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    • 4. 发明公开
    • Electrical power supply, fusing apparatus and recording apparatus using the same
    • Elektrische Stromversorgung,WärmefixiergerätundAufzeichnungsgeräthierfür。
    • EP0355698A2
    • 1990-02-28
    • EP89115119.3
    • 1989-08-16
    • HITACHI, LTD.HITACHI KOKI CO., LTD.
    • Mitsuya, TeruakiHori, YasuroKumasaka, TakaoNishino, ShinichiFujiwara, Shigetaka
    • G03G15/20H02M7/19
    • H02M7/19G03G15/201
    • Disclosed is an electrical power supply (18) for use, for example, for a flush fusing device in an electrophotographic recording apparatus, in which a DC high voltage is generated from a low voltage of a AC power supply (11) so that the high voltage DC energy is momentarily consumed or discharged. The electrical power supply (18) is configured in a manner so that, in order to make unnecessary a charging capacitor and a current limiting resistor for preventing rectifier elements from being damaged, at least a part of the rectifier elements are constituted by rectifying control elements such as thyristors or transistors (5, 6) and a control signal is given to those rectifying control elements so as to make the rectifying control elements be in an isolated state. By use of such a configura­tion, the electrical power supply (18) can be reduced in size as well as in power loss. The effect can be fully exhibited not only in a fusing apparatus employing the electrical power supply but in a recording apparatus employing such a fusing apparatus.
    • 公开了一种电源(18),其用于例如电子照相记录装置中的冲洗定影装置,其中从AC电源(11)的低电压产生DC高电压,使得高电平 电压直流能量瞬间消耗或放电。 电源(18)的配置方式是为了不使用充电电容器和限流电阻器来防止整流元件的损坏,整流元件的至少一部分由整流控制元件 例如晶闸管或晶体管(5,6),并且向整流控制元件提供控制信号,以使整流控制元件处于隔离状态。 通过使用这种结构,可以减小电力供应(18)的大小以及功率损耗。 该效果不仅可以在使用电力供应的熔接装置中,而且在使用这种定影装置的记录装置中充分发挥。
    • 7. 发明公开
    • Apparatus for processing gas by electron beam
    • Vorrichtung zur Behandlung von Gasen durch Elektronenstrahlung
    • EP0856349A3
    • 2002-05-08
    • EP97122794.7
    • 1997-12-23
    • Hitachi, Ltd.
    • Seki, HirofumiShirakata, HirofumiHori, YasuroShiono, Shigeo
    • B01D53/32H01J33/02H01J37/301H01J37/30
    • B01D53/323B01D2259/812Y10S422/90
    • The interior of a single vacuum vessel (14) is maintained at vacuum by means of a vacuum pump (16), first and second lenses (52, 54) are disposed in the vacuum vessel (14), an electron beam (64) emitted from an electron source (10) is focused by each of the lenses (52, 54), and the electron beam (64) is irradiated onto a processing gas (66) in a duct (18). When the current value of the electron beam is increased as the concentration of NOx in the processing gas increases, the focal distance is decreased by increasing the intensity of magnetic fields or the intensity of electric fields of the lenses (52, 54) in accordance with the current value of a filament (32), the current value of an arc power supply (36) and the gas pressure in a gas reservoir (20), the lens (52) is moved toward a draw-out electrode (44) and the lens (54) is moved toward the duct (18), so that a parallel electron beam of constant diameter is formed and the electron beam can be prevented from being increased in focusing diameter.
    • 单个真空容器(14)的内部通过真空泵(16)保持在真空状态,第一和第二透镜(52,54)设置在真空容器(14)中,发射电子束(64) 从电子源(10)通过每个透镜(52,54)聚焦,并且电子束(64)被照射到管道(18)中的处理气体(66)上。 当电子束的电流值随着处理气体中的NOx浓度的增加而增加时,通过根据磁场强度增加磁场的强度或透镜的电场强度来减小焦距 灯丝(32)的当前值,电弧电源(36)的当前值和气体贮存器(20)中的气体压力,透镜(52)朝向抽出电极(44)移动,并且 透镜(54)朝向管道(18)移动,使得形成恒定直径的平行电子束,并且可以防止电子束在聚焦直径上增加。