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1. 发明申请

US20120214290A1 SUBSTRATE HOLDER, PAIR OF SUBSTRATE HOLDERS, SUBSTRATE BONDING APPARATUS AND METHOD FOR MANUFACTURING DEVICES 审中-公开
标题翻译：基板支架，基板支架对，基板接合装置及制造装置的方法
公开(公告)号：US20120214290A1
公开(公告)日：2012-08-23
申请号：US13355247
申请日：2012-01-20
申请人： Isao Sugaya , Junichi Chonan , Hidehiro Maeda , Keiichi Tanaka , Tomoyuki Yasuda
发明人： Isao Sugaya , Junichi Chonan , Hidehiro Maeda , Keiichi Tanaka , Tomoyuki Yasuda
IPC分类号： H01L21/02 , H01L21/683
CPC分类号： H01L21/67092
摘要： Provided is a substrate holder pair comprising a first substrate holder that has a first holding portion holding a first substrate; a second substrate holder that has a second holding portion holding a second substrate to be bonded with the first substrate and that, together with the first substrate holder, sandwiches the first substrate and the second substrate; an engaging member that causes the first substrate holder to engage with the second substrate holder; and a dust inhibiting section inhibits dust generated by the engaging of the engaging member from entering between the first holding portion and the second holding portion.
摘要翻译：提供了一种衬底保持器对，其包括具有保持第一衬底的第一保持部分的第一衬底保持器; 第二基板保持器，具有保持与第一基板接合的第二基板的第二保持部，并且与第一基板保持件一起夹着第一基板和第二基板; 接合构件，其使所述第一基板保持件与所述第二基板保持器接合; 并且防尘部防止由接合构件的接合而产生的灰尘进入第一保持部和第二保持部之间。

2. 发明申请

US20120205024A1 SUBSTRATE HOLDER SYSTEM, SUBSTRATE HOLDER, FASTENING MECHANISM, SUBSTRATE BONDING APPARATUS AND METHOD FOR MANUFACTURING DEVICES 有权
标题翻译：基板支架系统，基板支架，紧固机构，基板接合装置及其制造方法
公开(公告)号：US20120205024A1
公开(公告)日：2012-08-16
申请号：US13354570
申请日：2012-01-20
申请人： Isao SUGAYA , Junichi CHONAN , Hidehiro MAEDA
发明人： Isao SUGAYA , Junichi CHONAN , Hidehiro MAEDA
IPC分类号： B29C65/78
CPC分类号： H01L21/67092 , H01L21/187 , H01L21/6831 , H01L21/6833 , Y10T156/10 , Y10T156/1744
摘要： Provided is a substrate holder system comprising a first substrate holder that holds a first substrate; an engaging member provided on the first substrate holder; a second substrate holder that holds a second substrate and can, together with the first substrate holder, sandwich the first substrate and the second substrate; an engagement receiving member that is provided on the second substrate holder and engages with the engaging member; and a dust restricting means for restricting generation of dust caused by the engagement of the engaging member and the engagement receiving member.
摘要翻译：提供了一种衬底保持器系统，其包括保持第一衬底的第一衬底保持器; 设置在所述第一基板保持器上的接合构件; 第二基板保持器，其保持第二基板，并且可以与第一基板保持器一起夹着第一基板和第二基板; 接合接收构件，其设置在所述第二基板保持器上并与所述接合构件接合; 以及用于限制由接合构件和接合接收构件的接合引起的灰尘产生的灰尘限制装置。

3. 发明授权

US09054140B2 Substrate holder system, substrate holder, fastening mechanism, substrate bonding apparatus and method for manufacturing devices 有权
标题翻译：基板固定器系统，基板支架，紧固机构，基板接合装置及其制造方法
公开(公告)号：US09054140B2
公开(公告)日：2015-06-09
申请号：US13354570
申请日：2012-01-20
申请人： Isao Sugaya , Junichi Chonan , Hidehiro Maeda
发明人： Isao Sugaya , Junichi Chonan , Hidehiro Maeda
IPC分类号： B29C65/78 , H01L21/67 , H01L21/18 , H01L21/683
CPC分类号： H01L21/67092 , H01L21/187 , H01L21/6831 , H01L21/6833 , Y10T156/10 , Y10T156/1744
摘要： Provided is a substrate holder system comprising a first substrate holder that holds a first substrate; an engaging member provided on the first substrate holder; a second substrate holder that holds a second substrate and can, together with the first substrate holder, sandwich the first substrate and the second substrate; an engagement receiving member that is provided on the second substrate holder and engages with the engaging member; and a dust restricting means for restricting generation of dust caused by the engagement of the engaging member and the engagement receiving member.
摘要翻译：提供了一种衬底保持器系统，其包括保持第一衬底的第一衬底保持器; 设置在所述第一基板保持器上的接合构件; 第二基板保持器，其保持第二基板，并且可以与第一基板保持器一起夹着第一基板和第二基板; 接合接收构件，其设置在所述第二基板保持器上并与所述接合构件接合; 以及用于限制由接合构件和接合接收构件的接合引起的灰尘产生的灰尘限制装置。

4. 发明申请

US20130057837A1 EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE-MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM 审中-公开
标题翻译：曝光装置，曝光方法，装置制造方法，程序和记录介质
公开(公告)号：US20130057837A1
公开(公告)日：2013-03-07
申请号：US13432717
申请日：2012-03-28
申请人： Go ICHINOSE , Junichi CHONAN , Yuichi SHIBAZAKI , Kenichi SHIRAISHI , Makoto Tokoro
发明人： Go ICHINOSE , Junichi CHONAN , Yuichi SHIBAZAKI , Kenichi SHIRAISHI , Makoto Tokoro
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An exposure apparatus capable of suppressing the occurrence of exposure defects is provided. The exposure apparatus exposes a substrate with exposure light via a liquid. The exposure apparatus includes an optical member having an emission surface from which exposure light is emitted; a substrate holding apparatus including a first holding portion that releasably holds the lower surface of the substrate, a first surface that defines an aperture in which the substrate can be disposed and that is disposed around the upper surface of the substrate in a state where the substrate is held on the first holding portion, and a first space portion that is in communication with a gap between the upper surface of the substrate and the first surface; a drive apparatus that moves the substrate holding apparatus in a state where an immersion space is formed with the liquid between the optical member and at least one of the upper surface of the substrate and the first surface; a suction port through which fluid in the first space portion is suctioned; and a control apparatus that sets a suction force of the suction port in at least a part of a first period in which exposure of the substrate is executed so as to be smaller than a suction force of the suction port in a second period in which exposure of the substrate is not executed.
摘要翻译：提供能够抑制曝光缺陷的发生的曝光装置。曝光装置通过液体曝光具有曝光光的基板。曝光装置包括具有发射曝光光的发射面的光学部件; 基板保持装置，包括：可释放地保持基板的下表面的第一保持部;限定基板可以设置的孔的第一表面，并且在基板的上表面设置在基板的上表面的状态被保持在第一保持部分上，第一空间部分与衬底的上表面和第一表面之间的间隙连通; 驱动装置，其使所述基板保持装置在所述光学部件与所述基板的上表面和所述第一表面中的至少一个之间的液体形成有浸渍空间的状态下移动; 抽吸口，第一空间部分中的流体被吸入口; 以及控制装置，其将吸入口的吸引力设定在第一期间的至少一部分中，在该第一期间中，进行基板的曝光，使其小于吸入口的抽吸力，该第二期间为曝光的基板不被执行。

5. 发明授权

US09041902B2 Exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US09041902B2
公开(公告)日：2015-05-26
申请号：US13228032
申请日：2011-09-08
申请人： Junichi Chonan
发明人： Junichi Chonan
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An exposure apparatus exposes a substrate with exposure light via a liquid. The exposure apparatus includes an optical system including an emission surface from which the exposure light is emitted; a liquid supply port that supplies the liquid in order to fill an optical path of the exposure light emitted from the emission surface with the liquid; and a fluid supply port that supplies a fluid including a material capable of changing the specific resistance of the liquid to at least a part of a space around a liquid immersion space that is formed by the liquid.
摘要翻译：曝光装置通过液体曝光具有曝光光的基板。曝光装置包括：光学系统，包括发射曝光的发光面; 液体供给口，其供给液体，以填充由所述液体从所述排放表面发射的所述曝光光的光路; 以及流体供给口，其将包括能够将液体的比电阻变化的材料的液体供给到由液体形成的液浸空间周围的空间的至少一部分。

6. 发明申请

US20120062860A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20120062860A1
公开(公告)日：2012-03-15
申请号：US13228032
申请日：2011-09-08
申请人： Junichi CHONAN
发明人： Junichi CHONAN
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An exposure apparatus exposes a substrate with exposure light via a liquid. The exposure apparatus includes an optical system including an emission surface from which the exposure light is emitted; a liquid supply port that supplies the liquid in order to fill an optical path of the exposure light emitted from the emission surface with the liquid; and a fluid supply port that supplies a fluid including a material capable of changing the specific resistance of the liquid to at least a part of a space around a liquid immersion space that is formed by the liquid.
摘要翻译：曝光装置通过液体曝光具有曝光光的基板。曝光装置包括：光学系统，包括发射曝光的发光面; 液体供给口，其供给液体，以填充由所述液体从所述排放表面发射的所述曝光光的光路; 以及流体供给口，其将包括能够将液体的比电阻变化的材料的液体供给到由液体形成的液浸空间周围的空间的至少一部分。

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