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1. 发明申请

US20120062861A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20120062861A1
公开(公告)日：2012-03-15
申请号：US13299891
申请日：2011-11-18
申请人： Hiroyuki NAGASAKA , Kenichi SHIRAISHI , Tomoharu FUJIWARA , Soichi OWA , Akihiro MIWA
发明人： Hiroyuki NAGASAKA , Kenichi SHIRAISHI , Tomoharu FUJIWARA , Soichi OWA , Akihiro MIWA
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70858 , G03F7/70891
摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.
摘要翻译：曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

2. 发明申请

US20120274915A1 EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光方法，曝光装置和装置制造方法
公开(公告)号：US20120274915A1
公开(公告)日：2012-11-01
申请号：US13541570
申请日：2012-07-03
申请人： Kenichi SHIRAISHI , Tomoharu FUJIWARA
发明人： Kenichi SHIRAISHI , Tomoharu FUJIWARA
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/2041
摘要： An exposure method comprises: forming an immersion region on a substrate; exposing the substrate by irradiating the substrate with an exposure light via a liquid of the immersion region; and preventing an integration value of a contact time during which the liquid of the immersion region and a first region on the substrate are in contact, from exceeding a predetermined tolerance value.
摘要翻译：曝光方法包括：在基板上形成浸渍区域; 通过用浸渍区域的液体用曝光光照射基板来曝光基板; 并且防止浸没区域的液体和基板上的第一区域接触的接触时间的积分值超过预定的公差值。

3. 发明申请

US20080239260A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20080239260A1
公开(公告)日：2008-10-02
申请号：US12134950
申请日：2008-06-06
申请人： Kenichi SHIRAISHI
发明人： Kenichi SHIRAISHI
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03B27/42 , G03F7/70341 , G03F7/70916
摘要： There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR2), is provided with a measuring device (60) which measures at least one of a property and composition of the liquid (LQ) for forming the liquid immersion area (AR2).
摘要翻译：提供一种能够精确地进行基于液浸法的曝光处理和测量处理的曝光装置。在投影光学系统（PL）的图像表面侧上形成液体（LQ）的液浸区域（AR 2）的曝光装置（EX），并经由投影光学系统（ PL）和浸渍区域（AR 2）的液体（LQ），设置有测量装置（60），其测量用于形成液浸区域（AR）的液体（LQ）的性质和成分中的至少一个 2）。

4. 发明申请

US20070242247A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20070242247A1
公开(公告)日：2007-10-18
申请号：US11767441
申请日：2007-06-22
申请人： Kenichi SHIRAISHI
发明人： Kenichi SHIRAISHI
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03B27/42 , G03F7/70341 , G03F7/70916
摘要： There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR2), is provided with a measuring device (60) which measures at least one of a property and composition of the liquid (LQ) for forming the liquid immersion area (AR2).
摘要翻译：提供一种能够精确地进行基于液浸法的曝光处理和测量处理的曝光装置。在投影光学系统（PL）的图像表面侧上形成液体（LQ）的液浸区域（AR 2）的曝光装置（EX），并经由投影光学系统（ PL）和浸渍区域（AR 2）的液体（LQ），设置有测量装置（60），其测量用于形成液浸区域（AR）的液体（LQ）的性质和成分中的至少一个 2）。

5. 发明申请

US20120062858A1 CLEANING METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING SYSTEM 审中-公开
标题翻译：清洁方法，装置制造方法，曝光装置和装置制造系统
公开(公告)号：US20120062858A1
公开(公告)日：2012-03-15
申请号：US13078544
申请日：2011-04-01
申请人： Ryo TANAKA , Suguru KANAI , Kenichi SHIRAISHI , Shunji WATANABE , Takashi SHIBUYA
发明人： Ryo TANAKA , Suguru KANAI , Kenichi SHIRAISHI , Shunji WATANABE , Takashi SHIBUYA
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70925
摘要： A cleaning method comprises: cleaning the liquid contact member by supplying a first liquid for cleaning to the liquid contact member; recovering the first liquid supplied to the liquid contact member; supplying a second liquid different from the first liquid to the liquid contact member after the liquid contact member is cleaned with the first liquid; recovering the second liquid supplied to the liquid contact member; and performing a process in which a concentration of the first liquid comprised in the recovered second liquid is set to a predetermined concentration or less.
摘要翻译：清洗方法包括：通过向液体接触构件提供用于清洁的第一液体来清洁液体接触构件; 回收供应到液体接触构件的第一液体; 在用第一液体清洗液体接触构件之后，将与第一液体不同的第二液体供应到液体接触构件; 回收供应到液体接触构件的第二液体; 并且执行将回收的第二液体中包含的第一液体的浓度设定为规定浓度以下的处理。

6. 发明申请

US20120057139A1 Cleaning method, device manufacturing method, cleaning substrate, liquid immersion member, liquid immersion exposure apparatus, and dummy substrate 审中-公开
标题翻译：清洗方法，装置制造方法，清洗基板，浸液部件，浸液曝光装置和虚设基板
公开(公告)号：US20120057139A1
公开(公告)日：2012-03-08
申请号：US13196439
申请日：2011-08-02
申请人： Akikazu TANIMOTO , Yutaka IKEDA , Kenichi SHIRAISHI , Ryo TANAKA , Shunji WATANABE
发明人： Akikazu TANIMOTO , Yutaka IKEDA , Kenichi SHIRAISHI , Ryo TANAKA , Shunji WATANABE
IPC分类号： G03B27/58 , B08B1/00 , B08B3/04
CPC分类号： G03F7/70341 , G03F7/70925
摘要： A cleaning substrate and a liquid immersion member face each other in order to clean the liquid immersion member. The cleaning substrate has a first liquid-repellent portion which is liquid-repellent to a first cleaning liquid for cleaning and a lyophilic portion which is disposed in at least a part of the periphery of the first liquid-repellent portion and is more lyophilic than the first liquid-repellent portion.
摘要翻译：为了清洗液浸部件，清洗基板和液浸部件彼此面对。清洁基板具有第一液体排斥部分，其对于用于清洁的第一清洗液体是疏液性的，并且亲液部分设置在第一疏液部分的至少一部分周边上，并且比第第一液体排斥部分。

7. 发明申请

US20130057837A1 EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE-MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM 审中-公开
标题翻译：曝光装置，曝光方法，装置制造方法，程序和记录介质
公开(公告)号：US20130057837A1
公开(公告)日：2013-03-07
申请号：US13432717
申请日：2012-03-28
申请人： Go ICHINOSE , Junichi CHONAN , Yuichi SHIBAZAKI , Kenichi SHIRAISHI , Makoto Tokoro
发明人： Go ICHINOSE , Junichi CHONAN , Yuichi SHIBAZAKI , Kenichi SHIRAISHI , Makoto Tokoro
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An exposure apparatus capable of suppressing the occurrence of exposure defects is provided. The exposure apparatus exposes a substrate with exposure light via a liquid. The exposure apparatus includes an optical member having an emission surface from which exposure light is emitted; a substrate holding apparatus including a first holding portion that releasably holds the lower surface of the substrate, a first surface that defines an aperture in which the substrate can be disposed and that is disposed around the upper surface of the substrate in a state where the substrate is held on the first holding portion, and a first space portion that is in communication with a gap between the upper surface of the substrate and the first surface; a drive apparatus that moves the substrate holding apparatus in a state where an immersion space is formed with the liquid between the optical member and at least one of the upper surface of the substrate and the first surface; a suction port through which fluid in the first space portion is suctioned; and a control apparatus that sets a suction force of the suction port in at least a part of a first period in which exposure of the substrate is executed so as to be smaller than a suction force of the suction port in a second period in which exposure of the substrate is not executed.
摘要翻译：提供能够抑制曝光缺陷的发生的曝光装置。曝光装置通过液体曝光具有曝光光的基板。曝光装置包括具有发射曝光光的发射面的光学部件; 基板保持装置，包括：可释放地保持基板的下表面的第一保持部;限定基板可以设置的孔的第一表面，并且在基板的上表面设置在基板的上表面的状态被保持在第一保持部分上，第一空间部分与衬底的上表面和第一表面之间的间隙连通; 驱动装置，其使所述基板保持装置在所述光学部件与所述基板的上表面和所述第一表面中的至少一个之间的液体形成有浸渍空间的状态下移动; 抽吸口，第一空间部分中的流体被吸入口; 以及控制装置，其将吸入口的吸引力设定在第一期间的至少一部分中，在该第一期间中，进行基板的曝光，使其小于吸入口的抽吸力，该第二期间为曝光的基板不被执行。

8. 发明申请

US20120120381A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
标题翻译：曝光装置，曝光方法和生产装置的方法
公开(公告)号：US20120120381A1
公开(公告)日：2012-05-17
申请号：US13354899
申请日：2012-01-20
申请人： Masahiko YASUDA , Takahiro MASADA , Yuho KANAYA , Tadashi NAGAYAMA , Kenichi SHIRAISHI
发明人： Masahiko YASUDA , Takahiro MASADA , Yuho KANAYA , Tadashi NAGAYAMA , Kenichi SHIRAISHI
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03F7/70141 , G03F7/70716 , G03F9/7088
摘要： A liquid immersion exposure apparatus includes a projection system having a last optical element, the projection system projecting a beam onto a substrate through an immersion liquid; a movable stage having a holder by which the substrate is held; a measurement member provided on the movable stage, the measurement member having a measurement portion covered with a light-transmissive material; a first alignment system by which an alignment mark is detected not through the immersion liquid; and a second alignment system which optically obtains, using the measurement member, first positional information of the beam projected by the projection system through the immersion liquid. In order to obtain the first positional information, the movable stage is moved so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.
摘要翻译：液浸曝光装置包括具有最后光学元件的投影系统，投影系统通过浸没液体将光束投射到基板上; 可动台，具有保持基板的保持架; 测量构件，设置在所述可移动台上，所述测量构件具有覆盖有透光材料的测量部分; 第一对准系统，通过该第一对准系统不通过浸没液体检测对准标记; 以及第二对准系统，其使用所述测量构件，通过所述浸没液体，光学地获得由所述投影系统投影的所述光束的第一位置信息。为了获得第一位置信息，移动台被移动，使得测量构件在投影系统下方，并且投影系统和测量构件之间的间隙被浸没液体填充。

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