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1. 发明专利

JP2014071349A Method and apparatus for forming pattern, exposure apparatus, and method for manufacturing display panel 审中-公开
标题翻译：用于形成图案的方法和装置，曝光装置以及制造显示面板的方法
公开(公告)号：JP2014071349A
公开(公告)日：2014-04-21
申请号：JP2012218287
申请日：2012-09-28
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： YAMAMOTO KENJI , MOCHIZUKI MASAAKI
IPC分类号： G03F7/20 , G02F1/1368 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To easily check at high speed the certainty of extraction of drawing data by a DMD (digital micromirror device) with respect to a drawing position and to execute high-quality pattern drawing with a high throughput.SOLUTION: A pattern forming apparatus forms a pattern based on drawing data in a resin film of a substrate by irradiating the substrate with a light beam, while modulating the light beam by use of a spatial optical modulator that drives a plurality of mirror groups arranged in two directions on the basis of the drawing data and relatively moving stage means that holds the substrate coated with the resin film. The drawing data stored in a memory is configured to include discriminable data as a part of the drawing data for discriminating a correction value of the coordinates of the drawing data when the coordinates are corrected by a value corresponding to the resolving power for drawing in a moving direction and/or in a direction orthogonal to the moving direction of the stage means. At the time when the coordinates of the drawing data are corrected, the discriminable data is read out from a part of the drawing data in the memory and a pattern responding to the correction value is drawn.
摘要翻译：要解决的问题：为了便于高速检查由DMD（数字微镜装置）相对于绘图位置提取绘图数据的确定性，并以高产量执行高质量图案绘制。解决方案：图案形成设备基于通过用光束照射衬底的衬底的树脂膜中的绘图数据形成图案，同时通过使用驱动沿两个方向布置的多个镜像组的空间光学调制器来调制光束的图形数据和保持涂覆有树脂膜的基板的相对移动的平台装置。存储在存储器中的绘图数据被配置为包括可辨别数据作为绘图数据的一部分，用于当坐标被校正时与用于绘制移动的分辨率相对应的值校正绘图数据的坐标的校正值方向和/或在与舞台装置的移动方向正交的方向上。当绘图数据的坐标被校正时，从存储器中的绘图数据的一部分中读出可辨别的数据，并且绘制响应于校正值的图形。

2. 发明专利

JP2014059410A Pattern formation method and apparatus, exposure apparatus, and method for manufacturing panel for display 审中-公开
标题翻译：图案形成方法和装置，曝光装置以及用于制造显示面板的方法
公开(公告)号：JP2014059410A
公开(公告)日：2014-04-03
申请号：JP2012203614
申请日：2012-09-14
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： UEHARA SATOSHI , MOCHIZUKI MASAAKI , HONDA HIDEYUKI
IPC分类号： G03F7/20 , G02F1/1368 , H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To avoid, in a case where coordinates of drawing data according with stage mobilization errors are corrected, the generation of irregularities at sites targeted for correction.SOLUTION: The position of a chuck 10 retaining a substrate 1 is detected while the chuck 10 is being mobilized by an X stage 5, and the mobilization error of the X stage 5 is detected based on the detection result of the position of the chuck 10. On the basis of the detection result of the mobilization error of the X stage 5, furthermore, coordinates of drawing data fed into the DMD drive circuit 27 of an optical beam irradiation apparatus 20 are corrected, and the drawing data of the coordinates thus corrected are fed into the DMD drive circuit 27 of the optical beam irradiation apparatus 20. On this occasion, pre-correction coordinates and post-correction coordinates of the to-be-fed drawing data are repeatedly fed prior to the switch of the former coordinates to the post-correction coordinates instead of immediately enforcing the switch to the post-correction coordinates. The generation of irregularities at the time of correction is thus inhibited.
摘要翻译：要解决的问题：为了避免在校正具有阶段动员误差的绘制数据的坐标的情况下，在针对校正的位置处产生不规则性。解决方案：检测保持衬底1的卡盘10的位置，同时卡盘10被X台5动员，并且基于卡盘10的位置的检测结果来检测X台5的移动误差。基于X台的动员误差的检测结果另外，如图5所示，进一步校正送入光束照射装置20的DMD驱动电路27的绘图数据的坐标，将这样校正的坐标的绘图数据送入光束照射装置20的DMD驱动电路27。在这种情况下，在将原始坐标切换到校正后坐标系之前，将要馈送的绘图数据的校正前坐标和校正后坐标重复馈送而不是立即强制切换到校正后坐标。因此，校正时的不规则的产生被抑制。

3. 发明专利

JP2012088464A Exposure device, exposure method, and method for manufacturing display panel substrate 审中-公开
标题翻译：曝光装置，曝光方法和制造显示板基板的方法
公开(公告)号：JP2012088464A
公开(公告)日：2012-05-10
申请号：JP2010234178
申请日：2010-10-19
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MOCHIZUKI MASAAKI , UEHARA SATOSHI
IPC分类号： G03F7/20
摘要： PROBLEM TO BE SOLVED: To improve drawing accuracy by correcting variation in an exposure amount due to deformation of an optical component included in a radiation optical system.SOLUTION: According to deformation of an optical component included in the radiation optical system of a light beam radiating device, a drawing controls part 71 corrects drawing data so that area radiated with light beam narrows or expands and supplies them to driving circuits of the light beam radiating device. A first memory 76a stores data specifying a position for narrowing an area to be radiated with a light beam. A second memory 76b stores data specifying a position for expanding area to be radiated with a light beam. A conversion circuit 77a converts drawing data according to data stored in a first memory. A conversion circuit 77b converts drawing data according to data stored in the second memory. A selection circuit 78 selects any one of the drawing data converted by the conversion circuit 77a, drawing data converted by the conversion circuit 77b, or drawing data before the conversion.
摘要翻译：要解决的问题：通过校正由于包括在辐射光学系统中的光学部件的变形引起的曝光量的变化来提高绘制精度。解决方案：根据光束辐射装置的辐射光学系统中包括的光学部件的变形，绘图控制部分71校正绘制数据，使得用光束辐射的面积变窄或扩大，并将其提供给光束辐射装置。第一存储器76a存储指定用于使用光束来减小要辐射的区域的位置的数据。第二存储器76b存储指定要用光束照射的扩展区域的位置的数据。 A转换电路77a根据存储在第一存储器中的数据转换绘图数据。 A转换电路77b根据存储在第二存储器中的数据转换绘图数据。选择电路78选择由转换电路77a转换的绘图数据中的任何一个，绘制由转换电路77b转换的数据或在转换之前绘制数据。版权所有（C）2012，JPO＆INPIT

4. 发明专利

JP2011237596A Exposure apparatus, exposure method, and manufacturing method of display panel substrate 审中-公开
标题翻译：曝光装置，曝光方法和显示板基板的制造方法
公开(公告)号：JP2011237596A
公开(公告)日：2011-11-24
申请号：JP2010108843
申请日：2010-05-10
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SAITO YOSHIHIRO , TEZUKA HIDEKAZU , DOI HIDEAKI , MOCHIZUKI MASAAKI , KOTAKE HIDEO , YAMAMOTO KENJI
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an exposure apparatus and an exposure method that suppress the change of exposure light intensity and uniformly perform pattern exposure while extending the lives of semiconductor light-emitting elements and also reducing power consumption when a substrate is exposed by exposure light generated from multiple semiconductor light-emitting elements.SOLUTION: When the exposure of a substrate is not performed, a light source controller 50 turns off each of semiconductor light-emitting elements 82 without supplying driving current to the multiple semiconductor light-emitting elements 82 of a light source 80. When the exposure of the substrate is performed, the light source controller 50 turns on each of the semiconductor light-emitting elements 82 with supplying driving current to the multiple semiconductor light-emitting elements 82 of the light source 80. The light source controller 50 detects change in the amount of light due to the temperature change of the multiple semiconductor light-emitting elements 82 of the light source 80, and increases or decreases the driving current supplied to the multiple semiconductor light-emitting elements 82 of the light source 80 so as to compensate the change in the detected amount of light.
摘要翻译：要解决的问题：提供一种曝光装置和曝光方法，其抑制曝光光强度的变化并均匀地进行图案曝光，同时延长半导体发光元件的寿命并且还降低基板暴露时的功耗通过从多个半导体发光元件产生的曝光光。解决方案：当不执行基板的曝光时，光源控制器50关闭每个半导体发光元件82，而不向光源80的多个半导体发光元件82提供驱动电流。当执行基板的曝光，光源控制器50通过向光源80的多个半导体发光元件82提供驱动电流来接通每个半导体发光元件82.光源控制器50检测变化由于光源80的多个半导体发光元件82的温度变化导致的光量增加或减少供给到光源80的多个半导体发光元件82的驱动电流，从而补偿检测到的光量的变化。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2014168040A Device and method for forming pattern, exposure device, and method of manufacturing display panel 审中-公开
标题翻译：用于形成图案，曝光装置的装置和方法以及制造显示面板的方法
公开(公告)号：JP2014168040A
公开(公告)日：2014-09-11
申请号：JP2013225909
申请日：2013-10-30
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MOCHIZUKI MASAAKI , HONDA HIDEYUKI
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To carry out drawing coordinate position correction perpendicular to a scanning direction in high definition by adding a small-scale circuit structure without increasing a load for a drawing process, and to perform a high quality pattern formation at a high throughput.SOLUTION: An irradiation device irradiates a light beam while moving an entire DMD in a scanning direction by inclining it with respect to a direction vertical to the scanning direction so that a mirror at a first row and a first column among m rows and n columns, which is actually used for drawing in a mirror group, shifts in the scanning direction by p (1-1/n) pieces (p is an integer) in terms of a mirror group center coordinate interval with respect to a mirror at the m-th row and the first column. The irradiation device divides drawing data allocated to the mirror group into data corresponding to q pieces of layer numbers with a section obtained by dividing the center coordinate interval by an integer q used as a unit, stores them in a drawing data memory by rearranging them for every layer number, outputs drawing data corresponding to the layer numbers to the DMD, and also shifts an address to a layer data memory memorizing correspondence between the mirror group and the drawing data.
摘要翻译：要解决的问题：通过在不增加拉伸加工的负荷的情况下添加小型电路结构来进行垂直于高清晰度的扫描方向的绘图坐标位置校正，并且以高生产量进行高质量图案形成。解决方案：照射装置通过相对于垂直于扫描方向的方向倾斜使扫描方向上的整个DMD移动而照射光束，使得m行和n列中的第一行和第一列的反射镜，其实际上用于在镜组中绘制，相对于在m面镜上的镜子，镜像组中心坐标间隔以p（1-1 / n）（p为整数）在扫描方向上移动，第一行和第一列。照射装置将分配给反射镜组的绘图数据分割为与q个层号相对应的数据，其中以通过将中心坐标间隔除以整数q而获得的部分作为单位，将它们重新排列在绘图数据存储器中，每个层号，将对应于层号的绘图数据输出到DMD，并且还将地址移动到存储镜像组和绘图数据之间的对应关系的层数据存储器。

6. 发明专利

JP2013065729A Exposure device, exposure method and method for manufacturing display panel substrate 审中-公开
标题翻译：曝光装置，曝光方法和制造显示板基板的方法
公开(公告)号：JP2013065729A
公开(公告)日：2013-04-11
申请号：JP2011203911
申请日：2011-09-19
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： HONDA HIDEYUKI , MOCHIZUKI MASAAKI
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To supply a large amount of drawing data to drive circuits of a spatial optical modulator at a high speed, and correct variations in exposure intensity due to distortion of optical components included in an irradiation optical system of a light beam irradiation device to improve drawing accuracy.SOLUTION: An exposure device divides drawing data for each of coordinates at equal intervals corresponding to a distance between centers of adjacent mirrors of a spatial optical modulator of a light beam irradiation device in a direction perpendicular to a scanning direction of a substrate by a light beam to store the divided data in a memory 72 collectively for each of the coordinates at equal intervals, and reads the drawing data from the memory 72 collectively for each of the coordinates at equal intervals in association with scanning of the substrate by the light beam, and corrects the coordinates of the drawing data read from the memory 72 according to distortion of optical components included in an irradiation optical system of the light beam irradiation device to supply the corrected drawing data to drive circuits (DMD drive circuits 27) of the light beam irradiation device.
摘要翻译：要解决的问题：为了高速地向空间光学调制器的驱动电路提供大量绘图数据，并且校正由于包含在光的照射光学系统中的光学部件的失真引起的曝光强度的变化光束照射装置，以提高绘图精度。解决方案：曝光装置以与基板的扫描方向垂直的方向上的光束照射装置的空间光学调制器的相邻反射镜的相邻反射镜的中心之间的距离相等的间隔划分每个坐标的绘图数据，一个光束，用于以等间隔将每个坐标统一地存储在存储器72中，并且以等间隔与每个坐标一起读取来自存储器72的绘制数据，与基板的扫描相关联并根据光束照射装置的照射光学系统中包含的光学部件的失真校正从存储器72读取的绘图数据的坐标，以将校正的绘图数据提供给驱动电路（DMD驱动电路27）光束照射装置。版权所有（C）2013，JPO＆INPIT

7. 发明专利

JP2013054262A Exposure apparatus, exposure method, and method of manufacturing panel substrate for display 审中-公开
标题翻译：曝光装置，曝光方法和制造用于显示的面板基板的方法
公开(公告)号：JP2013054262A
公开(公告)日：2013-03-21
申请号：JP2011193555
申请日：2011-09-06
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MOCHIZUKI MASAAKI
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To correct intensity distribution in a direction orthogonal to the scan direction of a light beam emitted from a light beam irradiation device, to suppress height difference of a pattern.SOLUTION: A substrate 1 is scanned by a light beam from a light beam irradiation device 20, to draw a pattern on the substrate 1. A drawing control unit 71 supplies drawing data for drawing a pattern and correction data for drawing a correction pattern to a drive circuit (DMD drive circuit 27) of the light beam irradiation device 20, so that the correction pattern where a position or a width in a direction orthogonal to the scan direction changes in the scan direction is drawn and superimposed over the drawn pattern in the scan direction.
摘要翻译：要解决的问题：为了校正与从光束照射装置发射的光束的扫描方向正交的方向上的强度分布，以抑制图案的高度差。解决方案：基板1被来自光束照射装置20的光束扫描，以在基板1上绘制图案。绘图控制单元71提供用于绘制图案的绘制数据和用于绘制校正的校正数据模式到光束照射装置20的驱动电路（DMD驱动电路27），使得在与扫描方向正交的方向上的位置或宽度在扫描方向上改变的校正图案被绘制并叠加在所绘制的图案在扫描方向。版权所有（C）2013，JPO＆INPIT

8. 发明专利

JP2013045029A Exposure apparatus and exposure method 审中-公开
标题翻译：曝光装置和曝光方法
公开(公告)号：JP2013045029A
公开(公告)日：2013-03-04
申请号：JP2011184270
申请日：2011-08-26
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： HIRANO KATSUNORI , TOBA TADANOBU , MOCHIZUKI MASAAKI , MAEDA YASUYUKI
IPC分类号： G03F7/20 , G02F1/13 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of converting vector data into raster data at high speed in real time.SOLUTION: The exposure apparatus includes: a vector data memory 1 for storing vector data deleted with duplicated data; sequence control means 4 for reading desired vector data information from vector data stored in the vector data memory 1 on the basis of a sequence control instruction; coordinate arithmetic means 5 for converting the vector data information read by the sequence control means 4 into raster data; and a driver 11 for performing exposure on the basis of the raster data converted by the coordinate arithmetic means 5.
摘要翻译：要解决的问题：提供能够实时地将矢量数据高速转换为光栅数据的曝光装置。解决方案：曝光装置包括：矢量数据存储器1，用于存储用重复数据删除的矢量数据; 序列控制装置4，用于根据序列控制指令从存储在矢量数据存储器1中的矢量数据中读出期望的矢量数据信息; 坐标运算装置5，用于将由顺序控制装置4读取的矢量数据信息转换成光栅数据; 以及用于基于由坐标运算装置5转换的光栅数据进行曝光的驱动器11.（C）2013，JPO＆INPIT

9. 发明专利

JP2012053296A Exposure device, exposure method and method of manufacturing display panel substrate 有权
标题翻译：曝光装置，曝光方法和制造显示板基板的方法
公开(公告)号：JP2012053296A
公开(公告)日：2012-03-15
申请号：JP2010196055
申请日：2010-09-01
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MOCHIZUKI MASAAKI
IPC分类号： G03F7/20 , G02F1/1335 , G02F1/1368 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To improve drawing accuracy by effectively suppressing stretching of a pattern drawn on a substrate in a scanning direction, without performing complicated processing to correct CAD data of the pattern.SOLUTION: A drawing control section (71) provides driving circuits (27) of a light beam radiating device with drawing data of a scanning range which is shorter than the length in the scanning direction of a pattern to be drawn in the scanning area. An operation circuit (85) determines from coordinate data memorized in a memory (82) a position to start radiation of a light beam to a substrate and a position to end the radiation. A correction circuit (87a) corrects the light beam radiation ending position determined by the operation circuit, to shorten the scanning range. A drawing data generation circuit (86) generates drawing data between the light beam radiation starting position determined by the operation circuit and the light beam radiation ending position corrected by the correction circuit.
摘要翻译：要解决的问题：通过有效地抑制在扫描方向上在基板上拉伸的图案的拉伸来提高拉伸精度，而不进行复杂的处理以校正图案的CAD数据。解决方案：绘图控制部分（71）提供光束辐射装置的驱动电路（27），其扫描范围的绘制数据短于在扫描中要绘制的图案的扫描方向上的长度区。操作电路（85）从存储在存储器（82）中的坐标数据确定开始将光束辐射到基板的位置和结束辐射的位置。校正电路（87a）校正由操作电路确定的光束辐射结束位置，以缩短扫描范围。绘图数据生成电路（86）在由运算电路决定的光束发射开始位置和由校正电路校正的光束辐射结束位置之间产生绘制数据。版权所有（C）2012，JPO＆INPIT

10. 发明专利

JP2011150053A Exposure apparatus, exposure method and method for manufacturing panel substrate for display 审中-公开
标题翻译：曝光装置，用于制造用于显示的面板基板的曝光方法和方法
公开(公告)号：JP2011150053A
公开(公告)日：2011-08-04
申请号：JP2010009801
申请日：2010-01-20
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MOCHIZUKI MASAAKI
IPC分类号： G03F7/20
摘要： PROBLEM TO BE SOLVED: To improve quality of drawing while rendering ruggedness in a pattern edge into less noticeable. SOLUTION: A spatial optical modulator 25 of a light beam irradiation device 20 comprises a plurality of mirrors arranged in two directions perpendicular to each other and is disposed as inclined with respect to the scanning direction on a substrate 1 with a light beam. A drawing control unit changes coordinates of drawing data in accordance with the inclination of the spatial optical modulator 25 of the light beam irradiation device 20. An edge correcting circuit irregularly changes positions for changing coordinates of the drawing data to irregularly change edges of a pattern to be drawn on a substrate 1. Compared with a process of regularly changing edges of a pattern in a stepwise manner, ruggedness in a pattern edge is less noticeable. The method requires no process of newly creating a drawing data for correcting a pattern edge, but allows real-time pattern edge correction. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提高绘图质量，同时使图案边缘的粗糙度变得不太明显。解决方案：光束照射装置20的空间光学调制器25包括布置在彼此垂直的两个方向上的多个反射镜，并且相对于扫描方向倾斜地设置在具有光束的基板1上。绘图控制单元根据光束照射装置20的空间光学调制器25的倾斜度改变绘制数据的坐标。边缘校正电路不规则地改变用于改变绘制数据的坐标的位置，以将图案的边缘不规则地改变为被绘制在基板1上。与以逐步方式定期改变图案的边缘的过程相比，图案边缘的粗糙度不太明显。该方法不需要新创建用于校正图案边缘的绘图数据的处理，而是允许实时图案边缘校正。版权所有（C）2011，JPO＆INPIT

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