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1. 发明专利

JP2013076858A Optical element and shape inspecting apparatus 审中-公开
标题翻译：光学元件和形状检查装置
公开(公告)号：JP2013076858A
公开(公告)日：2013-04-25
申请号：JP2011216851
申请日：2011-09-30
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： DOI HIDEAKI , SASAZAWA HIDEAKI , YOSHITAKE YASUHIRO , SASAKI HIROSHI
IPC分类号： G02B3/14 , G02B26/00
摘要： PROBLEM TO BE SOLVED: To improve performance of an optical element.SOLUTION: An optical element 1 has a container 2 having a space 8 formed therein. The container 2 is provided with a light transmissive film member 3, which partitions the space 8 inside of the container 2 into a first space 9 and a second space 10. The first space 9 is filled with a first medium 5. The second space 10 is filled with a second medium 6 having a refractive index different from that of the first medium 5. Furthermore, the optical element 1 has a differential pressure generating unit 7 that generates differential pressure between the first space 9 and the second space 10. A focal point distance of the light that passes through the film member 3 can be changed by warping the film member 3 by means of the differential pressure generated by the differential pressure generating unit 7.
摘要翻译：要解决的问题：提高光学元件的性能。解决方案：光学元件1具有形成在其中的空间8的容器2。容器2设置有透光膜构件3，其将容器2内的空间8分隔成第一空间9和第二空间10.第一空间9填充有第一介质5.第二空间10 填充有具有与第一介质5的折射率不同的折射率的第二介质6.此外，光学元件1具有在第一空间9和第二空间10之间产生压差的压差产生单元7.焦点通过薄膜构件3的光的距离可以通过由差压生成单元7产生的压差使膜构件3翘曲来改变。（C）2013，JPO和INPIT

2. 发明专利

JP2011026625A Film deposition apparatus and film deposition method 有权
标题翻译：膜沉积装置和膜沉积方法
公开(公告)号：JP2011026625A
公开(公告)日：2011-02-10
申请号：JP2009170097
申请日：2009-07-21
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MATSUURA HIROYASU , DOI HIDEAKI , KATO NOBORU , NIRASAWA NOBUHIRO
IPC分类号： C23C14/00 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a film deposition apparatus and a film deposition method capable of breaking the vacuum, reducing the cleaning frequency of a nozzle and a peripheral thereof, and achieving the film deposition of the high operation rate or the uniform film deposition.
SOLUTION: The film deposition apparatus has a vacuum vapor deposition chamber provided with an evaporation source moving means which evaporates (sublimes) an evaporation material provided inside the evaporation source, jets the evaporation material vapor from a plurality of nozzles and deposits the vapor on a substrate and moves the evaporation source. The vacuum vapor deposition chamber has a nozzle cleaning means provided with a cleaning unit for removing the deposited evaporation material on the nozzle or in a vicinity of the nozzle.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了提供能够破坏真空的成膜装置和成膜方法，降低了喷嘴及其周边的清洗频率，并且实现了高操作速率或均匀的膜沉积薄膜沉积解决方案：该成膜装置具有真空蒸镀室，该真空蒸镀室设置有蒸发（升华）设置在蒸发源内部的蒸发材料的蒸发源移动装置，从多个喷嘴射出蒸发材料蒸气并沉积蒸气在基板上并移动蒸发源。真空气相沉积室具有喷嘴清洁装置，其具有用于去除喷嘴上或喷嘴附近的沉积蒸发材料的清洁单元。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2011017065A Film deposition system, evaporation source device therefor and evaporation source container therefor 有权
标题翻译：薄膜沉积系统，其蒸发源装置及其蒸发源容器
公开(公告)号：JP2011017065A
公开(公告)日：2011-01-27
申请号：JP2009163894
申请日：2009-07-10
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MATSUURA HIROYASU , DOI HIDEAKI , KATO NOBORU , NIRASAWA NOBUHIRO
IPC分类号： C23C14/24 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a film deposition system where an EL material can be efficiently vaporized and evaporated, and can be fed in high quality and also at a high rate, to provide an evaporation source device therefor, and further, to provide an evaporation source container therefor.SOLUTION: The evaporation source device 20 used in a film deposition system where the surface of the substrate to be vapor-deposited is coated with a vapor deposition material in a vacuum is provided with a heater at the outside thereof, and is further provided with a heater case 210 forming a space at the inside and laminating a plurality of evaporation source containers 220 in a vertical direction so as to be stored. Each evaporation source container 220 is provided with: a container 221 made of a high thermal conduction material which is formed so as to have an almost U-shape in a cross section and formed so as to surround a through-hole 222 for gas discharge almost at the central part; a cover body made of a high thermal conduction material which covers the upper face opening of the container; and a gas gap part introducing the gas of a vapor deposition material generated at the inside of the container into the through-hole for gas discharge from a gap and collecting the gas to a guide part 212 provided at the upper part of the heater case 210 so as to be fed to the surface of the substrate to be vapor-deposited via jet holes 213.
摘要翻译：要解决的问题：为了提供能够有效地蒸发和蒸发EL材料的薄膜沉积系统，并且可以以高质量和高速率进料，以提供其蒸发源装置，并且还提供一种蒸发源容器。其中，在蒸镀系统中使用的蒸镀源装置20，其中蒸镀基板的表面在真空中涂敷蒸镀材料，在其外侧设置有加热器，还设置有在内部形成空间的加热器壳体210，并且沿垂直方向层叠多个蒸发源容器220以便被存储。每个蒸发源容器220设置有：由导热材料制成的容器221，其形成为具有大致U形截面并且形成为围绕用于气体放电的通孔222 在中部; 由覆盖容器的上表面开口的高导热材料制成的盖体; 以及气体部分，其将在容器内部产生的气相沉积材料的气体从间隙引入到用于气体排出的通孔中，并将气体收集到设置在加热器壳体210的上部的引导部212 以便通过喷射孔213被供给到待气相沉积的基板的表面上。

4. 发明专利

JP2013076806A Optical element and method of manufacturing the same 审中-公开
标题翻译：光学元件及其制造方法
公开(公告)号：JP2013076806A
公开(公告)日：2013-04-25
申请号：JP2011216063
申请日：2011-09-30
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： DOI HIDEAKI , SASAZAWA HIDEAKI , YOSHITAKE YASUHIRO , SASAKI HIROSHI
IPC分类号： G02B3/14
摘要： PROBLEM TO BE SOLVED: To improve performance of an optical element.SOLUTION: An optical element 1 has a container 2 having a space 8 formed therein. The container 2 is provided with a light transmissive film member 3, which partitions the space 8 inside of the container 2 into a first space 9 and a second space 10. The first space 9 is filled with a first medium 5. The second space 10 is filled with a second medium 6 having a refractive index different from that of the first medium 5. Furthermore, the optical element 1 has a differential pressure generating unit 7 that generates differential pressure between the first space 9 and the second space 10. A focal point distance of the light that passes through the film member 3 can be changed by warping the film member 3 by means of the differential pressure generated by the differential pressure generating unit 7. In addition, the elastic modulus of the film member 3 is distributed to form concentric circles with the center at the optical axis OA of the light that passes through the film member 3.
摘要翻译：要解决的问题：提高光学元件的性能。解决方案：光学元件1具有形成在其中的空间8的容器2。容器2设置有透光膜构件3，其将容器2内的空间8分隔成第一空间9和第二空间10.第一空间9填充有第一介质5.第二空间10 填充有具有与第一介质5的折射率不同的折射率的第二介质6.此外，光学元件1具有在第一空间9和第二空间10之间产生压差的压差产生单元7.焦点通过膜构件3的光的点距离可以通过由差压产生单元7产生的压差使膜构件3翘曲来改变。此外，膜构件3的弹性模量分布到在通过膜构件3的光的光轴OA处形成与中心的同心圆。（C）2013，JPO和INPIT

5. 发明专利

JP2011158718A Exposure apparatus, exposure method and method for manufacturing panel substrate for display 审中-公开
标题翻译：曝光装置，用于制造用于显示的面板基板的曝光方法和方法
公开(公告)号：JP2011158718A
公开(公告)日：2011-08-18
申请号：JP2010020476
申请日：2010-02-01
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： EBISAWA KEIICHI , MOCHIZUKI MASAAKI , YAMAMOTO KENJI , MURAKOSHI SHIGEYOSHI , DOI HIDEAKI , SAITO YOSHIHIRO
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To expose a substrate to transfer a new pattern on a base pattern preliminarily formed on the substrate, in such a manner that the new pattern is transferred by exposure as aligned to the base pattern over the whole substrate even if distortion of the base pattern differs depending on a position within the substrate.
SOLUTION: The surface of a substrate 1 where a base pattern is formed and a photoresist is applied on the base pattern is divided into a plurality of segments; distortion of the base pattern is detected in each divided segment; and a drawing data is corrected in accordance with the distortion of the base pattern in each divided segment based on the detection results. The substrate 1 is mounted on a chuck 10; the chuck 10 and a light beam irradiation device 20 are relatively moved; and the substrate 1 is scanned with a light beam from the light beam irradiation device 20 to draw a pattern on the substrate 1. The light beam irradiation device 20 includes a spatial optical modulator modulating a light beam, a drive circuit driving the spatial optical modulator based on a drawing data, and an irradiation optical system for projecting the light beam modulated by the spatial optical modulator.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了使基板露出，将新图案转印到预先形成在基板上的基底图案上，使得新图案通过曝光转印到整个基板上的基底图案上，甚至如果基底图案的变形根据衬底内的位置而不同。解决方案：将形成基底图案的基板1的表面和在基底图案上施加光致抗蚀剂的表面分成多个段; 在每个分割段中检测到基本图案的失真; 并且根据检测结果，根据每个分割段中的基本图案的失真来校正绘图数据。基板1安装在卡盘10上; 卡盘10和光束照射装置20相对移动; 并且用来自光束照射装置20的光束对衬底1进行扫描，以在衬底1上绘制图案。光束照射装置20包括调制光束的空间光学调制器，驱动空间光学调制器的驱动电路基于绘图数据，以及照射光学系统，用于投射由空间光学调制器调制的光束。版权所有（C）2011，JPO＆INPIT

6. 发明专利

JP2011134932A Light source unit, exposure light irradiating device, exposure device, method of manufacturing display panel substrate, device and method of inspecting semiconductor light emitting element section 审中-公开
标题翻译：光源单元，暴露光照射装置，曝光装置，制造显示面板基板的方法，装置和检查半导体发光元件部分的方法
公开(公告)号：JP2011134932A
公开(公告)日：2011-07-07
申请号：JP2009293952
申请日：2009-12-25
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： TEZUKA HIDEKAZU , DOI HIDEAKI , NEMOTO RYOJI , YOSHITAKE YASUHIRO , ISHIDA SUSUMU
IPC分类号： H01L21/027 , H01L33/58
CPC分类号： H01L2224/73253
摘要： PROBLEM TO BE SOLVED: To provide a light source unit or an irradiating-light irradiation device which can obtain easy and safe alignment between semiconductor light emitting elements and lenses even if a plurality of, or specifically hundreds to thousands or more of semiconductor light emitting elements are used to form exposure light, an exposure device which can obtain efficient or accurate light exposure using the unit or device, or a device or method of efficiently or safely inspecting an emitting light source having many semiconductor light emitting elements.
SOLUTION: In the light source unit having a plurality of semiconductor light emitting elements and lenses for receiving light emitted from the semiconductor light emitting elements and outputting light, the exposure light irradiating device or the exposure device, the semiconductor light emitting elements are provided to be associated with the lenses, the lens unit has a means for fixing the lenses in such a manner that adjacent ones of the lenses are contacted.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种能够在半导体发光元件和透镜之间获得容易且安全的对准的光源单元或照射光照射装置，即使多个或具体地数百到数千个或更多个半导体使用发光元件来形成曝光光，可以使用该单元或装置获得有效或准确的曝光的曝光装置，或有效或安全地检查具有许多半导体发光元件的发光光源的装置或方法。解决方案：在具有多个半导体发光元件的光源单元和用于接收从半导体发光元件发射的光并输出光的透镜中，曝光光照射装置或曝光装置，半导体发光元件是被设置为与透镜相关联，透镜单元具有用于以相邻的透镜接触的方式固定透镜的装置。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2010256428A Exposure device, exposure light-irradiating method, and method for manufacturing panel substrate for display 有权
标题翻译：曝光装置，曝光光照射方法以及用于制造用于显示的面板基板的方法
公开(公告)号：JP2010256428A
公开(公告)日：2010-11-11
申请号：JP2009103292
申请日：2009-04-21
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： TEZUKA HIDEKAZU , NEMOTO RYOJI , DOI HIDEAKI , SAITO YOSHIHIRO
IPC分类号： G03F7/20 , G02F1/1335 , G02F1/1368 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To efficiently cool a plurality of semiconductor light-emitting elements when exposure light is formed, by using the plurality of semiconductor light-emitting elements. SOLUTION: Exposure light-forming light is generated from the plurality of semiconductor light-emitting elements 42, and the light generated from the plurality of semiconductor light-emitting elements 42 is expanded and condensed to form the exposure light. The number of the light-emitting elements which emit lights among the plurality of semiconductor light-emitting elements 42, is altered to adjust the illuminance of the exposure light, while the plurality of semiconductor light-emitting elements 42 are cooled; and the semiconductor light-emitting elements which stop light emission are altered, as time elapses. Alternatively, some or all of the plurality of semiconductor light-emitting elements 42 are made to intermittently emit lights, to adjust the illuminance of the exposure light, while cooling the plurality of semiconductor light-emitting elements 42, and some of the semiconductor light-emitting elements, which intermittently emit light, are made to emit light in timing which is different from timing at which other semiconductor light-emitting elements intermittently emit light. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：通过使用多个半导体发光元件，在形成曝光光时有效地冷却多个半导体发光元件。解决方案：从多个半导体发光元件42产生曝光成型光，并且从多个半导体发光元件42产生的光被膨胀和冷凝以形成曝光光。改变多个半导体发光元件42中发光的发光元件的数量，以便在多个半导体发光元件42被冷却的同时调节曝光光的照度; 随着时间的推移，停止发光的半导体发光元件被改变。或者，使多个半导体发光元件42中的一些或全部间歇地发光，同时在冷却多个半导体发光元件42的同时调节曝光光的照度，间歇地发光的发光元件在与其他半导体发光元件间歇地发光的时刻不同的定时进行发光。版权所有（C）2011，JPO＆INPIT

8. 发明专利

JP2013209700A Vacuum vapor deposition apparatus and vacuum vapor deposition method 审中-公开
标题翻译：真空蒸发沉积装置和真空蒸发沉积方法
公开(公告)号：JP2013209700A
公开(公告)日：2013-10-10
申请号：JP2012079805
申请日：2012-03-30
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： ISHII HARUYUKI , DOI HIDEAKI , MATSUURA HIROYASU , MATSUMOTO FUSASHIGE
IPC分类号： C23C14/04 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a vacuum vapor deposition apparatus by which the substrate failure is reduced or reliability of substrate is enhanced by measuring the amount of deformation of a vapor deposition mask when the vapor deposition mask is replaced, and feed backing to alignment amount, and to provide a vacuum vapor deposition method.SOLUTION: In a vacuum vapor deposition apparatus or a vacuum vapor deposition method for aligning a vapor deposition mask and a substrate and vapor depositing a light emitting material on the substrate through the vapor deposition mask, a specific position before and after the replacement of the vapor deposition mask is imaged, then a difference between deformation amounts of the mask before cleaning and after cleaning is calculated based on the imaged results, and the alignment amount of the alignment is corrected based on the difference between the deformation amounts of the mask.
摘要翻译：要解决的问题：提供一种真空蒸镀装置，通过在更换蒸镀掩模时，通过测量蒸镀掩模的变形量来提高基板故障，提高基板的可靠性，并提供真空气相沉积方法。解决方案：在用于对准气相沉积掩模和基板的真空气相沉积设备或真空气相沉积方法中，并通过气相沉积掩模在基板上气相沉积发光材料，对蒸镀掩模更换前后的具体位置成像，然后基于成像结果计算清洁前和清洁后的掩模的变形量之间的差异，并且基于差异校正对准的对准量在掩模的变形量之间。

9. 发明专利

JP2011237596A Exposure apparatus, exposure method, and manufacturing method of display panel substrate 审中-公开
标题翻译：曝光装置，曝光方法和显示板基板的制造方法
公开(公告)号：JP2011237596A
公开(公告)日：2011-11-24
申请号：JP2010108843
申请日：2010-05-10
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SAITO YOSHIHIRO , TEZUKA HIDEKAZU , DOI HIDEAKI , MOCHIZUKI MASAAKI , KOTAKE HIDEO , YAMAMOTO KENJI
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an exposure apparatus and an exposure method that suppress the change of exposure light intensity and uniformly perform pattern exposure while extending the lives of semiconductor light-emitting elements and also reducing power consumption when a substrate is exposed by exposure light generated from multiple semiconductor light-emitting elements.SOLUTION: When the exposure of a substrate is not performed, a light source controller 50 turns off each of semiconductor light-emitting elements 82 without supplying driving current to the multiple semiconductor light-emitting elements 82 of a light source 80. When the exposure of the substrate is performed, the light source controller 50 turns on each of the semiconductor light-emitting elements 82 with supplying driving current to the multiple semiconductor light-emitting elements 82 of the light source 80. The light source controller 50 detects change in the amount of light due to the temperature change of the multiple semiconductor light-emitting elements 82 of the light source 80, and increases or decreases the driving current supplied to the multiple semiconductor light-emitting elements 82 of the light source 80 so as to compensate the change in the detected amount of light.
摘要翻译：要解决的问题：提供一种曝光装置和曝光方法，其抑制曝光光强度的变化并均匀地进行图案曝光，同时延长半导体发光元件的寿命并且还降低基板暴露时的功耗通过从多个半导体发光元件产生的曝光光。解决方案：当不执行基板的曝光时，光源控制器50关闭每个半导体发光元件82，而不向光源80的多个半导体发光元件82提供驱动电流。当执行基板的曝光，光源控制器50通过向光源80的多个半导体发光元件82提供驱动电流来接通每个半导体发光元件82.光源控制器50检测变化由于光源80的多个半导体发光元件82的温度变化导致的光量增加或减少供给到光源80的多个半导体发光元件82的驱动电流，从而补偿检测到的光量的变化。版权所有（C）2012，JPO＆INPIT

10. 发明专利

JP2011124391A Operation processing device or method for inspecting sticking state of acf, or line or method for assembling display substrate module 审中-公开
标题翻译：操作处理装置或检测ACF遮挡状态的方法，或用于组装显示基板模块的线或方法
公开(公告)号：JP2011124391A
公开(公告)日：2011-06-23
申请号：JP2009280944
申请日：2009-12-10
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： EBISAWA KEIICHI , TAMAMOTO JUNICHI , AKIBA YUJI , HISA TAKAFUMI , TAKEDA MASAOMI , KATAHO HIDEAKI , DOI HIDEAKI , SAITO YOSHIHIRO
IPC分类号： H05K13/08 , G02F1/13 , G02F1/1345 , H01L21/60
摘要： PROBLEM TO BE SOLVED: To provide a processing operation device or a method for inspecting a sticking state of an ACF, capable of reducing the total operation time of a processing operation for sticking the ACF and an inspection operation of the sticking state of the ACF, or capable of reducing a processing operation device length required for sticking the ACF, or to provide a line and method for assembling a display substrate module, capable of reducing a cycle time for assembling the display substrate module or achieving reduced line length. SOLUTION: When an ACF 3 stuck on a predetermined position of a side of a display substrate P conveyed by a conveyance unit is imaged to inspect a sticking state of an ACF, the display substrate P is imaged during conveyance after sticking the ACF 3, fluctuation in an ACF image obtained by imaging during the conveyance is corrected, and an imaging unit images an imaging region SH including the ACF 3 stuck on the predetermined position. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于检查ACF的粘附状态的处理操作装置或方法，其能够减少用于粘贴ACF的处理操作的总操作时间和对于ACF的粘附状态的检查操作 ACF，或者能够缩短粘附ACF所需的加工操作装置的长度，或提供组装显示基板模块的线路和方法，能够缩短组装显示基板模块的周期时间或实现缩短的线路长度。解决方案：当卡在由传送单元传送的显示基板P的一侧的预定位置上的ACF 3成像以检查ACF的粘附状态时，在粘贴ACF之后的传送期间对显示基板P进行成像如图3所示，校正了在传送期间通过成像获得的ACF图像的波动，并且成像单元对包括卡在预定位置上的ACF 3的成像区域SH进行成像。版权所有（C）2011，JPO＆INPIT

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