt
发明人： YOKOI IKUNORI , II TOSHIHIRO , OMI TADAHIRO , NITTA TAKEHISA
IPC分类号： H01L21/304 , B01F3/04 , B08B3/08 , C02F1/66 , C02F1/68
摘要： PROBLEM TO BE SOLVED: To provide a method of controlling a pH value and an oxidation-reduction potential of cleaning water and an apparatus, which are easily and accurately capable of controlling the pH value and oxidation-reduction potential (ORP) of the cleaning water by adding an adequate amount of gas component to the cleaning water via a gas pervious film for adding gas, in order to obtain a high cleaning effect of the cleaning water used for wet cleaning in the process of manufacturing a semiconductor base, a liquid crystal base, a magnetic base, or a superconductor base.
SOLUTION: The pH value and oxidation-reduction potential of the cleaning water are controlled by adding the gas component to the cleaning water via the gas pervious film for adding gas. Hydrogenation water is used as cleaning water for wet cleaning in the process of manufacturing the semiconductor base, liquid crystal base, magnetic base, or superconductor base, and ammonia gas is used as a gas component to be added to the hydrogenation water.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种控制清洗水的pH值和氧化还原电位的方法以及容易且准确地控制pH值和氧化还原电位（ORP）的装置，通过经由用于添加气体的气体透过膜向清洗水中添加适量的气体成分，以在半导体基体的制造工序中获得清洗水的清洗效果高的清洗水，液晶基座，磁性基座或超导体基座。解决方案：通过将气体成分加入清洁水中，通过气体透过膜加入气体来控制清洗水的pH值和氧化还原电位。在制造半导体基底，液晶基底，磁性基底或超导体基底的过程中，使用氢化水作为清洗水，氨气用作加入氢气中的气体成分。版权所有（C）2010，JPO＆INPIT

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