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1. 发明专利

JP2006179889A Method and apparatus for inspecting circuit pattern 有权
标题翻译：检查电路图的方法和装置
公开(公告)号：JP2006179889A
公开(公告)日：2006-07-06
申请号：JP2005346042
申请日：2005-11-30
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NOZOE MARI , MACHIDA KAZUHISA , ITO MASANORI , USAMI YASUTSUGU , HIROI TAKASHI , MORIOKA HIROSHI
IPC分类号： H01L21/66 , G01B11/24 , G01B15/04 , G01B15/08 , G01N21/956 , G01N23/225 , G03F1/84 , G03F1/86 , H01J37/22 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a technique for improving operability when setting various conditions needed for inspection in a technique for inspecting a minute circuit pattern using an image formed by irradiating a white light, a laser beam, or an electron beam. SOLUTION: This is a circuit pattern inspection apparatus that is composed of a means for irradiating a light or a light and charged particle beam onto a substrate surface on which a circuit pattern is formed, a means for detecting a signal generated from the substrate, a means for imaging the signal detected by the detection means for temporary storage, a means for comparing the stored image of the region against a region where the other same circuit pattern is formed, and a means for determining a defect on the circuit pattern from the comparison result. The operation screen for inspection and inspection conditions setting has a screen area that displays operation status or input data, and a means for displaying subject names showing the screen, and the subject names are displayed as an integral part of the operation screen region. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于在使用通过照射白光，激光束或电子束形成的图像的微小电路图案的检查技术中设置检查所需的各种条件时提高可操作性的技术。解决方案：这是一种电路图形检查装置，其由用于将光或光和带电粒子束照射到其上形成有电路图案的基板表面上的装置，用于检测从基板，用于对由检测装置检测的用于临时存储的信号进行成像的装置，用于将存储的区域的图像与形成另一个相同电路图案的区域进行比较的装置，以及用于确定电路图案上的缺陷的装置从比较结果。用于检查和检查条件设置的操作屏幕具有显示操作状态或输入数据的屏幕区域，以及用于显示显示屏幕的主题名称的装置，并且将主题名称显示为操作屏幕区域的组成部分。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2003031629A Method and apparatus for testing pattern 审中-公开
标题翻译：测试模式的方法和装置
公开(公告)号：JP2003031629A
公开(公告)日：2003-01-31
申请号：JP2001216254
申请日：2001-07-17
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： HIROI TAKASHI , WATANABE MASAHIRO , TANAKA MAKI , KUNI TOMOHIRO , SHISHIDO CHIE , NISHIYAMA HIDETOSHI , OKUDA HIROTO , MIYAI YASUSHI , GUNJI YASUHIRO , SHIMODA ATSUSHI , OSHIMA YOSHIMASA
IPC分类号： H01L21/66
摘要： PROBLEM TO BE SOLVED: To eliminate the problem that in a method wherein a charged particle beam is cast on a substrate to be tested, and secondary electrons or the like emitted are detected to obtain an image, and then the obtained image is compared with a reference image to test the substrate for pattern defects or a defect is checked by moving to a location of a pattern defect, the substrate to be tested is charged up by the irradiation of the charged particle beam, causing the charged particle beam to be bent and then the positional deviation of the defect.
SOLUTION: An amount of positional deviation at the time of inspection and an amount of positional deviation from a reference image are inspected and, at the same time, calculated to correct the location of the defect at the time of inspection. Defects information is added with an image at the time of inspection, and then is corrected for an amount of positional deviation between image information and layout information. The defects information is added with the image at the time of inspection, and then is compared with an image at the time of checking defects to correct the location of the defect. When checking defects, an image is obtained and then is added to the defects information, and the defects information is compared with the image at the time of checking defects and an image detected by another apparatus or with the layout information, to correct the location of the defect.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了消除在被测试的基板上投射带电粒子束的方法，并且检测发射的二次电子等以获得图像的问题，然后将获得的图像与通过移动到图案缺陷的位置来检查用于图案缺陷的基板的参考图像或缺陷，通过照射带电粒子束对待测试的基板进行充电，使带电粒子束弯曲，那么缺陷的位置偏差。解决方案：检查检查时的位置偏差量和与参考图像的位置偏差量，同时计算出在检查时纠正缺陷的位置。缺陷信息在检查时添加图像，然后对图像信息和布局信息之间的位置偏差量进行校正。缺陷信息在检查时与图像一起添加，然后与检查缺陷时的图像进行比较，以校正缺陷的位置。当检查缺陷时，获得图像，然后将其添加到缺陷信息中，并且在检查缺陷时的缺陷信息和与其他装置检测到的图像或布局信息相比较时，将缺陷信息与图像进行比较，以校正缺陷。

3. 发明专利

JP2006162609A Method and system for pattern inspection using electron beam 有权
标题翻译：使用电子束的图案检查的方法和系统
公开(公告)号：JP2006162609A
公开(公告)日：2006-06-22
申请号：JP2005333561
申请日：2005-11-18
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： HIROI TAKASHI , KUNI TOMOHIRO , WATANABE MASAHIRO , SHISHIDO CHIE , SHINADA HIROYUKI , GUNJI YASUHIRO , TAKATO ATSUKO
IPC分类号： G01N23/225 , G01B15/04 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a method and a system for pattern inspection using electron beam, which can solve the problem inherent to the present technology in electron optics systems or detectors requiring detector of above a certain area or larger as an important factor for irradiating electron beam and detect its secondary electrons, etc. at a high speed, where the detection of 200 Msps or higher is actually difficult due to the constraint of the frequency being inversely proportional to the area.
SOLUTION: For example, to detect at 400 Msps with the required area set as 4 mm angle and speed at this 4 mm angle as 150 Msps, four simple detectors of high-speed 2 mm angle are aligned, signals of them are amplified and then added to be subject to A/D conversion. Alternatively, a secondary electronic deflector is used to allow secondary electrons to sequentially be incident into the detector of 8 mm angle, detected at 100 Msps, and then aligned after A/D conversion. Both of these methods can achieve an area of 4 mm angle and a speed of 400 Msps.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种使用电子束进行图案检查的方法和系统，其可以解决当前技术中固有的电子光学系统或需要高于某一区域或更大的检测器的检测器的重要问题作为重要的问题用于照射电子束的因子并且以高速检测其二次电子等，其中由于频率与面积成反比的约束，实际上难以检测到200 Msps或更高。
解决方案：例如，为了检测400 Msps，所需区域设置为4 mm角，速度为4 mm，为150 Msps，高速2 mm角的四个简单检测器对齐，其信号为放大后再添加进行A / D转换。或者，二次电子偏转器用于允许二次电子顺序地入射到以100 Msps检测到的8mm角的检测器中，然后在A / D转换之后对准。这两种方法都可以达到4 mm角，400 Msps的速度。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2007180035A Method and apparatus for inspecting circuit pattern 有权
标题翻译：检查电路图的方法和装置
公开(公告)号：JP2007180035A
公开(公告)日：2007-07-12
申请号：JP2007000916
申请日：2007-01-09
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NOZOE MARI , SHINADA HIROYUKI , SUGIYAMA KATSUYA , TAKATO ATSUKO , HIROI TAKASHI , YOSHIMURA KAZUSHI , SUGIMOTO ARITOSHI , YODA HARUO , KURODA KATSUHIRO , USAMI YASUTSUGU , TANAKA MAKI , KANEKO YUTAKA , TOYAMA HIROSHI , INO TADAO , YAJIMA YUSUKE , ANDO MASAAKI , MAEDA SHUNJI , KUBOTA HITOSHI
IPC分类号： H01J37/28 , G01N23/225 , H01J37/20 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To rapidly, stably, and accurately inspect a circuit pattern with an insulating material in an inspection method for comparing the secondary electron images of the defects, foreign matter, and residues of the circuit pattern produced on a substrate of a semiconductor device. SOLUTION: In this circuit pattern inspection method, an electron beam image is formed on a substrate 9 to be inspected before the potential of the member of the circuit pattern is varied by radiating a heavy-current electron beam 19 onto the substrate 9 at a high speed. Before the inspection, the substrate 9 is radiated with a second charged particle beam 104 in addition to the first electron beam for forming an image for inspection to stabilize the potential of the member. Also, secondary electron detection signals are digitized before transfer to acquire high quality electron beam images with high efficiency and high SN ratio. By this inspection method, the circuit pattern with the insulating material can be inspected. Since those defects and abnormalities that cannot be detected by the prior art produced in various substrate manufacturing processes such as the semiconductor device can be found, the fraction defective in the substrate manufacturing processes can be reduced and the reliability can be enhanced. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：在用于比较在基板上产生的缺陷，异物和电路图案的残留物的二次电子图像的检查方法中，使用绝缘材料快速，稳定且准确地检查电路图案的半导体器件。解决方案：在该电路图案检查方法中，在通过将大电流电子束19辐射到基板9上来改变电路图案的部件的电位之前，在要检查的基板9上形成电子束图像以高速度。在检查之前，除了用于形成用于检查的图像的第一电子束之外，用第二带电粒子束104照射基板9以稳定该部件的电位。此外，二次电子检测信号在传送之前被数字化，以获得高效率和高SN比的高质量电子束图像。通过该检查方法，可以检查具有绝缘材料的电路图案。由于可以发现在诸如半导体器件的各种衬底制造工艺中产生的现有技术无法检测到的这些缺陷和异常，可以降低衬底制造工艺中的缺陷部分，并且可以提高可靠性。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2003021605A Pattern inspecting method and device 有权
标题翻译：模式检查方法和设备
公开(公告)号：JP2003021605A
公开(公告)日：2003-01-24
申请号：JP2001207213
申请日：2001-07-09
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： HIROI TAKASHI , WATANABE MASAHIRO , TANAKA MAKI , KUNI TOMOHIRO , SHISHIDO CHIE , MIYAI YASUSHI , NARA YASUHIKO , ISOBE MITSUNOBU
IPC分类号： G01N23/00 , G01N21/956 , G06T1/00 , G06T7/00 , H01J37/22 , H01L21/66
CPC分类号： G06T7/001 , G06T2207/30148
摘要： PROBLEM TO BE SOLVED: To resolve problems in a pattern inspecting device acquiring images by repeating stage scanning, determining a place with a different pattern as a defect candidate by comparing images of places with detection images stored in detected order and expected to have the same pattern, and determining a place determined as a defect candidate twice as a true defect where there are deterioration in various types of error defect detecting performance and un- inspectable areas respectively due to comparison of images acquired by different stage scanning and an occurrence of a place which can be inspected only once.
SOLUTION: A defect detected in highly sensitive conditions is regarded as a defect candidate, and a critical threshold value (a value where it is determined that there is a defect when a threshold is not more than this value) of the defect candidate is acquired by an image circuit or processing an image of the defect candidate by software. A plurality of inspection results can be acquired from one inspection by comparing the acquired critical threshold value with a plurality of threshold values.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了解决通过重复舞台扫描获取图像的图案检查装置中的问题，通过比较具有以检测顺序存储的并且预期具有相同图案的检测图像的位置的图像来确定具有不同图案的位置作为缺陷候选并且确定作为缺陷候选确定的两个作为真实缺陷的位置，其中由于通过不同阶段扫描获取的图像与发生的位置的发生而分别地存在各种类型的错误缺陷检测性能和不可检查区域的恶化，只能检查一次。解决方案：在高度敏感的条件下检测到的缺陷被认为是缺陷候选，并且通过以下方式获得缺陷候选的临界阈值（当阈值不大于该值时确定存在缺陷的值）图像电路或通过软件处理缺陷候选者的图像。通过将所获取的临界阈值与多个阈值进行比较，可以从一次检查获得多个检查结果。

6. 发明专利

JP2003006614A Method and device for inspecting circuit pattern, method and system for displaying defect candidate 有权
标题翻译：用于检查电路图的方法和装置，用于显示缺陷候选的方法和系统
公开(公告)号：JP2003006614A
公开(公告)日：2003-01-10
申请号：JP2002045569
申请日：2002-02-22
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： HIROI TAKASHI , WATANABE MASAHIRO , SHISHIDO CHIE , KUNI TOMOHIRO , TANAKA MAKI , MIYAI YASUSHI , NARA YASUHIKO , NOZOE MARI
IPC分类号： G01N23/225 , G01N21/956 , G06T1/00 , G06T7/00 , H01L21/66
CPC分类号： G06T7/001 , G01N21/95684 , G06T2207/10056 , G06T2207/30148
摘要： PROBLEM TO BE SOLVED: To provide technology provided with a method and a system for inspecting a defect in a circuit pattern on semiconductor materials. SOLUTION: As one specified execution style, a trial inspection threshold setting method is provided but in that method, an initial threshold is corrected after the defect of a trial inspection storage data is analyzed. Afterwards, the corrected threshold is used as a threshold in the real inspection.
摘要翻译：要解决的问题：提供一种提供用于检查半导体材料上的电路图案的缺陷的方法和系统的技术。解决方案：作为一种指定的执行方式，提供试验性检查阈值设定方法，但是在该方法中，在分析试验检查存储数据的缺陷之后校正初始阈值。之后，在实际检查中将校正后的阈值用作阈值。

7. 发明专利

JP2011090003A Image display method of defective candidates 有权
标题翻译：有缺陷的候选人的图像显示方法
公开(公告)号：JP2011090003A
公开(公告)日：2011-05-06
申请号：JP2010271028
申请日：2010-12-06
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： HIROI TAKASHI , WATANABE MASAHIRO , KUNI TOMOHIRO , TANAKA MAKI , FUKUNISHI MUNENORI , MIYAI YASUSHI , NARA YASUHIKO , ISOBE MITSUNOBU
IPC分类号： G01B15/04 , G01N23/225
摘要： PROBLEM TO BE SOLVED: To solve the problem wherein defective data which a device for inspecting patterns of substrates in the middle of manufacturing outputs, only includes feature quantity data such as coordinates data, areas, and projection lengths, and thus only coordinates data for moving to a defective position is effectively utilized.
SOLUTION: An inspection device allows an external result confirmation device to perform search of image data or the like, by adding not only feature quantity data but also image data as defective data. The inspection device allows defective image during inspection to be displayed, by searching similar defects on images in case of a plurality of sheets of defective data, performing trend display of a search result, displaying a defective map by designating a sheet on the trend, and designating a defect on the defective map.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题为了解决在制造输出中间检查基板图案的装置的缺陷数据仅包括诸如坐标数据，区域和投影长度的特征量数据的问题，因此仅仅是坐标用于移动到缺陷位置的数据被有效地利用。
解决方案：检查装置允许外部结果确认装置通过不仅添加特征量数据而且将图像数据添加为缺陷数据来执行图像数据等的搜索。检查装置允许在检查期间通过在多张不合格数据的情况下搜索图像上的类似缺陷，执行搜索结果的趋势显示，通过指定趋势图来显示缺陷图，并且指定缺陷图上的缺陷。版权所有（C）2011，JPO＆INPIT

8. 发明专利

JP2008147679A Electron beam application device 审中-公开
标题翻译：电子束应用器件
公开(公告)号：JP2008147679A
公开(公告)日：2008-06-26
申请号：JP2007324606
申请日：2007-12-17
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NOZOE MARI , MURAKOSHI HISAYA , TAKATO ATSUKO , SHINADA HIROYUKI , USAMI YASUTSUGU , YODA HARUO , HIROI TAKASHI
IPC分类号： H01L21/66 , G06T1/00 , H01J37/22
摘要： PROBLEM TO BE SOLVED: To provide a method capable of detecting contents of defects in a detected defect portion at a high speed in a high accuracy without increasing an inspection time, in an inspecting device for detecting defects in a circuit pattern formed on the surface of substrates in a semiconductor device and the like using the image by the electron beam.
SOLUTION: Electron beam images in a first and a second regions with the same designing pattern are sequentially obtained, about the surface 9 of an inspection object substrate. The obtained image data are temporarily stored in a first image memory 46 and a second image memory 47. The stored image data in the first and second regions are mutually compared and calculated in a comparative calculator 50. Both of the image data are sent to a fourth image memory 49 for storage on condition that either of the regions is determined in a defect determination processor 51 as defective in its pattern when the difference is greater than a predetermined value between both image data. By repeating these procedures, the defects in the pattern are sequentially detected about a plurality of the regions, and the detected results are stored as a defect data file.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在不增加检查时间的情况下以高精度检测检测到的缺陷部分的缺陷的内容的方法，在检测装置中检测形成的电路图案的缺陷半导体器件中的基板的表面等通过电子束使用该图像。解决方案：关于检查对象基板的表面9，顺序地获得具有相同设计图案的第一和第二区域中的电子束图像。获得的图像数据被临时存储在第一图像存储器46和第二图像存储器47中。在比较计算器50中相互比较和计算第一和第二区域中存储的图像数据。两个图像数据被发送到第四图像存储器49，用于在差异大于两个图像数据之间的预定值的情况下，在缺陷确定处理器51中确定其区域中的任何一个在其图案中有缺陷的条件下进行存储。通过重复这些过程，关于多个区域顺序地检测图案中的缺陷，并且将检测结果存储为缺陷数据文件。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2005181347A Inspection device, inspection system and inspection method for circuit pattern 审中-公开
标题翻译：检查装置，检查系统和电路图案检查方法
公开(公告)号：JP2005181347A
公开(公告)日：2005-07-07
申请号：JP2005033030
申请日：2005-02-09
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NARA YASUHIKO , HAYAKAWA KOICHI , MACHIDA KAZUHISA , NOZOE MARI , MORIOKA HIROSHI , USAMI YASUTSUGU , HIROI TAKASHI
IPC分类号： G01N23/225 , H01J37/22 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an inspection device, an inspection system and an inspection method for a circuit pattern, capable of enhancing using convenience by improving a screen function of the inspection device for the circuit pattern for inspecting defects in the circuit pattern in a wafer, a mask, a reticle or the like, i.e. thinning in a linear or hole-like shape, a chip, a formation defect, a foreign matter or the like, and capable of enhancing a production yield of a semiconductor device by discovery of the defect at an early stage, investigation of the cause thereof and countermeasures at the early stage, as the inspection system as a whole. SOLUTION: The inspection device for circuit pattern is constituted to display an image signal transmitted from another device. The inspection system for the circuit pattern is provided with an electron beam visual inspection device, provided with a monitor for displaying the defect on a map; and an external visual inspection device for storing an image of the defect, and is constituted to display concurrently the map and the image of the defect on the monitor. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于电路图案的检查装置，检查系统和检查方法，其能够通过改善用于检查电路中的缺陷的电路图案的检查装置的屏幕功能来增强使用的方便性晶片，掩模，掩模版等中的图案，即线状或孔状形状的薄化，芯片，地层缺陷，异物等，并且能够提高半导体器件的制造成品率通过早期发现缺陷，调查事故原因和对策，作为整体检查制度。解决方案：电路图案检查装置构成为显示从另一装置发送的图像信号。电路图案的检查系统设有电子束目视检查装置，设置有用于在地图上显示缺陷的监视器; 以及用于存储缺陷的图像的外部目视检查装置，并且被构造成在监视器上同时显示缺陷的地图和图像。版权所有（C）2005，JPO＆NCIPI

10. 发明专利

JP2004260193A Method and apparatus for testing circuit pattern 审中-公开
公开(公告)号：JP2004260193A
公开(公告)日：2004-09-16
申请号：JP2004067157
申请日：2004-03-10
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NOZOE MARI , MURAKOSHI HISAYA , TAKATO ATSUKO , SHINADA HIROYUKI , USAMI YASUTSUGU , YODA HARUO , HIROI TAKASHI
IPC分类号： G01B15/00 , G01N23/225 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a method for sensing a detected defect details fast and accurately in a circuit pattern on a surface of a substrate of a semiconductor device. SOLUTION: Electron beam images are obtained for testing a first, second, and third regions of a surface 9 of a substrate of the same design pattern and temporarily stored in image memories 46, 47 and 48. First, the first and second image data are compared in a comparison operation part 50, and when difference between them in determination by a defect determining processor 51 is larger than a predetermined value, either one of the data is determined to have a pattern defect, and then the both image data are stored in an image memory 49. Next, the second and third memory image data are compared, and when difference between them is larger than a predetermined value, a pattern defect is determined to be actually present in the second region, and then each of the memory image data in the first and second regions stored in the image memory 49 is attached with an identification sign of a normal portion or defective image data and restored. This procedure is repeated and detection results are stored as a defect data file. COPYRIGHT: (C)2004,JPO&NCIPI

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