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1. 发明申请

US20130057837A1 EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE-MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM 审中-公开
标题翻译：曝光装置，曝光方法，装置制造方法，程序和记录介质
公开(公告)号：US20130057837A1
公开(公告)日：2013-03-07
申请号：US13432717
申请日：2012-03-28
申请人： Go ICHINOSE , Junichi CHONAN , Yuichi SHIBAZAKI , Kenichi SHIRAISHI , Makoto Tokoro
发明人： Go ICHINOSE , Junichi CHONAN , Yuichi SHIBAZAKI , Kenichi SHIRAISHI , Makoto Tokoro
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An exposure apparatus capable of suppressing the occurrence of exposure defects is provided. The exposure apparatus exposes a substrate with exposure light via a liquid. The exposure apparatus includes an optical member having an emission surface from which exposure light is emitted; a substrate holding apparatus including a first holding portion that releasably holds the lower surface of the substrate, a first surface that defines an aperture in which the substrate can be disposed and that is disposed around the upper surface of the substrate in a state where the substrate is held on the first holding portion, and a first space portion that is in communication with a gap between the upper surface of the substrate and the first surface; a drive apparatus that moves the substrate holding apparatus in a state where an immersion space is formed with the liquid between the optical member and at least one of the upper surface of the substrate and the first surface; a suction port through which fluid in the first space portion is suctioned; and a control apparatus that sets a suction force of the suction port in at least a part of a first period in which exposure of the substrate is executed so as to be smaller than a suction force of the suction port in a second period in which exposure of the substrate is not executed.
摘要翻译：提供能够抑制曝光缺陷的发生的曝光装置。曝光装置通过液体曝光具有曝光光的基板。曝光装置包括具有发射曝光光的发射面的光学部件; 基板保持装置，包括：可释放地保持基板的下表面的第一保持部;限定基板可以设置的孔的第一表面，并且在基板的上表面设置在基板的上表面的状态被保持在第一保持部分上，第一空间部分与衬底的上表面和第一表面之间的间隙连通; 驱动装置，其使所述基板保持装置在所述光学部件与所述基板的上表面和所述第一表面中的至少一个之间的液体形成有浸渍空间的状态下移动; 抽吸口，第一空间部分中的流体被吸入口; 以及控制装置，其将吸入口的吸引力设定在第一期间的至少一部分中，在该第一期间中，进行基板的曝光，使其小于吸入口的抽吸力，该第二期间为曝光的基板不被执行。

2. 发明申请

US20110102762A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20110102762A1
公开(公告)日：2011-05-05
申请号：US12911089
申请日：2010-10-25
申请人： Go ICHINOSE
发明人： Go ICHINOSE
IPC分类号： G03B27/58
CPC分类号： G03F7/70991
摘要： An exposure apparatus is equipped with a wafer stage which holds a wafer and to which one ends of flat tubes having flexibility that transmit the power usage for exposure between the wafer stage and a predetermined external device are connected and which is movable along an XY plane, and a tube carrier which is placed on one side of the wafer stage in an X-axis direction, to which the other ends of the flat tubes are connected, and which moves along the XY plane according to movement of the wafer stage and also moves to the other side in the X-axis direction when the wafer stage moves to the one side in the X-axis direction. Accordingly, the wafer stage hardly receives the drag (tensile force) from the flat tubes and outward protrusion of the flat tubes in the X-axis direction can be restrained.
摘要翻译：曝光装置配备有保持晶片的晶片台，并且连接具有柔性的扁平管的一端，所述柔性传输用于在晶片载台和预定的外部装置之间的曝光的功率使用，并且其可沿着XY平面移动，以及管架，其放置在X轴方向的一侧，扁平管的另一端连接到该支架上，并且根据晶片台的移动而沿着XY平面移动，并且还移动当晶片台沿X轴方向移动到一侧时，在X轴方向上的另一侧。因此，晶片台几乎不受到来自扁平管的阻力（拉伸力）的影响，并且能够抑制扁平管在X轴方向的向外突出。

3. 发明申请

US20110075120A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20110075120A1
公开(公告)日：2011-03-31
申请号：US12893075
申请日：2010-09-29
申请人： Go ICHINOSE
发明人： Go ICHINOSE
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F7/70766
摘要： A wafer stage is driven, based on positional information of a wafer stage measured using a measuring system and tilt information of the wafer stage. This allows the wafer stage to be driven with high precision, with the influence on the wafer stage when the wafer stage is tilted being reduced.
摘要翻译：基于使用测量系统测量的晶片台的位置信息和晶片台的倾斜信息来驱动晶片台。这允许以高精度驱动晶片台，当晶片台倾斜时对晶片台的影响减小。

4. 发明申请

US20110008717A1 EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20110008717A1
公开(公告)日：2011-01-13
申请号：US12818386
申请日：2010-06-18
申请人： Go ICHINOSE
发明人： Go ICHINOSE
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/709 , G03F7/70691 , G03F7/70725 , G03F7/70733 , G03F7/70766 , G03F7/70775 , G03F7/70825 , G03F7/7085 , G03F7/70975
摘要： Positional information of wafer stages is measured by a plurality of encoder heads, Z heads and the like that a measurement bar placed below surface has, using gratings placed on the lower surface of fine movement stages. Consequently, high-precision measurement of the positional information of the wafer stages can be performed. Further, since a guide surface of the wafer stages is formed by the two guide surface forming members placed side by side via a predetermined clearance, each guide surface forming member is easier to handle and also maintenance of the vicinity of the guide surface forming member is easier to perform, compared with the case where the guide surface forming members are integrated.
摘要翻译：通过放置在表面下方的测量棒的多个编码器头，Z头等测量晶片台的位置信息，其中使用放置在微动级的下表面上的光栅。因此，可以进行晶片台的位置信息的高精度测量。此外，由于通过预定间隙并排配置的两个引导面形成部件形成晶片台的引导面，所以各引导面形成部件易于处理，并且导向面形成部件附近的维护与引导表面形成构件一体化的情况相比，更容易执行。

5. 发明申请

US20110085150A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20110085150A1
公开(公告)日：2011-04-14
申请号：US12893239
申请日：2010-09-29
申请人： Go ICHINOSE
发明人： Go ICHINOSE
IPC分类号： G03B27/54
CPC分类号： G03F7/7075 , G03F7/707
摘要： A wafer is loaded on a wafer stage and unloaded from a wafer stage, using a chuck member which holds the wafer from above in a non-contact manner. Accordingly, members and the like to load/unload the wafer on/from the wafer stage do not have to be provided, which can keep the stage from increasing in size and weight. Further, by using the chuck member which holds the wafer from above in a non-contact manner, a thin, flexible wafer can be loaded onto the wafer stage as well as unloaded from the wafer stage without any problems.
摘要翻译：将晶片装载在晶片载物台上，并使用从非接触方式将晶片从上方保持的卡盘构件从晶片载物台卸载。因此，不需要提供将晶片装载/从晶片载物台上卸载的部件等，这可以使台架的尺寸和重量保持不变。此外，通过以不接触的方式使用从上方保持晶片的卡盘构件，可以将薄的柔性晶片加载到晶片台上，并且从晶片台卸载而没有任何问题。

6. 发明申请

US20110007325A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20110007325A1
公开(公告)日：2011-01-13
申请号：US12818579
申请日：2010-06-18
申请人： Go ICHINOSE
发明人： Go ICHINOSE
IPC分类号： G01B11/14
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70733 , G03F7/70775
摘要： When a liquid immersion area (liquid) formed on a wafer stage is moved onto another wafer stage, a fine movement stage position measuring system measures positional information of the wafer stage, interferometers of a coarse movement stage position measuring system measure positional information of the another wafer stage, and different interferometers measure positional information of the wafer stage. Based on these measurement results, the wafer stage and the another wafer stage are made to be in proximity to each other and are driven while the scrum state is maintained, and thereby the liquid immersion area (liquid) formed on the wafer stage can be moved onto the another wafer stage.
摘要翻译：当形成在晶片台上的液浸区域（液体）移动到另一个晶片台上时，微动台位置测量系统测量晶片台的位置信息，粗动位置测量系统的干涉仪测量另一晶片台的位置信息晶片台和不同的干涉仪测量晶片台的位置信息。基于这些测量结果，晶片台和另一个晶片台被制成彼此接近并且在保持Scrum状态的同时被驱动，从而可以使形成在晶片台上的液浸区域（液体）移动到另一个晶圆台上。

7. 发明申请

US20110007290A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20110007290A1
公开(公告)日：2011-01-13
申请号：US12818644
申请日：2010-06-18
申请人： Go ICHINOSE
发明人： Go ICHINOSE
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70825 , G03F7/7085
摘要： Positional information of each of wafer stages during exposure and during alignment is measured directly under a projection optical system and directly under a primary alignment system, respectively, by a plurality of encoder heads, Z heads and the like, which a measurement bar placed below surface plates has, using gratings placed on the lower surfaces of fine movement stages. Consequently, high-precision measurement of the positional information of the wafer stages can be performed.
摘要翻译：在曝光和对准期间每个晶片台的位置信息直接在投影光学系统下直接测量，并且分别通过多个编码器头，Z头等在基本对准系统下面，测量棒放置在表面下方使用放置在精细运动级的下表面上的光栅，因此，可以进行晶片台的位置信息的高精度测量。

8. 发明申请

US20110086315A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20110086315A1
公开(公告)日：2011-04-14
申请号：US12893053
申请日：2010-09-29
申请人： Go ICHINOSE
发明人： Go ICHINOSE
IPC分类号： G03F7/20 , G21G5/00 , G01B11/14
CPC分类号： G03F7/70758 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70775 , G03F7/70783
摘要： A first driving section and a second driving section apply a drive farce in an X-axis direction, a Y-axis direction, a Z-axis direction, and a θx direction, respectively, with respect to one end and the other end of a fine movement stage whose one end and the other end in the Y-axis direction are each supported, so that the fine movement stage is relatively movable with respect to a coarse movement stage within an XY plane. Accordingly, by the first and the second driving sections making drive forces in directions opposite to each other in a θx direction apply simultaneously to one end and the other end of the fine movement stage (refer to the black arrow in the drawing), the fine movement stage (and the wafer held by the stage) can be deformed to a concave shape or a convex shape within a YZ plane.
摘要翻译：第一驱动部和第二驱动部相对于一端和另一端分别施加X轴方向，Y轴方向，Z轴方向，＆amp; x方向的驱动力其一端和另一端在Y轴方向上各自支撑的精细运动台，使得微动台相对于XY平面内的粗移动台相对移动。因此，通过第一驱动部和第二驱动部在沿着相反方向的驱动力的同时向x方向施加微动台的一端和另一端（参照图中的黑色箭头）在YZ平面内，精细运动台（和由台架保持的晶片）可以变形为凹形或凸形。

9. 发明申请

US20110007295A1 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：可移动身体装置，曝光装置和装置制造方法
公开(公告)号：US20110007295A1
公开(公告)日：2011-01-13
申请号：US12818429
申请日：2010-06-18
申请人： Go ICHINOSE
发明人： Go ICHINOSE
IPC分类号： G03B27/58
CPC分类号： G03F7/70758 , G03F7/70725 , G03F7/70733 , G03F7/70766 , G03F7/70991
摘要： A stage device is equipped with a fine movement stage on which a wafer is mounted, a coarse movement stage formed into a frame shape that encloses the periphery of the fine movement stage, which supports the fine movement stage such that the fine movement stage is relatively movable and which is movable along an XY plane, a planar motor that drives the coarse movement stage in a predetermined range within the XY plane, and an actuator that drives the fine movement stage with respect to the coarse movement stage. Therefore, the size, in a direction perpendicular to the XY plane (height direction), of a movable body made up of the fine movement stage and the coarse movement stage can be reduced, compared with a wafer stage having a coarse/fine movement configuration in which the fine movement stage is mounted on the coarse movement stage.
摘要翻译：舞台装置配备有安装有晶片的精细动作台，形成为围绕微动台的周边的框架形状的粗移动台，其支撑微动载台，使得微动载台相对可移动并且能够沿着XY平面移动，将在XY平面内的预定范围内驱动粗移动台的平面马达以及相对于粗移动台驱动细移动台的致动器。因此，与具有粗/细移动构造的晶片台相比，可以减小由微动台和粗动台组成的可移动体垂直于XY平面（高度方向）的方向的尺寸其中精细运动级安装在粗动级上。

10. 发明申请

US20110200944A1 MANUFACTURING METHOD OF EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置制造方法及装置制造方法
公开(公告)号：US20110200944A1
公开(公告)日：2011-08-18
申请号：US13022922
申请日：2011-02-08
申请人： Go ICHINOSE
发明人： Go ICHINOSE
IPC分类号： G03F7/20 , B23Q3/00
CPC分类号： G03F7/70833 , G03F7/70825 , G03F7/70975 , Y10T29/49895
摘要： A manufacturing method of an exposure apparatus includes adjusting a positioning device that determines a positional relation at the time of docking between a body and a stage module such that a positional relation between an absolute reference surface of a metrology frame of the body and a stage position reference surface of the stage module becomes a desired relation. Accordingly, after that, only by docking the body and the stage module with each other via the positioning device, the positional relation between the absolute reference surface of the body and the stage position reference surface of the stage module becomes a desired relation.
摘要翻译：曝光装置的制造方法包括调整定位装置，该定位装置确定身体与舞台模块之间的对接时的位置关系，使得身体的计量框架的绝对基准面与舞台位置之间的位置关系舞台模块的参考表面成为期望的关系。因此，在此之后，仅通过定位装置将车体和车架组件相互对接，车身的绝对基准面与车架组件的车座位置基准面之间的位置关系成为期望的关系。

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